Abstract: In a cleaning device, a signal processing circuit determines that a foreign substance has adhered to a surface of a protection cover based on at least two pieces of information among a change amount of a resonant frequency when a vibration portion is driven at a first voltage, a change amount of a current value relating to an impedance detected by an impedance detector, and a temporal change of an image captured by an imaging portion, and cleans the surface of the protection cover by controlling the vibration portion in accordance with the determination.

Abstract: The present application discloses a method of producing an aqueous rinsing liquid in an electrochemical cell having an anode chamber with an anode and a cathode chamber with a cathode, the anode chamber and cathode chamber being separated by a cation-selective membrane, wherein the method includes the steps of (a) feeding an aqueous anode chamber feedstock into the anode chamber (b) feeding an aqueous cathode chamber feedstock comprising at least one electrolyte through the cathode chamber; and (c) applying an electrical voltage to the anode and cathode to form rinsing liquid in the cathode chamber; and wherein steps a, b and c are performed, at least in part, simultaneously. Also disclosed is apparatus suitable for carrying out such methods.

Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

Abstract: A method for cleaning semiconductor substrate without damaging patterned structure on the semiconductor substrate using ultra/mega sonic device comprises applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency f1 and power P1 to drive the ultra/mega sonic device; before bubble cavitation in the liquid damaging patterned structure on the substrate, setting the ultra/mega sonic power supply at zero output; after temperature inside bubble cooling down to a set temperature, setting the ultra/mega sonic power supply at frequency f1 and power P1 again; detecting power on time at power P1 and frequency f1 and power off time separately or detecting amplitude of each waveform output by the ultra/mega sonic power supply; comparing the detected power on time with a preset time ?1, or comparing the detected power off time with a preset time ?2, or comparing detected amplitude of each waveform with a preset value, if the detected power on time

Abstract: The present disclosure discloses a method for reminding a replacement of a filter of a vacuum cleaner, including: obtaining a rotating speed difference of a motor within a set time interval; comparing, according to a working parameter of the vacuum cleaner, the rotating speed difference with a preset rotating speed difference threshold, to obtain a comparison result; and determining whether to remind a user to replace the filter according to the comparison result. With the method provided by the present disclosure, the vacuum cleaner may timely and automatically remind the user to replace the filter during the use of the vacuum cleaner, thereby reducing power loss, maintaining the normal use of the vacuum cleaner, and prolonging the service life of the motor.

Abstract: Disclosed relates to a mopping member, a mopping apparatus, a cleaning robot, and a control method for the cleaning robot. The mopping member includes a first mop and a second mop; the first mop is provided with a first rotating center, the second mop is provided with a second rotating center, and the distance between the first rotating center and the second rotating center is a rotating center distance. When the first mop and the second mop rotate, a short-diameter edge of one mop corresponds to a long-diameter edge of the other mop; at a connection line position of the first rotating center and the second rotating center, a gap between the first mop and the second mop is formed between the short-diameter edge of one mop and the corresponding long-diameter edge of the other mop.

Abstract: A method for cleaning rollers used for metal strip processing. According to said method, the roller surface is cleaned by an aqueous alkali metal hydroxide or alkaline earth metal hydroxide washing liquid or an acidic washing liquid, the washing liquid is removed and the roller surface is dried. A machine for cleaning rollers includes a washing frame designed for positioning a roller to be cleaned, and at least one means for applying at least one washing solution to the roller surface of the roller to be cleaned.

Abstract: A substrate processing apparatus includes a liquid processing tank, and a hydrophobizing gas supply unit. The liquid processing tank stores a processing liquid and dips a plurality of substrates in the processing liquid to liquid-process the plurality of substrates. The hydrophobizing gas supply unit supplies a gas of a hydrophobizing agent to the plurality of substrates after liquid processing thereof.

Abstract: According to one aspect, there is provided a method of cleaning a 3D object on a platform. The method comprises generating with a cleaning module a cleaning airflow to remove powder particles from a 3D object and an extraction airflow to extract any removed powder particles, determining a quantity of powder particles in the extraction airflow, and moving the cleaning module relative to the platform based on the determined quantity of powder particles.

Abstract: A drinking straw sanitizing appliance includes an exterior housing defining an interior having an adjustable heating element configured to covert a unit of water into steam. The interior is configured to also removable secure drinking straws therein thereby subjecting the same to sanitizing steam when the device is activated. The exterior of the device has a plurality of controls and a lid of the device has a locking mechanism.

Abstract: A cleaning apparatus includes an imaging section, a protective cover in a field of view of the imaging section, a vibrator to vibrate the protective cover, a piezoelectric driver to drive the vibrator, a cleaning liquid discharger to discharge a cleaner onto a surface of the protective cover, and a signal processing circuit to control the piezoelectric driver. The signal processing circuit controls the piezoelectric driver such that the protective cover is vibrated at a resonant frequency for a predetermined period after the cleaning liquid is caused to be discharged and controls the piezoelectric driver such that, after the predetermined period, vibration of the protective cover is stopped or the protective cover is vibrated at a frequency other than the resonant frequency.

Abstract: The present invention provides a method for reprocessing single-use medical devices. The method can include removing a coating from a single-use medical device, validating the removal of the coating, cleaning the single-use medical device, and applying a new coating to the single-use medical device.

Abstract: A liquid recirculation system having a pump for recirculating liquid and a liquid filtering system for filtering the recirculating liquid. The liquid filtering system includes a filter disposed in the recirculation flow path to filter the liquid and a flow diverter or flow diverter to aid in cleaning the filter.

Abstract: The present invention relates to a method for cleaning a spunbonding spinneret for the production of cellulosic spunbonded nonwoven fabric from a solution of cellulose in an aqueous organic solvent by extruding the solution through nozzle holes of the spunbonding spinneret to form filaments and stretching the filaments in the direction of extrusion by means of a gas stream, during which method contaminations containing cellulose will accumulate on the spinneret surface. The method according to the invention comprises the steps of: a) spraying the contamination with an aqueous fluid precipitating the cellulose; and b) detaching and carrying away the contamination by means of the gas stream.

Abstract: The present application provides a wafer cleaning equipment and a wafer cleaning method. During wafer cleaning operation, the landing position of a cleaning agent sprayed by a nozzle onto the surface of a wafer can be detected, and when the landing position produces a deviation, the measures of controlling a nozzle adjusting mechanism to adjust the position and/or spray angle of the nozzle, controlling a flow rate adjusting unit to adjust the flow rate of the cleaning agent sprayed by the nozzle, etc. are taken, so that the landing position of the cleaning agent sprayed by the nozzle onto the surface of the wafer is within a preset target region.

Abstract: A substrate processing method includes: increasing a temperature of a substrate by heating the substrate; after the increasing the temperature of the substrate, forming a liquid film of a pre-wetting liquid on a first surface of the substrate by supplying the pre-wetting liquid to the first surface of the substrate while heating and rotating the substrate at a first rotational speed; after the forming the liquid film, processing the first surface of the substrate with a chemical liquid by supplying the chemical liquid to the first surface of the substrate while heating and rotating the substrate at a second rotational speed that is lower than the second rotational speed; and after the processing the first surface of the substrate, decreasing the temperature of the substrate.

Abstract: A cleaning and sanitizing kit for use in a defined region of a hospital and a method employing the same.

Abstract: A substrate processing method includes supplying a developing liquid configured to form a resist pattern onto a surface of a substrate on which a resist film is formed; performing multiple cycles of a cleaning processing of supplying a modifying liquid containing a modifying agent having a hydrophilic group onto the surface of the substrate on which the resist pattern is formed and supplying a rinse liquid configured to remove the modifying liquid onto the surface of the substrate; and drying the surface of the substrate after performing the multiple cycles of the cleaning processing.

Abstract: A substrate holding and rotation mechanism includes: a substrate holding roller that holds a peripheral portion of the substrate and rotates the substrate, the substrate holding roller including, a lower portion of the roller facing the lower surface of the peripheral portion of the substrate, an upper portion of the roller facing the upper surface of the peripheral portion of the substrate, and a clamping groove which is provided between the lower portion of the roller and the upper portion of the roller and into which the peripheral portion of the substrate is inserted; and a roller washing nozzle that injects a fluid from diagonally above the substrate holding roller to an area including the clamp groove and an upper surface of the upper portion of the roller.

Abstract: An apparatus for removing a blockage in a solids injection lance extending into a direct smelting vessel The solids injection lance has a single inlet coupled to a section of supply line that conveys gas and solids to the solids injection lance and that is upstream and co-axial with the solids injection lance. The apparatus has a tool that extends through the supply line section and the solids injection lance to remove a blockage of solid material and an assembly for advancing the tool through the solids injection lance and the supply line section to the blockage from an upstream side of the blockage.