Patents Examined by Christopher Remavege
  • Patent number: 10712753
    Abstract: The invention relates to a control method for a secondary dust removal system in which a pipe network connects an induced draft fan to at least two suction points. The pipe network comprises a controllable exhaust air flap for each suction point, the position of said flap influencing the volumetric flow rate at the suction point. A mathematical model of the pipe network allows the method to energy-efficiently control the exhaust air flaps and the induced draft fan.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: July 14, 2020
    Assignee: SMS GROUP GMBH
    Inventors: Joerg Thomasberger, Volker Trappmann, Malte Braam, Felix Schuppert
  • Patent number: 10685856
    Abstract: While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: June 16, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Ryohei Hokaku, Junichi Ishii, Takashi Shinohara
  • Patent number: 10654076
    Abstract: An automatic fiber cleaning system comprises a first cleaning module, a second cleaning module, and a sprayer. Each of the first cleaning module and the second cleaning module has a cleaning belt, a driven belt wheel on which an unused portion of the cleaning belt is wound, a driving belt wheel on which a used portion of the cleaning belt is wound, and a pressing tool on which the cleaning belt is tightened. The sprayer sprays a cleaning agent onto the cleaning belts. The pressing tools press the cleaning belts on both sides of an optical fiber and clamp the optical fiber. The cleaning belts move relative to the optical fiber by the driving belt wheels to wipe the optical fiber.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: May 19, 2020
    Assignees: Tyco Electronics (Shanghai) Co. Ltd., TE Connectivity Corporation, Shenzhen AMI Technology Co., Ltd.
    Inventors: Fengchun Xie, Qinlong Zeng, Yu Zhang, Dandan Zhang, Lvhai Hu, Roberto Francisco-Yi Lu
  • Patent number: 10617093
    Abstract: A milking system includes several milking devices, each having a milk-carrying part, a temporary milk storage vessel, a milk pipe system, a milk storage tank, and a main milk pipe, which connects the temporary milk storage vessel to the milk storage tank. The milking system includes a first cleaning device having at least one first cleaning liquid supply and at least a pump, which cleaning device is configured to clean at least the milk-carrying part of at least one milking device and a part of the milk pipe system which connects the milk-carrying part to the temporary milk storage vessel, by transferring cleaning liquid from the cleaning liquid supply through at least the milk-carrying part of the at least one milking device and through said part of the milk pipe system to the temporary milk storage vessel by pumping. The temporary milk storage vessel includes a main pump for transferring liquid from the temporary milk storage vessel through the main milk pipe in the direction of the milk storage tank.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: April 14, 2020
    Assignee: LELY PATENT N.V.
    Inventors: Ruben Alexander Van Tilburg, Dirk Dijkshoorn, Mattheus Jacob De Hullu
  • Patent number: 10596537
    Abstract: A method for uniformly distributing a process liquid within a process vessel includes providing a process liquid to a fouling-resistant liquid distributor installed within a process vessel having a cross-sectional area; causing rotational movement of the fouling-resistant liquid distributor; uniformly distributing the process liquid over the cross-sectional area within the process vessel; and simultaneously self-rinsing the fouling-resistant liquid distributor with a portion of the process liquid during uniform distribution. A system is also disclosed which includes a supply of process fluid, a stationary conduit and a liquid distribution head attached to the conduit. The liquid distribution head is motive, powered by a fluid, and includes at least one process liquid delivery port. The at least one process liquid delivery port is configured to provide a +10° or greater angle of liquid coverage when the liquid distribution head is moving.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: March 24, 2020
    Assignee: Arkema France
    Inventors: Michael S. Decourcy, Christian Lacroix, Etienne Bastien
  • Patent number: 10588706
    Abstract: An accessory drive device includes a housing, a fluid inlet, a fluid outlet, a drive mechanism, and an output drive member. The output drive member may be driven by the drive mechanism and engage with an input drive member on a transmission mechanism of a surgical instrument. The drive mechanism may be configured to be driven by a motive force produced by fluid flowing through the housing from the inlet to the outlet, with the fluid being delivered by a fluid source of a reprocessing device. A portable, accessory drive device for a surgical instrument includes a portable housing to be removably coupled to a transmission mechanism of an instrument and a drive mechanism to drive an input drive member of the transmission mechanism. A method of reprocessing a surgical instrument includes converting a force associated with a flow of fluid for reprocessing to drive an instrument input drive member.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: March 17, 2020
    Inventor: Timothy Allen Limon
  • Patent number: 10584497
    Abstract: Roof cleaning processes and associated systems are disclosed. A representative process includes dispensing a cleaning fluid on the roof, at least restricting the cleaning fluid from exiting the roof via a roof drain, and collecting the cleaning fluid from the roof and directing the cleaning fluid to a sanitary sewer. A representative system includes a pump coupleable to a source of water and configured to pressurize the water, a surface cleaner coupled to the pump with a water line to receive pressurized water, a vacuum source coupled to the surface cleaner with a vacuum line to remove wastewater produced by the surface cleaner, and a retainer configured to be removably attached to a building at least proximate to a roof of the building, the retainer being removably coupleable to the vacuum line and the water line to at least restrict movement of the vacuum line and the water line.
    Type: Grant
    Filed: September 28, 2015
    Date of Patent: March 10, 2020
    Assignee: Dri-Eaz Products, Inc.
    Inventors: Keith Studebaker, William Bruders, Dennis P. Bruders, Kevin J. Miller, Brett Bartholmey
  • Patent number: 10569313
    Abstract: A treatment head for cleaning a container that has a valve arrangement that includes a tappet that is configured to move relative to the treatment head's housing to open the valve arrangement and fluid channels leading into the container. A first channel of the fluid channels has an annular fluid channel section and surrounds the second channel. A flow twister is disposed in either the first channel or in a line connected to the first fluid-channel.
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: February 25, 2020
    Assignee: KHS GmbH
    Inventor: Hilmar Fickert
  • Patent number: 10570522
    Abstract: A solution for selectively etching copper or a copper alloy from a microelectronic device, wherein the device simultaneously includes copper or a copper alloy and nickel-containing material, the solution being an etching solution for copper or a copper alloy comprising a chelating agent having an acid group in a molecule, hydrogen peroxide, and a surfactant having an oxyethylene chain in a molecule.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: February 25, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Yutaka Yoshida, Yukichi Koji
  • Patent number: 10557058
    Abstract: The polishing agent of the invention comprises water, an abrasive grain containing a hydroxide of a tetravalent metal element, polyalkylene glycol, and at least one cationic polymer selected from the group consisting of allylamine polymers, diallylamine polymers, vinylamine polymers and ethyleneimine polymers.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: February 11, 2020
    Inventors: Toshiaki Akutsu, Hisataka Minami, Tomohiro Iwano, Koji Fujisaki
  • Patent number: 10549325
    Abstract: A fluid flow processing plant for pig-free removal of wax and hydrate deposits in hydrocarbon production flowlines may include at least one cooling flowline. Further, the fluid flow processing plant my include cooling means arranged to cool the fluid in the at least one cooling flowline over a cooling section until the fluid reaches a temperature at or near the cooling flowline's surrounding temperature (Tsea) and at least one vehicle arranged on or near the outer circumference of the cooling flowline. Furthermore, each vehicle may include at least one sleeve configured to at least partly surround an outer circumference of the cooling flowline, deposit removing means being configured to remove deposits situated on an inner wall of the cooling flowline, and a propulsion unit configured to drive the vehicle bi-directionally on the cooling flowline.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: February 4, 2020
    Assignee: EMPIG AS
    Inventor: Fredrik Lund
  • Patent number: 10541163
    Abstract: A technique to prevent reduction in throughput of a substrate processing apparatus. On the occurrence of an event disabling execution of a recipe by a processing unit, a different recipe executed by this processing unit may be used depending on the type of event having occurred. The type of event to occur and a substitute recipe that can take the place of a recipe being executed are associated in advance. On the occurrence of abnormality, it is determined whether or not a recipe being executed can be substituted by a different recipe. If the recipe can be substituted, it is determined whether or not the substitute recipe is contained in an unfinished job. If these conditions are satisfied, a substrate processing schedule is changed to execute the substitute recipe in this processing unit. If these conditions are not satisfied, substrate process in this processing unit is stopped.
    Type: Grant
    Filed: January 7, 2015
    Date of Patent: January 21, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Masahiro Yamamoto
  • Patent number: 10535510
    Abstract: A substrate-treating apparatus includes a liquid-providing part, a first liquid-removing knife and a returning part. The liquid-providing part provides a first liquid chemical for cleaning a substrate that includes a metal pattern and a photoresist pattern on the metal pattern, and for removing an etchant that remains on the substrate. The first liquid-removing knife sprays a second liquid chemical in a direction inclined and opposite to a returning direction of the substrate, so as to remove the first liquid chemical, the first liquid chemical including a metal precipitate. The returning part returns the substrate from the liquid-providing part toward the first liquid-removing knife in the returning direction.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: January 14, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Bong-Kyun Kim, Young-Min Moon, Soo-Min An
  • Patent number: 10522369
    Abstract: A method of cleaning a wafer in semiconductor fabrication is provided. The method includes cleaning a wafer using a wafer scrubber. The method further includes moving the wafer scrubber into an agitated cleaning fluid. The method also includes creating a contact between the wafer scrubber and a cleaning stage in the agitated cleaning fluid. In addition, the method includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning fluid.
    Type: Grant
    Filed: February 26, 2015
    Date of Patent: December 31, 2019
    Inventors: Chien-Chun Hu, Chen-Liang Chang, Ju-Ru Hsieh, Po-Chia Chen, Shun-Yu Chuang, Wei-Tuzo Lin
  • Patent number: 10510551
    Abstract: Method of forming a protective hard mask layer on a substrate in a semiconductor etch process, comprising the step of applying by solution deposition on the substrate a solution or colloidal dispersion of an alumina polymer, said solution or dispersion being obtained by hydrolysis and condensation of monomers of at least one aluminium oxide precursor in a solvent or a solvent mixture in the presence of water and a catalyst. The invention can be used for making a hard mask in a TSV process to form a high aspect ratio via a structure on a semiconductor substrate.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: December 17, 2019
    Assignee: PIBOND OY
    Inventors: Juha T. Rantala, Thomas Gadda, Wei-Min Li, David A. Thomas, William McLaughlin
  • Patent number: 10500598
    Abstract: A dual function cleaning nozzle assembly for prewashing kitchen utensils. The cleaning nozzle includes air and fluid inlets. The air inlet is coupled to an air conduit which includes a first control valve, and the fluid inlet is coupled to a fluid conduit which includes a second control valve. A lever or button is coupled to a first valve for discharging pressurized air through the air conduit. The air and fluid conduits are coupled to an outlet chamber which has a spray head. Compressed air is discharged from the spray head for allowing kitchen utensils to be prewashed with air. The lever or button is further coupled to a second valve for discharging pressurized fluid through the fluid conduit. The fluid conduit is also coupled to the outlet chamber for allowing a discharge of pressurized air and fluid to be sprayed from the nozzle to further prewash the kitchen utensils.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 10, 2019
    Inventors: John Cox, Paul N. Kirpes, Amber R. Kirpes
  • Patent number: 10493504
    Abstract: Apparatus for and method of cleaning an electrically conductive surface of an optical element in a system for generating extreme ultraviolet radiation in which electrically conductive surface is used as an electrode for generating a plasma which cleans the surface.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: December 3, 2019
    Inventor: Alexander I. Ershov
  • Patent number: 10490392
    Abstract: A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the first focus ring is transferred out of the process chamber, controlling the plasma processing apparatus to clean the surface of the mount table; and after the surface of the mount table is cleaned, controlling the transfer device to transfer a second focus ring into the process chamber and place the second focus ring on the surface of the mount table without opening the process chamber to the atmosphere.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: November 26, 2019
    Assignee: Tokyo Electron Limited
    Inventor: Shigeru Ishizawa
  • Patent number: 10464109
    Abstract: Systems and methods for rinsing beverage residue from a mechanical interface between threads of a bottle and threads of a bottle cap is described. The bottle cap may include a sealable coating to create a seal against a rim of the bottle. The bottle cap may also include passages to allow pressurized water to be injected into an upper inner region of the bottle cap. The pressurized water is prevented from entering the bottle due to the seal between the rim of the bottle and the sealable coating of the bottle cap. Therefore, the pressurized water is caused to escape through the mechanical thread interface toward a lower inner region of the bottle cap where the water escapes from the cap at atmospheric pressure.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: November 5, 2019
    Inventor: Nolan Smith
  • Patent number: 10434546
    Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: October 8, 2019
    Inventors: Daisaku Yano, Masami Murayama, Yukinari Yamashita, Koji Yamanaka