Abstract: A developing machine and a developer carrier therefor, for visualizing an electrostatic latent image formed on an electrostatic latent image carrier by adhesion of a developer which is carried while adhering on the surface of the developer carrier and given electric charge by triboelectricity. The developer carrier has a resin surface layer containing a charge-imparting agent selected from the group consisting of an iron complex, a basic amino acid, a polyamide fine powder, and a stearic acid salt.

Abstract: For producing fine printing patterns on large serigraphical printing frames it is possible to apply an exposure through correspondingly large film areas, but it is cheaper to make use of a successive line-by-line exposure with the use of a modulated light or laser beam, which is caused to sweep across an emulsion coated printing frame surface from an oscillating deflection mirror. The beam (20), in its outermost positions, will be directed obliquely towards the surface (14), and if the latter changes its distance from the oscillating mirror (48) the exposure lines (16) will thus be correspondingly shorter or longer, whereby the printing pattern may be distorted.

Abstract: The present invention relates to a radiation-sensitive resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer binder. The copolymer binder comprises (meth)acrylic/(meth)acrylate copolymer.

Abstract: A developing solution comprising (A) at least one aromatic hydrocarbon having a boiling point of from 150.degree. to 300.degree. C.; (B) at least one alcohol represented by the following formula (I):R.sup.1 OH (I)wherein R.sup.1 represents an aliphatic or alicyclic alkyl group having from 5 to 12 carbon atoms, --C.sub.n H.sub.2n Ar, --(C.sub.m H.sub.2m O).sub.p C.sub.q H.sub.2q+1, a furfuryl group or a hydrogenated furfuryl group, an alkyl group substituted by an acyl group or an epoxy group, or --CH.sub.2 CH.sub.2 (OCH.sub.2 CH.sub.2).sub.r OR.sup.2 ; in which Ar represents an aromatic group; n represents an integer of from 1 to 3; m represents an integer of from 2 to 6; p represents 1 or 2; q represents 0 or an integer of from 1 to 4; R.sup.2 represents a hydrogen atom or an alkyl group; and r represents 0, 1 or 2; and (C) at least one compound represented by the following formula (II): ##STR1## wherein R.sup.3 and R.sup.

Abstract: A transfer recording medium comprising a substrate and a distributed layer of image forming elements, and an image forming method using the recording medium are provided. The distributed layer comprises first and second image forming elements. The first image forming elements comprise at least two species of different coloring characteristics which are capable of decreasing their transferabilities when provided with at light and heat energy under respectively prescribed at least two energy application conditions corresponding to the coloring characteristics. The second image forming element is capable of decreasing its transferability under any one of the at least two energy application conditions.

Abstract: A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the belt, a second surface opposite the first surface, and conduits which extend between first and second surfaces of the belt. The first surface of the framework has a paper side network formed therein which defines the conduits. The second surface of the framework has a backside network with passageways that provide surface texture irregularities in the backside network. The papermaking belt is made by applying a coating of photosensitive resinous material to a reinforcing structure which has opaque portions, and then exposing the photosensitive resinous material to light of an activating wavelength through a mask which has transparent and opaque regions and also through the reinforcing structure.

Abstract: A forming method of a fine resist pattern improve so as to form a fine pattern of high accuracy can be obtained. A positive-type photoresist 1 including naphthoquinone diazide and novolak resin is applied on a substrate. An anti-reflection film adjusted to alkalinity is applied on positive-type photoresist 1. Positive-type photoresist 1 on which anti-reflection film 9 is applied is selectively irradiated. Positive-type photoresist 1 is developed.

Abstract: High volume manufacturing process for flexographic printing plates comprises wash out, drying and post-exposure. During drying the printing plates are transported with a plurality of endless conveyors. The transport speed during drying/post-exposure is lower than the transport speed during wash out such that a storage of flexographic plates can be achieved in the drying and post exposure portion of the process.

Abstract: A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photoresist composition is also provided. The photoresist composition (1) includes a substance containing a skeleton as at least a part of the main chain. The skeleton is obtained through polymerization of a vinyl alcohol-type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by protective groups capable of being released by an acid. The skeleton preferably contains a group for improving the dry etching resistance. The photoresistive composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development and a negative pattern is obtained by alcohol development.

Abstract: Process for coating flexible belt seams including providing a flexible belt having an outwardly facing surface and a welded seam, forming a smooth liquid coating comprising a hardenable film forming polymer on the welded seam, the coating being substantially free of fugitive solvent, and hardening the coating to form a smooth solid coating on the seam.

Abstract: A developer for developing an electrostatic image is constituted by an insulating magnetic toner, inorganic fine powder and a flowability-improving agent having a BET specific surface area of at least 30 m.sup.2 /g. The insulating magnetic toner has a weight-average particle size (t-D.sub.4) of 4-14 .mu.m, a number-average particle size (t-D.sub.1) of 1-10 .mu.m, and a ratio (t-D.sub.4)/(t-D.sub.1) of 1.01-2. The inorganic fine powder has a weight-average particle size (m-D.sub.4) of 0.6-5 .mu.m, a number-average particle size (m-D.sub.1) of 0.5-4 .mu.m, and a ratio (m-D.sub.4)/(m-D.sub.1) which is in the range of 1.0-2.4 and is equal to or larger than the ratio (t-D.sub.4)/(t-D.sub.1). The inorganic fine powder is contained in an amount which is 2-8 times that of the flowability-improving agent by weight. The developer is able to retain stable developing performances by effecting suppressing preferential consumption of a particular particle size fraction in a long term of successive copying.

Abstract: Neutral density pigmented toner particles are produced by limited coalescence polymerization. The organic neutral density black colorant employed is a 1,4-bis arylazo derivative of 2,3-naphthalenediol.

Abstract: Optically active (optically non-linear or electro-optically active) waveguides are formed by depositing a layer of organic material, typically polymeric material, comprising one or more opticaly active components, and subjecting predetermined regions of the layer to actinic radiation to alter the refractive index of these regions.

Abstract: A coating-removing solution for photo-cross-linked and thermally cross-linked photoresist masks and solder resist masks cross-linked by exposure to light and heat and which solution contains a diglycol monoalkyl ether, a glycol monoalkyl ether, an alkali hydroxide, water, and a water-soluble fluoride.

Abstract: A developing solution comprising (A) at least one aromatic hydrocarbon having a boiling point of from 150.degree. to 300.degree. C.; (B) at least one alcohol represented by the following formula (I):R.sup.1 OH (I)wherein R.sup.1 represents an aliphatic or alicyclic alkyl group having from 5 to 12 carbon atoms, --C.sub.n H.sub.2n Ar, --(C.sub.m H.sub.2m O).sub.p C.sub.q H.sub.2q+1, a furfuryl group or a hydrogenated furfuryl group, an alkyl group substituted by an acyl group or an epoxy group, or --CH.sub.2 CH.sub.2 (OCH.sub.2 CH.sub.2).sub.r OR.sup.2 ; in which Ar represents an aromatic group; n represents an integer of from 1 to 3; m represents an integer of from 2 to 6; p represents 1 or 2; q represents 0 or an integer of from 1 to 4; R.sup.2 represents a hydrogen atom or an alkyl group; and r represents 0, 1 or 2; and (C) at least one compound represented by the following formula (II): ##STR1## wherein R.sup.3 and R.sup.

Abstract: A photocurable resin composition comprising (a) 100 parts by weight of a modified resin prepared by reacting an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride adduct having a softening point ranging from 70.degree. to 200.degree. C. and derived from a conjugated diene polymer or copolymer having a number average molecular weight of 500 to 5000 and a vinyl group content of 50 mole % or above, with an .alpha.,.beta.-unsaturated monocarboxylic acid ester having a specific alcoholic hydroxy group to open at least 10 mole % of the acid anhydride rings present in the adduct, (b) inorganic or organic powder having an average particle diameter of not larger than 5 .mu.m or inorganic powder grafted with a hydrocarbon residue, and (c) a photopolymerization initiator.

Abstract: A polycarbonate and a method of preparing the polycarbonate which comprises a repeating unit represented by the following general formula ##STR1## wherein each of R.sup.1 and R.sup.2 respectively is a halogen atom, an alkyl group, a cycloalkyl group or an aryl group, each of a and b is an integer of 0 to 4, and X is a single bond, --O--, --CO--, --S--, --SO--, --SO.sub.2 --, --CR.sup.3 R.sup.4 --, a 1,1-cycloalkylidene group or an .alpha.,.omega.-alkylene group, and end groups represented by the following general formulas ##STR2## wherein, R.sup.5 is a perfluoroalkyl group or substituted perfluoroalkyl group of 1 to 30 carbon atoms, Y is --CH.sub.2 --, e is an integer of 0 to 6, Z is --O--, --CO--, --OCO--, --S--, --SO--, --SO.sub.2 -- or --NHCO--, f is 0 or 1, R.sup.6 is a halogen atom, an alkyl group, a cycloalkyl group or an aryl group, and each of c and d is an integer satisfying c+d.ltoreq.

Abstract: A method and apparatus for controlling the rate of replenishment of chemical solutions in a photographic processing apparatus used for copying a photographic negative having a transmittance onto photographic material includes a number of steps and an apparatus for carrying out those steps. First, light is exposed onto the photographic negative to form a latent image of the photographic negative on the photographic material. Next, the latent image formed on the photographic material is developed by placing the photographic material in chemical solutions. The photographic material reacts with the chemical solutions to form an amount of dyes on the developed photographic material. The exposure given to the photographic material is measured and then the amount of dyes on the developed photographic material is obtained from the measured exposure.

Abstract: The invention relates to a process for producing microstructure elements having structure depths of from several .mu.m to the mm region by imagewise irradiation of polymers with X-rays, where the polymers employed are aliphatic polyesters.

Abstract: In a photolithographic process utilizing a wafer coated with a chemically amplified photoresist, a method for controlling a line dimension. The method comprises the steps of measuring at at least two times, and from at least two angles, evolving signals comprising intensities of light diffracted from a portion of an exposed patterned area on the waver, the evolving signals corresponding to vector combinations of time dependent light diffracted from the pattern appearing in the photoresist; and substantially time invariant light diffracted due to any underlying pattern beneath the photoresist; and, combining the measurements mathematically for extracting a contribution due to the pattern evolving in the photoresist.