Abstract: In a resist composition comprising a base resin which is a high molecular weight structure free from an aromatic substituent group, a photoacid generator, and a solvent, the photoacid generator is a one capable of generating a perfluoroalkyl ether sulfonic acid. The resist composition has many advantages including excellent resolution, minimized size difference between isolated and densely packed patterns, and minimized line edge roughness.

Abstract: The present invention aims to provide a printing plate capable of preventing paste of high viscosity adhering to an edge of a squeegee from being transferred to and left on a through hole of a printed circuit board when the paste is being filled by a squeegeeing method. The printing plate has a metal sheet (3) provided with a squeegee cleaning section (7) formed thereon and fixed to the back surface of a slanting area (5) of mask (2) attached to a plate framework (1). The through hole of the printed circuit board is filled with paste only after paste of high viscosity adhering to the edge of the squeegee is removed by the squeegee cleaning section (7), to prevent the paste from being left on the through hole, and thereby achieving the printed circuit board of excellent quality.

Abstract: A photoluminescent polymer/transition metal complex is disclosed which is capable of selectively binding to alkenes to thereby alter the photoluminescence of the complex. In one embodiment, a poly(vinyl phenyl ketone)/Ag(I) complex is disclosed which reversibly and selectively binds with ethylene. The disclosed photoluminescent polymer/transition metal complex can be used as part of a sensor to determine the presence and/or concentration of alkenes such as ethylene.

Abstract: A heat mode-applicable image-formation material having high sensitivity and excellent image-forming property, and a novel infrared absorber which can be suitably used in this material. The present invention relates to a substrate carrying thereon an image-formation layer which contains an infrared absorption agent. The agent has at least one surface orientation group in the molecule, and solubility of the image-formation layer in an alkaline aqueous solution is changed by action of radiation in the near-infrared range. Preferable as the infrared absorbing agent is an infrared absorber comprising, in a molecule thereof, a fluorine-containing substituent which have at least 5 fluorine atoms, or a polymethine chain of at least 5 carbon atoms and an alkyl group of at least 8 carbon atoms, said alkyl group being connected to the polymethine chain via any of nitrogen, oxygen and sulfur.

Abstract: High-temperature-stable polybenzoxazoles are formed from novel poly-o-hydroxyamides. The novel poly-o-hydroxyamides have low dielectric constants, are suitable for exposure at 248 nm or shorter wavelengths, and have hydroxyl groups at least some of which have been protected by tert-butoxycarbonyl protective groups.

Abstract: A photosensitive resin composition which comprises (A) a binder polymer, (B) a photopolymerizing compound having at least one ethylenic unsaturated bond in the molecule and (C) a photopolymerization initiator, wherein the binder polymer as component (A) comprises two or more binder polymers and/or has a dispersity of 2.5-6.0, and wherein the photopolymerizing compound as component (B) has in the molecule at least one ethylene glycol chain and at least one C3-C6 alkylene glycol chain.

Abstract: Polydioxaborine compositions are prepared by intermixing a polydioxaborine and a non-linear optical chromophore. Preferred polydioxaborine compositions are photorefractive and/or photoconductive composites.

Abstract: The disclosure pertains to a photoresist composition and a method of using the photoresist in the fabrication of reticles or features on a semiconductor substrate. The photoresist composition and the method are designed to reduce the variation in critical dimension of features across a surface of a substrate, where the variation in critical dimension is a result of localized resist loading. The photoresist composition is useful when the imaging system is G-line, H-line, or I-line, and the photoresist composition includes a sensitizer which works in combination with a DUV photoresist including a PAC, to sensitize the photoresist to the G-line, H-line and I-line imaging.

Abstract: A color photographic material is described containing a compound of formula (I) wherein, if n=1, R1 is, inter alia, a radical of formula (II), and, if n=2, R1 is unsubstituted or C1–C4alkyl- or hydroxy-substituted phenylene or naphthylene; or —R12—X—R13—, and other residues are as defined in claim 1. The compound of formula (I) is effective as scavenger of the oxidized form of the developer (Dox scavenger), especially when contained in an interlayer between light sensitive layers. Selected compounds of this class can also be used as additives, for example as dye stabilizer, in color photographic materials, or as an antioxidant for organic materials.

Abstract: Infrared absorbing compounds are disclosed. The compounds are co-polymers that comprise covalently attached ammonium, sulfonium, phosphonium, and/or iodonium cations, and infrared absorbing cyanine anions that have two to four sulfonate groups and/or sulfate groups, and/or infrared absorbing oxonol anions. The infrared absorbing compounds can be used in aqueous developable lithographic printing plate precursors.

Abstract: Disclosed are a light sensitive composition comprising an addition polymerizable ethylenically unsaturated monomer, a photopolymerization initiator and a polymer binder, and a light sensitive planographic printing plate material comprising a hydrophilic support, and provided thereon, the light sensitive composition, wherein the photopolymerization initiator is a trihalomethyl group-containing oxadiazole compound represented by the following formula 1 or 2,

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed comprising a polymer which is soluble in an aqueous alkaline solution and which comprises at least one chromophoric moiety having a light absorption maximum in the wavelength range between 400 and 780 nm. Such materials show no dye stain after processing in areas where the coating has been removed by an alkaline developer.

Abstract: There is provided a lithographic printing plate precursor having good on-machine development quality, and moreover high sensitivity and high printing durability, which comprises a support having provided thereon an image forming layer containing (1) at least one ingredient selected from the group consisting of fine particles containing a compound having two or more vinyloxy groups and microcapsules encapsulating a compound having two or more vinyloxy groups, (2) a light-to-heat conversion agent, (3) a hydrophilic resin and (4) an acid precursor, wherein the acid precursor is not contained in the fine particles or the microcapsules.

Abstract: Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1–10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1–10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained.

Abstract: Silver-free, aqueous-based direct thermographic materials are designed to have image tone with near neutral density. Without the use of organic silver salts containing reducible silver ions, the image is formed using a color developing agent precursor that releases a color developing agent when heated to a temperature of at least 80° C., a combination of cyan, yellow and magenta dye-forming color couplers that provide cyan, yellow, and magenta dyes, and a substituted or unsubstituted benzoquinone as an oxidizing agent. No silver metal or silver ions are purposely added to these materials. This combination of components provides a means for controlling image tone without reliance upon conventional toning agents.

Abstract: An organometallic precursor mixture for forming a metal alloy pattern and a method of forming the metal alloy pattern using the same, wherein the metal alloy pattern having improved adhesive force to a substrate, heat resistance, and resistance to atmospheric corrosion can be readily formed using the organometallic precursor mixture by and exposing step without using a separate photosensitive resin.

Abstract: Photoresist polymers and photoresist compositions containing the same are disclosed that comprise a chain linking compound including an alcohol group and a boron compound represented by Formula 1 as a moiety. As a result, the photoresist polymer and the photoresist composition containing the same have excellent transmissivity, etching resistance, thermal resistance and adhesive property, low light absorbance and high affinity to an developing solution at a wavelength of 13 nm as well as 248 nm and 157 nm, thereby reducing line edge roughness (LER). wherein R1, R2, R3, R4 and R5 are as defined in the specification.

Abstract: There are described novel rhodamine dye compounds and imaging members and imaging methods, including thermal imaging members and imaging methods, utilizing the compounds. The dye compounds exhibit a first color when in the crystalline form and a second color, different from the first color, when in the liquid, amorphous form.

Abstract: A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound.

Abstract: For a 2-dimensional periodic array of contact holes or islands, a depth-of-focus-enhancement lithographic scheme based on a combination of alternating phase-shifting mask and off-axis illumination is revealed. The scheme is achieved by choosing appropriate off-axis illumination and smaller numerical aperture such that only two diffraction orders, which are of equal distance from the pupil center, are collected in the first exposure. The image of the 2-dimensional periodic array can be formed by superposing a second exposure on the first. In the second exposure, another appropriate off-axis illumination and smaller numerical aperture is chosen such that another two diffraction orders, which are also of equal distance from the pupil center, are collected.