Abstract: The invention discloses an improvement in the photolithographic patterning process of a photoresist layer in the manufacture of semiconductor devices in which occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. The improvement can be accomplished by using a chemical-amplification positive-working photoresist composition which exhibits a rate of film thickness reduction in the range from 0.09 to 1.0 nm/second when the photoresist layer before light-exposure is kept in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23° C. to dissolve away the resist layer.

Abstract: An radiographic imaging system for making a radiograph by a radiography apparatus using a photographic combination of a silver halide photographic light sensitive material in combination with intensifying screens, the photographic material comprising a support having a light sensitive silver halide emulsion layer on each both sides of the support, wherein the radiography apparatus conducts making a radiograph under the condition that a distance between a focal point of an X-ray tube and the photographic material is 0.9 to 3.0 m, a distance between the focal point of the X-ray tube and an object is 0.5 to 2.7 m and a distance between the object and the photographic combination is 0.3 to 1.5 m.

Abstract: An information recording material which contains a fluorine-containing nonionic surfactant, 1.5×10−5 mol/m2 or more of a polyvalent metal salt, and an anionic surfactant capable of forming a sparingly soluble salt in an aqueous solution with the polyvalent metal, in the outermost layer on a support on the side of an information recording layer. The information recording material is less in static charge and improved in surface deficiencies due to coating.

Abstract: Making a high absorption donor substrate for providing one or more OLED materials to an OLED device by: providing an absorber anti-reflection layer over a transparent support element, the anti-reflection layer having the real portion of its index of refraction greater than 3.0, and a thickness near the first reflectivity minimum at the wavelength of interest; providing a metallic heat-absorbing layer over the anti-reflection layer for absorbing laser light which passes through the transparent support element and the anti-reflection layer; and selecting the transparent support element, the anti-reflection layer, and the metallic heat-absorbing layer to have an average reflectivity of less than 10%, and the micro reflectivity variation due to variations in the thickness of the transparent support element of less than 10% at the wavelength of interest; and providing one or more organic material layers in the absence of a binder material, over the metallic heat-absorbing layer.

Abstract: A pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator. When the formed pattern is heated, a thermal generator generates acid during the heating process, and a cross-linking reaction occurs to photoresist compositions, thereby preventing pattern width slimming due to SEM-beam for CD measurement.

Abstract: A photosensitive glass paste containing: an inorganic component containing a glass powder and a photosensitive organic component is provided. The glass powder contains about 1 to 30 percent by weight of a low melting point glass powder having a glass softening point in a range of about 400° C. to 600° C. and about 70 to 99 percent by weight of a high melting point glass powder having a glass softening point about 300° C. or more higher than the glass softening point of the low melting point glass. As the high melting point glass, a borosilicate glass which inhibits diffusion of a conductive component such as Ag is employed. The content of the inorganic component in the photosensitive glass paste is in a range of about 40 to 70 percent by weight. A method of manufacturing a multilayered interconnected circuit board using the above-described photosensitive glass paste is also provided.

Abstract: The invention discloses an improvement in the photo-lithographic patterning process of a photoresist layer in the manufacture of semiconductor devices in which occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. The improvement can be accomplished by using a chemical-amplification positive-working photoresist composition which exhibits a rate of film thickness reduction in the range from 0.09 to 1.0 nm/second when the photoresist layer before light-exposure is kept in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23° C. to dissolve away the resist layer.

Abstract: A UV absorbent represented by the following formula (1) [R1 represents an alkenyl group, all of R1 represent the same group, and R2, R3 and R4 independently represent a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom], a method of preparing the UV absorbent due to a reaction of a compound represented by the following formula (2) and an alkenylating agent represented by the following formula (3) in the presence of a base [R2, R3 and R4 independently represent a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom, and X represents a halogen atom, —OSO2R5 or —OSO2OR1, and R5represents an alkyl group or an aryl group], a composition containing therein the UV absorbent, and an image forming method using the composition:

Abstract: Pyrrolotriazole compounds of the formula (I) and silver halide color photographic light-sensitive materials containing the compound as a cyan coupler, are disclosed: wherein R1 and R2 each independently are an alkyl, cycloalkyl, alkenyl, aryl or heterocyclic group, or R1 and R2 may bond together to form a 5- or 6-membered nitrogen-containing heterocycle; R3 is an alkyl, cycloalkyl or alkenyl group; R5 is an alkyl or aryl group; R4, R6, R7 and R8 each independently are a hydrogen atom or a substituent, with the proviso that at least one of R4, R6, R7 and R8 is a substituent, and that two groups of R4 to R8, which adjoin each other, do not bond together to form any ring.

Abstract: A color filter array having a blue filter layer on a substrate wherein the blue filter layer comprises triallylmethane dye showing its absorption maximum at a wavelength within the range of from 550 to 650 nm; and has a transmittance at a wavelength of 450 nm of 70% or more and that at 650 nm of 5% or less is provided; and the color filter array shows excellent spectroscopic characteristics with respect to blue light and has a blue filter layer excellent in light fastness.

Abstract: The present invention relates to a polymer for a chemically amplified resist and a resist composition using the same. The present invention provides a polymer represented by the Formula (1) and a chemically resist composition for extreme ultraviolet light comprising the same. The chemically amplified resist composition comprising the polymer represented by the formula (1) of the present invention responds to mono wavelength in a micro-lithography process and can embody a micro-pattern of high resolution on a substrate.

Abstract: The optical functional element contains aggregates of developed silver grains obtained by developing silver halide grains arranged so as to constitute a periodical structure. The element includes a substrate and a medium layer. The aggregates of the developed silver grains are arranged in the medium layer so as to constitute said periodical structure. The element is produced by first selectively exposing a photo-curing resin layer formed on said substrate in which the silver halide grains are dispersed so as to selectively photo-cure the photo-curing resin layer, then overall exposing the photo-curing resin layer to expose the silver halide grains in the photo-curing resin layer, and thereafter developing the photo-curing resin layer.

Abstract: An apparatus and method for applying at least one solution of a predetermined viscosity to photosensitive material. The apparatus includes at least an application roller that applies the coating solution onto the photosensitive material. The application roller partially extends into a solution tray of the coating apparatus and is partially submerged in solution in the solution tray. In an arrangement of the present invention, a cascade wall and metering blade are positioned within the solution tray so as to define a first section at which solution enters the tray, and a second section which receives solution that spills over from the first section and includes a port which leads coating solution back to a coating solution tank for recycling or leads cleaning solution to drain. The apparatus further includes a washing arrangement that washes the coating apparatus in an efficient manner.

Abstract: A planographic printing plate precursor includes a photosensitive layer obtained by coating and drying on a support a photosensitive layer coating solution formed of a photosensitive composition, which contains a cyanine dye represented by general formula (I) below and a polymer insoluble in water and soluble in an aqueous alkali solution, dissolved or dispersed in a solvent system containing 80% by weight or more of a solvent having a boiling point lower than 100° C. in a solvent having a boiling point lower than 200° C.; wherein a solubility in an aqueous alkali solution of the photosensitive layer is increased by exposure to an infrared laser.

Abstract: The present invention provides a tabular internal latent image type direct positive photographic silver halide emulsion which provides a high sensitivity and a low re-reversal negative sensitivity and a color diffusion transfer photographic light-sensitive material comprising such an emulsion. The present invention also provides an internal latent image type direct positive photographic silver halide emulsion which can be prepared with a good reproducibility and a color diffusion transfer photographic light-sensitive material less susceptible to variation of sensitivity and S/N ratio comprising such an emulsion. An internal latent image type direct positive photographic silver halide emulsion comprising tabular silver halide grains having an average grain diameter of not less than 0.

Abstract: There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition. The method for producing a pattern film-coated article comprises the steps of coating a photosensitive composition comprising an organometallic or organosilicon compound having photosensitivity and a hydrolyzable metal or silicon alkoxide on a substrate, irradiating the coated film on the substrate with light to polymerize the exposed portions of the coated film and then dissolving unexposed portions to remove them, wherein a pattern film-coated article is produced from an allyl group-containing metal or silicon alkoxide as the organometallic or organosilicon compound.

Abstract: The present invention provides a silver halide photographic material free of cyanide ions but having a higher photographic speed than ever. A novel silver halide photographic material is provided comprising a support having thereon at least one silver halide emulsion layer, wherein there is contained a complex in which an organic compound having no electric charge which doesn't form coordinate bond with metals or metal ions other than the central metals or metal ions occupies more than half of the central metals or metal ions as coordination site.

Abstract: A silver halide color photographic material, which is superior in color reproduction as well as its stability, is disclosed, comprising a support having thereon a blue-sensitive silver halide emulsion layer containing a yellow coupler, a green-sensitive silver halide emulsion layer containing a magenta coupler, a red-sensitive silver halide emulsion layer containing a yellow coupler, an invisible light-sensitive silver halide emulsion layer containing a coupler and a layer having an interlayer effect, which is light sensitive or light-insensitive.