Abstract: A cleaning device includes a handle having a longitudinal axis and a wiper connected to the handle. The wiper includes a plurality of ridges arranged along the longitudinal axis to form a hollow member. The plurality of ridges have a plurality of contact surfaces for contacting a surface to be cleaned.

Abstract: A cleaning method includes (A) and (B) described below. (A) A first processing liquid is supplied to a central portion of a top surface of a substrate from a first nozzle and, also, a second processing liquid is supplied to a periphery of the top surface of the substrate from a second nozzle in a state that the substrate is horizontally held inside a cup and the substrate is rotated in a first direction about a vertical rotation shaft. (B) During a discharge of the second processing liquid by the second nozzle, the second nozzle is moved in a diametrical direction of the substrate between a first position where a discharge line of the second nozzle touches the periphery of the top surface of the substrate and a second position where the discharge line of the second nozzle deviates from the substrate.

Abstract: A cleaning device includes: a substrate rotation mechanism that holds and rotates a substrate around center axis thereof; a first single-tube nozzle that discharges first cleaning liquid toward a top surface of the substrate; and a second single-tube nozzle that discharges second cleaning liquid toward the top surface of the substrate. The first single-tube nozzle and the second single-tube nozzle are disposed such that the second single-tube nozzle discharges the second cleaning liquid in a forward direction of a rotation direction of the substrate at a position farther away from the center of the substrate than a landing position of the first cleaning liquid, and a part is generated in which liquid flow on the top surface of the substrate after landing of the first cleaning liquid and liquid flow on the top surface of the substrate after landing of the second cleaning liquid are combined.

Abstract: The present invention provides a refillable container (1) for use with a nebulizer device having an aerosol generator comprising a transducer body and a membrane having pores, the container having an opening being fillable with a cleaning liquid (3), wherein the opening is sized and shaped to fit onto the transducer body, so that the container is held in place on the nebulizer device and the membrane is immersed in the liquid inside the container. The invention also provides a pack comprising a multi-day supply of a drug, one or more cleaning liquids and one or more containers; and a method for cleaning the membrane of a nebulizer device using the container.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprising: a treating vessel including an outer cup and an inner cup placed in an inner side of the outer cup, the inner cup and the outer cup in combination defining a recollecting route for a recollecting a liquid; a rotatable spin head placed within the treating vessel on which a cleaning jig is placed; wherein the treating vessel comprises a first protrusion protruding from an inner side surface of the outer cup to direct a cleaning liquid scattering from the cleaning jig toward a surface of the inner cup.

Abstract: A system and method are disclosed for removal of unwanted material from additively manufactured parts by application of vibratory and/or acoustic energy. The system and method include a vibratory platform located in a chamber. Additively manufactured parts having unwanted material adhered thereto are placed on the vibratory platform. The platform is caused to vibrate thereby causing the unwanted material to detach from the parts. The system and method may also include the application of acoustic energy to cause unwanted material to detach from the parts. Advantageously, the unwanted material removed from the additively manufactured object can be recycled.

Abstract: An adjustment device, an air duct structure, an exhaust system, a dishwasher, and a method for controlling the dishwasher are provided. The adjustment device is applied in an exhaust system. The exhaust system has an exhaust channel with a second air inlet and a first air inlet. The adjustment device includes an adjustment mechanism and a controller. The adjustment mechanism is configured to, under control of the controller, respectively adjust a flow rate of a first gas entering the exhaust channel through the first air inlet and a flow rate of a second gas entering the exhaust channel through the second air inlet, to control a ratio of the first gas entering the exhaust channel to the second gas entering the exhaust channel. Humidity of the second gas is lower than humidity of the first gas.

Abstract: A device for cleaning an end face of an optical fiber may receive a first pressure signal from a first pressure sensor, wherein the device includes a pneumatic circuit, wherein the pneumatic circuit includes: one or more circuit components, the first pressure sensor, and a second pressure sensor. The device may receive a second pressure signal from the second pressure sensor. The device may determine, based on the first pressure signal and the second pressure signal, whether a pressure difference across a circuit component, of the one or more circuit components, satisfies a threshold. The device may perform, based on the pressure difference across the circuit component not satisfying the threshold, one or more actions.

Abstract: Cleaning equipment for an EUV wafer chuck or clamp, which removes particles that have accumulated between burls on the surface of the wafer chuck. The equipment includes a spinning bi-polar electrode placed in proximity to the surface, which can attract and adsorb the charged particle residue therefrom using its generated symmetric electric field when the wafer chuck is not in use.

Abstract: A substrate processing method that includes a processing liquid supplying step which supplies a processing liquid to a surface of a substrate, a processing film forming step in which the processing liquid on the surface of the substrate is solidified or cured to form a processing film that holds removal objects present on the surface of the substrate, and a removing step in which a removing liquid is supplied to the surface of the substrate to thereby remove the processing film from the surface of the substrate in a state that the removal objects are held by the processing film. The processing liquid contains a dissolution component which dissolves at least one of a front layer of the substrate and the removal objects as a dissolution object. The processing liquid supplying step includes a dissolution step which partially dissolves the dissolution object by the dissolution component in the processing liquid supplied to the surface of the substrate.

Abstract: A cleaning device (100) for cleaning fiber optic end faces comprises a dispensing nozzle (104) configured to discharge a jet column (118) generated by the Coanda effect with intermittent injection of a cleaning solvent into the jet column (118). The method comprises impinging the jet column (118) onto a fiber optic end face (120) while maintaining a stand-off distance from the end face being cleaned.

Abstract: A washing device comprises a manifold dispenser comprising at least one liquid input and a plurality of liquid outputs that operably direct fluid to contact a plurality of laboratory consumables held by a rack in the washing device. A number of the plurality of liquid outputs being at least equal to a number of the plurality of laboratory consumables such that each liquid output of the plurality of liquid outputs operably directs the liquid at a corresponding laboratory consumable of the plurality of laboratory consumables.

Abstract: A dish washer includes a cabinet; a tub in the cabinet; a sump underneath the tub; a case brake on a side wall of the tub and connected to the sump; a water supply valve connected to an external water supply source; a filter assembly between the water supply valve and the case brake and including a plurality of flow path valves to open or close a plurality of flow paths corresponding to the plurality of flow path valves to guide water supplied from the external water supply source to the case brake; and a processor configured to open the water supply valve and one of the plurality of flow path valves at different points in time to start supplying the water and close the water supply valve and the one of the plurality of flow path valves at different points in time to stop the supplying of the water.

Abstract: An apparatus and method for removing support material from and/or smoothing surfaces of an additively manufactured part (the “AM part”) is disclosed. The apparatus may include a chamber, a support surface within the chamber, one or more nozzles within the chamber, a tank positioned below the nozzles, and a diverter positioned between the nozzles and the tank. The support surface may be configured to support the AM part and may have one or more openings configured to allow the fluid to pass through the opening(s). The nozzles may be configured to spray a fluid at the AM part, and the spray may be an atomized or semiatomized spray of the fluid. The diverter comprises an umbrella or a diverter shield and diverts sprayed fluid from directly impacting the fluid being collected in the tank, whereby foaming of the fluid in the tank is reduced.

Abstract: A substrate processing apparatus configured to process a combined substrate in which a first substrate having thereon a device layer and a second substrate are bonded to each other includes a holder configured to hold a rear surface of the second substrate; a processing unit configured to process the first substrate held by the holder; a first processing liquid supply configured to etch a front surface of the first substrate by supplying a first processing liquid to the front surface of the first substrate opposite to a surface thereof where the device layer is provided; and a second processing liquid supply configured to remove a metal contaminant on the rear surface of the second substrate by supplying a second processing liquid to the rear surface of the second substrate.

Abstract: There is described a method of monitoring the cleaning of hospital environments, the hospital environment comprising at least an item disposed inside thereof, wherein the method comprises the steps of: generating a statement of events of the hospital environment, the statement of events related to the occurrence of at least a touch between at least a passer-by of the hospital environment with one of the items disposed in the hospital environment, and performing the cleaning action of the hospital environment based on the statement of events generated. A system of monitoring the cleaning of hospital environments is also described.

Abstract: This disclosure provides a wafer processing method having the following steps: providing a wafer (10), an immersion device (100), a carrier (200), and a spray device (300); turning the wafer (10) from a horizontal manner to an upright manner; upright placing the wafer (10) into the immersion device (100) for immersion; taking the wafer (10) out from the immersion device (100) and placing that onto the carrier (200) horizontally; spraying a liquid on the wafer (10) by the spray device (300); rinsing the wafer (10); rotating the carrier (200) to dry the wafer (10). Multiple steps for processing the wafer (10) may be performed on the same carrier (200) to accelerate the process.

Abstract: A system comprises an imager having a lens; a housing supporting the imager and defining an inlet opening; a moveable vent cover configured to move between a first position and a second position; and a channel defined by a portion of the housing, the moveable vent cover, and a diverter, the channel configured to selectively direct an incoming fluid from the inlet opening defined by the moveable vent cover in the open position and the housing toward the lens. The system may further comprise a lens cover supported by the housing; the lens cover disposed to at least partially cover the lens.

Abstract: A cleaning device for cleaning a filter arrangement which has a first fluid connection, a second fluid connection, and a filter assembly between the first and second fluid connections and which has a surface to which contaminants can adhere. A generator device for generating a gas-fluid mixture includes a receiving chamber for receiving a fluid, and a pressurized gas generating device. A first pipe assembly is connected to the generator device so that the gas-fluid mixture can be provided under pressure into the filter arrangement. A second pipe assembly is connectable to the second fluid connection and a collection device. The collection device collects the gas-fluid mixture and contaminants entrained from the filter arrangement. The first pipe assembly has a deflection pipe section which allows the receiving chamber to be filled with fluid without fluid entering the filter arrangement before the gas-fluid mixture is generated.

Abstract: A modular power washer contains a power washing system (10), containing a base unit (20) and an accessory unit (34), wherein the accessory unit (34) is removably-attached to the base unit (20). The base unit (20), contains a housing (22), a pump (26), a motor (24), a power source (28), an input valve (64), and an output valve (32). The housing (22), contains the pump (26), and the motor (24), therein, and the housing (22), at least partially contains the power source (28), therein. The motor (24), is operatively-connected to the power source (28). The pump (26), is operatively-connected to the motor (24). The pump (26), is fluidly-connected to the input valve (64), and the output valve (32). The accessory unit (34), is selected from a hose storage unit (68), an additive tank (88), a handle (36) a roll bar (50), a frame (72), a wheel (74), and a combination thereof. A kit and a method of use are also described herein.