Abstract: A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus, such that the initial exposure is performed while using non-standard alignment model settings optimized for accuracy, such as those used for testing the apparatus. An associated lithographic apparatus is also disclosed.

Abstract: Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen contents to the instant film, using a collimation layer that may be embedded in an opaque ribbon and drawn across the instant film. The collimation layer blocks any light not parallel to the normal vector of the display screen, thereby eliminating the need for traditional lenses to focus light. This in turn allows the printing device to yield high resolution photos with very short printing timeframes.

Abstract: A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.

Abstract: The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component in a first polarization direction of the incident light and a phase of a second polarized light component in a second polarization direction perpendicular to the first polarization direction, to form a phase difference distribution between phase distributions for the first and second polarized light components. The plurality of cells are designed so that a number of phase difference levels of the phase difference distribution is less than a number of phase levels of the phase distribution of the first polarized light component.

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Abstract: An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

Abstract: A mask alignment method for a substrate holding apparatus. A first engaging portion is formed in one of a substrate holder and a mask and has two protruding portions. A second engaging portion is formed in the other one of the substrate holder and the mask and has at least one protruding portion. First groove portions formed in the other one of the substrate holder and the mask engage with the protruding portions of the first engaging portion. A second groove portion formed in the other one of the substrate holder and the mask engages with the protruding portion of the second engaging portion.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

Abstract: A system and method for calibrating system parameters of a lithography apparatus is disclosed. The system includes a measurement device configured to measure an overlay error between patterns formed on a substrate during different exposures and a processing device configured to determine a model representative of a relationship between the overlay error and a system parameter error based on the measured overlay error. The method includes measuring an overlay error between patterns formed at different exposures with the substrate positioned at different orientations during each of the different exposures. The method further includes determining a model representative of a relationship between the overlay error and a system parameter error based on the measured overlay error and deriving a calibration correction factor from the model.

Abstract: A processing apparatus includes a unit processing an object, a first conveyer to perform conveyance of the object between the unit and a station arranged between an external apparatus and the unit, the external apparatus including a second conveyer to hold the object with a hand thereof to perform conveyance of the object to or from the station, and a controller to output a request signal and a stop instruction signal. The request signal requests the external apparatus to perform the conveyance by the second conveyer, and is output before the processing apparatus becomes a state to allow the second conveyer to perform the conveyance, and the stop instruction signal instructs the external apparatus to stop the hand and is output based on a state of the processing apparatus after an output of the request signal and before the conveyance of the second conveyer.

Abstract: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective.

Abstract: Disclosed are systems and methods for a fluid transportation system having a first flexible tube with an inner wall. The fluid transportation system also has a second flexible tube with an outer wall. The second tube is located inside the first tube and a standoff is located between the inner wall of the first tube and the outer wall of the second tube. The first flexible tube is configured to transport a first fluid and the second flexible tube is configured to transport a second fluid. The first and second flexible tubes are configured such that the first fluid isolates the second fluid from an ambient environment, and the first fluid can be monitored for leakage.

Abstract: An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger includes at least one well defined therein. The mirror assembly includes a mirror block having a mirrored surface. The mirror assembly also has at least one surface. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The at least one surface is in contact with the liquid metal to transfer heat from the mirror block to the heat exchanger.

Abstract: An exposure apparatus exposes a substrate via a projection optical system and a liquid. The exposure apparatus includes a stage that is movable below the projection optical system while holding the substrate and a detector that is capable of detecting a liquid adhered to a rear surface of the substrate. As an alternative, or in addition, the apparatus can include a detector that is capable of detecting a liquid adhered to an optical member disposed at the stage.

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred from the first mirror block to the heat exchanger.

Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.

Abstract: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.