Patents Examined by Duane Smith
  • Patent number: 11294280
    Abstract: A coloring composition includes a colorant, a radically polymerizable compound, a photo-radical polymerization initiator, and a thermal-radical polymerization initiator, in which the thermal-radical polymerization initiator includes at least one selected from a pinacol compound or an ?-hydroxyacetophenone compound.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: April 5, 2022
    Assignee: FUJIFILM Corporation
    Inventor: Shoichi Nakamura
  • Patent number: 11294284
    Abstract: A white photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment has a sufficient reflectivity, good reliability with respect to adhesion and crack resistance, resolution, flexibility, and light resistance.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: April 5, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Patent number: 11294281
    Abstract: Photosensitive polymer formulations, materials and uses of such materials are disclosed. Embodiments of the present disclosure provide photosensitive polyimide materials having chain extenders and formulations thereof that improve elongation and formability of the polyimide materials, and methods of making such polymer materials.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: April 5, 2022
    Assignee: Hutchinson Technology Incorporated
    Inventors: Andrew R. Dick, Jeffery D. Weckwerth
  • Patent number: 11287739
    Abstract: A photosensitive coloring composition includes a magenta pigment having an average primary particle diameter of 50 nm or less, a polymerizable compound, a photopolymerization initiator, and an ultraviolet absorber, in which the magenta pigment has a maximum absorption wavelength in a range of 500 to 600 nm, and in a case where an absorbance of the maximum absorption wavelength is 1, a wavelength at which an absorbance is 0.5 is 450 nm or more on a side where a wavelength is shorter than the maximum absorption wavelength and is 650 nm or less on a side where a wavelength is longer than the maximum absorption wavelength.
    Type: Grant
    Filed: July 8, 2019
    Date of Patent: March 29, 2022
    Assignee: FUJIFILM Corporation
    Inventor: Shoichi Nakamura
  • Patent number: 11269263
    Abstract: A bischloroformate composition is represented by a formula (1) below, contains a plurality of Ar components, and has an average number of monomer units (m1), which is calculated by an expression (Numerical Expression 1) below, ranging from 1.0 to 1.99. The plurality of Ar components are each independently Ar1 or Ar2. The plurality of Ar components include at least one Ar1 and at least one Ar2. Ar1 is a group represented by a formula (2) below. Ar2 is a group represented by a formula (3) below. A molar composition ratio represented by Ar1/(Ar1+Ar2) ranges from 45 mol % to 99 mol %.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: March 8, 2022
    Assignee: IDEMITSU KOSAN CO., LTD.
    Inventors: Kengo Hirata, Takaaki Hikosaka, Hironobu Morishita
  • Patent number: 11262666
    Abstract: Provided is a positive-charging toner having a toner particle that contains a binder resin, the binder resin contains a polymer A having a first monomer unit derived from a first polymerizable monomer, and a second monomer unit derived from a second polymerizable monomer, the first polymerizable monomer is at least one selected from the group consisting of (meth)acrylic acid esters having a C18 to C36 alkyl group, the content of the first monomer unit in the polymer A is 5.0 to 60.0 mol % and the content of the second monomer unit is 20.0 to 95.0 mol %, SP11 of the first monomer unit and SP21 of the second monomer unit satisfy 3.00?(SP21?SP11)?25.00, and the work function of the toner is 5.0 to 5.4 V.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: March 1, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Daisuke Yoshiba, Tomoya Nagaoka, Takashi Matsui
  • Patent number: 11262656
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: March 1, 2022
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Hye-Won Lee, Eunhye Cho, Jung Kyu Jo, Jin Hong Park, Eui Hyun Ryu, Jae-Bong Lim
  • Patent number: 11236248
    Abstract: A method for producing a conductive liquid electrophotographic ink composition is described, the method comprising: heating a polymer resin in a carrier fluid to dissolve the polymer resin; adding conductive metallic pigment particles to be coated to the carrier fluid; cooling the carrier fluid to effect precipitation of the polymer resin from the carrier fluid such that a coating of the resin is at least partially formed on the conductive metallic pigment particles; reheating the suspension of partially coated conductive metallic pigment particles in the carrier fluid; and cooling the carrier fluid at a controlled rate to effect precipitation of the polymer resin from the carrier fluid such that a coating of the resin is formed on the conductive metallic pigment particles, thereby producing the conductive liquid electrophotographic ink composition.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: February 1, 2022
    Assignee: HP Indigo B.V.
    Inventors: Olga Kagan, Yaron Grinwald, Rada Nuchimov, Shiran Zabar, Eyal Negreanu, Guy Nesher
  • Patent number: 11226561
    Abstract: A self-priming resist may be formed from a first random copolymer forming a resist and a polymer brush having the general formula poly(A-r-B)-C-D, wherein A is a first polymer unit, B is a second polymer unit, wherein A and B are the same or different polymer units, C is a cleavable unit, D is a grafting group and r indicates that poly(A-r-B) is a second random copolymer formed from the first and second polymer units. The first random copolymer may be the same or different from the second random polymer. The self-priming resist can create a one-step method for forming an adhesion layer and resist by using the resist/brush blend.
    Type: Grant
    Filed: August 11, 2018
    Date of Patent: January 18, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Chi-Chun Liu, Indira Seshadri, Kristin Schmidt, Nelson Felix, Daniel Sanders, Jing Guo, Ekmini Anuja De Silva, Hoa Truong
  • Patent number: 11227749
    Abstract: A method for manufacturing an arrestor for an electrostatic chuck includes printing first layers of an arrestor for an electrostatic chuck using a 3-D printer and an electrically non-conductive material. The first layers of the arrestor at least partially define a first opening to a gas flow channel. The method includes printing intermediate layers of the arrestor using the 3-D printer and the electrically non-conductive material. The intermediate layers of the arrestor at least partially define the gas flow channel. The method includes printing second layers of the arrestor using the 3-D printer and the electrically non-conductive material. The second layers of the arrestor at least partially define a second opening of the gas flow channel. At least one of the first opening, the second opening and/or the gas flow channel of the arrestor is arranged to prevent a direct line of sight between the first opening and the second opening of the arrestor.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: January 18, 2022
    Assignee: Lam Research Corporation
    Inventor: Michael Kellogg
  • Patent number: 11214857
    Abstract: The present disclosure provides a method for manufacturing an aluminum alloy member capable of suppressing deterioration in ductility thereof. In the method for manufacturing an aluminum alloy member, an aluminum alloy casting material that contains 2.0 to 5.5 mass % of Cu, and 4.0 to 7.0 mass % of Si in which a content of Mg is 0.5 mass % or less, a content of Zn is 1.0 mass % or less, a content of Fe is 1.0 mass % or less, a content of Mn is 0.5 mass % or less and the balance is made of Al and inevitable impurities is used. The method for manufacturing an aluminum alloy member includes a heating and holding step of heating and holding the aluminum alloy casting material within a solid-liquid coexisting temperature region; and a quenching step of rapidly cooling the aluminum ally casting material after performing the heating and holding step.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: January 4, 2022
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yusuke Yokota, Hirotsune Watanabe, Makoto Kikuchi, Hiroshi Kawahara, Yasushi Iwata, Jun Yaokawa, Kazuma Hibi
  • Patent number: 11215928
    Abstract: A composition for resist underlayer film formation contains: a first compound including at least one oxazine structure fused to an aromatic ring; and a solvent. The first compound preferably includes a partial structure represented by formula (1). In formula (1), R2 to R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; Ar1 represents a group obtained by removing (n+3) or (n+2) hydrogen atoms on the aromatic ring from an arene having 6 to 20 carbon atoms; R6 represents a hydroxy group, a halogen atom, a nitro group or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 0 to 9.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: January 4, 2022
    Assignee: JSR CORPORATION
    Inventors: Kazunori Takanashi, Hiroki Nakatsu, Kazunori Sakai, Ichihiro Miura
  • Patent number: 11186894
    Abstract: A process disclosed herein is related to the isolation and purification of substantially pure chemicals, including silica gel, sodium silicate, aluminum silicate, iron oxide, and rare earth elements (or rare earth metals, REEs), from massive industrial waste coal ash. In one embodiment, the process includes a plurality of caustic extractions of coal ash at an elevated temperature, followed by an acidic treatment to dissolve aluminum silicate and REEs. The dissolved aluminum silicate is precipitated out by pH adjustment as a solid product while REEs remain in the solution. REEs are captured and enriched using an ion exchange column. Alternatively, the solution containing aluminum silicate and REEs is heated to produce silica gel, which is easily separated from the enriched REEs solution. REEs are then isolated and purified from the enriched solution to afford substantially pure individual REE by a ligand-assisted chromatography.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: November 30, 2021
    Assignee: PURDUE RESEARCH FOUNDATION
    Inventors: Nien-Hwa Linda Wang, Hoon Choi, David Harvey
  • Patent number: 11167517
    Abstract: A powder compaction mold includes a die and upper and lower punches configured to fit into the die and is configured to compress a powder between the upper and lower punches to manufacture a powder compact. Of the members forming the powder compaction mold, at least one of two members in sliding contact with each other has therein a vent passage through which gas is vented from a filling space for the powder surrounded by the die and the lower punch to an outside of the powder compaction mold. The vent passage has a gas intake port that is open to a clearance section formed between the two members and connecting to the filling space.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: November 9, 2021
    Assignees: Sumitomo Electric Industries, Ltd., Sumitomo Electric Sintered Alloy, Ltd.
    Inventors: Hijiri Tsuruta, Tomoyuki Ueno, Kazunari Shimauchi
  • Patent number: 11155894
    Abstract: A process for reducing arsenic content from arsenic-bearing gold concentrate or other arsenic-bearing gold materials to produce a low arsenic-bearing gold concentrate. The process may comprise adding oxygen, water, and/or acid to an acidulated arsenic-bearing gold concentrate slurry and reacting them together in an autoclave at an elevated pressure and temperature in a pressure oxidation step. In one or more examples, the process may further comprise processing the oxidized concentrate slurry in an arsenic re-dissolution step to dissolve unstable solid arsenic compounds, and applying a first solid/liquid separation and wash step to form a first washed slurry/solid and first acid-containing solutions. The process may further comprise reacting the first washed slurry/solid with sulfur dioxide in a reductive leach step, and applying a second solid/liquid separation and wash step to form a second washed slurry/solid and second acid-containing solutions.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: October 26, 2021
    Assignee: Eldorado Gold Corporation
    Inventors: Roman Berezowsky, Paul Skayman, Jinxing Ji
  • Patent number: 11143961
    Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: October 12, 2021
    Assignee: The University of Manchester
    Inventors: Scott Lewis, Richard Winpenny, Stephen Yeates, Antonio Fernandez
  • Patent number: 10376825
    Abstract: A filter apparatus for filtering a stream of gas is disclosed. The apparatus has a head with an inlet and an outlet, the head also having a first flow conduit connected to the inlet and a second flow conduit the outlet. The apparatus also has a filter and a bowl which contains the filter and is connected to the head. The bowl an annular recess. There is also a connector for connecting the filter to the head and the bowl. The part of the connector that engages the bowl has a protrusion that is inserted into the recess.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: August 13, 2019
    Assignee: Norgren Limited
    Inventor: Colin Billiet
  • Patent number: 10369507
    Abstract: The present invention relates to a filter frame for receiving a media pack, the filter frame comprising a front plate, and first and second gable plates arranged at opposite ends of the front plate. The front plate comprises a groove at each of the ends and a front edge portion of each gable plate is received in a respective one of the grooves. Each gable plate comprises a retainment member arranged at the front edge portion, which retainment member has been engaged with a complementary retainment member of the front plate. The invention also relates to a filter assembly and a method for assembling a filter frame.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: August 6, 2019
    Assignee: CAMFIL AB
    Inventor: Kenny Hedlund
  • Patent number: 10359011
    Abstract: An air filter element includes a filter arrangement, an elbow, and a filter element seal member. The filter arrangement includes a filter media pack having a dirty air inlet and a clean air outlet, wherein air flowing through the clean air outlet flows in a first axial direction and the clean air outlet defines a filter arrangement cross sectional area. The elbow has a first end constructed to extend from the filter arrangement clean air outlet, a second end wherein air flowing through the second end flows in a second axial direction, and an air flow enclosure extending from the elbow first end to the elbow second end. The air flow enclosure includes an air deflector constructed to direct air from the first axial direction to the second axial direction, wherein the second axial direction is different from the first axial direction, and an interior volume between the elbow first end and the elbow second end.
    Type: Grant
    Filed: May 22, 2014
    Date of Patent: July 23, 2019
    Assignee: Donaldson Company, Inc.
    Inventors: Johan Dewit, Johnny Craessaerts
  • Patent number: 10350530
    Abstract: A filter holder for a filter element that has an oval-shaped cross section transverse to a longitudinal direction thereof, the filter holder including: a receiving section configured to receive the filter element; fluid inlet for allowing fluid to be filtered into the filter holder; fluid outlet for letting the fluid filtered out of the filter holder; the fluid inlet is arranged so the inflow direction of the fluid to be filtered into the fluid inlet is parallel to the longitudinal direction of the filter element; the fluid inlet has a guide member configured to deflect the fluid as it flows into the fluid inlet such that it flows around in a spiral in the filter element that can be received in the receiving section in order to separate particles contained in the fluid to be filtered on a wall of the receiving section with the aid of centrifugal force.
    Type: Grant
    Filed: April 10, 2016
    Date of Patent: July 16, 2019
    Assignee: MANN+HUMMEL GmbH
    Inventors: Dennis Stark, Thomas Grein, Volker Greif