Abstract: A device (1) for manipulating charged particles, the device comprising a series of electrodes (2, 3) that form a channel for transportation of the charged particles. A power supply unit (5, 6) provides a voltage to axially segmented bunching electrodes to create a potential well within the channel having one or more local minima between local maxima (50, 51). The well is translated along the channel. An axial extraction region (54) comprises electrodes defining an end of the channel. They receive a supply voltage to create a pseudo-potential within the channel such that the depth of the potential well varies according to the mass-to-charge ratio (m/z) of the charged particles transported therein and reduces as a local maxima of the potential well is translated axially towards the axial extraction region thereby to release the transported charged particles of different mass-to-charge ratio (m/z) at different respective times.

Abstract: A micro-tooling device, such as, for example, a scanning electron microscope or a focused-ion beam microscope, provides images. A first machine-learning algorithm and a second machine-learning algorithm are sequentially coupled. The first machine-learning algorithm determines a progress along a predefined workflow based on feature recognition in images associated with the workflow. The second machine-learning algorithm predicts settings of operational parameters of the micro-tooling device in accordance with the progress along the predefined workflow.

Abstract: The present disclosure pertains to method and system of characterizing a protein using an electrospray ionization source.

Abstract: From a reference waveform 112 and a BSE signal waveform 211 that is extracted from a backscattered electron image and indicates a backscattered electron signal intensity from a pattern along a first direction, a difference waveform indicating a relationship between the backscattered electron signal intensity and a difference between a coordinate of the BSE signal waveform and a coordinate of the reference waveform which have the same backscattered electron signal intensity is generated, and presence or absence of a shielded region 203 that is not irradiated with a primary electron beam on a side wall of the pattern is determined based on the difference waveform. The reference waveform indicates a backscattered electron signal intensity from a reference pattern along the first direction in which the side wall is formed perpendicularly to an upper surface and a bottom surface of the pattern when the reference pattern is scanned with the primary electron beam.

Abstract: A 3D nanoprinter electron beam lithography module for a lithography system, such as a scanning electron microscope (SEM) or an environmental SEM (ESEM) with a beam blanker and electron beam lithography attachment, but generally applicable to any electron beam lithography capable system. The module is comprised of an in-situ spin-coating stage that is compatible with a cooling-SEM stage, with a spin-coating motor, a spin-coating sample stub, a liquid waste collector cup, a liquid dispensing arm holding a tube bundle that is connected via tubing to micro-syringe pumps or a pressure driven flow controller or pumps connected to fluid reservoirs, an electron beam scan generator control box, electrical feedthroughs, control electronics, and a computing system responsible for controlling the entire module. The dispensing arm can be controlled by a servo motor.

Abstract: Methods, devices, and systems for improving the quality of electrospray ionization mass spectrometer (ESI-MS) data are described, as are methods, devices, and systems for achieving improved correlation between chemical separation data and mass spectrometry data.

Abstract: Amorphous silicon carbide may be doped with one or more ions such as vanadium and these ions may radiate light if excited, for example, using optical or electrical pumping. A single photon light source may be formed from a single such ion that is pumped or from a plurality of ions that are pumped if light from only one ion is collected, e.g., using an aperture or pin hole. Such single photon sources may possibly be use in quantum computing, quantum sensing and/or quantum telecommunications.

Abstract: Provided in the present invention is an apparatus for treating clothing comprising: a cabinet in which a clothing accommodation space for accommodating clothing is formed; a housing detachably coupled to an inner wall of the clothing accommodation space and provided with a purifying space communicating with the clothing accommodation space; a photocatalyst containing a photocatalytic material and provided inside the housing; and a light source assembly, provided inside the housing, for irradiating light including UV rays by penetrating through the purifying space.

Abstract: An electron beam emitted from a photoexcited electron gun is increased in luminance. An electron gun 15 includes: a photocathode 1 including a substrate 11 and a photoelectric film 10; a light source 7 that emits pulsed excitation light; a condenser lens 2 that focuses the pulsed excitation light toward the photocathode; and an extractor electrode 3 that faces the photocathode and that accelerates an electron beam generated from the photoelectric film by focusing the pulsed excitation light by the condenser lens, transmitting the pulsed excitation light through the substrate of the photocathode, and causing the pulsed excitation light to be incident on the photocathode. The pulsed excitation light is condensed at different timings at different positions on the photoelectric film of the photocathode.

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

Abstract: A plasma doping system including a plasma doping chamber, a platen mounted in the plasma doping chamber for supporting a workpiece, a source of ionizable gas coupled to the chamber, the ionizable gas containing a desired dopant for implantation into the workpiece, a plasma source for producing a plasma having a plasma sheath in a vicinity of the workpiece, the plasma containing positive ions of the ionizable gas, and accelerating said positive ions across the plasma sheath toward the platen for implantation into the workpiece, a shield ring surrounding the platen and adapted to extend the plasma sheath beyond an edge of the workpiece, and a cover ring disposed on top of the shield ring and adapted to mitigate sputtering of the shield ring, wherein the cover ring comprises a crystalline base layer and a non-crystalline top layer.

Abstract: A method for checking a validity of a mass axis calibration of a mass spectrometer (MS) of an analyzer system, comprising obtaining a mass axis check sample spanning a predetermined m/z measurement range of the MS and automatically processing the sample, performing multiple full scan mode MS measurements of different types using the MS for the at least two mass axis points to obtain measurement data, wherein the different types include at least a first full scan MS measurement in a positive mode and a second measurement in a negative mode, or at least a first full scan measurement for a first mass filter and a second full scan measurement for a second mass filter; comparing the measurement data for each of the at least two mass axis points with respective reference data and determining if a condition is out of specification based on a result of the comparing steps.

Abstract: An aperture plate assembly for an analytical instrument comprises a first sub-assembly comprising an aperture plate and a second sub-assembly comprising a guide. The first sub-assembly is configured to be attached to the second sub-assembly such that the aperture plate is positioned in a first position relative to the second sub-assembly. The first sub-assembly and the second sub-assembly are configured such that when the first sub-assembly is engaged by the guide, the aperture plate can be moved into the first position and the first sub-assembly can be attached to the second sub-assembly.

Abstract: The present disclosure discloses an implant packaging bottle, which includes a bottle body; a bottle cap, wherein the bottle cap has a bottle cap body detachably connected with one end of the bottle body and an implant support frame configured to extend into the bottle body; an electrified base, which is provided at the other end of the bottle body; an implant bracket detachably connected to the implant support frame, wherein the implant can be installed on the implant bracket; and an ultraviolet light source configured to be provided in the bottle body, wherein the ultraviolet light source is electrically connected to the electrified base, and a plurality of ultraviolet light sources are provided; and when the implant support frame is extended into the bottle body, a plurality of ultraviolet light sources are provided around the implant on the implant bracket.

Abstract: The invention relates to a device for irradiating a liquid with electromagnetic radiation, in particular for sterilizing an in particular flowing liquid by means of UV radiation (UV reactor), comprising a container having an inlet for receiving the liquid and having an outlet for releasing the liquid from the container, wherein within the container a variable or adjustable irradiation zone is provided for irradiating the liquid with electromagnetic radiation, in particular UV radiation, emitted by a radiation source. In the irradiation zone the liquid is configured in the form of a liquid layer having the layer thickness which extends between the underside of the container and a gas bubble expanding above the liquid layer.

Abstract: Systems for analyzing a biological sample include a separation unit configured to separate a component from the biological sample, an ionization unit configured to generate a plurality of ions from the component, an adjustable mass-selective filtering element, a detector configured to detect ions that pass through the mass-selective filtering element, and a controller connected to the mass-selective filtering element and to the detector, where the controller is configured so that during operation of the system, the controller adjusts the mass-selective filtering element and activates the detector to measure at least three different ion signals corresponding to the plurality of ions, and determines a mass axis shift of the system based on the at least three different ion signals.

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having openings configured for the passage of at least a subset of beamlets that are formed by the apertures. The absorber array device comprises openings corresponding to one of the aperture arrangement sets, whereas it includes a charged-particle absorbing structure comprising absorbing regions surrounded by elevated regions and configured to absorb charged particles impinging thereupon at locations corresponding to apertures of the other aperture arrangements of the aperture array device, effectively confining the effects of irradiated particles and electric charge therein.

Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.

Abstract: There is provided a gas analyzer apparatus that analyzes inflowing sample gas. The gas analyzer apparatus includes a filter unit that filters the sample gas, a detector unit that detects the result of filtering, a housing that houses these elements, and a control unit that controls the respective potentials of these elements. The control unit includes a cleaning control unit that sets the respective potentials of the filter unit, the detector unit, and the housing to cleaning potentials that draws in, as plasma for cleaning purposes, process plasma from a source that supplies the sample gas or plasma generated by a plasma generation unit.

Abstract: A sanitation device includes a housing with a channel extending into the housing and a plurality of openings in the channel. A plurality of light emitting diodes emit light through the openings in the channel. A shield is coupled to the housing and a motion sensor emits and detect light through the shield when activated, such that the shield narrows a field of view of the motion sensor. The sanitation device is positioned near a common touch point with the motion sensor determining when an object is near, and has moved away from, the touch point. The plurality of light emitting diodes are activated to clean the touch point after the object moves away. The sanitation device may further include a status indicator light to provide information regarding the current state of operation of the sanitation device.