Abstract: A method for forming a metal-semiconductor alloy layer uses particular thermal annealing conditions to provide a stress free metal-semiconductor alloy layer through interdiffusion of a buried semiconductor material layer and a metal-semiconductor alloy forming metal layer that contacts the buried semiconductor material layer within an aperture through a capping layer beneath which is buried the semiconductor material layer. A resulting semiconductor structure includes the metal-semiconductor alloy layer that further includes an interconnect portion beneath the capping layer and a contiguous via portion that penetrates at least partially through the capping layer. Such a metal-semiconductor alloy layer may be located interposed between a substrate and a semiconductor device having an active doped region.

Abstract: Fiber-amplifier device the light-path of which is devoid of a free-space element. The system device an all-fiber-optic Faraday rotator and isolator. The device has a multicomponent glass optical fiber having a core having a first doping concentration of 55%-85% (wt./wt.) of a first rare-earth oxide and a the isolator includes at least three magnetic cells with throughout bores hosting an optical fiber, the same magnetic poles of two immediately neighboring cells facing each other. The first rare-earth oxide includes one or more of Pr2O3, Nd2O3, Pm2O3, Sm2O3, Eu2O3, Gd2O3, Tb2O3, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, La2O3, Ga2O3, Ce2O3, and Lu2O3.

Abstract: A memory card has a wiring board, four memory chips stacked on a main surface of the wiring board, and a controller chip and an interposer mounted on a surface of the memory chip of the uppermost layer. The memory chips are stacked on the surface of the wiring board so that their long sides are directed in the same direction as that of the long side of the wiring board. The memory chip of the lowermost layer is mounted on the wiring board in a dislocated manner by a predetermined distance in a direction toward a front end of the memory card so as not to overlap the pads of the wiring board. The three memory chips stacked on the memory chip of the lowermost layer are disposed so that their short sides on which pads are formed are located at the front end of the memory card.

Abstract: A copper bonding compatible bond pad structure and associated method is disclosed. The device bond pad structure includes a buffering structure formed of regions of interconnect metal and regions of non-conductive passivation material, the buffering structure providing buffering of underlying layers and structures of the device.

Abstract: A semiconductor device includes a recess in a polymer layer between two adjacent metal lines and over passivation layer or anti-electromigration layers on redistribution metal lines to increase the resistance to electromigration.

Abstract: An electronic package with improved warpage compensation. The electronic package includes a mold cap having a variable thickness. The variable thickness can have a mound or dimple design. In another embodiment, a method is provided for reducing unit warpage of an electronic package by designing the topography of a mold cap to compensate for warpage.

Abstract: Some embodiments include semiconductor processing methods in which a copper barrier is formed to be laterally offset from a copper component, and in which nickel is formed to extend across both the barrier and the component. The barrier may extend around an entire lateral periphery of the component, and may be spaced from the component by an intervening ring of electrically insulative material. The copper component may be a bond pad or an interconnect between two levels of metal layers. Some embodiments include semiconductor constructions in which nickel extends across a copper component, a copper barrier is laterally offset from the copper component, and an insulative material is between the copper barrier and the copper component.

Abstract: An embodiment of the invention provides a chip package, which includes: a semiconductor substrate having a device region; a package layer disposed on the semiconductor substrate; a spacing layer disposed between the semiconductor substrate and the package layer and surrounding the device region; and an auxiliary pattern having a hollow pattern formed in the spacing layer, a material pattern located between the spacing layer and the device region, or combinations thereof.

Abstract: A backside mold configuration (BSMC) process for manufacturing packaged integrated circuits includes applying a mold compound to a side of a packaging substrate opposite an attached die. The mold compound is deposited on a dielectric (such as photo resist). The mold compound and dielectric are patterned after coupling a die to the packaging substrate to expose a contact pad of the packaging substrate. After patterning the mold compound and dielectric, a packaging connection is coupled to contact pads through the mold compound and dielectric. The mold compound surrounding the packaging connection reduces warpage of the packaging substrate during processing. Additionally, patterning the dielectric after attaching the die improves reliability of the packaging connection.

Abstract: This disclosure provides systems, methods and apparatus for manufacturing display devices having electronic components mounted within a display device package. In one aspect, the electronic component connects to the exterior of the display device through pads that run below a seal that holds a substrate and a backplate of the display device together. In another aspect the electronic components also connect to an electromechanical device within the display device, as well as connecting to pads that are external to the display device.

Abstract: A die assembly includes a die mounted to a support, in which the support has interconnect pedestals formed at bond pads, and the die has interconnect terminals projecting beyond a die edge into corresponding pedestals. Also, a support has interconnect pedestals. Also, a method for electrically interconnecting a die to a support includes providing a support having interconnect pedestals formed at bond pads on the die mount surface of the support, providing a die having interconnect terminals projecting beyond a die edge, positioning the die in relation to the support such that the terminals are aligned with the corresponding pedestals, and moving the die and the support toward one another so that the terminals contact the respective pedestals.

Abstract: A semiconductor component having improved thermomechanical durability has in a semiconductor substrate at least one cell comprising a first main electrode zone, a second main electrode zone and a control electrode zone lying in between. For making contact with the main electrode zone, at least one metallization layer composed of copper or a copper alloy is provided which is connected to at least one bonding electrode which likewise comprises copper or a copper alloy.

Abstract: The present invention discloses a semiconductor device and a manufacturing method therefor. Conventionally, platinum is deposited in a device substrate to suppress diffusion of nickel in nickel silicide. However, introducing platinum by means of deposition makes the platinum only stay on the surface but fails to effectively suppress the diffusion of nickel over a desirable depth. According to the present invention, a semiconductor device is formed by implanting platinum into a substrate and forming NiSi in a region of the substrate where platinum is implanted. With the present invention, platinum can be distributed over a desirable depth range so as to more effectively suppress nickel diffusion.

Abstract: A method of forming a semiconductor device includes forming first and second bumps on a semiconductor substrate, forming first and second penetration electrodes penetrating the semiconductor substrate, forming a first conductive structure making a first electrical path between the first bump and the first penetration electrode, and forming a second conductive structure making a second electrical path between the second bump and the second penetration electrode, the second conductive structure being smaller in resistance value than the first conductive structure.

Abstract: A chip package includes a PCB, a connecting pad fixed on a surface of the PCB and a chip fixed on the connecting pad. The connecting pad includes a first metal film on its surface facing away from the PCB. The chip includes a second metal film formed on its surface opposite to the PCB. The first and the second metal are connected to each other via a eutectic manner.

Abstract: A method for fabricating a semiconductor chip module and a semiconductor chip package is disclosed. One embodiment provides a first layer, a second layer, and a base layer. The first layer is disposed on the base layer, and the second layer is disposed on the first layer. A plurality of semiconductor chips is applied above the second layer, and the second layer with the applied semiconductor chips is separated from the first layer.

Abstract: A semiconductor device includes a plurality of parallel-trenches that are parallel to each other, a plurality of intersect-trenches that are parallel to each other, a plurality of active regions that are confined by the parallel-trenches and the intersect-trenches, a plurality of lower conductive lines that cross the active regions, a plurality of upper conductive lines that are parallel to each other, that cross the lower conductive lines, and that cross over the active regions, and data storage elements connected to the active regions. Each of the parallel-trenches and the intersect-trenches is a straight line. The parallel-trenches cross the upper conductive lines and form a first acute angle with the upper conductive lines. The intersect-trenches cross the parallel-trenches and form a second acute angle with the parallel-trenches.

Abstract: An integrated circuit structure includes a bond pad; an Mtop pad located directly underlying the bond pad; an Mtop-1 pad having at least a portion directly underlying the Mtop pad, wherein at least one of the Mtop pad and the Mtop-1 pad has a horizontal dimension smaller than a horizontal dimension of the bond pad; a plurality of vias interconnecting the Mtop pad and the Mtop-1 pad; and a bond ball on the bond pad. Each of the Mtop pad and the Mtop-1 pad has positive enclosures to the bond ball in all horizontal directions.

Abstract: This invention provides an optical device comprising a large group of non-uniform resonators operating cumulatively as a ‘super-ring’ to provide a controllable group delay with large bandwidth. The super-ring tuning is performed by a single control. The device may include two super-rings, each includes a large number of resonators with a resonant frequencies centered around ?1 and ?2 respectively. The invention provides multiple ways to improve the delay duration, bandwidth and the tuning speed, and overcomes the issue of non-uniformity of resonance frequency for devices incorporating multiple optical resonators.

Abstract: The inventive optical fiber coupler array is capable of providing a low loss, high-coupling coefficient interface with high accuracy and easy alignment between a plurality of optical fibers (or other optical devices) with a first channel-to-channel spacing, and an optical device having a plurality of closely-spaced waveguide interfaces with a second channel-to-channel spacing, where each end of the optical fiber coupler array is configurable to have different channel-to-channel spacing, each matched to a corresponding one of the first and second channel-to-channel spacing. The novel optical coupler array includes a plurality of waveguides (at least one of which may optionally be polarization maintaining), that comprises at least one gradually reduced vanishing core fiber, at least in part embedded within a common housing structure. Alternatively, the novel coupler array may be configured for utilization with at least one of an optical fiber amplifier and an optical fiber laser.