Abstract: The present application relates to a Lactobacillus paracasei or progeny thereof. Specifically, the present application relates to Lactobacillus paracasei 207-27 and a composition, culture, food product or dietary supplement containing the same. The present application also relates to the use of Lactobacillus paracasei 207-27 and the composition, culture, food product or dietary supplement containing the same in medicine.

Abstract: The present invention relates to a window-type dust collecting apparatus for effectively shielding inflow of fine dust according to external environmental factors on the basis of artificial intelligence. The window-type dust collecting apparatus according to the present invention adjusts the intensity of electric power applied to a dust collector according to the wind speed or the fine dust concentration measured by a sensor so as to optimize the electric power required for shielding the fine dust.

Abstract: A punch item management tool may be provided that coordinates and guides the process of taking a punch item from creation to completion. As one possibility, the punch item management tool may coordinate and guide the interactions between a creator of a punch item, a punch item manager for the punch item, and one or more assignees that are expected to perform work on the punch item. As another possibility, the punch item management tool may coordinate and guide the interactions between an individual serving the dual role of creator and punch item manager for a punch item and one or more assignees that are expected to perform work on the punch item. In either case, the punch item management tool may provide a user interface including various views through which these individuals may interact with one or more punch items.

Abstract: A method of forming a semiconductor device includes: forming, in a first device region of the semiconductor device, first nanostructures over a first fin that protrudes above a substrate; forming, in a second device region of the semiconductor device, second nanostructures over a second fin that protrudes above the substrate, where the first and the second nanostructures include a semiconductor material and extend parallel to an upper surface of the substrate; forming a dielectric material around the first and the second nanostructures; forming a first hard mask layer in the first device region around the first nanostructures and in the second device region around the second nanostructures; removing the first hard mask layer from the second device region after forming the first hard mask layer; and after removing the first hard mask layer, increasing a first thickness of the dielectric material around the second nanostructures by performing an oxidization process.

Abstract: Examples of the present technology include semiconductor processing methods to form diffusion barriers for germanium in a semiconductor structure. The methods may include forming a semiconductor layer stack from pairs of Si-and-SiGe layers. The Si-and-SiGe layer pairs may be formed by forming a silicon layer, and then forming the germanium barrier layer of the silicon layer. In some embodiments, the germanium-barrier layer may be less than or about 20 ?. A silicon-germanium layer may be formed on the germanium-barrier layer to complete the formation of the Si-and-SiGe layer pair. In some embodiments, the silicon layer may be an amorphous silicon layer, and the SiGe layer may be characterized by greater than or about 5 atom % germanium. Examples of the present technology also include semiconductor structures that include a silicon-germanium layer, a germanium-barrier layer, and a silicon layer.

Abstract: An example of a system for use in collecting fluid from a gas stream includes one or more collection panels and a frame for arranging the panel(s). Each of the collection panel(s) may comprise an emitter electrode assembly member, comprising one or more emitter electrodes, physically attached to an electrically insulated from a fluid collection member comprising one or more collection electrodes. The frame may be sized and shaped to be disposed near a gas outlet or a duct. An example of a method for collecting fluid from a gas stream includes providing the collection panel(s) disposed in a path of the gas stream; providing the gas stream; generating and maintaining a voltage at the one or more emitter electrodes of each of the collection panel(s); and collecting an amount of the fluid from the gas stream with the one or more collection panels.

Abstract: A food product is coated by applying a first coating to an exterior of the food product with a first depositor. Next, the food product is located in a dough proofer. Then, a second coating is applied to the exterior of the food product with a second depositor. Afterwards, the food product is baked in an oven. Optionally, prior to applying the first coating, a tacking agent is applied to the exterior of the food product with a third depositor. In a preferred embodiment, multiple coatings of a combination sugar and cinnamon are applied to filled dough products.

Abstract: Provided is an enzymatic process that hydrolyzes celery plant material to form a salt-enhancing ingredient, the formed salt-enhancing ingredient, food products comprising said salt-enhancing ingredient and a method of enhancing the salty taste of food products.

Abstract: This disclosure provides a highly concentrated protein composition and the processes of making the same. The compositions are shelf-stable, easy to use and have excellent nutritional values as compared to other protein products. The compositions may be prepared from animal sources, such as chickens or turkeys.

Abstract: Singulated integrated circuit (IC) dice are provided. The singulated IC dice are positioned on dicing tape to provide open space between sides of adjacent singulated IC dice. An underfill layer and a protective cover film is disposed above the singulated IC dice and the open space between the sides of the adjacent singulated IC dice. The underfill layer and the protective cover film include one or more photodefinable materials. An exposure operation is performed to produce a pattern on the underfill layer and the protective cover film. Based on the pattern, the underfill layer and the protective cover film is removed at areas above the open space between the sides of the adjacent singulated IC dice to create portions of the underfill layer and portions of the protective cover film that are disposed above the singulated IC dice.

Abstract: An air purification system for purifying atmospheric air has an ionization chamber that includes a needle arrangement. The needles create a dense and strong electric field when a high voltage is passed to them by the effect of dual charge ionization due to which the suspended particles in the polluted air get clumped together and fall. The second invention is an air monitoring system facilitating a two-way communication with external information sources. It contains gas sensors comprising of an ambient noise sensor, temperature and humidity sensor, and sensors to measure the amount of oxides of nitrogen, Sulphur, carbon and size of suspended particles in the air. The third invention is a theft protection module for the safe keeping of an air purification system.

Abstract: A method for workforce scheduling by a computer system is provided. The method includes receiving a first workforce schedule describing initial assignments of a plurality of workers to a plurality of shifts, each shift comprising one or more work activities, each work activity comprising an activity and a time interval, and storing the first workforce schedule in a memory. The method also includes receiving a cell size associated with each activity, and determining a quantity of workers in each work activity associated with each activity in the first workforce schedule. The method further includes determining cell size violations by dividing the quantity of workers assigned to each work activity by the cell size for the activity associated with the work activity. The method also includes modifying the first workforce schedule to minimize cell size violations, resulting in a second workforce schedule, and storing the second workforce schedule in the memory.

Abstract: A method of manufacturing a display device, the method including providing a substrate, forming a first electrode, a second electrode spaced from the first electrode and in a same plane as the first electrode, a first alignment line connected to the first electrode, and a second alignment line connected to the second electrode on the substrate, self-aligning the plurality of light emitting elements by providing a solution containing a plurality of light emitting elements on the substrate, removing the first alignment line and the second alignment line from the substrate on which the plurality of light emitting elements are self-aligned, forming a first contact electrode electrically connecting one end of each light emitting element to the first electrode, and forming a second contact electrode electrically connecting an other end of each light emitting element to the second electrode.

Abstract: Methods for protecting edges of semiconductor dies are disclosed. Further, the disclosed methods provide for separating the semiconductor dies without using a dicing technique. In one embodiment, a plurality of trenches may be formed on a front side of a substrate including a plurality of semiconductor dies. Individual trenches may correspond to scribe lines of the substrate where each trench includes a depth greater than a final thickness of the semiconductor dies. A dielectric layer may be formed on sidewalls of the trenches, thereby protecting the edges of the semiconductor dies, prior to filling the trenches with an adhesive material. Subsequently, the substrate may be thinned from a back side such that the adhesive material in the trenches may be exposed from the back side. The adhesive material may be removed to singulate individual semiconductor dies of the plurality from the substrate.

Abstract: This application relates to an electrostatic precipitator with an electromagnetic wave tube comprising a carbon nanotube (CNT)-based emitter. The electrostatic precipitator includes a charger configured to include the CNT-based emitter and ionize microparticles, in contaminated air introduced from the environment, by emitting an electromagnetic wave. The electrostatic precipitator further includes a collector configured to collect the ionized microparticles to discharge clean air.

Abstract: The present disclosure provide a method for using a hard mask layer on a top surface of fin structures to form a fin-top mask layer. The fin-top mask layer can function as an etch stop for subsequent processes. Using the fin-top hard mask layer allows a thinner conformal dielectric layer to be used to protect semiconductor fins during the subsequent process, such as during etching of sacrificial gate electrode layer. Using a thinner conformal dielectric layer can reduce the pitch of fins, particularly for input/output devices.

Abstract: The described method enables removal of any flexible material from a temporary carrier for transfer to another surface. In particular, a semiconductor wafer is commonly held by a temporary adhesive to a carrier substrate for support during a variety of processing steps, including thinning of the semiconductor device layer. Subsequent to processing, the described method attaches the ultra-thin device layer to a roll of tape for removal from the temporary adhesive, followed by transfer to a demount roller, which then releases it onto a desired permanent surface. Utilizing the flexible nature of the ultra-thin device layer, the sequence of rollers is able to peel it from the temporary adhesive without any need for laser release processing or chemical adhesive removal while maintaining the thinned wafer in a planar form during processing. This transfer supports operations that include a change of orientation, such as from face up to face down.

Abstract: An embodiment includes extracting a capability from a dataset representative of a project description of a proposed project using a first machine learning process to form a cluster representative of the capability. The embodiment assigns the capability to a first node of a business operations graph based on a classification result of the capability by a second machine learning process. The embodiment generates a visual indicator based, at least in part, on the assigning of the capability to the first node. The embodiment generates the visual indicator by a process comprising generating a first visual indicator of the capability being assigned to the first node, and a second visual indicator of a development sequence for the capability relative to another capability from the project description based at least in part on an association from the business operations graph between the first node and a second node of the graph.

Abstract: A grill guard assembly has a vehicle coupling portion mounted to the vehicle forwardly of the vehicle grill. A hinge couples a coupling portion of a grill guard frame on the vehicle coupling portion to pivot between a working position extending primarily upwardly and a lowered position extending primarily forwardly. A latch assembly has a clamping surface and a clamping jaw supported on opposing ones of the vehicle coupling portion and the grill guard coupling portion. An over-center linkage operatively connects the clamping jaw to the respective coupling portion and the second coupling portion such that the linkage is rotated through an over-center position between open and closed positions of the jaw, whereby the clamping force of the jaw acts to urge the jaw to remain closed.

Abstract: Embodiments of the present disclosure provide a method of forming N-type and P-type source/drain features using one patterned mask and one self-aligned mask to increase windows of error tolerance and provide flexibilities for source/drain features of various shapes and/or volumes. In some embodiments, after forming a first type of source/drain features, a self-aligned mask layer is formed over the first type of source/drain features without using photolithography process, thus, avoid damaging the first type of source/drain features in the patterning process.