Patents Examined by Alexander Markoff
  • Patent number: 10181335
    Abstract: A method and system for cleaning and/or burnishing an article. The article is operated on by a burnishing object having one more cutting edges and one or more heating surfaces. The article rotates relative to the burnishing head and the cutting edges remove asperities from the article. The heating surface can be activated and can optionally protrude from the burnishing head to further reduce roughness of the surface of the article as the article is rotating relative to the head. The cutting edges and heating surfaces can be configured in shape and size (i.e., geometry) to accommodate the article.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: January 15, 2019
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Shashi Bhushan Agarwal, Huan Tang, Jing Gui
  • Patent number: 10173249
    Abstract: A method of cleaning calibration and other substrates that improves the correlation of measurements from calibration and product substrates and increases the useful life of the calibration substrates is herein disclosed. By exposing a calibration substrate to ultraviolet light, a reaction is triggered that results in the cleaning of the contaminants from the calibration substrate. For instance, monatomic oxygen is introduced to contaminants on the surface of a calibration substrate to remove the contaminants without inducing modifications in the substrate itself. Through the cleaning process, the temperature of the calibration substrate may be controlled to limit adverse effects caused by the overheating of the calibration substrate.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: January 8, 2019
    Assignee: Rudolph Technologies, Inc.
    Inventors: Jian Ding, Priya Mukundhan, James Kane, Steven Peterson, Fei Shen
  • Patent number: 10174564
    Abstract: The present invention relates to a method and apparatus for cleaning an oil and gas well riser section or assembly on location offshore that includes a larger diameter central pipe and a plurality of smaller diameter pipes that are spaced radially away from the central larger diameter pipe. Even more particularly, the present invention relates to an improved method and apparatus for cleaning oil and gas well riser sections wherein a specially configured cap or pair of caps are fitted to the ends of the riser which enable pressure washing cleaning tools (or a camera) to be inserted into and through a selected one of the pipes including either a smaller diameter of the pipes or the central larger diameter pipe and wherein the cap continuously collects spent cleaning fluid and debris, allowing the cleaning process to be done on location without transporting the riser section back onshore.
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: January 8, 2019
    Assignee: TRI-STATE ENVIRONMENTAL, LLC
    Inventor: Anthony Scott Carter
  • Patent number: 10166576
    Abstract: A system includes a high-pressure liquid supply system including a valve to relieve pressure upon a state change, at least one nozzle in fluid connection with the valve, and at least one filter element, the nozzle at least one being adapted to spray the filter element with high-pressure liquid upon actuation of the valve upon a state change. The high-pressure liquid supply system may, for example, be a high-pressure coolant system for use with a machine tool, and the at least one nozzle may, for example, be adapted to spray the at least one filter element to remove metal particles therefrom.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: January 1, 2019
    Inventor: Gregory S. Antoun
  • Patent number: 10163664
    Abstract: A substrate cleaning apparatus (50) that cleans a substrate (S) includes: circumference supporting members (51) that support and rotate the substrate (S); a sponge (541) having a cleaning surface that is brought into contact with the surface to be cleaned of the substrate (S) being rotated by the circumference supporting members (51), and cleans the surface to be cleaned; an arm (53) that moves the sponge (541) in a radial direction of the substrate (S) while maintaining the cleaning surface in contact with the surface to be cleaned; and a controller (60) that controls the contact pressure of the cleaning surface on the surface to be cleaned. When the sponge (541) is located near the edge of the substrate (S), the controller (60) adjusts the contact pressure to a smaller value than that of when the sponge (541) is located near the center of the substrate (S).
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: December 25, 2018
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: 10155055
    Abstract: A washing device comprises top, middle, and bottom compartments. The top compartment comprises a manifold dispenser that comprises at least one liquid input and a plurality of liquid outputs that operably direct fluid to contact a plurality of laboratory consumables held by a rack. A number of liquid outputs is equal to a number of laboratory consumables such that each one of the fluid outputs operably directs fluid at a corresponding one of the laboratory consumables. The middle compartment is positioned below the top compartment and comprises a washing chamber capable of receiving fluid output by the plurality of liquid outputs. The washing chamber has a floor comprising a material transparent to ultraviolet light. The bottom compartment is positioned below the washing chamber and has a light source that is capable of outputting UV light in the direction of the washing chamber and through the floor of the washing chamber.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: December 18, 2018
    Assignee: GRENOVA, INC.
    Inventor: Ali Safavi
  • Patent number: 10144396
    Abstract: A vehicle wash control system for controlling the amount of wash product applied to a vehicle based on environmental or other conditions, sensed locally or controlled/sensed remotely. The vehicle wash control system generally includes one or more electronic control valves that may be controlled by a control unit that receives inputs from a sensor or remotely which adjusts the flow of wash products responsive to the inputs.
    Type: Grant
    Filed: August 10, 2017
    Date of Patent: December 4, 2018
    Assignee: Cleaning Systems, Inc.
    Inventors: David R. Krause, Donald J. Pansier, Daniel J. Mathys, Kenneth R. Smith
  • Patent number: 10144206
    Abstract: A method of removing support material attached to an object printed with build material by a three-dimensional object printer achieves reliable removal of the support material in a short time. The method includes moving a first dry absorbent media into a volume within a vessel having at least one wall and moving the object into the volume of the vessel. The vessel is agitated to enable the first dry absorbent media to dislodge and absorb the support material from the object, and the first dry absorbent media is moved from the volume of the vessel.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: December 4, 2018
    Assignee: Xerox Corporation
    Inventors: Paul M. Fromm, Jeffrey J. Bradway, Timothy J. Clark, Jorge M. Rodriguez
  • Patent number: 10143347
    Abstract: Provided is a cleaning device comprising: a camera unit for capturing an image; a cleaning unit for cleaning; an air purification unit for purifying air; a driving unit for moving the cleaning device; and a processor for controlling the camera unit, the cleaning unit, the air purification unit and the driving unit, wherein the processor detects a user by using the camera unit, cleans by moving the cleaning device to a position exceeding a first threshold distance from the detected user when the cleaning device is in a cleaning mode, and purifies the air by moving the cleaning device to a position within a second threshold distance from the detected user when the cleaning device is in an air purification mode.
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: December 4, 2018
    Assignee: LG ELECTRONICS INC.
    Inventors: Dongkyu Lee, Kihyung Kim, Jihwan Kim, Seungkwon Ahn, Kichu Hong
  • Patent number: 10147587
    Abstract: A system and method for a waferless cleaning method for a capacitive coupled plasma system. The method includes forming a protective layer on a top surface of an electrostatic chuck, volatilizing etch byproducts deposited on one or more inner surfaces of the plasma process chamber, removing volatilized etch byproducts from the plasma process chamber and removing the protective layer from the top surface of the electrostatic chuck. A capacitive coupled plasma system including a waferless cleaning recipe is also described.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: December 4, 2018
    Assignee: Lam Research Corporation
    Inventors: Shijian Li, David Carman, Chander Radhakrishnan
  • Patent number: 10123559
    Abstract: Embodiments of the present disclosure relate generally to systems and methods for combing ozone and water to deliver ozonated water in a rinse stream. The ozone rain pan finds particular use for rinsing food products traveling along a conveyor line with ozonated water.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: November 13, 2018
    Assignee: GUARDIAN MANUFACTURING, INC.
    Inventors: Charles Smith, Thoram Charanda
  • Patent number: 10112221
    Abstract: Apparatus and method utilize an ultrasonic operation to process articles. Processing tanks are arranged serially, each having an interior extending vertically downwardly for receiving articles delivered into the tank. A plurality of baskets carry the articles to the consecutive tanks, and an overhead support arrangement at each tank receives each basket suspended from a corresponding support placed at a first location outside and above the tank. Each support is moved in a vertical direction between the first location, outside the tank, wherein the support is in position to receive a corresponding basket suspended below the support, and a second location outside the tank and below the first location, wherein the corresponding basket is placed within the tank, while the support remains outside the tank, whereby the articles are placed sequentially into each tank, while the supports remain overhead, outside the tanks, during a processing operation.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: October 30, 2018
    Inventor: Michael P. Pedziwiatr
  • Patent number: 10111563
    Abstract: A system and method for cleaning a collector surface of a solar collector. The system includes a first liquid-dispensing unit configured to deliver a first spray of liquid to the collector surface. The system also includes a brush element having a longitudinal side oriented along a first direction and disposed adjacent to the first liquid-dispensing unit. A first squeegee element is oriented along the first direction and adjacent to the brush element. The first squeegee element, the brush element, and the first liquid-dispensing unit define a first cleaning area. A second squeegee element is oriented along the first direction and separated from the first squeegee element by a gap to define a second cleaning area. The system also includes a second liquid-dispensing unit configured to deliver a second spray of liquid to the second cleaning area located between the first and second squeegees.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: October 30, 2018
    Assignee: SUNPOWER CORPORATION
    Inventors: Marc Grossman, Cedric Jeanty
  • Patent number: 10115581
    Abstract: The present disclosure provides a method of cleaning a semiconductor wafer during a process of fabricating a semiconductor device. The method includes loading a semiconductor wafer into a wafer handling system. The method includes removing contaminant particles from an edge region of the wafer from the back side, wherein alignment marks are located in the edge region. The method includes collecting the removed contaminant particles and discarding the collected contaminant particles out of the wafer handling system. The disclosure also provides an apparatus for fabricating a semiconductor device. The apparatus includes a wafer cleaning device that is operable to clean a predetermined region of the wafer on the back surface thereof. The predetermined region of the wafer at least partially overlaps with one or more alignment marks.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: October 30, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsun-Peng Lin, Hsin-Kuo Chang, Han-Chih Chung, Yueh-Chih Wang, Chi-Jen Hsieh
  • Patent number: 10109504
    Abstract: A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: October 23, 2018
    Assignee: International Test Solutions, Inc.
    Inventors: Alan E. Humphrey, James H. Duvall, Jerry Broz
  • Patent number: 10077521
    Abstract: A washing machine capable of reducing power consumption comprising: a substantially bottomed cylindrical washing tank; a rotary wing rotatably and freely arranged at a bottom of the washing tank; and a driving unit for rotatably driving the rotary wing by being powered by electricity. The rotary wing is formed in a disc shape and centered on a rotary axis (Ra), and a plurality of stirring blades radially extending towards an outer circumference are arranged on a surface of the rotary wing. A center (Cw) of these stirring blades is set at a position more misplaced towards an outer diameter direction than the rotary axis (Ra), and a protrusion part more protruded towards an axial direction of the rotary axis (Ra) than the stirring blades is arranged at the center (Cw) of the plurality of stirring blades.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: September 18, 2018
    Assignees: HAIER ASIA INTERNATIONAL CO., LTD., QINGDAO HAIER WASHING MACHINE CO., LTD.
    Inventors: Tamotsu Kawamura, Tomohiro Yamauchi
  • Patent number: 10067418
    Abstract: A method of removing particles from a surface of a reticle is disclosed. The reticle is placed in a carrier, a source gas is flowed into the carrier, and a plasma is generated within the carrier. Particles are then removed from a surface of the reticle using the generated plasma. A system of removing particles from a surface includes a carrier configured to house a reticle, a reticle stocker including the carrier, a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier, and a gas source configured to flow a gas into the carrier. A plasma may be generated within the carrier, and particles can be removed from a surface of the reticle using the generated plasma. An acoustic energy source configured to agitate at least one of the source gas and the generated plasma may be provided to facilitate particle removal using an agitated plasma.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: September 4, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shu-Hao Chang, Chi-Lun Lu, Shang-Chieh Chien, Ming-Chin Chien, Jui-Ching Wu, Jeng-Horng Chen, Chieh-Jen Cheng, Chia-Chen Chen
  • Patent number: 10049900
    Abstract: A substrate treatment method and apparatus including a change controlling unit which changes at least one of a protection liquid application position relative to a liquid droplet nozzle and a protection liquid incident angle relative to the liquid droplet nozzle, the protection liquid application position being a position at which the protection liquid is applied on an upper surface of the substrate, the protection liquid incident angle being an angle at which the protection liquid is incident on the liquid application position; wherein the change controlling unit controls the liquid application position and the incident angle in a first condition when the spraying region is located on an upper surface center portion of the substrate, and controls the liquid application position and the incident angle in a second condition when the spraying region is located on an upper surface peripheral portion of the substrate.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: August 14, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Kota Sotoku, Takayoshi Tanaka, Masanobu Sato
  • Patent number: 10045681
    Abstract: A dishwasher including a washing compartment, and at least one cutlery basket arranged in the washing compartment, wherein the at least one cutlery basket holds items of cutlery horizontally, wherein at least some sections of the cutlery basket have different clearance heights.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: August 14, 2018
    Assignee: BSH Hausgeräte GmbH
    Inventors: Bernd Schessl, Rainer Schütz
  • Patent number: 10031051
    Abstract: A device for collecting a sample and for depositing the sample in a sample-receiving port of a measuring apparatus comprises a first connection element (8) with three connections for fluid, and a second connection element (7), and a hollow needle (5) for collecting and depositing the sample. A first feed line (9) for a first washing liquid is connected via a first pump to a first connection for fluid of the first connection element (8). A second feed line (10) for a second washing liquid is connected via a second pump to a second connection for fluid of the first connection element (8). A connection for fluid of the second connection element (7) is connected to the third connection for fluid of the first connection element (8), and the second connection element (7) is connected to a dosing device (1) and to the hollow needle (5). A valve (2) is arranged between the third connection for fluid of the first connection element (8) and the second connection element (7).
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: July 24, 2018
    Assignee: CTC ANALYTICS AG
    Inventors: Werner Doebelin, Thomas Maetzke, Chris C. E. Van Tilburg