Abstract: A method and system for designing a photomask. The method provides a single machine methodology for inspecting photomasks having regions that repeat and regions that do not repeat. The method includes generating a chip dataset representing an integrated circuit chip design to be included in a cell region of a photomask, generating a kerf dataset to be included in the cell region, generating a kerf copy dataset, and merging the chip dataset, the kerf dataset and the kerf copy dataset into a photomask dataset representing a pattern of clear and opaque regions of the photomask.

Abstract: A method of forming a photomask includes providing a layout of design patterns, setting an optical proximity correction (OPC) with respect to the layout of design patterns, and forming a layout of correction patterns with respect to the layout of design patterns by using the set OPC. The method also includes collecting verification data about the layout of correction patterns by using a layout of contour patterns based on the layout of correction patterns, and verifying whether the layout of design patterns and the layout of correction patterns are substantially identical to each other by using the verification data.

Abstract: A computer-implemented method for performing a layout extraction for a multi-fingered semiconductor device is disclosed. The method reduces the netlist for the device and the number of device fingers by identifying a set of device common nodes, and combining a plurality of parasitic elements in the device to form a set of representative parasitic elements which are connected to respective device common nodes. In one embodiment, the method includes combining the parasitic elements of at least one device common node into a single representative parasitic element which is representative of the original parasitic elements.

Abstract: A computer-readable, non-transitory medium stores therein a verification support program that causes a computer to execute a procedure. The procedure includes first detecting a state change in a circuit and occurring when input data is given to the circuit. The procedure also includes second detecting a state change in the circuit and occurring when the input data partially altered is given to the circuit. The procedure further includes determining whether a difference exists between a series of state changes detected at the first detecting and a series of state changes detected at the second detecting. The procedure also includes outputting a determination result obtained at the determining.

Abstract: A method for designing an optimal wiring topology for electromigration avoidance is disclosed. The wiring topology includes multiple sources, multiple sinks and multiple wires. The method includes the following steps: A feasible wire, a wire of the shortest length connecting each pair of source and sink, is calculated, and the capacity of each feasible wire is decided. An initial feasible topology is found. A flow network is created based on the initial topology. Negative cycles are iteratively checked and removed until no more negative cycles.

Abstract: A mechanism is provided for verifying a register-transfer level design of an execution unit. A set of instruction records associated with a test case are generated and stored in a buffer. For each instruction record in the set of instruction records associated with the test case: the instruction record is retrieved from the buffer and sent to both a reference model and an execution unit in the data processing system. Separately, the reference model and the execution unit execute the instruction record and send results of the execution of the instruction record to a result checker in the data processing system. The result checker compares the two results and, responsive to a mismatch in the results, a failure of the test case is indicted, the verification of the test case is stopped, and all data associated with the test case is output from the buffer for analysis.

Abstract: In a method for verifying a printed circuit board (PCB) layout using a computing device, a PCB simulation file is obtained from a storage device of the computing device, and a PCB image is displayed on a display device according to the PCB simulation file. The PCB image includes multiple signal lines and switching voltage regulator nodes (SVRN). A SVRN to be checked is selected from the PCB image, and all signal lines around the SVRN are searched. The method calculates a layout distance between the selected SVRN and each of the searched signal lines, and generates a graphical window interface to position a signal line whose layout distance is equal to or less than the minimum distance. The method further modifies the layout of the positioned signal line to satisfy a layout design specification by increasing the layout distance to the minimum distance.

Abstract: Methods, apparatuses, and computer program products are disclosed for controlling plating stub reflections in a chip package. In one embodiment, a resonance optimizer determines performance characteristics of a bond wire that connects a chip to a substrate of a semiconductor chip mount. In this embodiment, the resonance optimizer selects, based on the performance characteristics of the bond wire, a line width for an open-ended plating stub that extends from a signal interconnect of the substrate to a periphery of the substrate, The resonance optimizer also generates a design of signal traces for the substrate, where the signal traces include the open-ended plating stub with the selected line width.

Abstract: A method and system for subnet defect diagnostics through fault compositing is disclosed. A testing apparatus generates callout data for an integrated circuit device under test. A computer received the callout data, which includes a list of faults. Each fault of the list of faults has associated with it one or more failures and/or conflicts. In order to explain the failures, two or more faults are selected and composited, yielding a composite fault having a composite conflict count. The composite fault is assigned a score based on the composite conflict count, which score determines a candidate composite that best explains the faults of the list of faults. This procedure may be repeated to explain all the failures.

Abstract: A mechanism is provided for reducing through process delay variation in metal wires by layout retargeting. The mechanism performs initial retargeting, decomposition, and resolution enhancement techniques. For example, the mechanism may perform optical proximity correction. The mechanism then performs lithographic simulation and optical rules checking. The mechanism provides retargeting rules developed based on coupling lithography simulation and resistance/capacitance (RC) extraction. The mechanism performs RC extraction to capture non-linear dependency of RC on design shape dimensions. If the electrical properties in the lithographic simulation are within predefined specifications, the mechanism accepts the retargeting rules; however, if the electrical properties from RC extraction are outside the predefined specifications, the mechanism modifies the retargeting rules and repeats resolution enhancement techniques.

Abstract: One embodiment provides a method for protecting an integrated circuit chip design. The method can include storing in memory a circuit description of an integrated circuit core comprising a set of nodes and selecting a plurality of modification nodes from the set of nodes. A sequential structure can be inserted into the circuit description to provide a modified circuit description, the sequential structure utilizing the plurality of modification nodes as inputs. The modified circuit description can be stored in memory.

Abstract: Described embodiments relate to methods, systems and computer readable medium for developing a system architecture. Resources constraints are defined, where each resource constraint corresponds to a maximum number of a each kind of resources available to construct the system architecture. Constraint values for each of at least three optimization parameters are defined, which includes a final optimization parameter. A design space is defined as a plurality of vectors representing different combinations of a number of each kind of resource available to construct the system architecture. For each of the plurality of optimization parameters, a priority factor function is defined. A plurality of satisfying sets of vectors is determined for each of the optimization parameters except for the final optimization parameter. A set of vectors is determined based on an intersection of the plurality of satisfying sets of vectors for the optimization parameters.

Abstract: Systems and methods for testing a component by using encapsulation are described. The systems and methods facilitate communication between two components that use two different languages in a test environment. Such communication is allowed by encapsulating an identifier of a function to create a call message, encapsulating an identifier of an event to create an event message, or encapsulating an identifier of the function to create a return message.

Abstract: The timing cycles in a circuit design are identified and cut such that timing constraint paths in the circuit design are preserved. Timing cycles in the circuit design may be identified by traversing an adjacency list data structure, in which elements of the circuit design are represented as vertices interconnected by edges. Timing constraint paths may be distinguished from false timing paths using timing analysis, such as a greatest common path heuristic. Timing constraint paths may be marked as “constrained” to prevent these paths from being cut. With the cycles and timing constraint paths identified, cuts may be selected that cut the identified timing cycles while preserving the timing constraint paths. The cycle cuts allow the circuit design to be correctly processed within a conventional CAD tool design flow.

Abstract: An apparatus and method may be used for compiling a hardware logic design into data-driven logic programs to be executed on a data-driven chip. The apparatus may include storage with a library for defining a net-list synthesized by a synthesis tool. The apparatus may also include a data-driven logic verification chip comprising a plurality of logic processors. The apparatus may further include a code generator for adopting heuristics to convert the net-list into data driven logic programs and for allocating hardware resources to balance computing and storage loads across the plurality of logic processors of the verification chip.

Abstract: An integrated circuit design apparatus includes a macro signal terminal position determination unit that determines temporary arrangement positions of a scan-in terminal and a scan-out terminal of each of a number of macros. The unit updates layout information of an integrated circuit based on the temporary arrangement positions. The apparatus includes an initial scan path route determination unit that updates scan path connection information, such that one of the macros arranged in a closest distance is connected in turn starting with a scan-in external terminal, with reference to the updated layout information and the scan path connection information. The apparatus include a scan path re-routing unit that determines a scan path connection order, such that a scan path total wiring length becomes shortest, with reference to the updated layout information and the updated scan path connection information. This unit updates the scan path connection information based on this determined order.

Abstract: A method and system checks a double patterning layout and outputs a representation of G0-rule violations and critical G0-spaces. The method includes receiving layout data having patterns, determining whether each distance between adjacent pattern elements is a G0-space, find all G0-space forming a G0-rule violation, finding all G0-space that are critical G0-spaces, and outputting a representation of G0-rule violations and critical G0-spaces to an output device. By resolving G0-rule violations and critical G0-spaces, a design checker can effectively generate a double patterning technology (DPT) compliant layout.

Abstract: In a method of designing a double patterning mask set, a chip is first divided into a grid that includes grid cells. A metal layer of the chip is laid out. In substantially each of the grid cells, all left-boundary patterns of the metal layer are assigned with a first indicator, and all right-boundary patterns of the metal layer are assigned with a second indicator. Starting from one of the grid cells in a row, indicator changes are propagated throughout the row. All patterns in the grid cells are transferred to the double patterning mask set. All patterns assigned with the first indicator are transferred to a first mask of the double patterning mask set, and all patterns assigned with the second indicator transferred to a second mask of the double patterning mask set.

Abstract: A method, system and computer program product are provided for implementing spare latch placement quality (SLPQ) determination in a floor plan design of an integrated circuit chip. A spare latch placement quality (SLPQ) metric data function is defined and compared to a spare latch placement input with a series of calculations performed. The spare latch placement quality (SLPQ) determination is made based upon the compared SLPQ metric data function and the spare latch placement input. Then associated reports including textual and visual reports are generated responsive to the SLPQ determination. In addition, a new spare latch placement can be constructed with an algorithm responsive to the SLPQ determination.

Abstract: A routing system is improved by performing three steps sequentially to complete an execution process. The first step estimates a normalized criticality score for each design net. The second step arranges the scores for each design net in descending order. Third step rips up and reroutes the design so as to make it more feasible.