Patents Examined by Bruce Anderson
  • Patent number: 6974951
    Abstract: A method and associated apparatus for in-process automated analysis employing a mass spectrometry ratio measurements is disclosed. It involves elemental and speciation threshold measurement that is optimized for quality assurance at and is capable of functioning at and near quantitative instrumental detection limits. The system is automated and may be employed in an unattended operation for identification and quantification of elemental or specie contaminants. In a preferred aspect of the method, a sample is subjected to equilibration with at least one spike after which it is subjected to ionization in an atmospheric ion generator and processed by a mass spectrometer with the output of the mass spectrometer being processed by a microprocessor which through a controller coordinates operation of sample and spike delivery and equilibration as well as the operation of the atmospheric ion generator and mass spectrometer. The method may in the alternative be employed qualitatively.
    Type: Grant
    Filed: December 4, 2001
    Date of Patent: December 13, 2005
    Assignee: Metara, Inc.
    Inventor: Howard M. Kingston
  • Patent number: 6765220
    Abstract: A compact infrared (IR) scene generator capable of generating multiple-color mid-IR scenes through the use of readily available commercial near-IR lasers and a fluorescent conversion material (FCM). Such a scene generator would be useful to test IR imaging sensors in a controlled laboratory environment. In operation, each laser emits energy at an initial wavelength outside the operating band of an IR imaging sensor. This energy of a first set of wavelengths is written onto the FCM in patterns, which collectively form an IR scene. The FCM absorbs the energy and radiates it at wavelengths longer than the initial wavelengths, i.e., a second set of wavelengths. As these longer wavelengths are within the operating waveband of the IR imaging sensor, the patterns written onto the FCM are detectable by it.
    Type: Grant
    Filed: January 10, 2001
    Date of Patent: July 20, 2004
    Assignee: Lockheed Martin Corporation
    Inventors: Albert W. Kongable, Mark T. Myers
  • Patent number: 6720556
    Abstract: A method of examining a sample, including: performing a first spectroscopic analysis of a surface portion of the sample when the sample surface portion is in a first electrical charge state; placing the sample surface portion in a second electrical charge state that is different from the first electrical charge state and performing a second spectroscopic analysis of the surface portion of the sample when the sample surface portion is in the second electrical charge state; and comparing the first spectroscopic analysis result with the second spectroscopic analysis result to obtain at least one of structural and electrical information about the sample.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: April 13, 2004
    Assignee: Yeda Research and Development Co. Ltd.
    Inventors: Hagai Cohen, Israel Rubinstein
  • Patent number: 6713759
    Abstract: An apparatus and method for inspecting a surface of a sample, particularly but not limited to a semiconductor device, using an electron beam is presented. The technique is called Secondary Electron Emission Microscopy (SEEM), and has significant advantages over both Scanning Electron Microscopy (SEM) and Low Energy Electron Microscopy (LEEM) techniques. In particular, the SEEM technique utilizes a beam of relatively high-energy primary electrons having a beam width appropriate for parallel, multi-pixel imaging. The electron energy is near a charge-stable condition to achieve faster imaging than was previously attainable with SEM, and charge neutrality unattainable with LEEM. The emitted electrons may be detected using a time delay integration detector.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: March 30, 2004
    Assignee: KLA Tencor Corporation
    Inventors: David L. Adler, David J. Walker, Fred Babian, Travis Wolfe
  • Patent number: 6700118
    Abstract: Adjustment systems, methods, computerized methods and computer readable-mediums that can be used in time-of-flight mass spectrometry (TOFMS) to account for thermal drift or mechanical strain are provided.
    Type: Grant
    Filed: August 15, 2001
    Date of Patent: March 2, 2004
    Assignee: Agilent Technologies, Inc.
    Inventors: George Yefchak, Carl Myerholtz, Gangqiang Li
  • Patent number: 6690022
    Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: February 10, 2004
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Grant Kenji Larsen, Ashwin Purohit, Robert A. Poitras, Morgan Evans, Damian Brennan
  • Patent number: 6686601
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: February 3, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson
  • Patent number: 6683304
    Abstract: A method for preparing a transmission electron microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder. Areas of the IC chip are removed by polishing until a region surrounding a particular contact or via is exposed. The piece of glass supports the IC chip during the polishing process. The IC chip is cut using a focused ion beam to create a thin membrane suitable for TEM failure analysis. The thin membrane includes a plan-view cross-section from the particular contact or via. The cross-sectional plan-view is perpendicular to the longitudinal axis of the contact or via.
    Type: Grant
    Filed: July 8, 2002
    Date of Patent: January 27, 2004
    Assignee: Chartered Semiconductor Manufacturing Limited
    Inventors: Dai Jiyan, Tee Siam Foong, Tai Chui Lam, Eddie Er, Shailesh Redkar
  • Patent number: 6680474
    Abstract: A semiconductor calibration wafer that has no charge effect is disclosed. The calibration wafer has a substrate layer and a conductive metal layer. The conductive metal layer completely covers the substrate layer, and has a critical dimension (CD) bar corresponding to a desired CD. The substrate layer may be an oxide layer or another type of substrate layer, whereas the conductive metal layer may be an aluminum layer, a copper layer, or another type of conductive metal layer. Where the calibration wafer is used in conjunction with a scanning electron microscope (SEM) to monitor the CD, the electrons ejected by the SEM do not remain on the semiconductor calibration wafer, but instead are carried away via the conductive metal layer. The calibration wafer is thus not vulnerable to the charge effect.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: January 20, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Chi-Yao Wang, Ming-Shuo Yen
  • Patent number: 6680477
    Abstract: Disclosed is an invention that provides a system and process for focusing light to micron and submicron spot sizes for matrix assisted laser desorption/ionization (MALDI). Moreover, the present invention features a second process and system for creating a correlated optical image of the ion desorption region of a sample substrate.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: January 20, 2004
    Assignee: Battelle Memorial Institute
    Inventors: Kenneth M. Beck, David S. Wunschel
  • Patent number: 6677583
    Abstract: The present invention proposes a liquid chromatograph/mass spectrometer (LC/MS) constructed so that only necessary data are efficiently collected, and that the apparent dynamic range and/or the operational condition of the MS part is appropriately changed according to the concentrations and/or the qualitative information of the sample components coming from the LC part. In the LC/MS, the passage of the carrier liquid is designed so that the carrier liquid containing the sample is first introduced to an auxiliary detector and then to a main detector (mass spectrometer) with a delay of a preset time period. During the analysis, a controller constructs a chromatogram from the output signal of the auxiliary detector and analyzes its waveform to determine in real-time a time period ts0-te0 corresponding to each peak in the chromatogram.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: January 13, 2004
    Assignee: Shimadzu Corporation
    Inventor: Yoshikatsu Umemura
  • Patent number: 6677587
    Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.
    Type: Grant
    Filed: December 27, 2002
    Date of Patent: January 13, 2004
    Assignee: Nikon Corporation
    Inventor: Yoshiaki Kohama
  • Patent number: 6669121
    Abstract: A holder support device in an electron microscope. The device has a detachable cylindrical holder extending along the X-axis. The holder support device permits the position of the inner end of the holder to be adjusted along the X-, Y-, and Z-axes and about the angular position about the X-axis. The support device has an inner cylinder rotatably held to an outer cylinder. The inner cylinder is provided with a holder through-hole and a pin guide hole. The holder is slidably held in the holder through-hole. The pin guide hole guides a pin on the holder when it is inserted into the holder through-hole. The outer cylinder is provided with a circumferential guide hole and axial guide holes.
    Type: Grant
    Filed: August 9, 2002
    Date of Patent: December 30, 2003
    Assignee: JEOL Ltd.
    Inventor: Toru Kasai
  • Patent number: 6661018
    Abstract: A gas jet nozzle (20, 60) for an extreme-ultraviolet light (EUV) source, including a housing (22, 62) having a front (24, 64) and a back (26, 66). The housing (22, 62) is coupleable to a primary gas source (44) and a secondary gas source (46) and is adapted to. expel primary gas (36, 76) and secondary gas (42, 82) from the housing front (24, 64). The housing (22, 62) has a gas-expelling primary channel (39, 70) located centrally within the housing (22, 62) and a gas-expelling secondary channel (34, 74) proximate the primary channel (39, 70). The primary channel (39, 70) may be circular and the secondary channel (34, 74) may be annular, surrounding the primary channel (39, 70). A secondary gas stream (42, 82) expelled from the secondary channel (34, 74) restricts the lateral expansion of a primary gas stream (36, 76) expelled from the primary channel (39, 70), optimizing gas jet properties and reducing heating and erosion of the nozzle (20, 60).
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: December 9, 2003
    Assignee: Northrop Grumman Corporation
    Inventors: Roy D. McGregor, Charles W. Clendening, Jr.
  • Patent number: 6657208
    Abstract: The resolution achieved with a proximity printing method and apparatus can be increased considerably by using, instead of a photo mask, a diffraction mask (30) wherein the image information is encoded in a two-dimensional array (32) of image cells (37) having dimensions which are smaller than the minimum feature size to be printed, each image cell having one out of at least two amplitude levels and one out of at least three phase levels. The mask may be a multiple focus mask which has multiple focal planes within one image field.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: December 2, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventor: Antonius Johannes Maria Nellissen
  • Patent number: 6657209
    Abstract: The invention provides a method and system for determining a pressure compensation factor for use in an ion implanter, which uses one or a small number of test workpieces. The method includes providing a test workpiece in the ion implantation system, wherein the test workpiece has at least one band region, assuming a predicted pressure compensation factor, implanting the at least one band region of the test workpiece with an ion beam using the ion implantation system and the predicted pressure compensation factor while measuring ion beam current and a pressure in the ion implantation system, measuring a sheet resistance associated with the implanted test workpiece, and determining a pressure compensation factor according to the predicted pressure compensation factor, the measured sheet resistance, the measured ion beam current, and the measured pressure.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: December 2, 2003
    Assignee: Axcelis Technologies, Inc.
    Inventor: Alfred Michael Halling
  • Patent number: 6653639
    Abstract: A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: November 25, 2003
    Assignee: Nikon Corporation
    Inventor: W. Thomas Novak
  • Patent number: 6653623
    Abstract: A method and associated apparatus for in-process automated analysis employing a modified form of isotope dilution mass spectrometry is disclosed. It involves elemental and speciation threshold measurement that is optimized for quality assurance at and is capable of functioning at and near quantitative instrumental detection limits. The system is automated and may be employed in an unattended operation for identification and quantification of elemental or specie contaminants. In a preferred aspect of the method, a sample is subjected to equilibration with at least one spiked enriched stable isotope element or specie after which it is subjected to ionization in an atmospheric ion generator and processed by a mass spectrometer with the output of the mass spectrometer being processed by a microprocessor which through a controller coordinates operation of sample and spike delivery and equilibration as well as the operation of the atmospheric ion generator and mass spectrometer.
    Type: Grant
    Filed: December 4, 2001
    Date of Patent: November 25, 2003
    Assignee: Metara, Inc.
    Inventor: Howard M. Kingston
  • Patent number: 6653641
    Abstract: A bulk material irradiation system includes an input for inserting bulk material. A bulk material tube is connected to the input, forming a path for bulk material flow. A pressurizing assembly is connected to the bulk material tube for forcing the bulk material to flow through the bulk material tube. An irradiation assembly provides ionizing radiation to irradiate the bulk material passing adjacent to the irradiation assembly in the bulk material tube. Irradiated bulk material exits the bulk material tube through an output.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: November 25, 2003
    Assignee: Mitec Incorporated
    Inventors: Stan V. Lyons, Steven E. Koenck, Brian T. Dalziel, Douglas C. White, Janette J. Kewley
  • Patent number: 6646261
    Abstract: The invention relates to wafer inspection by means of a scanning electron microscope (SEM) column in which the secondary electron detector 22, 24 is positioned centrally above the objective lens of the column. Secondary electrons that leave the central part of the specimen in a direction substantially perpendicular to its surface are inevitably collected in the central part of the detector surface where the bore 36 for the primary beam 6 is situated. Consequently, such electrons do not contribute to the detector signal. In order to avoid such a detrimental loss of signal contribution, it is proposed to provide a central electrode 35 in the central bore 36 such that secondary electrons that approach the bore are driven aside towards the electron-sensitive detector region 48.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: November 11, 2003
    Inventor: Jan Martijn Krans