Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

Abstract: The present application relates to a binder. The present application can provide a binder which can be applied to production of silicon series negative electrodes to cope well with shrinkage and expansion by repeated charge and discharge, and has excellent binding force between active materials and adhesive force to a current collector, and an active material composition, an electrode and a secondary battery, comprising the same.

Abstract: The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance.

Abstract: A class of sulfonimide salts for solid-state electrolytes can be synthesized based on successive SNAr reactions of fluorinated phenyl sulfonimides: Fluorinated Aryl Sulfonimide Tags (FAST). The chemical and electrochemical oxidative stability of these FAST salts as well as other properties like solubility, Lewis basicity, and conductivity can be tuned by introducing different numbers and types of nucleophilic functional groups to the FAST salt scaffold.

Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.

Abstract: Provided is a lithium secondary battery including an anode including a silicon-based anode active material; a cathode; and an electrolyte, the electrolyte including a lithium salt, a non-aqueous organic solvent, and a conjugated diene compound.

Abstract: Provided herein are photoresist compositions and methods for fabricating semiconductor devices using the same. A photoresist composition may include an organometallic material, a fluorine-containing material, and an organic solvent.

Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

Abstract: A method of correcting error of hydrogen pressure sensor of vehicle fuel cell system, may checking, whether an opening ratio of a hydrogen pressure regulation valve is in a normal range by use of data map; checking whether a hydrogen purge valve is opened when the opening ratio of the hydrogen pressure valve is not within the normal range; changing the opening ratio of the hydrogen pressure regulation valve at least one time when the hydrogen purge valve is determined as being opened, and detecting two or more measurement values of the hydrogen pressure sensor at two or more different opening ratios of the hydrogen pressure regulation valve; and comparing, the two or more measurement values of the hydrogen pressure sensor detected at the two more opening ratios, respectively with predetermined pressure values corresponding to the opening ratios, and correcting errors between the measurement values and the predetermined pressure values.

Abstract: Disclosed are a photoresist composition, a pixel definition structure and a manufacturing method thereof, and a display panel. The photoresist composition includes an organic film-forming resin, a superhydrophobic polymerizable monomer, a polyfunctional crosslinkable polymerizable monomer, a photoinitiator, an additive and a solvent.

Abstract: A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

Abstract: Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.

Abstract: A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.

Abstract: A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.

Abstract: Articles and methods including additives in electrochemical cells, are generally provided. As described herein, such electrochemical cells may comprise an anode, a cathode, an electrolyte, and optionally a separator. In some embodiments, at least one of the anode, the cathode, the electrolyte, and/or the optional separator may comprise an additive and/or additive precursor. For instance, in some cases, the electrochemical cell comprises an electrolyte and an additive and/or additive precursor that is soluble with and/or is present in the electrolyte. In some embodiments, the additive precursor comprises a disulfide bond. In certain embodiments, the additive is a carbon disulfide salt. In some cases, the electrolyte may comprise a nitrate.

Abstract: Provided is a light-emitting element with high emission efficiency including a fluorescent material as a light-emitting substance. In a light-emitting element including a pair of electrodes and an EL layer between the pair of electrodes, a delayed fluorescence component due to triplet-triplet annihilation accounts for 20% or more of light emitted from the EL layer, and the light has at least one emission spectrum peak in the blue wavelength range. The EL layer includes an organic compound in which an energy difference between the lowest singlet excited energy level and the lowest triplet excited energy level is 0.5 eV or more. The EL layer includes a benzo[a]anthracene compound.

Abstract: A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

Abstract: A surface treatment composition and methods for improving adhesion of an organic layer on a titanium-containing hardmask includes forming a self-assembled monolayer on a surface of the titanium-containing hardmask prior to depositing the organic layer. The self-assembled monolayer is formed from a blend of alkyl phosphonic acids of formula (I): X(CH2)nPOOH2 (I), wherein n is 6 to 16 and X is either CH3 or COOH, wherein a ratio of the methyl terminated (CH3) alkyl phosphonic acid to the carboxyl terminated (COOH) alkyl phosphonic acid ranges from 25:75 to 75:25.

Abstract: A sol of inorganic oxide particles is stably dispersed in a hydrophilic organic solvent containing a hydrocarbon such as a paraffinic hydrocarbon or a naphthenic hydrocarbon. The sol contains a dispersion medium containing an organic solvent containing a C6-18 paraffinic hydrocarbon, a C6-18 naphthenic hydrocarbon, or a mixture of these, a C4-8 alcohol having a carbon chain with a carbon-carbon bond in the molecule in an amount of 0.1 to 5% by mass in the entire dispersion medium, and inorganic oxide particles having an average particle diameter of 5 to 200 nm as measured by dynamic light scattering as a dispersoid, wherein the inorganic oxide particles contain a C1-3 alkyl group bonded to a silicon atom and a C4-18 alkyl group. The paraffinic hydrocarbon is a normal paraffinic hydrocarbon or an isoparaffinic hydrocarbon. The naphthenic hydrocarbon is a saturated aliphatic cyclic hydrocarbon substitutable with a C1-10 alkyl group.

Abstract: Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A1 represents a single bond or *-A2-CO—O—; A2 and A3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R2 and R3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R4 represents a hydrogen atom, —CH2— in the group may be replaced by —O—, —S—, etc., R2 and R3, or R2, R3 and R4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.