Abstract: A method and associated apparatus for in-process automated analysis employing a modified form of isotope dilution mass spectrometry is disclosed. It involves elemental and speciation threshold measurement that is optimized for quality assurance at and is capable of functioning at and near quantitative instrumental detection limits. The system is automated and may be employed in an unattended operation for identification and quantification of elemental or specie contaminants. In a preferred aspect of the method, a sample is subjected to equilibration with at least one spiked enriched stable isotope element or specie after which it is subjected to ionization in an atmospheric ion generator and processed by a mass spectrometer with the output of the mass spectrometer being processed by a microprocessor which through a controller coordinates operation of sample and spike delivery and equilibration as well as the operation of the atmospheric ion generator and mass spectrometer.

Abstract: An apparatus for delivering ions between vacuum stages. The apparatus includes a concave electrode ion pipe originating in a first vacuum stage and terminating in a second vacuum stage. The design of the concave electrode ion pipe provides for transport of ions over long distances without substantial loss of the ions while at the same time restricting overall gas flow. The invention allows for the elimination of vacuum stages or a reduction in vacuum pumping speed(s) if the same number of vacuum stages is employed.

Abstract: A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

Abstract: The invention relates to wafer inspection by means of a scanning electron microscope (SEM) column in which the secondary electron detector 22, 24 is positioned centrally above the objective lens of the column. Secondary electrons that leave the central part of the specimen in a direction substantially perpendicular to its surface are inevitably collected in the central part of the detector surface where the bore 36 for the primary beam 6 is situated. Consequently, such electrons do not contribute to the detector signal. In order to avoid such a detrimental loss of signal contribution, it is proposed to provide a central electrode 35 in the central bore 36 such that secondary electrons that approach the bore are driven aside towards the electron-sensitive detector region 48.

Abstract: A mass spectrometry apparatus is provided with a mass spectrometry mechanism for analyzing the mass of ionized detected gas. The mass spectrometry apparatus is further provided with two ion sources, that is, a first ion source for attaching positive charge metal ions to cause ionization, and a second ion source for causing electrons to impact to cause ionization. Based on the configuration, it becomes possible to simultaneously or separately measure the molecular weight and analyze the molecular structure of the detected gas with a high sensitivity. The second ion source is positioned between the first ion source and the mass spectrometry mechanism and the detected gas is introduced into the first ion source. According to the above mass spectrometry apparatus, it is possible to measure the accurate molecular weight of the detected gas with a sufficient sensitivity and to simultaneously analyze the molecular structure with a sufficient sensitivity.

Abstract: A small and compact infrared scene projector allows for projection of infrared images from a variety of sources. The unit utilizes an external power supply to reduce the weight of the unit and has several input pathways such as an integrated RS-232 serial port and a video port for receiving RS-170 formatted video signals. The projector uses a digital signal processor to control its internal electronics and for on-board generation of pre-programmed infrared images. A processor electronics card and a scene generator electronics card communicate internally to generate images and to control a thermoelectric cooling device mounted to a semiconductor infrared emitter array to project flicker free, high resolution infrared images. Optics in the form of an interchangeable lens or a mirrored collimator allow for projection of a generated image onto a test object.

Abstract: An ultraviolet device used for flooding an air duct of an air ventilation system with ultraviolet light comprising a mounting portion, the mounting portion that is mountable to an air duct, at least one mounting bracket which is interchangeably mountable to the mounting portion and at least one ultraviolet light lamp, the lamp is mountable to the mounting bracket wherein the angle at which the lamp mounts to said mounting bracket may be configured to maximize the coverage of ultraviolet light within the air duct.

Abstract: A sample changer for transferring radioactive samples between a hot cell (12) and a measuring apparatus (10), as e.g. a hybrid K-edge densitometer, comprises a transfer channel (28) axially extending through a tubular containment (22) between the charging/discharging port and the measuring window section D. A recipient (24), with at least one compartment (100) for receiving therein a radioactive sample, is arranged in the transfer channel (28) so as to be movable therethrough. A threaded spindle (44) is rotatably housed in a spindle channel (42) below the transfer channel (28). A coupling (46) passing in a sealed manner through the closed rear end section connects a stepping motor (34) to the threaded spindle (44). A longitudinally guided support carriage supports the magazine (24) and engages the threaded spindle (44), so as to be subjected to a translational movement upon rotation of the spindle (44).

Abstract: A mass spectrometer has an ion source for producing sample ions. The ions pass through an ion interface, to a reaction/collision cell section. An ion-neutral decoupling device is provided between the ion interface and the reaction/collision cell section, to provide substantial separation between ions and neutral particles. The supersonic jet entering the spectrometer can have sufficient energy to cause the plasma gases, such as argon, to overcome the pressure differential between the reaction/collision cell and an upstream section of the spectrometer so as to penetrate into the reaction/collision cell; the decoupling device prevents this. The decoupling device can have offset apertures provided by plates or rods or other comparable arrangements, or can comprise a quadrupolar electrostatic deflector, an electrostatic sector deflector or a magnetic sector deflector.

Abstract: An electrostatic pin chuck consisting of an annular array of gas inlets, located towards the periphery of the chuck, for providing a uniform distribution of cooling gas to a wafer held by the chuck. This uniform distribution of cooling gas results in a uniform transfer of heat from the wafer to the chuck. Two annular rims positioned towards the outer perimeter of the chuck, and separated by an annular array of vacuum pumpout ports connected through a manifold to a vacuum pump, help to prevent leakages of cooling gas by functioning as gas bearing seals. Varying the annular thickness of the inner and outer rim, vacuum pump pressure, and the space between the wafer and chuck all affect the leakage rate of cooling gas from the chuck.

Abstract: An apparatus and method for distributing dopant gas or vapor in an arc chamber of ion source used as part of an ion implanter. The apparatus includes a plenum, a sub-plenum, and a baffle to distribute the dopant gas or vapor through out the arc chamber. The method allows dopant gas and vapors to be distributed in such a way as to cause efficient reaction of dopant gas or vapor molecules with electrons created by a filament contained in the arc chamber. The reaction of dopant gas or vapor molecules with the electrons in turn produces positively charged ions by the ion implanter.

Abstract: Methods are disclosed for performing a calibration of a charged-particle-beam (CPB) microlithography apparatus. In an embodiment, a specimen having a crystal-orientation plane is mounted on a specimen stage of the CPB microlithography apparatus. A charged particle beam (e.g., electron beam) produced by a suitable source passes through a CPB-optical system so as to irradiate the surface of the specimen. Using a deflector, the beam is scanned over an area of the specimen surface, and backscattered charged particles produced by the irradiated area of the specimen are detected. A corresponding electrical signal produced by detecting the backscattered particles is produced. The signal has a property that is a function of the specific crystalline properties of the specimen surface. From the signal, the relationship between the angle of incidence of the beam on the specimen surface versus the output of the deflector is determined and used to calibrate the beam axis of the CPB-optical system.

Abstract: The invention relates to the scanning and representation of daughter ion spectra for the purpose of determining the structural characteristics of parent ions in ion traps. The invention consists of combining all or selected daughter and granddaughter spectra of a parent ion over several generations in one combined descendants spectrum. This combined descendants spectrum can be depicted as a graphic or a list. The references to origin can be plotted on the combined descendants spectrum. For biopolymers, where the loss of fragments can be identified due to their mass, the names or abbreviations of lost molecule fragments can be entered. The criteria for selection of the spectra can be predefined; in this way, the spectra can be depicted and even scanned automatically.

Abstract: A method of producing a broad-band signal including a plurality of component frequencies of regular or irregular intervals, where the broad-band signal is used to apply an alternating voltage to the end cap electrodes of an ion trap mass spectrometer. The method includes the following steps: (S3) a sinusoidal signal having one of the component frequencies with 0° initial phase angle is generated; (S4) the sinusoidal signal is added to a current temporary superposed signal to produce an addition signal; (S5) the sinusoidal signal is subtracted from the current temporary superposed signal to produce a subtraction signal; (S6-S12) either of the addition signal or the subtraction signal is selected that has a smaller amplitude as a next temporary superposed signal; and (S13) the steps are repeated for all the component frequencies.

Abstract: A magnetic lens focuses a charged particle beam generated by an instrument to a very small spot for deriving characteristics of a sample. The magnetic flux pattern is created by splitting the winding coil into a primary coil and a secondary coil. This enables faster adjustment of the magnetic flux, and with improved resolution.

Abstract: For producing an exposure pattern on a curved, in particular concave substrate field of a substrate which comprises a layer of resist material sensitive to exposure to an energetic radiation, in a pattern transfer system a wide, substantially parallel beam of said energetic radiation is produced, and by means of said beam a planar mask having a structure pattern, namely, a set of transparent windows to form a structured beam, is illuminated and the structure pattern is imaged onto the substrate by means of the structured beam, producing a pattern image, namely, a spatial distribution of irradiation over the substrate.

Abstract: A cold light UV irradiation device is used for curing UV paint and UV printing dyes on heat-sensitive substrates (12,13). It is used, for example, in plants for printing on packaging foils or in the production line for CD□s (Compact Discs) and DVD□s (Digital Versatile Discs). The irradiation devices used until now emit in addition to the UV radiation also a high portion of heat radiation (IR Radiation) onto the substrate (12,13), which often leads to deformation and brittleness of the substrate. The present invention allows an effective separation of the UV radiation from the IR radiation. With short beam paths, a high UV intensity with a low heat load of the substrate is realized.

Abstract: The improved process according to the invention prepares samples for subsequent imaging by directing the FIB beam so that its incident angle is not parallel to the planar boundaries between the materials with different etch rates. This nonparallel alignment has the effect of evening out the etch rate, since most of the key beamlets cut more than one type of material. SEM images of the resulting samples are easier to interpret than those produced by the prior art since the obscuring effect of curtaining is reduced. This allows greater accuracy of measurement from the image obtained by an SEM. A method according to a preferred embodiment of the invention is used to prepare a pole piece tip of a magnetic transducer so that the bottom width may be more accurately measured.

Abstract: A radiation shield device (100) and method, the apparatus comprising either an absorbing shield (130), a scattering shield (200) or an absorbing and scattering shield (300) arranged in a processing tool (50) that irradiates a workpiece (70) with high-irradiance radiation (80) from a light source (78). The processing tool has a tool portion (66) having an irradiance damage threshold (IDT). The radiation shield device is designed to intercept a portion of the high-irradiance radiation that would otherwise be incident the tool portion, and to ensure that radiation exiting the particular shield comprising the radiation shield device and incident the tool portion has an irradiance below the tool portion irradiance damage threshold. The method includes using the radiation shield device in processing a workpiece using a processing tool.

Abstract: A process and apparatus for separating element isotopes in space by heating a stream of raw materials using concentrated sunlight and ionizing radiation, followed by electromagnetic separation, and collection of the desired isotopes in appropriate receptacles. The unique design of this invention allows flexibility of implementation, very high separation efficiency, and minimal waste. The intent of collecting a multiplicity of isotopes simultaneously is a key feature of this invention. The goal for this work is to greatly reduce the cost of producing purified finished materials in space. This capability makes economical the fabrication of complex and large structures for space-based industry and habitation. This invention builds upon the sciences of plasma physics, ion separation, and microgravity processing, and incorporates new concepts of the integral design and efficient process operation, taking advantage of the peculiar properties of a microgravity environment.