Abstract: A method for synthesizing 4-hydroxy-3,5-diiodobenzyl alcohol. The synthesis method includes, in just one step, the synthesis of 4-hydroxy-3,5-diiodobenzyl alcohol from 4-hydroxybenzylalcohol, in an aqueous medium at an initial pH of at least 7, containing at least 2 equivalents of diiodide. The method is simple and makes it possible to achieve very good yields at a lower cost.
Abstract: The system includes information and data from analysis systems about optimal window covering positions that is communicated to building occupants. The analysis system communicates information to the occupant via the occupant's client computer to allow the occupant to fully or partially adjust the position of a manual shade or motorized shade, without the need for the analysis system to fully or partially electronically control the shades. The system may also adjust window covering systems and other systems to ensure desired or optimal daylight exposure in order promote optimal circadian functionality in the occupants.
Type:
Grant
Filed:
March 5, 2021
Date of Patent:
November 21, 2023
Assignee:
MECHOSHADE SYSTEMS, LLC
Inventors:
Stephen P. Hebeisen, Eugene Miroshnichenko, Xi Ming Liarno
Abstract: It is an object of the present invention to reduce the amount of data used in an apparatus, a system, and a method for performing a substrate processing. In order to achieve this object, a substrate processing apparatus includes one or more processing units each for performing a processing on a substrate and one or more arithmetic processing parts. One or more arithmetic processing parts generate a flow recipe defining a flow of a series of processings for a substrate by combining two or more processing recipes among a plurality of processing recipes each defining a processing condition relating to a processing to be performed on a substrate in the one or more processing units. The plurality of processing recipes include a plurality of liquid processing recipes each defining a condition of a processing to be performed on a substrate by using a processing liquid.
Type:
Grant
Filed:
September 6, 2019
Date of Patent:
November 21, 2023
Assignee:
SCREEN Holdings Co., Ltd.
Inventors:
Koji Hashimoto, Shinji Shimizu, Hiroshi Horiguchi, Masahiro Yamamoto
Abstract: A substrate processing system includes manufacturing process equipment including a plurality of process chambers and a control server configured to control the manufacturing process equipment. When a transporting order of semiconductor substrates is transmitted from the control server to the manufacturing process equipment, the control server provides, to the manufacturing process equipment performing an Nth process cycle (where N is a natural number) in a first transporting order, a command to switch to a second transporting order from an N+1th process cycle immediately when a restriction on at least one process chamber, into which insertion of the semiconductor substrate is restricted, is lifted.
Type:
Grant
Filed:
August 5, 2021
Date of Patent:
November 21, 2023
Inventors:
Eungjin Kim, Pyongil Cho, Hyeonjun Jeon, Kyoungho Kim