Abstract: Systems, methods, and computer-readable storage media for performing a peer-to-peer (P2P) transfer by a third-party, where a method includes receiving transfer information and a first token including sender information of a sender and a second token including receiver information of a receiver, and validating the first token and the second token based on verifying both the sender and the receiver are registered with the real-time payment system. The method includes processing the first token and the second token based on determining a sender endpoint, a receiver endpoint, and a demand deposit account of the sender, and transmitting a request for a guarantee, the request for the guarantee including the sender endpoint and the demand deposit account of the sender. The method includes receiving an issued guarantee, transferring funds based on the transfer information, the first token, and the second token, and transmitting a transfer confirmation.

Abstract: Computer implemented systems and methods are disclosed that allow for the efficient and rapid determination of guarantee funds for clearing member firms. Disclosed systems and methods account for the exposure of self-referencing risk.

Abstract: Systems and methods are described for providing an enhanced rebate and marketing program which may automatically enroll a consumer in a loyalty programs after the consumer completes rebate form; filter consumer information to provide to customer relationship management campaigns; capture real-time consumer responses to queries; provide real-time and dynamic, targeted offers and other communications to consumers and recipients; and provide bonus added value to consumer received rebates.

Abstract: A method and associated apparatus for in-process automated analysis employing a mass spectrometry ratio measurements is disclosed. It involves elemental and speciation threshold measurement that is optimized for quality assurance at and is capable of functioning at and near quantitative instrumental detection limits. The system is automated and may be employed in an unattended operation for identification and quantification of elemental or specie contaminants. In a preferred aspect of the method, a sample is subjected to equilibration with at least one spike after which it is subjected to ionization in an atmospheric ion generator and processed by a mass spectrometer with the output of the mass spectrometer being processed by a microprocessor which through a controller coordinates operation of sample and spike delivery and equilibration as well as the operation of the atmospheric ion generator and mass spectrometer. The method may in the alternative be employed qualitatively.

Abstract: A compact infrared (IR) scene generator capable of generating multiple-color mid-IR scenes through the use of readily available commercial near-IR lasers and a fluorescent conversion material (FCM). Such a scene generator would be useful to test IR imaging sensors in a controlled laboratory environment. In operation, each laser emits energy at an initial wavelength outside the operating band of an IR imaging sensor. This energy of a first set of wavelengths is written onto the FCM in patterns, which collectively form an IR scene. The FCM absorbs the energy and radiates it at wavelengths longer than the initial wavelengths, i.e., a second set of wavelengths. As these longer wavelengths are within the operating waveband of the IR imaging sensor, the patterns written onto the FCM are detectable by it.

Abstract: A method of examining a sample, including: performing a first spectroscopic analysis of a surface portion of the sample when the sample surface portion is in a first electrical charge state; placing the sample surface portion in a second electrical charge state that is different from the first electrical charge state and performing a second spectroscopic analysis of the surface portion of the sample when the sample surface portion is in the second electrical charge state; and comparing the first spectroscopic analysis result with the second spectroscopic analysis result to obtain at least one of structural and electrical information about the sample.

Abstract: An apparatus and method for inspecting a surface of a sample, particularly but not limited to a semiconductor device, using an electron beam is presented. The technique is called Secondary Electron Emission Microscopy (SEEM), and has significant advantages over both Scanning Electron Microscopy (SEM) and Low Energy Electron Microscopy (LEEM) techniques. In particular, the SEEM technique utilizes a beam of relatively high-energy primary electrons having a beam width appropriate for parallel, multi-pixel imaging. The electron energy is near a charge-stable condition to achieve faster imaging than was previously attainable with SEM, and charge neutrality unattainable with LEEM. The emitted electrons may be detected using a time delay integration detector.

Abstract: Adjustment systems, methods, computerized methods and computer readable-mediums that can be used in time-of-flight mass spectrometry (TOFMS) to account for thermal drift or mechanical strain are provided.

Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.

Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.

Abstract: A method for preparing a transmission electron microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder. Areas of the IC chip are removed by polishing until a region surrounding a particular contact or via is exposed. The piece of glass supports the IC chip during the polishing process. The IC chip is cut using a focused ion beam to create a thin membrane suitable for TEM failure analysis. The thin membrane includes a plan-view cross-section from the particular contact or via. The cross-sectional plan-view is perpendicular to the longitudinal axis of the contact or via.

Abstract: A semiconductor calibration wafer that has no charge effect is disclosed. The calibration wafer has a substrate layer and a conductive metal layer. The conductive metal layer completely covers the substrate layer, and has a critical dimension (CD) bar corresponding to a desired CD. The substrate layer may be an oxide layer or another type of substrate layer, whereas the conductive metal layer may be an aluminum layer, a copper layer, or another type of conductive metal layer. Where the calibration wafer is used in conjunction with a scanning electron microscope (SEM) to monitor the CD, the electrons ejected by the SEM do not remain on the semiconductor calibration wafer, but instead are carried away via the conductive metal layer. The calibration wafer is thus not vulnerable to the charge effect.

Abstract: Disclosed is an invention that provides a system and process for focusing light to micron and submicron spot sizes for matrix assisted laser desorption/ionization (MALDI). Moreover, the present invention features a second process and system for creating a correlated optical image of the ion desorption region of a sample substrate.

Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.

Abstract: The present invention proposes a liquid chromatograph/mass spectrometer (LC/MS) constructed so that only necessary data are efficiently collected, and that the apparent dynamic range and/or the operational condition of the MS part is appropriately changed according to the concentrations and/or the qualitative information of the sample components coming from the LC part. In the LC/MS, the passage of the carrier liquid is designed so that the carrier liquid containing the sample is first introduced to an auxiliary detector and then to a main detector (mass spectrometer) with a delay of a preset time period. During the analysis, a controller constructs a chromatogram from the output signal of the auxiliary detector and analyzes its waveform to determine in real-time a time period ts0-te0 corresponding to each peak in the chromatogram.

Abstract: A holder support device in an electron microscope. The device has a detachable cylindrical holder extending along the X-axis. The holder support device permits the position of the inner end of the holder to be adjusted along the X-, Y-, and Z-axes and about the angular position about the X-axis. The support device has an inner cylinder rotatably held to an outer cylinder. The inner cylinder is provided with a holder through-hole and a pin guide hole. The holder is slidably held in the holder through-hole. The pin guide hole guides a pin on the holder when it is inserted into the holder through-hole. The outer cylinder is provided with a circumferential guide hole and axial guide holes.

Abstract: A gas jet nozzle (20, 60) for an extreme-ultraviolet light (EUV) source, including a housing (22, 62) having a front (24, 64) and a back (26, 66). The housing (22, 62) is coupleable to a primary gas source (44) and a secondary gas source (46) and is adapted to. expel primary gas (36, 76) and secondary gas (42, 82) from the housing front (24, 64). The housing (22, 62) has a gas-expelling primary channel (39, 70) located centrally within the housing (22, 62) and a gas-expelling secondary channel (34, 74) proximate the primary channel (39, 70). The primary channel (39, 70) may be circular and the secondary channel (34, 74) may be annular, surrounding the primary channel (39, 70). A secondary gas stream (42, 82) expelled from the secondary channel (34, 74) restricts the lateral expansion of a primary gas stream (36, 76) expelled from the primary channel (39, 70), optimizing gas jet properties and reducing heating and erosion of the nozzle (20, 60).

Abstract: The resolution achieved with a proximity printing method and apparatus can be increased considerably by using, instead of a photo mask, a diffraction mask (30) wherein the image information is encoded in a two-dimensional array (32) of image cells (37) having dimensions which are smaller than the minimum feature size to be printed, each image cell having one out of at least two amplitude levels and one out of at least three phase levels. The mask may be a multiple focus mask which has multiple focal planes within one image field.

Abstract: The invention provides a method and system for determining a pressure compensation factor for use in an ion implanter, which uses one or a small number of test workpieces. The method includes providing a test workpiece in the ion implantation system, wherein the test workpiece has at least one band region, assuming a predicted pressure compensation factor, implanting the at least one band region of the test workpiece with an ion beam using the ion implantation system and the predicted pressure compensation factor while measuring ion beam current and a pressure in the ion implantation system, measuring a sheet resistance associated with the implanted test workpiece, and determining a pressure compensation factor according to the predicted pressure compensation factor, the measured sheet resistance, the measured ion beam current, and the measured pressure.

Abstract: A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.