Abstract: A mass spectrometer 1, which is for generating a product ion from a precursor ion derived from a sample component having a hydrocarbon chain to analyze a mass, includes a reaction chamber 2 into which the precursor ion is introduced, radical generating units 51, 52, and 53 that generate a radical having an oxidizing ability or/and a radical other than a hydrogen radical having a reducing ability, a radical irradiation unit 54 that irradiates the inside of the reaction chamber 2 with the generated radical, a separation detection unit 3 that separates and detects the product ion generated from the precursor ion by a reaction with the radical according to a mass-to-charge ratio, and a structure estimation unit 14 that estimates the structure of the sample component based on the mass-to-charge ratio of the detected product ions and the information on the structure or the structure candidate.
Abstract: An ion source has an arc chamber with a first end and a second end. A first cathode at the first end of the arc chamber has a first cathode body and a first filament disposed within the first cathode body. A second cathode at the second end of the arc chamber has a second cathode body and a second filament disposed within the second cathode body. A filament switch selectively electrically couples a filament power supply to each of the first filament and the second filament, respectively, based on a position of the filament switch. A controller controls the position of the filament switch to alternate the electrical coupling of the filament power supply between the first filament and the second filament for a plurality of switching cycles based on predetermined criteria. The predetermined criteria can be a duration of operation of the first filament and second filament.
Type:
Grant
Filed:
September 30, 2021
Date of Patent:
October 24, 2023
Assignee:
Axcelis Technologies, Inc.
Inventors:
Wilhelm Platow, Neil Bassom, Jonathan David
Abstract: A device for disinfecting the interior of a drain pipe having a tubular wall formed with a hole between the sink drain inlet and the U-shaped trap. A UV-C LED module is positioned to register with the hole and includes a UV-C LED that generates a radiation beam having a predetermined radiation angle to transmit UV-C light into the drain pipe through the hole to irradiate at least a portion of said interior surface and expose airborne pathogens contained therein to UV-C light. A lens generally coextensive with the tubular wall has a peripheral edge aligned with the hole. The UV-C LED is spaced from the lens a distance to cause the radiation beam to extend up to but not beyond the peripheral edge of the lens to maximize transmission of UV-C light through the lens to maximize exposure of the interior surface and airborne pathogens to the UV-C light.
Abstract: Provided is a compact two-dimensional electron spectrometer that is capable of variably adjusting the deceleration ratio over a wide range, and performing simultaneous measurement of the two-dimensional emission angle distribution with a high energy resolution over a wide solid angle of acquisition. The two-dimensional electron spectrometer is configured from: a variable deceleration ratio spherical aberration correction electrostatic lens; a cylindrical mirror type energy analyzer or a wide angle energy analyzer; and a projection lens.
Type:
Grant
Filed:
August 5, 2019
Date of Patent:
October 17, 2023
Assignee:
University Corporation National Nara Institute of Science and Technology
Abstract: The present disclosure provides a method of achieving an integral number of sweeps within an ion beam. A substrate having a fiducial is placed on a wafer stage within the ion beam system. An energetic particle beam is generated within the ion beam system. The substrate is exposed to the energetic particle beam while the wafer stage with the substrate is rotated clockwise so that the fiducial of the substrate travels a sweep distance in a clockwise direction at a first speed and the fiducial of the substrate travels the same sweep distance in a counterclockwise direction at a second speed. The exposure of the substrate to the energetic particle beam is discontinued when the number of complete/full sweeps in the clockwise direction equals the number of complete/full sweeps in the counterclockwise direction.
Abstract: To improve startability in a UV irradiation apparatus equipped with excimer lamps. The UV irradiation apparatus includes a plurality of excimer lamps each having a light-emitting tube filled with a discharge gas containing a noble gas. The plurality of excimer lamps includes a first excimer lamp filled with the discharge gas at a first enclosed gas pressure and a second excimer lamp filled with the discharge gas at a second enclosed gas pressure lower than the first enclosed gas pressure. The first excimer lamp is placed in a position such that at least part of light emitted from the second excimer lamp is allowed to enter the first excimer lamp.
Abstract: An electrospray emitter assembly for interfacing a separation column to a mass spectrometer is disclosed. An emitter capillary includes an inlet end and an outlet end. A fitting is coupled to the inlet end of the emitter, configured to be removably connected to the separation column. A stop with a defined through hole is integrated proximate the inlet end of the emitter to produce a path for liquid to flow from the separation column to the emitter via the through hole where a voltage is applied to the liquid entering the emitter.
Abstract: According to the present invention, writing data capable of suppressing a data amount and a calculation amount in a multi charged particle beam writing apparatus is generated from design data including a figure having a curve. The present embodiment relates to a writing data generating method for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.
Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.
Abstract: A method for measuring damage (D) of a substrate (1) caused by an electron beam (2). The method comprises using an atomic force microscope (AFM) to provide a measurement (S2) of mechanical and/or chemical material properties (P2) of the substrate (1) at an exposure area (1a) of the electron beam (2). The method further comprises calculating a damage parameter (Sd) indicative for the damage (D) based on the measurement (S2) of the material properties (P2) at the exposure area (1a).
Type:
Grant
Filed:
August 30, 2017
Date of Patent:
October 3, 2023
Assignee:
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
Abstract: A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.
Type:
Grant
Filed:
September 22, 2020
Date of Patent:
October 3, 2023
Assignee:
KLA Corporation
Inventors:
Matthew Derstine, Ilya Bezel, Anatoly Shchemelinin, Eugene Shifrin
Abstract: A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.
Type:
Grant
Filed:
July 13, 2020
Date of Patent:
October 3, 2023
Assignee:
Samsung Electronics Co., Ltd.
Inventors:
Dohyung Kim, Seongchul Hong, Kyungsik Kang, Insung Kim, Motoshi Sakai, Seulgi Lee, Jungchul Lee
Abstract: An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to shape the ribbon ion beam as it is being extracted. For example, the height of the ribbon ion beam may be reduced by injecting gas above and below the ion beam so as to compress the extracted ion beam in the height direction. In some embodiments, the feedgas is introduced near the extraction aperture. In other embodiments, a shield gas, such as an inert gas, is introduced near the extraction aperture.
Abstract: Isobaric mass spectrometry tags (e.g., TMT) are susceptible to ratio compression, which arises from the co-isolation and co-fragmentation of interfering species that also contribute to the final reporter ion ratios. Additional stages of ion activation/transformation (e.g., MSn and PTR) have been shown to decrease ratio compression. Embodiments of the present invention include a mass spectrometry cleavable moiety on the isobaric mass tags. The cleavable moiety allows for a predictable mass loss, and results in an improved tag reporter ion purity.
Type:
Grant
Filed:
July 6, 2018
Date of Patent:
September 19, 2023
Inventors:
Michael W. Senko, Graeme McAlister, Christopher L. Etienne
Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.
Type:
Grant
Filed:
November 27, 2019
Date of Patent:
September 19, 2023
Assignee:
ASML Netherlands B.V.
Inventors:
Jeroen Gerard Gosen, Sven Antoin Johan Hol, Martijn Petrus Christianus Van Heumen, Dennis Herman Caspar Van Banning, Naseh Hosseini
Abstract: The invention generally relates to systems and methods for precursor and neutral loss scan in an ion trap. In certain aspects, the invention provides a system that includes a mass spectrometer having an ion trap, and a central processing unit (CPU). The CPU includes storage coupled to the CPU for storing instructions that when executed by the CPU cause the system to excite a precursor ion and eject a product ion in the single ion trap.
Type:
Grant
Filed:
April 27, 2022
Date of Patent:
September 19, 2023
Assignee:
Purdue Research Foundation
Inventors:
Robert Graham Cooks, Dalton Snyder, Christopher Pulliam
Abstract: This disclosure relates to a handheld disinfection device. The device may be used to disinfect various items and/or surfaces in home, workplace, and travel settings, as examples. The disclosed device includes a UV light source and further includes one or more protective features configured to protect the UV light source. As examples, the disclosed device may include a grille and/or a retractable shade configured to protect the UV light source. The disclosed device may also incorporate one or more safety features configured to reduce accidental exposure of a user's eyes to the UV light source, one of which is a proximity feature preventing the UV light source from activating when the device is too far from an object of disinfection. These and other benefits will be appreciated from the following description.
Abstract: Improved ion mirrors 30 (FIG. 3) are proposed for multi-reflecting TOF MS and electrostatic traps. Minor and controlled variation by means of arranging a localized wedge field structure 35 at the ion retarding region was found to produce major tilt of ion packets time fronts 39. Combining wedge reflecting fields with compensated deflectors is proposed for electrically controlled compensation of local and global misalignments, for improved ion injection and for reversing ion motion in the drift direction. Fine ion optical properties of methods and embodiments are verified in ion optical simulations.