Abstract: A memory device includes a plurality of memory sub-arrays. Each of the memory sub-arrays is accessed through a staircase of word lines (WLs) and a plurality of interconnect structures. The memory device includes a plurality of test structures. Each of the test structures corresponds to one of the memory sub-arrays, and includes: (i) a staircase of test WLs that emulate the staircase of WLs coupled to the corresponding memory sub-array, and (ii) a plurality of test interconnect structures that emulate the interconnect structures coupled to the corresponding memory sub-array. The plurality of test structures are electrically coupled to one another in series.

Abstract: An opto-electronic device includes a nucleation-inhibiting coating (NIC) disposed on a surface of the device in a first portion of a lateral aspect thereof; and a conductive coating disposed on a surface of the device in a second portion of the lateral aspect thereof; wherein an initial sticking probability of the conductive coating is substantially less for the NIC than for the surface in the first portion, such that the first portion is substantially devoid of the conductive coating.

Abstract: Provided on a substrate are an N+ layer connecting to a source line SL and an N+ layer connecting to a bit line BL that are located at opposite ends of a Si pillar standing in an upright position along the vertical direction, an N layer continuous with the N+ layer, an N layer continuous with the N+ layer, a first gate insulating layer surrounding the Si pillar, a first gate conductor layer surrounding the first gate insulating layer and connecting to a plate line PL, and a second gate conductor layer surrounding a second gate insulating layer surrounding the Si pillar and connecting to a word line WL. A voltage applied to each of the source line SL, the plate line PL, the word line WL, and the bit line BL is controlled to perform a data retention operation for retaining holes, which have been generated through an impact ionization phenomenon or using a gate induced drain leakage current, in a channel region of the Si pillar, and a data erase operation for removing the holes from the channel region.

Abstract: In a power line structure for supplying power to standard cells, buried power lines extending in the X direction are placed at a given spacing in the Y direction. A local power line extending in the Y direction is connected with the buried power lines. Metal power lines extending in the X direction are formed in an upper-layer metal interconnect layer and connected with the local power line. The spacing of placement of the metal power lines in the Y direction is greater than the spacing of placement of the buried power lines.

Abstract: A display device includes a base layer on which a display area and a non-display area are defined, a circuit layer including a first power electrode and driving circuits, which are disposed in the non-display area, a first planarization layer in which a first opening through which the first power electrode is exposed is defined and which covers the driving circuits, a second power electrode disposed on the first planarization layer to contact the first power electrode that is exposed through the first opening and overlapping at least a portion of the driving circuits, and a second planarization layer disposed on the first planarization layer to cover a portion of the second power electrode and having a groove part in an area overlapping the first planarization layer and the second power electrode in a plan view.

Abstract: A semiconductor device includes a first semiconductor chip, and a second semiconductor chip, wherein the first semiconductor chip includes a substrate including a first principal surface facing the second semiconductor chip and a second principal surface opposite to the first principal surface, a first power supply line and a second power supply line arranged on the second principal surface of the substrate, a power supply switch circuit arranged electrically between the first power supply line and the second power supply line, a first via arranged in the substrate to extend from the first power supply line to the first principal surface, and a second via arranged in the substrate to extend from the second power supply line to the first principal surface, wherein the second semiconductor chip includes a third power supply line connected to the first via, and a fourth power supply line connected to the second via.

Abstract: A method for fabricating a semiconductor chip includes forming a plurality of conducting pads at a front face of a substrate, thinning a rear face of the substrate, etching openings under each conducting pad from the rear face, depositing a layer of a dielectric on walls and a bottom of the openings, forming a conducting material in the openings, and forming a conducting strip on the rear face. The conducting strip is electrically connected to the conducting material of each of the openings. The etching is stopped when the respective conducting pad is reached.

Abstract: An image sensor includes an active pixel photodiode, a black pixel photodiode, a metal grid structure, and a light shield. Each of the active pixel photodiode and the black pixel photodiode are disposed in a semiconductor material having a first side and a second side opposite the first side. The first side of the semiconductor material is disposed between the light shield and the black pixel photodiode. The metal grid structure includes a first multi-layer metal stack including a first metal and a second metal different from the first metal. The light shield includes a second multi-layer stack including the first metal and the second metal. A first thickness of the first multi-layer metal stack is less than a second thickness of the second multi-layer metal stack.

Abstract: A display device includes a substrate including a first display region, a second display region having an area smaller than that of the first display region, a third display region having an area smaller than that of the first display region, and a non-display region, a plurality of pixels provided in the first to third display regions, a power line which is connected to each of the plurality of pixels and applies a first power voltage to the plurality of pixels, and a fan-out line provided in the non-display region, the fan-out line applying a data signal to the plurality of pixels, where the power line includes an additional power line, a first power line, and disposed on the additional power line, and a second power line disposed on the first power line.

Abstract: A graphene transistor includes a graphene layer including at least one sheet of graphene, a drain electrode and a source electrode each electrically connected to the graphene layer, a charge donor on at least one main surface of the graphene layer, the charge donor including an impurity charge, and a counter ion having a charge with a sign different from a sign of the impurity charge.

Abstract: An organic electroluminescence device includes an anode, an emitting layer, and a cathode in this order. The emitting layer comprises a delayed fluorescent compound M2 and a compound M3 having at least one deuterium atom, and the compound M3 is not a compound having a partial structure represented by a formula (1C) or (2C). S1(M2) of the compound M2 and S1(M3) of the compound M3 satisfy a relationship of S1(M3)>S1(M2). In the formulae (1C) and (2C), Y41 to Y48 are each independently a N atom, CR, or a C atom bonded to another atom or the like in the compound M3, where each R is independently a H atom or a substituent, at least one of Y41 to Y48 is a N atom, and at least one of Y41 to Y48 is a C atom bonded to another atom or the like in the compound M3.

Abstract: Embodiments of the present disclosure are based on extending a nanocomb transistor architecture to implement gate all around, meaning that a gate enclosure of at least a gate dielectric material, or both a gate dielectric material and a gate electrode material, is provided on all sides of each nanoribbon of a vertical stack of lateral nanoribbons of a nanocomb transistor arrangement. In particular, extension of a nanocomb transistor architecture to implement gate all around, proposed herein, involves use of two dielectric wall materials which are etch-selective with respect to one another, instead of using only a single dielectric wall material used to implement conventional nanocomb transistor arrangements. Nanocomb-based transistor arrangements implementing gate all around as described herein may provide improvements in terms of the short-channel effects of conventional nanocomb transistor arrangements.

Abstract: A semiconductor device may include: a substrate; a protective region provided over the substrate; and a core structure enclosed by the protective region. The core structure may include a core material etchable by a chemical solution. The protective region may include a protective material resistant to etching by the chemical solution. The core structure may have a first side and a second side opposite to the first side, the first side being closer to the substrate than the second side. The core structure may be narrowest at the first side of the core structure.

Abstract: A silicon carbide transistor device includes a silicon carbide semiconductor and a silicon carbide epitaxial layer formed at a top surface of the substrate. A source structure is formed in a top surface of the silicon carbide epitaxial layer and includes a p-well region, a n-type source region and a p-type contact region. A source contact structure is formed over and electrically connected to a top surface of the source structure. A planar gate structure includes a gate dielectric and a gate runner adjacent a p-type channel region. The gate dielectric covers the channel region, at least part of the source structure and at least part of the source contact structure. The gate runner is electrically insulated from the channel region and the source structure and the source contact structure by the gate dielectric and overlaps the channel region.

Abstract: A semiconductor device of an embodiment includes: a semiconductor layer having a first face and a second face, the semiconductor layer including a first trench and a second trench on a side of a first face; a first electrode on the side of the first face; a second electrode on the side of the second face; a first gate electrode in the first trench; a first field plate electrode electrically connected to the first electrode in the first trench, a second gate electrode in the second trench; and a second field plate electrode electrically connected to the first electrode in the second trench, a resistance between first electrode and second field plate is different from a resistance between first electrode and the first field plate electrode.

Abstract: A semiconductor package structure and a method for manufacturing a semiconductor package structure are provided. The semiconductor package structure includes a first substrate, a second substrate, and a solid solution layer. The first substrate includes a first metal layer, and the first metal layer includes a first metal. The second substrate includes a second metal layer. The solid solution layer electrically connects the first metal layer to the second metal layer. The solid solution layer includes a first metal-rich layer.

Abstract: A display panel and a display device are disclosed. The display panel includes: a display region including a first display region and a second display region, a light transmittance of the second display region being greater than a light transmittance of the first display region; a substrate located in the first display region and the second display region; an anode layer located on the substrate; a light-emitting layer located on the anode layer; and a cathode layer located on the light-emitting layer; the anode layer includes a reflecting layer, a thickness of the reflecting layer in the second display region is less than the thickness of the reflecting layer in the first display region.

Abstract: The present application provides a display panel and a display device. The display panel includes a driving backplane and display components. A first binding terminal of each of the display components includes a first terminal portion and second terminal portions. One end of the second terminal portion is electrically connected to the first terminal portion, and the other end is electrically connected to the driving backplane. The second terminal portion is arranged in a dense and spaced columnar structure to alleviate an existing problem that display panel and motherboard have malfunction joints existing in the conventional seamless spliced display technologies.

Abstract: A semiconductor arrangement includes a memory array including bitcells and a peripheral logic block for accessing the bitcells. The peripheral logic block includes a first nanostructure having a first width for providing power to a first logic unit of the peripheral logic block, and a second nanostructure axially aligned with the first nanostructure and having a second width less than the first width for providing power to a second logic unit of the peripheral logic block.

Abstract: A first organic resin layer is formed over a first substrate; a first insulating film is formed over the first organic resin layer; a first element layer is formed over the first insulating film; a second organic resin layer is formed over a second substrate; a second insulating film is formed over the second organic resin layer; a second element layer is formed over the second insulating film; the first substrate and the second substrate are bonded; a first separation step in which adhesion between the first organic resin layer and the first substrate is reduced; the first organic resin layer and a first flexible substrate are bonded with a first bonding layer; a second separation step in which adhesion between the second organic resin layer and the second substrate is reduced; and the second organic resin layer and a second flexible substrate are bonded with a second bonding layer.