Patents Examined by Amanda C. Walke
  • Patent number: 10539870
    Abstract: New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: January 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: William Williams, III, Cong Liu, Cheng-Bai Xu
  • Patent number: 10541448
    Abstract: Articles and methods including additives in electrochemical cells, are generally provided. As described herein, such electrochemical cells may comprise an anode, a cathode, an electrolyte, and optionally a separator. In some embodiments, at least one of the anode, the cathode, the electrolyte, and/or the optional separator may comprise an additive and/or additive precursor. For instance, in some cases, the electrochemical cell comprises an electrolyte and an additive and/or additive precursor that is soluble with and/or is present in the electrolyte. In some embodiments, the additive precursor comprises a disulfide bond. In certain embodiments, the additive is a carbon disulfide salt. In some cases, the electrolyte may comprise a nitrate.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: January 21, 2020
    Assignee: Sion Power Corporation
    Inventors: Yuriy V. Mikhaylik, Igor P. Kovalev, Thomas Weiss
  • Patent number: 10527942
    Abstract: In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: January 7, 2020
    Assignee: Rohm and Haas Electronics Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Jung Kyu Jo, EunHye Cho, Hye-Won Lee, Jin Hong Park, Eui-Hyun Ryu, Jae-Bong Lim
  • Patent number: 10516187
    Abstract: There is provided a nonaqueous electrolyte solution for the sodium secondary battery including a sodium salt, a compound having a sulfur-oxygen bond, and a nonaqueous solvent in which an amount of the compound having the sulfur-oxygen bond is in a rage of 0.05% by weight or more and 10% by weight or less with respect to the nonaqueous electrolyte solution. According to the present invention, the nonaqueous electrolyte solution for the sodium secondary battery and the sodium secondary battery which have excellent charge-discharge cycle characteristics can be provided and is useful industrially.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: December 24, 2019
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toru Onodera, Hidenaka Tanaka, Takitaro Yamaguchi
  • Patent number: 10514605
    Abstract: The present invention provides a resist multilayer film-attached substrate, including a substrate and a resist multilayer film formed on the substrate, in which the resist multilayer film has an organic resist underlayer film difficultly soluble in ammonia hydrogen peroxide water, an organic film soluble in ammonia hydrogen peroxide water, a silicon-containing resist middle layer film, and a resist upper layer film laminated on the substrate in the stated order. There can be provided a resist multilayer film-attached substrate that enables a silicon residue modified by dry etching to be easily removed in a wet manner with a removing liquid harmless to a semiconductor apparatus substrate and an organic resist underlayer film required in the patterning process, for example, an ammonia aqueous solution containing hydrogen peroxide called SC1, which is commonly used in the semiconductor manufacturing process.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: December 24, 2019
    Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Seiichiro Tachibana, Tsutomu Ogihara, Hiroko Nagai, Romain Lallement, Karen E. Petrillo
  • Patent number: 10514610
    Abstract: Disclosed is an apparatus for lithography patterning. The apparatus includes a substrate stage configured to hold a substrate coated with a deposition enhancement layer (DEL), a radiation source for generating a patterned radiation towards a surface of the DEL, and a supply pipe for flowing an organic gas near the surface of the DEL, wherein elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang, Jeng-Horng Chen
  • Patent number: 10511059
    Abstract: A battery cell includes an electrode assembly having a negative electrode, positive electrode, and separator bathed in an alkaline electrolyte, a pouch encapsulating the electrode assembly, and first and second tabs respectively extending from the positive and negative electrodes through the pouch. The first tab has thereon a coating including acrylic paint and the second tab has thereon a coating including lacquer to discourage creepage of the alkaline electrolyte along the first and second tabs and out of the pouch.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: December 17, 2019
    Assignee: ZAF Energy Systems, Incorporated
    Inventors: Adam Weisenstein, Allen Charkey, Melissa D. McIntyre, Blaine D. Latimer, Benjamin J. Washburn
  • Patent number: 10509316
    Abstract: The invention relates to polysulfonamide compositions for use as redistribution layers as used in the manufacture of semiconductors and semiconductor packages. More specifically it relates to photoimageable polysulfonamide composition for redistribution applications. The invention also relates to the use of the compositions in semiconductor manufacture.
    Type: Grant
    Filed: May 10, 2017
    Date of Patent: December 17, 2019
    Inventors: Daniel J Nawrocki, Qingzhou Cui, Nao Honda
  • Patent number: 10509315
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: December 17, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • Patent number: 10505192
    Abstract: A lithium metal composite oxide includes a primary particle having a hexagonal crystal structure, and a primary particle having a cubic crystal structure.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: December 10, 2019
    Assignees: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY), ENERCERAMIC INC.
    Inventors: Yangkook Sun, Chongseung Yoon, Gangjun Park, Jangwook Park
  • Patent number: 10495968
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: December 3, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 10490816
    Abstract: The present invention relates to a positive electrode active material for a lithium secondary battery, and a lithium secondary battery including the same, and the positive electrode active material includes lithium cobalt oxide particles. The lithium cobalt oxide particles include lithium cobalt oxide having a Li/Co molar ratio of less than 1 in the particles. Good rate property and life property may be obtained without worrying on the deterioration of initial capacity property.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: November 26, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Min Suk Kang, Chi Ho Jo, Ji Hoon Ryu, Sun Sik Shin, Wang Mo Jung
  • Patent number: 10490811
    Abstract: A negative electrode active material for a lithium secondary battery including silicon (Si), manganese (Mn), Component A including at least one selected from iron (Fe), molybdenum (Mo), chromium (Cr), zinc (Zn), titanium (Ti), nickel (Ni), vanadium (V), tungsten (W), and yttrium (Y), and Component B including at least one selected from carbon (C), boron (B), oxygen (O), nitrogen (N), phosphorous (P), and sulfur (S), wherein a total amount of Si, Mn, and Component A is about 70 atom % or less, an amount of Component B is 30 atom % or more, and a total amount of Mn and Component A is in a range of about 10 atom % to about 35 atom %.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: November 26, 2019
    Assignees: Samsung SDI Co., Ltd., MK Electron Co., Ltd.
    Inventors: Hana Yoo, Deokhyun Kim, Jaehyuk Kim, Soonsung Suh, Jaemyung Kim, Heesang Jeon, Yungu Cho, Jongsoo Cho
  • Patent number: 10481495
    Abstract: Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: November 19, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers, Mingqi Li
  • Patent number: 10483585
    Abstract: A glass ceramic containing lithium-ions and having a garnet-like main crystal phase having an amorphous proportion of at least 5% is disclosed. The garnet-like main crystal phase preferably has the chemical formula Li7+x?yMxIIM3?xIIIM2?yIVMyVO12, wherein MII is a bivalent cation, MIII is a trivalent cation, MIV is a tetravalent cation, MV is a pentavalent cation. The glass ceramic is prepared by a melting technology preferably within a Skull crucible and has an ion conductivity of at least 5·10?5 S/cm, preferably of at least 1·10?4 S/cm.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: November 19, 2019
    Assignee: SCHOTT AG
    Inventors: Meike Schneider, Oliver Hochrein, Wolfgang Schmidbauer, Miriam Kunze
  • Patent number: 10483525
    Abstract: A non-aqueous electrolyte secondary battery having a long cycle life and generates a small amount of gas during, for example, storage in a charged state. A negative electrode in a non-aqueous electrolyte secondary battery according to an exemplary embodiment includes a negative electrode current collector and a negative electrode mixture layer formed on the negative electrode current collector. The negative electrode mixture layer contains a water-soluble polymer and a negative electrode active material containing a silicon-based active material. The water-soluble polymer contains 0.30 mol/100 g or more and 0.40 mol/100 g or less of an acrylic acid monomer unit and 10?4 mol/100 g or more and 10?3 mol/100 g or less of a tetrafunctional (meth)acrylate monomer unit. An aqueous solution containing 1% by mass of the polymer in terms of solid content has a viscosity of 0.05 Pa·s or higher and 0.70 Pa·s or lower.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: November 19, 2019
    Assignee: SANYO Electric Co., Ltd.
    Inventors: Shinji Kasamatsu, Na Wang
  • Patent number: 10474030
    Abstract: A resist composition comprising a base polymer and a metal salt of carboxylic acid or sulfonamide is provided, the metal being selected from calcium, strontium, barium, cerium, aluminum, indium, gallium, thallium scandium, and yttrium. The resist composition exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: November 12, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takeshi Sasami
  • Patent number: 10468701
    Abstract: Multi-acid polymers are produced having the formula R—SO2—NH—(SO3?H+)n or R—SO2—NH—(PO3?H2+)n and made from a polymer precursor in sulfonyl fluoride form or sulfonyl chloride form The R is one or more units of the polymer precursor without sulfonyl fluoride or sulfonyl chloride, n is one or more, and the multi-acid polymer has two or more proton conducting groups. A method of making the multi-acid polymers includes reacting an amino acid having multiple sulfonic acids or phosphonic acids with a polymer precursor in sulfonyl fluoride form or sulfonyl chloride form in a mild base condition to produce the multi-acid polymer having two or more proton conducting groups.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: November 5, 2019
    Assignee: Nissan North America, Inc.
    Inventor: Rameshwar Yadav
  • Patent number: 10468702
    Abstract: The present specification relates to composite metal oxide particles manufactured by reacting two or more metal oxides and a method for manufacturing the same.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: November 5, 2019
    Assignee: LG CHEM, LTD.
    Inventors: Jong Woo Kim, Changseok Ryoo, Gyunjoong Kim, Sanghyeok Im, Kwangwook Choi
  • Patent number: 10461361
    Abstract: A nonaqueous electrolyte secondary battery insulating porous layer which has an excellent discharge output characteristic is provided. The insulating porous layer is arranged such that an aspect ratio of a projection image of an inorganic filler at a surface of the insulating porous layer is in a range of 1.4 to 4.0 and respective peak intensities I(hkl) and I(abc) of any diffraction planes (hkl) and (abc) of the insulating porous layer satisfy the following Formula (1). The peak intensities obtained from the diffraction planes (hkl) and (abc) orthogonal to each other are measured using a wide-angle X-ray diffraction method, and a maximum value of the peak intensity ratio is in a range of 1.5 to 300 when calculated by the following Formula (2): I(hkl)>I(abc)??(1) I(hkl)/I(abc)??(2).
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: October 29, 2019
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ichiro Arise, Chikara Murakami