Abstract: The invention provides an objective lens 1 for focusing a charged particle beam 30 on a specimen. The objective lens comprises a first focusing lens 2 positioned between a charged particle source and the specimen for finely focusing the beam of charged particles on the specimen. The objective lens further comprises a second focusing electrostatic lens 20 positioned between the first focusing lens and the specimen for coarsely focusing the beam of charged particles on the specimen.

Abstract: A back scattered ion receiver is mounted on the process chamber of an ion implanter to receive beam ions back scattered from a wafer mounted on the wafer holder in the chamber. Minima in the intensity of back scattered ions as the wafer on the holder is moved relative to the beam direction, can be used to obtain an accurate calibration of the true beam direction. Beam direction error can then be compensated for when operating holder tilt and twist mechanisms so as to bring a process wafer accurately into the required orientation relative to the true beam. If the crystallographic alignment and orientation of process wafers has been precharacterised, this data can be used to control the wafer holder to align process wafers crystallographically to the process beam.

Abstract: The installation for microscopic observation of a semiconductor electronic circuit includes, in a vacuum, a reflection particle interaction microscope and parts for supporting the circuit facing the reflection particle interaction microscope. The installation further includes a reflection optical microscope including optical observation part and elements for illuminating the circuit to be observed, with the illumination elements and the optical observation part on the same side of the circuit and the reflection optical microscope and the reflection particle interaction microscope disposed face-to-face on a common observation axis on respective opposite sides of the circuit.

Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.

Abstract: The mass resolution and accuracy of delayed extraction matrix assisted desorption/ionization time of flight mass spectrometry is improved by spatially separating the electric field used for driving extraction/acceleration from the sample being analyzed.

Abstract: An autoadjusting charged-particle probe-forming apparatus improving the resolution of probe-forming charged-particle optical systems by minimizing optical aberrations. The apparatus comprises a source of charged particles, a probe-forming system of charged-particle lenses, a plurality of detectors optionally comprising a two-dimensional image detector, power supplies, a computer and appropriate software. Images are recorded by the two-dimensional detector and analyzed to determine the aberration characteristics of the apparatus. Alternately, multiple scanned images are recorded by a scanned image detector and also analyzed to determine the aberration characteristics of the apparatus. The aberration characteristics are used to automatically adjust the apparatus for improved optical performance.

Abstract: Embodiments of the present invention provide methods for measuring a wafer surface. A portion of the wafer surface is measured using a particle counter to provide first measurements corresponding to a plurality of points on the wafer surface. A selected area of the wafer surface including one of the plurality of points is measured using an atomic force microscope (AFM) to provide a microroughness measurement of the selected area. The selected area is a localized area of the portion of the wafer surface measured using the particle counter. The first measurements and the microroughness measurement are provided as a measurement of the wafer surface. The portion measured using a particle counter may, for example, be substantially the entire wafer surface.

Abstract: A method and system are provided for measuring water current. An acoustically-modulated beam of radiation is transmitted to a target location on the surface of a body of water. As the beam transits the water, acoustic radiation propagates away from the beam towards the surface and experiences a Doppler shift in frequency relative to the acoustic frequency used for modulation. The Doppler shift is caused by current in the water through which the acoustic radiation transits. The Doppler-shifted frequency is measured as an indication of water current.

Abstract: A goniometer for performing scanning probe microscopy on a substrate surface is disclosed. The goniometer has a cantilever, having a cantilevered end and a supported end and a tip disposed at the cantilevered end of the cantilever. The goniometer also has a block disposed at the supported end of the cantilever. The block has at least one pair of piezoelectric layers, a pair of electrodes disposed about each individual piezoelectric layer such that varying a potential difference applied between the individual electrodes of a pair of electrodes causes the corresponding piezoelectric layer to deform, and a first insulating material disposed between the individual electrodes for insulating the individual electrodes from each other. The individual piezoelectric layers are deformed at different rates resulting in a deformity of the block and tilting of the cantilever and tip connected therewith.

Abstract: The invention provides an aligner enabling to perform high accuracy positioning at manufacturing a multi-layered circuit board. A board alignment mark is photographed by a CCD camera by irradiating X-ray from an X-ray generator at the state removing a photo mask, and position of the board alignment mark is memorized. Then, the photo mask is set on a print circuit board, a mask alignment mark is photographed, and positioning of the mask alignment mark and the print circuit board is performed by comparing with position of memorized board alignment mark and by moving a platen so that the gap becomes zero.

Abstract: A high efficiency enhanced detecting light guide scintillator detector for charged particle beam apparatus, wherein primary beam passes through the light guide scintillator detector. Light guide scintillator detector is formed as a fork-like part having an open area covering effectively the same area in which the shadow of the primary beam shielding causes low efficiency detection of impinging charged particles. There is further provided a conductive grid or mesh-sheet fitted in the open area between the prongs of the fork-like part biased at various electric potentials inducing one out of many desired possible interactions with detected charged particles such as e.g. deflection and generation of SE's.

Abstract: A process treats the surface of a polymeric tampon applicator so as to improve its whitening. The process applies electron beam energy to the applicator in sufficient magnitude and time duration to achieve the desired whitening.

Abstract: An apparatus and method for removing neutral noise from a quadrupole mass filter ion beam. A mask plate has a lobed aperture centered on a longitudinal axis and positioned between a quadrupole mass filter exit end and an ion detector. The mask plate operates to remove neutral atoms from the ion beam that may interfere with instrument sensitivities. The lobed aperture passes the ion beam with little loss of the ion beam intensity. The invention substantially maintains signal intensity and removes unwanted noise from a mass spectrometer.

Abstract: Charged-particle-beam (CPB) microlithography apparatus and methods are disclosed that produce reduced blur resulting from the Coulomb effect, without having to reduce exposure current, exposure accuracy, or throughput. An exemplary apparatus is configured to expose regions (“exposure units” or “subfields”) each having a maximal lateral dimension of at least 1 mm. The beam half-angle (half width at half maximum of the distribution of beam intensity) is 1 mrad or less.

Abstract: The present invention includes a magnetic storage ring into which electrons or other charged particles can be injected from a point external to the ring and still subscribe a path, after injection, contained within the magnetic storage ring. The magnetic storage ring consists of purely static (permanent) magnetic fields. The particles pass one or more times through a solid target that causes the high energy charged particles to emit radiation and damps the momentum of the particles, so that they cannot escape the magnetic field, allowing them to be captured therein.

Abstract: Methods and apparatus are disclosed for performing charged-particle-beam (CPB) microlithography, in which states of contamination of any of various components in the CPB column are monitored. From data concerning state(s) of contamination of one or more components, information is provided regarding when system cleaning is required (i.e., cleaning intervals). Thus, problems such as degradation of resolution and increased beam deflection distortion over time are avoided, and consistently more accurate pattern transfers are performed. Detection of contaminants on selected component(s) can be performed by mass analysis of contaminant molecules released from the component(s) during irradiation of the component(s) with the charged particle beam. Mass analysis data are routed to a control computer, which analyzes a correlation between the types and amounts of molecules of a specific contaminant and detected beam-position variance arising from accumulated contaminant.

Abstract: The present invention provides, according to a first aspect, a method for automatically evaluating the performance of a charged particle device. The method uses a signal coming from a gold-on-carbon reference target. From this signal the spot size of the particle beam is determined. The method according to the present invention has the advantage that it does not depend on operator judgment. Therefore, the method leads to improved consistency, accuracy and reliability of the beam characterization, and, accordingly, to a better characterization of the quality of the system's performance.

Abstract: A plasma mass spectrometer comprises a plasma torch (1) for generating ions from a sample introduced into a plasma (2), a nozzle-skimmer interface (3,5) for transmitting said ions into a first evacuated chamber (11), ion guiding means (12), an apertured diaphragm (18) dividing said first evacuated chamber (11) from a second evacuated chamber, and an ion mass-to-charge ratio analyzer in the second chamber for producing a mass spectrum. The ion guiding means comprises a multipole rod-set (13,14,15), means for applying an AC voltage between rods in the set, and means (22) for introducing into said ion guiding means an inert gas selected from the group comprising helium, neon, argon, krypton, xenon and nitrogen so that the partial pressure of said inert gas inside said rod-set is at least 10−3 torr. Interfering peaks in the spectrum, such as Ar+, are thereby reduced.

Abstract: Multiple sample introduction means have been configured in Atmospheric Pressure Ion sources which are interfaced to mass analyzers. Different samples can be introduced through multiple Electrospray (ES) or Atmospheric Pressure Chemical Ionization (APCI) probes individually or simultaneously and ionized. The gas phase ion mixture resulting from individual solutions sprayed from multiple ES or APCI probe inputs is mass analyzed. In this manner a calibration solution can be introduced through one ES or APCI probe while one or more sample solutions are spray from additional probes. Simultaneous spraying of calibration and sample solutions, results in an acquired mass spectrum containing peaks of ions with known molecular weights as well as sample related peaks. The calibration peaks can be used as an internal calibration standard during data analysis.

Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam.