Abstract: An electron beam device includes an electron beam source, plural spaced plates having aligned apertures through which an electron beam is directed, an electrostatic focusing arrangement, and plural electrostatically charged deflection plates for deflecting the beam and displacing it over a target surface. The apertures in the spaced plates are of deceasing size in the direction of travel of the electron beam for intercepting the outer periphery of the beam and providing a beam of reduced cross section. The electron beam is simultaneously deflected by the deflection plates and focused by the electrostatic focusing arrangement. The electrostatic focusing arrangement includes first and second focusing elements through which the beam is directed which are disposed along the beamline and adjacent the upper and lower end portions, respectively, of the beam deflection plates.

Abstract: The invention relates to an irradiating device, especially for irradiating with ultraviolet light substrates which are provided with a coating that can be cured using ultraviolet light. The inventive device comprises a longitudinally extending radiation source (12) which is provided for emitting ultraviolet and/or visible electromagnetic radiation, which is arranged in a housing (10) between a reflector (18) and a housing opening (14) that can be aligned with an object (16) to be irradiated, and which is preferably configured as a tubular mercury discharge lamp. The inventive device also comprises a cooling system (20) for dissipating the waste heat generated by the radiation source (12). The aim of the invention is to create a compact modular construction and, optionally, an oxygen-reduced illumination zone.

Abstract: The invention is provides a method and an apparatus for performing electrospray ionization mass spectrometric analysis, which method can exactly analyze a mass of a molecular ion or a fragment ion of an unstable organometallic complex or a polymeric organic compound. The method includes cooling a sample to be analyzed which contains a solvent and is caused to flow out from a spray small-diameter tube with an inert gas for low temperature vaporization (A), and carrying out ionization and mass spectrometric analysis of the sample to be analyzed while cooling a chamber (7) for removing a solvent or an ion source shield (8) with liquid nitrogen.

Abstract: A high-energy ion implanter for fabricating a semiconductor device includes a low-energy accelerator for converting a polarity of ions flowed in from an ion source; a stripper for converting the ions accelerated from the low-energy accelerator to positive ions in vacuum conditions; a high-energy accelerator for accelerating, in high-energy, the positive ions that are converted in the stripper; a turbo pump for providing vacuum conditions in the stripper; a current sensor for detecting currents to check for abnormal operating conditions of the turbo pump; and a central processing unit (CPU) that interrupts a circuit breaker to suspend the ion implanting process in response to the level of current detected in the current sensor. The high-energy ion implanter of the present invention is capable of preventing an unsuccessful ion implanting process by suspending operation thereof when abnormal operating conditions are detected.

Abstract: To provide a mass spectrometer having a high sensitivity to dioxins. In the mass spectrometer including: a sample supply tube for supplying a sample solution containing a sample to be measured; a nebulizer for nebulizing the sample solution supplied from the sample supply tube; an ion source having a needle electrode for ionizing the sample nebulized and vaporized in the nebulizer; and a mass analyzer for analyzing ions formed in the ion source, and a gas of a flow rate corresponding to the flow rate of the sample solution is mixed to the vaporized sample, and a moving direction of the sample is made opposite to a moving direction of ions at a tip of the needle electrode.

Abstract: For use in charged-particle-beam (CPB) microlithography apparatus, hollow-beam apertures are provided that define a substantially annular aperture having very narrow radial width. In a planar embodiment, triangular portions are provided at a midline of a first plane member. The triangular portions have respective angled edges and tips that narrow to a bridge supporting a circular portion. Semicircular cutouts are provided at the midline of respective forward edges of two second members. The radius of each semicircular cutout is slightly larger than the radius of the central portion. As the second members are urged together, a substantially annular aperture is formed between the semicircular cutouts and the central portion. The annular aperture can have extremely narrow width.

Abstract: A bag (10) for transporting radioactive flood sources and the like is formed from a lightweight, multi-layer sheet material comprising a layer (42) of a high-Z, radiation shielding material sandwiched between inner and outer layers (46, 40) of protective material. The radiation shielding material is preferably formed from a lead or tungsten composite comprising a lead or tungsten powder dispersed in a polymer matrix, such as a lead/vinyl composite. The flexible bag is lightweight, allowing the flood shield to be transported easily by handles (26, 28), without the need for maneuvering the bag along the floor on wheels.

Abstract: An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.

Abstract: The methods of the invention exploit the mass-to-charge ratio dependent motion of ions in an electrodynamic ion traps in synergy with a charge quenching process. In an electrodynamic ion trap, each mass-to-charge ratio is characterized by a unique set of frequencies of motion. Accordingly, by tailoring the time-varying electrical potential of the ion trap the invention controls which ions are allowed or retained in the ion trap and which ions are subjected to charge quenching reactions. Control of ion retention and charge quenching is used to improve sample throughput, dynamic mass range and signal discrimination in the mass spectrometry of multiply charged ions.

Abstract: Infrared scene projectors are useful in testing infrared surveillance and guidance equipment which identify and track objects, such as enemy missiles, based on their infrared emissions or heat-generation characteristics. Infrared scene projectors typically include a thermal pixel array which converts electrical input signals into a desired thermal or infrared image. One problem with conventional thermal pixel arrays is that each pixel has a unique ground voltage based on its point of connection to a ground terminal running through the array, making it difficult to precisely control the pixels. Accordingly, the present inventors devised not only innovative infrared pixel arrays and related control methods, but also infrared scene projectors incorporating them. In one exemplary pixel array, each pixel includes a resistor and a current-mirror circuit which enables control.

Abstract: The present invention relates to radiochromic imaging methods for generating a permanent colored spatial representation of an irradiation pattern wherein the intensity of the color in the image correlates to the dose level of irradiation, and more particularly to a method that provides representations of the quantity and position of radiolabelled polymeric materials separated by chromatographic techniques and furthermore, to a method that provides a two or three dimensional colored image correlating to a dosimetric pattern supplied by an external or embedded source.

Abstract: A beam delivery system uses a set of electronically controlled magnets with a common magnetic yoke to steer the beam directly onto the products being irradiated with a very short distance between the magnets and the products.

Abstract: The present invention relates to microdevices for introducing a small volume of a fluid sample into an ionization chamber. The microdevices are constructed from a substrate having a first and second opposing surfaces, the substrate having a microchannel formed in the first surface, and a cover plate arranged over the first surface, the cover plate in combination with the microchannel defining a conduit for conveying the sample. A sample inlet port is provided in fluid communication with the microchannel, wherein the sample inlet port allows the fluid sample from an external source to be conveyed in a defined sample flow path that travels, in order, through the sample inlet port, the conduit and a sample outlet port and into the ionization chamber. Optionally, the fluid sample undergoes a chemical or biochemical reaction within an integrated portion of the microdevice before reaching the ionization chamber. A nebulizing means nebulizes the fluid sample in a nebulizing region adjacent to the sample outlet port.

Abstract: A system and method provide three-dimensional real time stabilization of the gap between probe tip and sample in a scanning probe microscope (SPM) against creep and drift. Supplemental signals in each axis provide supplemental movement to the probe tip to offset drift. The supplemental signals can be applied simultaneously or sequentially in any combination of axes. Typically the supplemental signals are determined from calculated drift predictions, based on drift measurements inferred from feedback in response to the gap-dependent strength of an interaction between probe and sample. Waveform modulation is coupled into the drive circuitry for each axis, and a waveform-synchronous feedback signal is extracted and processed to measure drift. The waveform modulations can be identical or asynchronous and applied sequentially or simultaneously in any combination of axes. An algorithm performs the process in real time.

Abstract: Disclosed is an apparatus for inspecting a sample. The apparatus includes a first electron beam generator arranged to direct a first electron beam having a first range of energy levels toward a first area of the sample and a second electron beam generator arranged to direct a second electron beam having a second range of energy levels toward a second area of the sample. The second area of the sample at least partly overlaps with the first area, and the second range of energy levels are different from the first range such that charge build up caused by the first electron beam is controlled.

Abstract: The invention provides apparatus by which a cooling gas is supplied from a stationary source to the back side of batch ion implanter workpieces being implanted in a rotating or spinning batch implanter process disk. The cooling gas provides improved heat transfer from the workpieces to the process disk, which may be advantageously combined with circulation of cooling fluid through passages in the process disk to remove heat therefrom. The invention further includes a rotary feedthrough employed to transfer the cooling gas from a stationary housing to a gas chamber in a rotating shaft which spins the batch implanter process disk. In addition, a seal apparatus is provided which seals the cooling gas applied to the back sides of the workpieces from the vacuum in which the front sides of the workpieces are implanted.

Abstract: A fast dosimeter for ion implantation and other systems that produce charges or current to be measured. When a charge accumulator reaches a predetermined charge, a fixed charge is removed to reduce the accumulated charge. A counter records each charge removal. Between removals, an analog-to-digital converter measures the accumulator charge. The outputs from the counter and the analog-to-digital converter provide a continually updated value for the total accumulated charge, and by differentiation, current with respect to time.

Abstract: An ultraviolet water purifier that includes a chamber tube, a pair of chamber heads, a pair of replaceable primary chamber clamps, a quartz sleeve, and a germicidal ultraviolet lamp. The chamber tube is length adjustable. The pair of chamber heads are rotatably attached to the ends of the chamber tube, respectively, so as to allow the pair of chamber heads to be rotated relative to the chamber tube as desired and provide independently configurable inlet and outlet orientations. The pair of replaceable primary chamber clamps rotatably and interchangeably attach the pair of chamber heads to the ends of the chamber tube, respectively, so as to allow the pair of chamber heads to be readily rotated relative to the chamber tube, interchanged as desired, and allow for more complete disassembly of the purifier. The quartz sleeve extends axially through the chamber tube and the pair of chamber heads. The germicidal ultraviolet lamp extends axially through the quartz sleeve.

Abstract: The invention provides apparatus by which a cooling gas is supplied from a stationary source to the back side of batch ion implanter workpieces being implanted in a rotating or spinning batch implanter process disk. The cooling gas provides improved heat transfer from the workpieces to the process disk, which may be advantageously combined with circulation of cooling fluid through passages in the process disk to remove heat therefrom. The invention further includes a rotary feedthrough employed to transfer the cooling gas from a stationary housing to a gas chamber in a rotating shaft which spins the batch implanter process disk. In addition, a seal apparatus is provided which seals the cooling gas applied to the back sides of the workpieces from the vacuum in which the front sides of the workpieces are implanted.

Abstract: An object is to provide a sample holder and a sample mount which allow observation of a sample from many directions in an electron microscope. A sample holder (10) is made for use in a transmission electron microscope (TEM). In the TEM, an electron beam is incident in the Z direction. A sample mount (17) and a sample (SA) affixed on it can be rotated by a motor (12) in the range of 0 to 360° on an axis extending in the Y direction which differs from the direction of the electron beam incidence. Therefore the electron beam can enter the observed sample (SA) from many directions, thus allowing observation of the sample (SA) from many directions. It is also possible to FIB-process the sample (SA) in many directions without removing the sample (SA) from the sample holder (10), which facilitates the handling in the FIB processing.