Abstract: An electron beam inspection apparatus according to one aspect of the present invention includes an image acquisition mechanism to acquire a secondary electron image by scanning a substrate, on which a figure pattern is formed, with an electron beam, and detecting a secondary electron emitted due to irradiation with the electron beam by the scanning, a resize processing unit to perform, using design pattern data being a basis of the figure pattern, resize processing on the figure pattern to enlarge its size in a scan direction of the electron beam, a first developed image generation unit to generate, using the design pattern data which has not been resized, a first developed image by developing an image of a design pattern of a region corresponding to the secondary electron image, a second developed image generation unit to generate, using partial patterns enlarged by the resize processing in the figure pattern having been resized, a second developed image by developing an image of partial patterns in a region

Abstract: A system inspects, modifies or analyzes a region of interest of a sample via charged particles. A detector device of the system produces a pixel image having horizontal and vertical pixel resolutions. A charged particle deflection device produces a scanning charged particle beam in a scanning region. The deflection device has horizontal and vertical deflection units controlled by a digital to analog converter having a digital resolution larger than the horizontal pixel resolution and/or the vertical pixel resolution. An operator control interface of the system selects an assignment between respective image pixels of a desired pixel image and digital inputs of the DAC to produce horizontal and/or vertical deflection signals to guide the charged particle beam to the location of the respective image pixel. A reliable image of a sample can be obtained even when there is zooming or panning within an accessible region of the sample.

Abstract: An ultra-high-vacuum (UHV) cell includes an integrated guide stack (IGS) as part of a boundary between an internal vacuum and an external ambient. The IGS is formed by bonding together plural integrated guide components (IGCs). Each IGC includes (prior to the bonding) electrical and/or electro-magnetic (EM) guides defined within a bulk material such as glass or silicon. The electrical guides can be, for example, conductive paths or vias, while the EM guides can include microwave or other RF guides, optical fibers and/or paths along which an index of refraction has been modified along an desired optical path. EM and electrical connections between IGCs can be formed after the IGCs are bonded together to form the IGS. Use of an IGS as a vacuum boundary can provide substantial functionality for manipulating and interrogating quantum particles; the functionality can include, for example, the ability to regulate fields within the UHV cell.

Abstract: A sample protection device for a scanning electron microscope, the sample protection device comprising: a shell; an accommodating part having an accommodating space for accommodating a sample, the accommodating part being arranged in the shell in such a manner that the accommodating part can move relative to the shell, such that the accommodating part at least partially enters the shell or moves out of the shell; a sealing part connected to the accommodating part and configured to seal between the accommodating part and the shell when the accommodating part is at least partially accommodated in the shell; and a driving member configured to drive relative movement of the shell relative to the accommodating part.

Abstract: In a writing process in a charged-particle multi-beam apparatus, a desired pattern is written onto a target wherein said desired pattern is provided as input pattern data (INPDAT) in a vector format and processed through a pattern data processing flow. A data preprocessing system receives the input pattern data (INPDAT) and preprocesses the input pattern data independently of the writing process, preferably in advance to it, using writing parameter data provided to the data preprocessing system, and writes the intermediate pattern data (IMDAT) thus obtained to a data storage. When a writing process is carried out using the apparatus, its writing control system reads the intermediate pattern data from the data storage, converts them into pattern streaming data (SBUF), and streams the pattern streaming data to the apparatus for writing the pattern to the target.

Abstract: The invention relates to a method for detecting a measured value (d?/dx, M).

Abstract: A method comprises obtaining a stack for an energy storage device, the stack comprising one or more layers: laser ablating the stack so as to form a cut through one or more of the layers, thereby producing one or more laser ablation products: and analysing, using a mass spectrometry-based analysis technique, the laser ablation products thereby to determine one or more characteristics of the stack. Also disclosed is an apparatus.

Abstract: There is provided a mass spectrometer that can appropriately maintain the atmospheric pressure of a vacuum chamber, and a method of controlling the same. An example of a mass spectrometer according to the present invention includes first vacuum chambers, first vacuum pumps, an atmospheric pressure relating value acquiring unit, and an adjustment unit configured to adjust the effective exhaust velocity of the first vacuum pumps, and controllers. The controllers control the adjustment unit corresponding to an atmospheric pressure relating value.

Abstract: A holographic optical tweezers for manipulating a micro- or nano-size particle, the optical tweezers including a light source configured to emit first and second light beams; a light focusing apparatus configured to focus the first and second light beams to generate focused light beams, which create optical forces; and a trapping assembly configured to receive the first and second focused light beams and form a trap for holding the particle with the optical forces. The trapping assembly includes first and second micromirrors attached to a microscope coverslip.

Abstract: The present techniques relate to methods of manufacturing MEMS gas sensors, for example, an ion mobility filter which may be used as a field asymmetric ion mobility spectrometry filter. The method comprises a step of providing a support with an aperture (S300, S302) and forming electrical connections (S304) in the support. The method also comprises steps of attaching an electrode layer to the support (S306) so that the electrode layer covers the aperture and forming a plurality of ion mobility electrodes (S308) by mechanically dicing through the electrode layer. Each adjacent pair of electrodes defines an ion channel between them and each electrode is separate from the adjacent electrode(s).

Abstract: An electron-beam irradiation apparatus includes: a power source device; an accelerating tube that accelerates electrons when power is supplied from the power source device, to generate an electron beam; and a pressure tank that contains the power source device and the accelerating tube. The pressure tank is configured so as to be dividable into a first division body that contains the power source device and a second division body that contains the accelerating tube. The second division body has an outlet for emitting the electron beam emitted from the accelerating tube, to the outside of the pressure tank. In addition, the power source device has a connecting part connected to the second division body.

Abstract: An optical resonator device (100) with crossed cavities, in particular being configured for optically trapping atoms, comprises a first linear optical resonator (10) extending between first resonator mirrors (11A, 11B) along a first resonator light path (12) and supporting a first resonator mode, a second linear optical resonator (20) extending between second resonator mirrors (21A, 21B) along a second resonator light path (22) and supporting a second resonator mode, wherein the first and second resonator light paths (12, 22) span a main resonator plane, and a carrier device carrying the first and second resonator mirrors (11A, 11B, 21A, 21B), wherein the first and second resonator mirrors (11, 21) are arranged such that the first and second resonator modes cross each other for providing an optical lattice trap (1) in the main resonator plane.

Abstract: An ion milling device which balances high processing speed and a wide processing region with smoothness of a processing surface. The ion milling device includes first to third ion guns that emit unfocused ion beams. An ion beam center of the third ion gun is included in a first plane defined by a normal to a surface of a sample and a mask end, and an ion beam center of the first ion gun and an ion beam center of the second ion gun are included in a second plane. The second plane is inclined toward the mask with respect to the first plane, and an angle formed by the first plane and the second plane is more than 0 degrees and 10 degrees or less. The processing surface of the sample is formed in a region where the emitted ion beams overlap on the surface of the sample.

Abstract: A remote diagnostic monitoring and control of physical components of a particle accelerator system has a particle emitting system located at a first physical site and includes one or more particle emitting system components to operate the particle emitting system, a particle delivery system located at the first physical site and including one or more particle delivery system components to operate the particle delivery system, a particle system gateway located at the first physical site and operatively coupled to the particle emitting system components and the particle delivery system components by a first network interface, and a diagnostic monitoring system located at a second physical site remote from the first physical site, operatively coupled to the particle system gateway by a second network interface, and operable to monitor one or more first operating states corresponding to one or more of the particle emitting system components and one or more second operating states corresponding to one or more of t

Abstract: Provided are a sterilization module and an air purifier, which are applied in the field of air sterilization. The sterilization module is applied in the air purifier. The sterilization module includes a frame, a plurality of wave-shaped plates, and at least one sterilizing lamp. The frame is provided with a channel running through the frame from one end to another end. The plurality of wave-shaped plates are arranged at intervals in the channel, where each of the plurality of wave-shaped plates is bent alternately from the one end to the another end of the frame, so as to form an air duct that is wave-shaped between two adjacent wave-shaped plates. The at least one sterilizing lamp is disposed on the wave-shaped plate and used to emit ultraviolet (UV) light towards the air duct.

Abstract: An apparatus includes a linear ion trap and a charged particle source coupled to one another in a vacuum housing. The linear ion trap has a longitudinal axis and a trapping region configured to store analyte ions. The charged particle source has a conduit, a pulse valve, and a discharge device. The conduit extends towards the trapping region in a direction perpendicular to the longitudinal axis of the linear ion trap and has an entrance and an exit. The pulse valve is disposed in fluid communication with the conduit and is configured to release a gas pulse from a gas supply into the entrance of the conduit. The discharge device is electrically coupled to an electrical potential supply and disposed between the entrance and the exit of the conduit.

Abstract: A method includes applying a first voltage to a source of a first transistor of a detector unit of a semiconductor detector in a test wafer and applying a second voltage to a gate of the first transistor and a drain of a second transistor of the detector unit. The first transistor is coupled to the second transistor in series, and the first voltage is higher than the second voltage. A pre-exposure reading operation is performed to the detector unit. Light of an exposure apparatus is illuminated to a gate of the second transistor after applying the first and second voltages. A post-exposure reading operation is performed to the detector unit. Data of the pre-exposure reading operation is compared with the post-exposure reading operation. An intensity of the light is adjusted based on the compared data of the pre-exposure reading operation and the post-exposure reading operation.

Abstract: A sterilizer is provided to include: a first pipe having an inner wall with a light reflecting property; a second pipe disposed in the first pipe so as to pass fluid therethrough and formed of a light transmitting material; and a plurality of UV LEDs arranged on the inner wall of the first pipe and configured to irradiate sterilization UV light onto the fluid.

Abstract: Methods for making molecular sieves are provided. The molecular sieves are comprised of thin semiconductors films in which a plurality of apertures is defined. The apertures are non-circular, nanoscale openings with tapered sidewalls that selectively pass certain molecules, while discriminating against the passage of other molecules.

Abstract: A system comprising a spinning disk is disclosed. The system comprises a semiconductor processing system, such as a high energy implantation system. The semiconductor processing system produces a spot ion beam, which is directed to a plurality of workpieces, which are disposed on the spinning disk. The spinning disk comprises a rotating central hub with a plurality of platens. The plurality of platens may extend outward from the central hub and workpieces are electrostatically clamped to the platens. The plurality of platens may also be capable of rotation. The central hub also controls the rotation of each of the platens about an axis orthogonal to the rotation axis of the central hub. In this way, variable angle implants may be performed. Additionally, this allows the workpieces to be mounted while in a horizontal orientation.