Abstract: The present invention relates in general to the field of cleaning devices, and more specifically, to a cleaning device and method of cleaning bathrooms. The cleaning device and method of cleaning bathrooms is inexpensive and environmentally friendly in that it utilizes a removable, washable and reusable cleaning head to thereby reduce unnecessary waste and cost. The cleaning device and method of cleaning bathrooms is sturdy and allows a user to clean an entire bathroom including showers, bathtubs, sinks, counters and toilets. The cleaning head may also be used separate from the cleaning device to clean easy to reach places such as countertops, sinks and toilets. The cleaning head may be reversible wherein opposite sides of the cleaning head may utilize certain materials to better clean different areas of the bathroom.

Abstract: A method and system for cleaning an array of solar panels. The system can include an applicator apparatus configured with a plurality of cleaning devices, and an automatic position system (APS) configured with the applicator apparatus. The APS can include a first and second sensor coupled to the applicator apparatus. A controller coupled to the first and second sensor devices can be configured to adjust a position of the applicator apparatus to maintain the plurality of cleaning devices in a direction facing a solar panel to facilitate a removal of an undesired material from the solar panel, while the applicator apparatus is moved from a first position to a second position. A mobile vehicle can be configured with the applicator apparatus to move along a row of the array of solar panels to perform the method for cleaning.

Abstract: A wash system for a gas turbine engine includes a core turning assembly having a motor configured to be mechanically coupled to the gas turbine engine. The rotor of the core turning assembly is further configured to rotate one or more components of a compressor section or a turbine section of the gas turbine engine at a rotational speed greater than two (2) revolutions per minute and less than five hundred (500) revolutions per minute during washing operations of the gas turbine engine.

Abstract: A method of cleaning a powder coating production line, the method including: providing a powder coating production line including equipment, an automatic cleaning tool, and a monitoring device; receiving, by the equipment, an instruction of automatic cleaning, and allowing the equipment to enter an automatic cleaning mode; cleaning, by the automatic cleaning tool, the equipment of the powder coating production line; monitoring, according to a preset monitoring condition and by the monitoring device, whether the automatic cleaning is completed; stopping the automatic cleaning when the monitoring device indicates the automatic cleaning has been completed, or continuing the automatic cleaning of the equipment; and turning off the automatic cleaning mode of the equipment.

Abstract: There is described a method of monitoring the cleaning of hospital environments, the hospital environment (1) comprising at least an item (2, 2a, 2b, 2c, 2d, 2e, 2f, 2g, 2h, 2i, 2j) disposed inside thereof, wherein the method comprises the steps of: generating a statement of events (5,5?,5?) of the hospital environment (1), the statement of events (5,5?,5?) related to the occurrence of at least a touch between at least a passer-by (3,3?,3?,30) of the hospital environment (1) with one of the items (2, 2a, 2b, 2c, 2d, 2e, 2f, 2g, 2h, 2i, 2j) disposed in the hospital environment (1), and performing the cleaning action of the hospital environment (1) based on the statement of events (5,5?,5?) generated. A system of monitoring the cleaning of hospital environments is also described.

Abstract: Aspects of the present disclosure relate to dispersing graphene oxide in a fluid and washing a first electronic part with cleaning fluid. Aspects of the present disclosure relate to testing cleaning fluid for a concentration of ions, and determining whether the ion concentration is below a threshold. If the ion concentration is below a threshold level, continuing to wash parts with the fluid. If the ion concentration is above a threshold level, replacing the cleaning fluid.

Abstract: A method for treating a substrate is provided. The method includes supplying a first treating liquid to a treating target surface of the substrate while the substrate is rotating, and subsequently, supplying a second treating liquid having a surface tension lower than a surface tension of the first treating liquid to the substrate while an evaporation inhibiting agent in a vapor state is present around the first treating liquid supplied to the substrate, such that the first treating liquid on the substrate is substituted with the second treating liquid. Thus, a vapor atmosphere may be formed around a cleaning liquid applied to the substrate. Thus, a liquid-film destroying phenomenon may be prevented in a procedure in which the cleaning liquid is replaced with an organic solvent.

Abstract: A washing container for washing or maintaining various objects includes opposite side portions, end portions, and a bottom portion. Embodiments include at least one lower support having an engagement gap extending between lower support arms and configured to releasably secure the objects. Some embodiments include opposing lower supports that secure opposite ends of the objects. An upper support arm may be used independently or together with one or more lower supports to secure one or more objects, in various positions, within the washing container. A perforated support platform support the objects above the bottom portion of the washing container and allows fluids and debris to pass to the bottom portion and into a drain trough. A debris basket within the trough limits the passage of debris into a drain.

Abstract: The invention provides a highly reliable automatic analyzer and dispenser probe cleaning method that allows for the removal of leftover cleaning water from the outer wall surfaces of a probe without increasing the size of a cleaning bath and contaminating the outer wall surfaces of the probe. A cleaning bath 113 (108, 106) comprises: a cleaning water outlet 203 for discharging into the cleaning bath 113 (108, 116) the cleaning water supplied from a cleaning water supply mechanism 123; and a compressed air outlet 204, disposed on the trajectory of the cleaning water discharged from the cleaning water outlet 203, for discharging the compressed air supplied from a compressed air supply mechanism 124 toward a sample probe 111b or a reagent probe 120 inserted in the cleaning bath 113 (108, 106).

Abstract: A system for ultrasonic cleaning of a solar panel includes a plurality of microelectromechanical systems (MEMS) ultrasonic transducers arranged on a side wall of the solar panel and/or under transparent glass on a surface of the solar panel; a hydraulic sun tracking mechanism configured to move the solar panel into a plurality of positions; a valve connected to a water source; and a controller which controls the plurality MEMS ultrasonic transducers, the sun tracking mechanism, and the valve, wherein the controller is configured to activate a cleaning protocol comprising the steps of moving the solar panel into a substantially horizontal position; opening the valve to allow a water flow over the surface of the solar panel; activating the plurality of MEMS ultrasonic transducers to apply ultrasonic waves to the water on the surface of the solar panel, wherein signal interference from different transducers are controlled to generate a rotating focused ultrasound signal over the surface of the solar panel; and m

Abstract: A cleaning and sanitizing apparatus for handheld devices may comprise a cuboid-shaped unit body having a top end and a base end, a slot opening, a user interface and microcontroller system for governing the individual components of the said cleaning and sanitizing apparatus for handheld devices, a gripping and carriage apparatus, a removeable cleaning solution reservoir, a pump and sprayer apparatus for dispensing cleaning solution, a moveable cleaning roller apparatus for cleaning the surfaces of handheld devices as such devices are lowered into and raised from the said unit body, and an irradiation chamber located at the base of the cuboid shaped body including at least one germicidal ultraviolet lamp array housed inside the said unit body. The apparatus may further comprise a wireless induction charging module configured to charge a handheld device while the handheld device is within the enclosure or compartment.

Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.

Abstract: A vehicle washing system and a method for operating such a vehicle washing system in which a vehicle is scanned in a longitudinal direction by a sensor device. Measurement data are captured so that position data for the positions of vehicle wheels are determined based on an evaluation of the measurement data. The determined position data of the positions of the wheels are subjected to a confidence check, so that a confidence measure is determined. If the determined confidence measure is greater than or equal to a confidence threshold value, a treatment of the wheels is carried out in a first mode at the positions associated with the position data, and, if the determined confidence measure is smaller than the confidence threshold value, a treatment of the wheels is not carried out, or is carried out in a second mode at the positions associated with the position data.

Abstract: The present invention is directed to a method of cleaning an oil and gas well riser section that has a central larger diameter tubular member having a flow bore and a plurality of smaller diameter tubular members connected to the central larger diameter tubular member, each smaller diameter tubular member having a flow bore. The method includes placing a fitting on an end portion of the riser section, the fitting covering an end of the larger diameter tubular member and the ends of the smaller diameter tubular members, wherein the fitting preferably has multiple openings including one or more centrally located openings and a plurality of circumferentially spaced apart outer openings that are spaced radially away from each of the one or more centrally located openings, said fitting having a drain opening.

Abstract: A method of removing a blockage in a solids injection lance under normal operating conditions of a direct smelting vessel is disclosed. The direct smelting vessel contains a bath of molten metal and slag and the solids injection lance extends into the direct smelting vessel and has an outlet end that is submerged in the molten slag. The solids injection lance further has a single inlet coupled to a section of supply line that conveys gas and solid feed material to the solids injection lance. The method comprises (a) advancing a blockage-removing tool through the supply line section and through the solids injection lance to an upstream side of the blockage, (b) operating the tool under elevated gas pressure conditions to remove the blockage such that solid feed material and gas are able to flow through the solids injection lance. The method further comprises (c) retracting the tool from the solids injection lance and the supply line section.

Abstract: A substrate processing apparatus with efficient drying includes a chamber body having an upper opening, a chamber cover having a lower opening, and a shield plate disposed in a cover internal space of the chamber cover. With the upper opening of the chamber body covered by the chamber cover, a chamber is formed. In the cover internal space, a scanning nozzle for discharging a processing liquid toward a substrate is disposed and an inert gas is supplied and a gas is exhausted from the inside. When the processing liquid is supplied onto the substrate, the discharge part is disposed at a discharge position, and when the discharge part is dried while no processing liquid is supplied onto the substrate, the discharge part is disposed at a waiting position and the lower opening is closed by the shield plate.

Abstract: A substrate processing method includes a vapor atmosphere filling step of filling surroundings of a liquid film of a processing liquid with a vapor atmosphere containing a vapor of a low surface tension liquid that has a lower surface tension than the processing liquid, a dry region forming step of forming a dry region in the liquid film of the processing liquid by partially excluding the processing liquid while spraying a gas containing the vapor of the low surface tension liquid onto the liquid film of the processing liquid in parallel with the vapor atmosphere filling step, and a dry region expanding step of expanding the dry region toward an outer periphery of a substrate while rotating the substrate in parallel with the vapor atmosphere filling step.

Abstract: A substrate processing method includes an intermediate processing step of processing the pattern forming surface by the intermediate processing liquid after a chemical liquid processing step, a filler discharging step of discharging a filler after the intermediate processing step, a filler spreading step of spreading the filler, a solidified film forming step of solidifying the filler, a lower position disposing step of making a blocking member be disposed at a lower position prior to start of the chemical liquid processing step, and a blocking member elevating step of starting elevation of the blocking member toward an upper position in a state where the pattern forming surface is covered with the intermediate processing liquid. The chemical liquid is discharged from a central nozzle. Spreading of the filler is started in a state where the blocking member is positioned at the upper position.

Abstract: According to an example, an apparatus may include a printhead to deliver a printing liquid from firing chambers through a plurality of bores arranged along a surface of the printhead. The apparatus may also include a cleaning system to apply a pressurized cleaning fluid onto the surface of the printhead while preventing application of the pressurized cleaning fluid into the firing chambers through the plurality of bores.

Abstract: A method for removing photoresist, an oxidation layer, or both from a semiconductor substrate is disclosed. The method includes placing a substrate in a processing chamber, the processing chamber separate from a plasma chamber for generating a non-oxidizing plasma to be used in treating the substrate; generating a first non-oxidizing plasma from a first reactant gas and a first carrier gas in the plasma chamber, wherein the first non-oxidizing plasma comprises from about 10% to about 40% of the first reactant gas, wherein the first reactant gas has a flow rate of from about 100 standard cubic centimeters per minute to about 15,000 standard cubic centimeters per minute, and wherein the first carrier gas has a flow rate of from about 500 standard cubic centimeters per minute to about 20,000 standard cubic centimeters per minute; and treating the substrate by exposing the substrate to the first non-oxidizing plasma in the processing chamber.