Abstract: A substrate processing method includes supplying a processing liquid to a peripheral edge of a surface of a substrate to form a processing film on the peripheral edge of the surface of the substrate; and bringing a molding solvent supplied to an inner region than a region of the surface of the substrate to which the processing liquid is supplied, into contact with an interface of the processing liquid that faces a central side of the surface.

Abstract: A substrate processing device includes: a chamber; a substrate processing mechanism that has a holding member, and discharges a processing fluid onto a substrate held by the holding member; a joint pipe that has a lower opening provided below the holding member, and an upper opening provided above the holding member, and is disposed such that at least part of the joint pipe from the lower opening to the upper opening passes through the outside of the chamber; and an air flow generator that is provided in the joint pipe. The air flow generator circulates an atmosphere in the chamber by discharging the atmosphere in the chamber from the lower opening to the joint pipe to allow the atmosphere to pass through the joint pipe, thereby introducing the atmosphere again into the chamber via the upper opening so that a downflow of the atmosphere occurs in the chamber.

Abstract: The present invention provides a container for containing a plate to be used to remove particles in a processing apparatus for processing a substrate, comprising: a charging unit configured to charge the stored plate, wherein the charging unit includes a contactor configured to be in contact with the plate, and is configured to charge the plate by supplying electric charges to the plate via the contactor and then separating the contactor from the plate.

Abstract: A cleaning device for selectively bombarding a surface with a first medium, including an accumulator valve module having a high-pressure accumulator configured to store the first medium at a high-pressure accumulator pressure, an impulse nozzle configured to bombard the surface with the first medium, a changeover valve having a nozzle connector configured to connect to the impulse nozzle and a high-pressure accumulator connector configured to connect to the high-pressure accumulator, wherein the changeover valve is configured to: connect, in a release position, the high-pressure accumulator and the impulse nozzle via the high-pressure accumulator connector and the nozzle connector, interrupt, in a charge position, a flow path from the high-pressure accumulator to the impulse nozzle, and switch between the release position and the charge position. The cleaning device includes a high-pressure accumulator holding valve connecting the high-pressure accumulator to the first medium source.

Abstract: Embodiments described herein relate a cleaning fixture and method to prevent chemical solutions from contacting the various substrate supporting member features and penetrating into the holes and the metal plate of the substrate supporting surface. The cleaning fixture includes a mounting plate having a plurality of thru-holes arranged on a bolt circle and configured to align with a plurality of thread holes disposed in an electrostatic chuck, a recess formed in the mounting plate, and a gas port formed through the mounting plate. A sealed plenum is formed between the recess of the mounting plate and a lower surface of the electrostatic chuck when the electrostatic chuck is coupled to the mounting plate. The gas port is fluidly coupled to the sealed plenum.

Abstract: A device for cleaning an optical communication device includes a hollow outer stem, an inner stem core, a locking handle, a flexible base, at least one ring seal, and a flexible cover. The inner stem core, fits within a length of the hollow outer stem and is slidable along the length of the hollow outer stem. The locking handle is coupled to a top end of the inner stem core, and is movable between a released position and a locked position, where moving the locking handle to the locked position from the released position slides the inner stem core within the hollow outer stem. The flexible base is coupled to a bottom end of the hollow outer stem, and is transformable between a contracted position when the locking handle is in the released position and an expanded position when the locking handle is in the locked position. The at least one ring seal is coupled to the flexible base. The flexible cover is wrapped around the flexible base and the at least one ring seal.

Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.

Abstract: A substrate processing apparatus includes: a processing tank that stores a processing liquid for performing a liquid processing on a plurality of substrates; a substrate support that supports the plurality of substrates such that main surfaces of each of the plurality of substrates follow a vertical direction in the processing tank; a processing liquid ejection unit provided below the plurality of substrates supported by the substrate support, and generates an ascending flow of the processing liquid in the processing tank; and a rectifying section that adjusts flow of the processing liquid in a side space formed between a first side wall of the processing tank and a first substrate having a main surface facing the first side wall of the processing tank among the plurality of substrates.

Abstract: A washing device comprises a manifold dispenser comprising at least one liquid input and a plurality of liquid outputs that operably direct fluid to contact a plurality of laboratory consumables held by a rack in the washing device, an ultra-violet (UV) light source, and a plurality of fiber optic channels coupled to the UV light source, each of the fiber optic channels extending into a corresponding one of the liquid outputs. The plurality of liquid outputs may each comprise a nozzle having an opening into which a respective one of the plurality of fiber optic channels extends.

Abstract: A cleaning apparatus that cleans a detection element including a detection surface, including a first cleaner configured to perform cleaning, and configured to clean the detection surface by using a first cleaning portion, a second cleaner, and configured to clean the detection surface by using a second cleaning portion, a driver to which the first cleaner and the second cleaner are attached and configured to move to approach or recede from the detection surface in a state where the first cleaner and the second cleaner are attached to the driver, and a control unit configured to control each of the first cleaner, the second cleaner, and the driver, wherein the control unit controls, based on the received setting, a cleaning order and/or a number of cleaning operations of the cleaning performed by the first cleaner and the cleaning performed by the second cleaner.

Abstract: The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.

Abstract: The apparatus and method of the present invention relate to a cleaning cloth, a cleaning cloth system, and a method for cleaning. The present invention contemplates a cleaning cloth that is adapted to operate together with a body to provide for an enhanced cleaning experience, and in at least certain embodiments provides an improved ability to more efficiently and effectively clean in tight spaces, such as for example within a relatively small opening between two adjacent structures.

Abstract: Aspects of the disclosure relate to cleaning rotating sensors having a sensor housing with a sensor input surface. For instance, a first signal indicating that there is a contaminant on the sensor input surface may be received. In response to receiving the first signal, a second signal may be sent in order to cause one or more transducers to generate waves in order to attempt to remove the contaminant from the sensor input surface.

Abstract: In some embodiments, a method for cleaning a processing chamber is provided. The method may be performed by introducing a processing gas into a processing chamber that has a by-product disposed along sidewalls of the processing chamber. A plasma is generated from the processing gas using a radio frequency signal. A lower electrode is connected to a first electric potential. Concurrently, a bias voltage having a second electric potential is applied to a sidewall electrode to induce ion bombardment of the by-product, in which the second electric potential has a larger magnitude than the first electric potential. The processing gas is evacuated from the processing chamber.

Abstract: Systems and methods for efficient on-line pigging of a coker furnace without interruption of the delayed coking process, which will save time and money during the delayed coking process. This system can be retrofitted to existing coker furnaces.

Abstract: A cleaning system includes at least one cleaning module configured to receive a substrate after a chemical mechanical polishing (CMP) process and to remove contaminants on the substrate using a cleaning solution. The cleaning system further includes a cleaning solution supply system configured to supply the cleaning solution to the at least one cleaning module. The cleaning solution supply system includes at least one temperature control system. The at least one temperature control system includes a heating device configured to heat the cleaning solution, a cooling device configured to cool the cleaning solution, a temperature sensor configured to monitor a temperature of the cleaning solution, and a temperature controller configured to control the heating device and the cooling device.

Abstract: The present invention relates to a nozzle for cleaning a substrate by discharging cleaning liquid to the substrate and a method of manufacturing the nozzle and, more particularly, to a nozzle for cleaning a substrate and a method of manufacturing the nozzle, the nozzle having pressure resistance performance capable of enduring high supply pressure of the cleaning liquid.

Abstract: A method includes: supplying a processing liquid to a center position of a substrate surface; shifting a supply position of the processing liquid from the center position to a first eccentric position; holding the supply position of the processing liquid at the first eccentric position and supplying a substitute liquid to a second eccentric position; shifting the supply position of the processing liquid in a direction away from the center position, and shifting a supply position of the substitute liquid to the center position; and supplying the processing liquid to the first eccentric position at a first flow rate, and reducing the flow rate of the processing liquid to a second flow rate after the supply position of the processing liquid starts to be shifted from the first eccentric position in the direction and until the supply position of the substitute liquid reaches the center position.

Abstract: A method of cleaning an aspiration tube in a specimen measuring apparatus includes: moving the aspiration tube while discharging a cleaning liquid onto an outer side surface of the aspiration tube; stopping the aspiration tube in a state where a tip of the aspiration tube or a droplet attached to the tip contacts a surface of a flow of the cleaning liquid; and moving the stopped aspiration tube in a direction away from the surface of the flow of the cleaning liquid.