Abstract: Provided herein are methods and systems for verifying a path in a monitored space, comprising transmitting a device identification (ID) of the mobile wireless device while the mobile wireless device moves through a monitored space, receiving one or more location certificates transmitted, in response to reception of the device ID, by one or more wireless transceivers deployed at a predefined location in the monitored space and having a limited transmission range, each location certificate comprising at least the device ID and a transceiver ID of the respective wireless transceiver, storing the one or more location certificates, and transmitting the one or more location certificates to one or more verification units configured to verify a path of the mobile wireless device in the monitored space estimated according to the predefined location of the one or more wireless transceivers identified by the transceiver ID extracted from the one or more location certificates.

Abstract: A collimated electron beam is illuminated to a grounded metal mask such that patterns on the mask can be transferred to a substrate identically. In a preferred embodiment, a linear electron source can be provided for enhancing lithographic throughput. The metal mask is adjacent to the substrate, but does not contact with substrate.

Abstract: The invention relates to a method for, in an ion guide (10), modulating a stream of ions according to a modulation function, wherein the stream of ions includes at least N different ion species, wherein N is at least 1. This ion guide (10) forms an ion guide path, wherein the ions of the stream of ions are conveyed along the ion guide path in a conveying direction to form the stream of ions. The ion guide (10) includes an ion gate (12) arranged at an ion gate position on the ion guide path, wherein the ion gate (12) is adapted to provide an open state for allowing the ions passing the ion gate position when being conveyed along the ion guide path and a closed state for preventing the ions from passing the ion gate position.

Abstract: Aberration corrector includes a lower electrode substrate to be formed therein with plural first passage holes having a first hole diameter and making multiple electron beams pass therethrough, and to be arranged thereon plural electrode sets each being plural electrodes of four or more poles, surrounding a first passage hole, for each of the plural first passage holes, and an upper electrode substrate above the lower one, to be formed therein with plural second passage holes making multiple electron beams pass therethrough, whose size from the top of the upper electrode substrate to the middle of way to the back side of the upper electrode substrate is a second hole diameter, and whose size from the middle to the back side is a third hole diameter larger than each of the first and second hole diameters, wherein a shield electrode is on inner walls of plural second passage holes.

Abstract: A mass spectrometry method comprises: receiving a stream of ions at an inlet end of an ion transport device; accumulating a first portion of the ion stream at a first electrical potential well at a first position within the ion transport device between the inlet and outlet ends; creating a generally descending potential profile within the ion transport apparatus between a second position and the outlet end and, simultaneously, creating a second potential well at a third position within the ion transport apparatus, the second position disposed between the first position and the inlet end, the third position disposed between the second position and the inlet end; and transporting the accumulated first portion of the ion stream from the first position to the outlet end under the impetus of the generally descending potential profile and, simultaneously, accumulating a second portion of the ion stream at the second potential well.

Abstract: A method of carrying out mass spectrometry, comprising: using an electrostatic or electrodynamic ion trap to contain a plurality of ions, each ion having a mass to charge ratio, the ions having a first plurality of mass to charge ratios, each ion following a path within the electrostatic or electrodynamic ion trap having a radius; and for each of a second plurality of the mass to charge ratios: modulating the radii of the ions in a mass to charge ratio-dependent fashion dependent upon the mass to charge ratio; fragmenting the ions thus modulated in a radius-dependent fashion; and determining a mass spectrum of the ions.

Abstract: Detectors and detection systems are disclosed. According to certain embodiments, a detector comprises a substrate comprising a plurality of sensing elements including a first sensing element and a second sensing element, wherein at least the first sensing element is formed in a triangular shape. The detector may include a switching region configured to connect the first sensing 5 element and the second sensing element. There may also be provided a plurality of sections including a first section connecting a first plurality of sensing elements to a first output and a second section connecting a second plurality of sensing elements to a second output. The section may be provided in a hexagonal shape.

Abstract: A CDMS may include an ELIT having a charge detection cylinder (CD), a charge generator for generating a high frequency charge (HFC), a charge sensitive preamplifier (CP) having an input coupled to the CD and an output configured to produce a charge detection signal (CHD) in response to a charge induced on the CD, and a processor configured to (a) control the charge generator to induce an HFC on the CD, (b) control operation of the ELIT to cause a trapped ion to oscillate back and forth through the CD each time inducing a charge thereon, and (c) process CHD to (i) determine a gain factor as a function of the HFC induced on the CD, and (ii) modify a magnitude of the portion of CHD resulting from the charge induced on the CD by the trapped ion passing therethrough as a function of the gain factor.

Abstract: The invention generally relates to systems and methods for conducting reactions and screening for reaction products.

Abstract: A substrate processing system includes a substrate processing apparatus and a switching timing creation support device, wherein the switching timing creation support device includes: an acquisition part configured to acquire, for each of a plurality of properties of particles contained in a gas in the substrate processing apparatus during a processing for a substrate, a measured value of an amount of the particles from a measuring device; a selection part configured to select properties of a predetermined number of the particles in descending order of temporal variations in the amount of the particles; a determination part configured to determine an operation expression and a switching condition for determining a switching timing based on a temporal change in the amount of the particles for each of the selected properties of the particles; and an output part configured to output the operation expression and the switching condition to the substrate processing apparatus.

Abstract: A multi-pass time-of-flight mass spectrometer is disclosed having an elongated orthogonal accelerator (30). The orthogonal accelerator (30) has electrodes (31) that are transparent to the ions so that ions that are reflected or turned back towards it are able to pass through the orthogonal accelerator (30). The electrodes (31) of the orthogonal accelerator (30) may be pulsed from ground potential in order to avoid the reflected or turned ion packets being defocused. The spectrometer has a high duty cycle and/or space charge capacity of pulsed conversion.

Abstract: The invention relates to a device and method for determining a property of a sample that is to be used in a charged particle microscope. The sample comprises a specimen embedded within a matrix layer. The device comprises a light source arranged for directing a beam of light towards said sample, and a detector arranged for detecting light emitted from said sample in response to said beam of light being incident on said sample. Finally, the device comprises a controller that is connected to said detector and arranged for determining a property of said matrix layer based on signals received by said detector.

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

Abstract: An ion detector according to this embodiment has a structure for reducing influences of signal reflection or the like on an output signal. The ion detector comprises an electron multiplier, a signal output unit, a signal output terminal, and an AC coupler. The AC coupler is disposed on a signal line between the signal output unit and the signal output terminal, including a resin sheet and a pair of conductive sections facing each other with the resin sheet interposed therebetween. One conductive section is electrically connected to an output terminal of the signal output unit, and the other conductive section is electrically connected to the signal output terminal.

Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.

Abstract: Provided is a time-of-flight mass spectrometer including: a loop-orbit defining electrode (21) including an outer electrode (211) and inner electrode (212) located on the outside and inside of a loop orbit, respectively; an ion inlet (22); an ion outlet (23) provided in either the outer or inner electrode; a loop-flight voltage applier (28) configured to apply loop-flight voltages to the outer and inner electrodes, respectively; a set of deflecting electrodes (24) facing each other across a section of an n-th loop orbit, where n is a predetermined number, the deflecting electrodes including a first portion (241) which faces the n-th loop orbit and a second portion (242) which includes other portions; and a voltage applier (29) configured to apply deflecting voltages to the first portion so as to reverse the drifting direction of the ions flying in the n-th loop orbit, and a voltage to the second portion so as to create the loop-flight electric field.

Abstract: An ion implanter includes an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, a first Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a preparation process performed before the implantation process, a second Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a calibration process for calibrating a beam current measurement value of the first Faraday cup, and a blockade member for blocking the ion beam directed toward the second Faraday cup, the blockade member being configured so that the ion beam is not incident into the second Faraday cup during the implantation process and the preparation process, and the ion beam is incident into the second Faraday cup during the calibration process.

Abstract: An apparatus for analysing ions, including a first mass analyser configured to eject groups of ions in a predetermined sequence during different time windows; an ion transport device having a plurality of electrodes arranged around a transport channel; control means configured to control voltages applied to the electrodes to generate a transport potential in a transport channel, the transport potential having a plurality of potential wells configured to move along the transport channel such that each group of ions received by the ion transport device is respectively transported along the transport channel by one or more selected potential; fragmentation means configured to fragment precursor ions in each group of ions so as to produce product ions; and a second mass analyser configured to produce a respective mass spectrum using each group of ions after the group of ions has been fragmented and transported.

Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.

Abstract: In order to suppress a charge-up in an ion source configured to ionize a component contained in a sample gas, a mass spectrometer according to the present invention is provided with an ion source (3) including: an ionization chamber (30) having an ion ejection opening (301) and internally having a space substantially separated from an outside area; a repeller electrode (31), located within the ionization chamber, for creating an expelling electric field which acts on an ion generated within the ionization chamber to expel the ion through the ion ejection opening to the outside area; and a voltage generator (7) configured to selectively apply, to the repeller electrode, a first voltage for creating the expelling electric field and a second voltage for creating a charge-up-removing electric field, where the second voltage is a positive voltage having a larger absolute value than the first voltage.