Patents Examined by Christopher M. Kalivoda
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Patent number: 6717134Abstract: In its most general terms the invention compensates for the effect of the mass offset in the prior art calibration method. This can be achieved either by correcting for the offset or assigning mass to the peaks in such a way that the offset is avoided. Accordingly in a first aspect there is provided a method of calibrating a reflectron time-of-flight mass spectrometer using a spectrum generated by fragment ions wherein the mass of the fragment ion is assigned using the mono-isotopic peak only. In other words a value corresponding to the mass of the fragment ion used for calibration is assigned using the fragment ion mono-isotopic peak only and said value is used to calibrate the spectrometer.Type: GrantFiled: September 6, 2001Date of Patent: April 6, 2004Assignee: Kratos Analytical LimitedInventor: Andrew R. Bowdler
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Patent number: 6710336Abstract: In a quadrupole ion trap mass spectrometer, a library of optimized notched waveforms are pre-calculated, optimized and stored in a fast memory such as semiconductor RAM. Computer controlled apparatus selectively applies the pre-calculated waveforms to end caps of the quadrupole ion trap for isolating an ion with a specific mass to charge ratio. The pre-calculated waveforms are optimized notch waveforms with each waveform being pre-calculated for a specific mass. The memory further stores a library of single frequency CID waveforms for use in collision induced dissociation of an isolated ion. By providing the pre-calculated waveforms, a method is provided to isolate and dissociate a selected ion.Type: GrantFiled: January 30, 2002Date of Patent: March 23, 2004Assignee: Varian, Inc.Inventor: Gregory J. Wells
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Patent number: 6710362Abstract: The invention relates to an apparatus and a method for irradiating tumor tissue (3) of a patient (10) by means of an ion beam (2). For that purpose, the apparatus has a deflecting device (1) for the ion beam (2) for slice-wise and area-wise scanning of the tumor tissue (3) and an ion beam energy control device for slice-wise and depth-wise scanning of the ion beam (2). An electromechanically driven ion-braking device (11, 12) is provided as a depth-wise scanning adaptation apparatus (5) for adapting the range of the ion beam (2) and has faster depth-wise adaptation than the energy control device of an accelerator. The movement of a patient is monitored by means of a movement detection device (7) for detecting a temporal and positional change in the location of the tumor tissue (3) in a treatment space (8).Type: GrantFiled: January 8, 2003Date of Patent: March 23, 2004Assignee: Gesellschaft fuer Schwerionenforschung mbHInventors: Gerhard Kraft, Ulrich Weber
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Patent number: 6707036Abstract: An ionization apparatus for connection to a mass analyzer is provided. The ionization apparatus comprises a sample slide having at least two sample spots containing analytes to be analyzed by a mass analyzer, means for delivering energy to one of the sample spots to release and ionize the analytes to form ions, and an interface connecting the one of the sample spot to the analyzer. The interface comprises a chamber having an orifice in close proximity to the one of the sample spots and defining a first region encompassing the one of the sample spots, and an ion guide disposed in the chamber and leading to the mass analyzer in a second region. Means for sustaining a pressure substantially lower than atmospheric within the first region is provided for capturing the ions while other sample spots are maintained at atmospheric pressure. Means for sustaining a pressure within the second region substantially lower than the pressure within the first region is provided.Type: GrantFiled: March 21, 2002Date of Patent: March 16, 2004Assignee: Thermo Finnigan LLCInventors: Alexander A. Makarov, Pavel V. Bondarenko
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Patent number: 6707048Abstract: Method and apparatus for treating a pressurized liquid. The apparatus includes pressurized liquid treatment chamber having a window transmissive to UV light; a UV light source outside of the chamber to emit UV light into the chamber; a shaft which extending between inlet and outlet ends of the chamber which turns about a central axis of the chamber; a flexible cleaning member affixed to the shaft and engaging an interior surface of the window; and at least one member extending radially from the shaft into the treatment chamber to disrupt axial flow of water through the chamber.Type: GrantFiled: October 11, 2001Date of Patent: March 16, 2004Assignee: UV Pure Technologies Inc.Inventors: Ronald C. Hallett, Sandro Pecile
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Patent number: 6707031Abstract: A laser optical bench for use with a laser desorption/ionization mass spectrometer. The laser optical bench includes a laser for producing light, a focusing structure that receives light from the laser and focuses predominantly in a single plane, an attenuator that receives light from the focusing structure, beam steering structure for directing light from the attenuator from the target; and a final focusing element for focusing light from the beam steering structure on the target. Further focusing elements may be included for further focusing and dispersing the light beam in different planes. Additionally, photodetectors or photodiodes may be included for energy measurement and sensing a lasing event.Type: GrantFiled: May 11, 2000Date of Patent: March 16, 2004Assignee: Ciphergen Biosystems, Inc.Inventors: Scot R. Weinberger, Raymond G. Bryan
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Patent number: 6703625Abstract: Methods and apparatuses for shaping an illumination pattern for off-axis lithography are disclosed. A disclosed apparatus includes a first and second reflecting objective. The first reflecting objective includes a first reflective surface that reflects input light having an on-axis illumination pattern through a first focal point. The second reflecting objective includes a second reflective surface that receives the reflected light through the first focal point and through a second focal point aligned with the first focal point, and reflects the reflected light through an output end as output light having an off-axis illumination pattern. A disclosed method includes receiving collimated light with a conventional illumination pattern centered on an optical axis, symmetrically reflecting the collimated light in multiple directions away from the optical axis and reflecting the reflected light to create output light having an off-axis illumination pattern symmetrical about the optical axis.Type: GrantFiled: December 31, 2002Date of Patent: March 9, 2004Assignee: Intel CorporationInventor: Theodore G. Doros
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Patent number: 6703631Abstract: To provide an infrared projector in which it is not necessary to develop arrayed elements radiating infrared radiation, a high temporal resolution and a high spatial resolution are made available, the simulation of a high-temperature body is made possible, the wavelength and luminance characteristics are controlled, a high contrast and a high simulation accuracy are made available, and so on. A micromirror device (6) as an optical modulator for changing the direction of reflection by providing a plurality of mirrors and changing the direction of each of the plurality of mirrors independently, a controller (7) for controlling the direction of each mirror of the micromirror device, and infrared light sources (8, 9, and 10) for irradiating the micromirror device with infrared light are provided.Type: GrantFiled: October 5, 2001Date of Patent: March 9, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventor: Hiroshi Suzuki
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Patent number: 6686592Abstract: An ion source using a corona discharge for ionizing a sample at high efficient is provided. In the corona discharge generated at a tip end of a needle electrode by application of high voltage thereto, the direction in which the sample is introduced to the region of corona discharge and the direction in which ions are drawn out of the corona discharge region are substantially opposed to each other to improve the efficiency of ionization and to maintain a stable discharge for a long period of time.Type: GrantFiled: September 18, 2000Date of Patent: February 3, 2004Assignee: Hitachi, Ltd.Inventors: Minoru Sakairi, Yuichiro Hashimoto, Masuyoshi Yamada, Masao Suga, Kyoko Kojima
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Patent number: 6686590Abstract: There is disclosed a low-vacuum scanning electron microscope wherein a bias voltage is applied to a specimen. A primary electron beam is made to strike the specimen, producing secondary electrons which are accelerated by an electric field producing an electron avalanche effect. Positive ions traveling toward the specimen reach the specimen or specimen holder. Then, the electrons lose their electric charge and return to molecules. In this way, a scanned image corresponding to a secondary electron image can be obtained based on the specimen current.Type: GrantFiled: March 25, 2002Date of Patent: February 3, 2004Assignees: JEOL Ltd., JEOL Technics Ltd.Inventor: Kouji Ogawa
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Patent number: 6683303Abstract: An ion trap mass spectrometer and spectrometry capable of dissociating ions to be dissociated efficiently regardless of ionic species without useless time and performing high-sensitive MS/MS spectrometry, lengthens a period for applying a CID voltage in accordance with a mass number or characteristics of ions to be dissociated in proportion to a mass-to-charge ratio of ions to be dissociated to thereby optimize the application period of the supplementary AC voltage applied in superposition manner in order to dissociate specific ionic species, so that ions to be dissociated are dissociated efficiently and high-sensitive analysis of dissociated ions can be attained without useless time.Type: GrantFiled: March 5, 2002Date of Patent: January 27, 2004Assignee: Hitachi, Ltd.Inventors: Kiyomi Yoshinari, Yoshiaki Kato, Tadao Mimura, Shinji Nagai
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Patent number: 6680481Abstract: Methods and apparatus are disclosed for performing charged-particle-beam (CPB) microlithography, in which methods and apparatus certain position-measurement marks are detected by appropriate deflections of a charged particle beam. The deflections are performed using a primary deflector and a mark-scanning deflector. For example, the beam is deflected by the primary deflector to illuminate a position-measurement mark on the reticle and a corresponding position-measurement mark on the substrate. The position-measurement mark on the substrate is scanned by minute deflections of the beam as performed by the mark-scanning deflector. Meanwhile, charged particles backscattered from the position-measurement mark on the substrate (as the mark is being scanned) are captured and detected by a detector. The marks are detected at timing moments during normal operation of the primary deflector.Type: GrantFiled: June 4, 2002Date of Patent: January 20, 2004Assignee: Nikon CorporationInventor: Teruaki Okino
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Patent number: 6677592Abstract: An electron beam device includes an electron beam source, plural spaced plates having aligned apertures through which an electron beam is directed, an electrostatic focusing arrangement, and plural electrostatically charged deflection plates for deflecting the beam and displacing it over a target surface. The apertures in the spaced plates are of deceasing size in the direction of travel of the electron beam for intercepting the outer periphery of the beam and providing a beam of reduced cross section. The electron beam is simultaneously deflected by the deflection plates and focused by the electrostatic focusing arrangement. The electrostatic focusing arrangement includes first and second focusing elements through which the beam is directed which are disposed along the beamline and adjacent the upper and lower end portions, respectively, of the beam deflection plates.Type: GrantFiled: September 7, 2001Date of Patent: January 13, 2004Inventor: Hsing-Yao Chen
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Patent number: 6674067Abstract: An ion trap mass spectrometer uses electrospray ionization to introduce multiply-charged positive ions in an axial direction into a quadrupole ion trap and glow discharge ionization to introduce singly-charged negative ions in a radial direction into the ion trap. Methods of controlling ion-to-ion charge transfer reactions include applying a combination of a dipolar DC voltage and a dipolar RF voltage across endcap electrodes to allow partial charge state neutralization reactions to occur between the positive and negative ions and then control suspension and resumption of further charge state neutralization reactions. The remaining ions can be further processed and transformed and a mass spectrum created by scanning a quadrupolar RF field.Type: GrantFiled: July 2, 2002Date of Patent: January 6, 2004Assignee: Hitachi High Technologies America, Inc.Inventors: Peter B. Grosshans, Chad M. Ostrander, Craig A. Walla
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Patent number: 6670618Abstract: The present invention relates to a method of checking an isocentre and a patient-positioning device of an ion beam therapy system that comprises a grid scanner device, arranged in a beam guidance system, having vertical deflection means and horizontal deflection means for the vertical and horizontal deflection of a treatment beam perpendicular to its beam direction, with the result that the treatment beam is deflected by the grid scanner device onto an isocentre of the irradiation site, and a specific area surrounding the isocentre is scanned, wherein a check of the isocentre and a patient-positioning device is carried out and the patient-positioning device comprises a patient table rotatable about an axis of rotation of the table. For the checking, a target point within a spherical phantom is represented by means of a special specimen body and the centre point of the specimen body is visibly represented by means of several image-forming methods.Type: GrantFiled: November 20, 2001Date of Patent: December 30, 2003Assignee: Gesellschaft fuer Schwerionenforschung mbHInventors: Gunther Hartmann, Peter Heeg, Oliver Jaekel, Christian Karger
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Patent number: 6670626Abstract: Interlocking, modular anti-microbial Radiation fixtures mount on a custom rack or bracket, which are used to irradiate an air stream and/or surfaces within an HVAC (heating, ventilating, air conditioning) system. The individual units are adapted for modular integration and slidable mounting on a rack, bracket or fixture which allows for ease of installation.Type: GrantFiled: June 25, 2002Date of Patent: December 30, 2003Assignee: UltraViolet Devices, Inc.Inventors: David L. Witham, Robert Arrance
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Patent number: 6664552Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.Type: GrantFiled: November 5, 2001Date of Patent: December 16, 2003Assignee: Hitachi, Ltd.Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
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Patent number: 6664544Abstract: A magnetic immersion lens has inner and outer pole-pieces arranged symmetrically about a longitudinal axis X-X of the lens, the inner pole piece having a through-bore and the lens producing a magnetic imaging field for directing along the through-bore secondary electrons emitted from a specimen positioned in front of the inner pole-piece. The lens has an axially-symmetric detection arrangement located within the through-bore.Type: GrantFiled: November 13, 2001Date of Patent: December 16, 2003Assignee: Shimadzu Research Laboratory (Europe) Ltd.Inventors: Takao Marui, Ranjan Krishnachandra Badheka, Frank Henry Read
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Patent number: 6657206Abstract: An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A pair of reflectors are mounted within the processing space of the microwave chamber. The reflectors are capable of reflecting a significant portion of the ultraviolet radiation to irradiate the backside of the substrate in a surrounding and uniform fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.Type: GrantFiled: April 4, 2001Date of Patent: December 2, 2003Assignee: Nordson CorporationInventors: Patrick Gerard Keogh, James W. Schmitkons
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Patent number: 6653643Abstract: A method and apparatus are disclosed for accelerating ions in an ion implantation system. An ion accelerator is provided which comprises a plurality of energizable electrodes energized by a variable frequency power source, in order to accelerate ions from an ion source. The variable frequency power source allows the ion accelerator to be adapted to accelerate a wide range of ion species to desired energy levels for implantation onto a workpiece, while reducing the cost and size of an ion implantation accelerator.Type: GrantFiled: December 26, 2001Date of Patent: November 25, 2003Assignee: Axcelis Technologies, Inc.Inventors: Kourosh Saadatmand, William F. DiVergilio