Abstract: Various embodiments provide methods, apparatuses, systems, or computer program products for performing quantum object loss detection. The method performed by a controller of a quantum computer includes controlling one or more voltage sources to cause a quantum object confinement apparatus to confine a quantum object crystal, where the quantum object crystal (i) includes at least one of (a) a first species quantum object or (b) a second species quantum object and (ii) defines a crystal axis that is aligned along the RF null axis of the quantum object confinement apparatus; causing at least one first control signal to be provided to at least one control electrode of the plurality of control electrodes, where the at least one first control signal causes the at least one control electrode to generate a push field configured to cause the quantum object crystal axis to rotate with respect to the RF null axis.

Abstract: A method and apparatus for curing a substrate are described. The apparatus includes a curing apparatus with a casing and an ultraviolet (UV) radiation assembly coupled to the casing. The ultraviolet radiation assembly further includes a line UV radiation source. The casing includes an opening on one end. A substrate passes by the opening and is exposed to the UV radiation of the line UV radiation source. The curing apparatus further includes a purge assembly configured to continuously purge the process volume and the volume directly above the exposed portion of the substrate. The curing apparatus is configured to only cure a portion of the substrate at any one point in time, such that the curing apparatus is a scanning curing apparatus and includes a small process volume.

Abstract: A method of calibrating a mass spectrometer comprises generating calibration ions from an ion source that are transported from the ion source to a mass analyser of the mass spectrometer via an ion optics device. A characteristic voltage is applied to the ion optics device to control the transit of ions into or out of the ion optics device. The applied characteristic voltage results in an amount of unintentional dissociation of the calibration ions. An MS1 analysis of the calibration ions is performed using the mass analyser to obtain an MS1 spectrum. The amount of unintentional dissociation of the calibration ions in the MS1 spectrum is determined. The characteristic voltage is calibrated based on the amount of unintentional dissociation of the calibration ions to provide a target amount of unintentional dissociation during an MS1 analysis.

Abstract: Methods and systems for delivering a liquid sample to an ion source for the generation of ions and subsequent analysis by mass spectrometry are provided herein. In accordance with various aspects of the present teachings, MS-based systems and methods are provided in which an open port of a sampling probe for receiving a specimen may be exposed to washing solvent to wash the sampling probe while fluid within the sampling probe remains continuously flowing.

Abstract: A charged particle beam device 1 includes analysis means performed by a controller when a sample holder HL holding a sample SAM is installed on a stage 23. The analysis means includes a step (a) of raising a degree of vacuum of each of an observation chamber 10 and a preprocessing chamber 20 by opening a gate valve VL5, opening a valve VL1, closing a valve VL2, and driving a vacuum pump 40, a step (b) of closing the gate valve VL5 and opening the valve VL2 after the step (a), and a step (c) of processing the sample SAM by radiating an ion beam from an ion source 22 to the sample SAM while performing vacuum exhaust of the preprocessing chamber 20 by the vacuum pump 40 after the step (b). The analysis means can process the sample SAM quickly after performing the vacuum exhaust of the preprocessing chamber 20 in a short time.

Abstract: An uncertainty weighted average of the equalized amounts of two or more quantifier ions is calculated from a quantitation experiment itself. n known i ions of a compound are mass analyzed over time in each of m different samples, producing n XIC peaks for each of the m samples. A reference ion j is selected that is a j ion of the n i ions or a hypothetical ion j. A ratio r(j,i) of a peak area of the j ion to a peak area of each ion of the n i ions is calculated for each of the m samples, producing m r(j,i) ratios for each of the n i ions. An expected ratio rq(j,i) is calculated for each ion of the n i ions from the m r(j,i) ratios for each of the n i ions. For each sample, the uncertainty weighted average is calculated using rq(j,i).

Abstract: Aspects of the present disclosure relate to efficiently trapping ions for QIP systems. A system may include an ablation laser beam source and an ion trapping structure including: an enclosure with an orifice, a source material that is arranged in the enclosure and receives an ablation laser pulse to provide a plume of atoms. A system may include at least one LED that is arranged in the enclosure and onto which at least a portion of the plume of atoms is deposited, wherein the at least one LED is configured to emit light that desorbs at least one deposited atom through the orifice. A system may include an ion trap with a gap through which the at least one deposited atom desorbed travels from the orifice, and a laser beam source configured to generate a laser beam towards the at least one deposited atom creating a trapped ion.

Abstract: An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.

Abstract: Aspects of the present disclosure describe techniques for using a parabolic Cassegrain-type reflector for ablation. For example, a system for ablation loading of a trap is described that includes a reflector having a hole aligned with a loading aperture of the trap, and an atomic source positioned at a focal point of the reflector, where one or more laser beams are reflected from a reflective front side of the reflector and focused on a surface of the atomic source to produce an atomic plume, and the atomic plume once produced passing through the hole in the reflector and through a loading aperture of the trap for loading the trap. A method for ablation loading of a trap within a chamber in a trapped ion system is also described.

Abstract: A mass spectrometry device can reduce a deviation in a mass axis due to the generation of heat from an AC voltage control circuit; and a method for controlling the mass spectrometry device. The mass spectrometry device has a quadrupole electrode, to which a controlled AC voltage is applied, and uses the quadrupole electrode as a mass filter. Before measurement, the mass spectrometry device applies an AC voltage of a prescribed amplitude V1 to the multipole electrode for a prescribed time T1, and a heating value J1 that is generated when the AC voltage of the prescribed amplitude V1 is applied to the multipole electrode for the prescribed time T1 is equivalent to a heating value that is generated when the AC voltage of the amplitude that is applied during the measurement is applied until a thermally steady state is reached (see FIG. 3A).

Abstract: A method is disclosed comprising providing a biological sample on a swab, directing a spray of charged droplets onto a surface of the swab in order to generate a plurality of analyte ions, and analysing the analyte ions.

Abstract: An ion source includes: an atomizer configured to continuously introduce a liquid sample and atomize the liquid sample; a heating and mixing chamber configured to vaporize the atomized liquid sample; and a charge supply unit configured to ionize the vaporized liquid sample. The charge supply unit has a positive pressure with respect to the heating and mixing chamber. The vaporized liquid sample and a gaseous seed ion supplied from the charge supply unit are mixed in the heating and mixing chamber. An auxiliary gas for adjusting a gas flow rate in the heating and mixing chamber can be introduced into the heating and mixing chamber. The heating and mixing chamber has a chamber outlet configured to introduce the ionized liquid sample into a mass spectrometer. The chamber outlet is connected to a first pore of the mass spectrometer.

Abstract: In a method for obtaining the equivalent oxide thickness of a dielectric layer, a first semiconductor capacitor including a first silicon dioxide layer and a second semiconductor capacitor including a second silicon dioxide layer are provided and a modulation voltage is applied to the semiconductor capacitors to measure a first scanning capacitance microscopic signal and a second scanning capacitance microscopic signal. According to the equivalent oxide thicknesses of the silicon dioxide layers and the scanning capacitance microscopic signals, an impedance ratio is calculated. The modulation voltage is applied to a third semiconductor capacitor including a dielectric layer to measure a third scanning capacitance microscopic signal. Finally, the equivalent oxide thickness of the dielectric layer is obtained according to the equivalent oxide thickness of the first silicon dioxide layer, the first scanning capacitance microscopic signal, third scanning capacitance microscopic signal, and the impedance ratio.

Abstract: Apparatuses are disclosed which include a lamp assembly having a germicidal lamp configured to emit ultraviolet light and a base supporting the germicidal lamp. The apparatuses further include a support structure holding operational components for the apparatus and an automated actuator for moving the base and the germicidal lamp relative to the support structure. In addition, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the automated actuator such that the base and the germicidal lamp are repositioned relative to the support structure while the germicidal lamp is emitting ultraviolet light.

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

Abstract: A method for analyzing the quality of a thin layer surface of PCB includes steps of taking a region to be tested from the PCB as a sample by scissors or an automatic sampler; performing gold spraying treatment; fixing a sample to be tested onto a metal sample platform, and then mounting the sample platform on the inclined surface of a test platform; depositing a first protective layer by an electron beam; after deposition with the electron beam is completed, depositing a second protective layer by a focused ion beam; adjusting the angle of inclination of the test platform to ensure that the surface of the sample can be cut perpendicular to the direction of the focused ion beam; and finally adjusting angle of inclination of the sample to perform observation. The method can avoid influences of chemical solutions, mechanical stress, and impurity contamination in the sample preparation process.

Abstract: Provided is an electron gun chamber for a scanning electron microscope with (a) an electron source chamber; (b) an intermediate room; (c) an air lock valve installation part; (d) exhaust holes for a preliminary vacuum exhaust pump; and (e) an opening and closing means.

Abstract: A multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the beam on a substrate, n (n?3) correction lenses correcting an imaging state of the multi charged particle beam, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied. The electric field control electrode generates an electric field between the substrate and the electrode. The objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the beam. m (n?m?1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens. (n?m) correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction.

Abstract: A charge detection mass spectrometer, CDMS, is described. The CDMS 4, comprises: an electrostatic sector field ion trap 40 and an inductive charge detector 400; wherein the electrostatic sector field ion trap 40 is configured to define, at least in part, an ion path via the inductive charge detector 400. A method is also described.

Abstract: The invention relates to a multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, said device being adapted to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming a corresponding number of beamlets, said device comprising an aperture array device in which at least two sets of apertures are realized, an opening array device located downstream of the aperture array device having a plurality of openings configured for the passage of beamlets, said opening array device comprises impact regions, wherein charged impinge upon said impact regions.