Abstract: A method for producing 3D semiconductor devices including: providing a first level including first transistors and a first single crystal layer; forming a first metal layer on top of the first level; forming a second metal layer on top of the first metal layer; forming at least one second level on top of or above the second metal layer; performing a lithography step on the second level; forming at least one third level on top of or above the second level; performing processing steps to form first memory cells within the second level and second memory cells within the third level, where the first memory cells include at least one second transistor, the second memory cells include at least one third transistor, first transistors control power delivery to some second transistors; and then forming at least four independent memory arrays which include some first memory cells and/or second memory cells.

Abstract: A semiconductor device and method of manufacture are provided wherein the semiconductor device includes a first system on chip device bonded to a first memory device, a second system on chip device bonded to the first memory device, a first encapsulant surrounding the first system on chip device and the second system on chip device, a second encapsulant surrounding the first system on chip device, the second system on chip device, and the first memory device, and a through via extending from a first side of the second encapsulant to a second side of the first encapsulant, the through via being located outside of the first encapsulant.

Abstract: The present disclosure relates to a thermally enhanced package, which includes a carrier, a thinned die over the carrier, a mold compound, and a heat extractor. The thinned die includes a device layer over the carrier and a dielectric layer over the device layer. The mold compound resides over the carrier, surrounds the thinned die, and extends beyond a top surface of the thinned die to define an opening within the mold compound and over the thinned die. The top surface of the thinned die is at a bottom of the opening. At least a portion of the heat extractor is inserted into the opening and in thermal contact with the thinned die. Herein the heat extractor is formed of a metal or an alloy.

Abstract: Various implementations described herein are related to various devices having a frontside power network with frontside supply rails and a backside power network with backside supply rails. The device may include intermixing architecture with transition vias that couple the frontside power network to the backside power network. The intermixing architecture may transition the frontside supply rails of the frontside power network to the backside supply rails of the backside power network.

Abstract: An RF switch device and a method of manufacturing the same are proposed. A trap area is formed in or on a surface of a highly resistive substrate to trap carriers accumulating on the surface of the substrate, thus improving RF characteristics.

Abstract: Voltage converter inlay modules are provided for embedding within a package substrate, and are configured to supply power to a processor, or similar digital circuit, which is mounted to the package substrate. The package substrate is typically mounted to a circuit board, or similar. The circuit board provides high-voltage, low-current power to the voltage converter module which, in turn, provides low-voltage high-current power to the processor. The voltage converter inlay provides largely vertical current conduction from the circuit board to the processor, thereby reducing conduction losses incurred by lateral current conduction. The location of the voltage converter inlay between the circuit board and the microprocessor minimizes radiation of electromagnetic interference. The number of terminals allocated for providing power to the package substrate may be minimized due to the voltage converter inlay inputting fairly low levels of current.

Abstract: A semiconductor device structure includes a memory element disposed within an interlayer dielectric (ILD) layer. A contact is disposed within the ILD in contact with the memory element and includes a first metal. A logic element is disposed within the ILD and comprises a second metal that is different than the first metal. A method of forming the semiconductor structure includes forming at least one memory element within an interlayer dielectric (ILD) layer. A contact that includes a first metal is formed in contact with the memory element. At least one logic element is formed in the ILD layer, where the logic element includes a second metal that is different than the first metal.

Abstract: A semiconductor device includes pads arrayed between a region where a transistor portion or a diode portion is disposed and a first end side on an upper surface of a semiconductor substrate, and a gate runner portion that transfers a gate voltage to the transistor portion. The gate runner portion has a first gate runner disposed passing between the first end side of the semiconductor substrate and at least one of the pads in the top view, and a second gate runner disposed passing between at least one of the pads and the transistor portion in the top view. The transistor portion is also disposed in the inter-pad regions, the gate trench portion disposed in the inter-pad regions is connected to the first gate runner, and the gate trench portion arranged so as to face the second gate runner is connected to the second gate runner.

Abstract: A capacitor includes: a lower electrode including a metal nitride represented by MM?N, wherein M is a metal element, M? is an element different from M, and N is nitrogen; a dielectric layer on the lower electrode; an interfacial layer between the lower electrode and the dielectric layer and including a metal nitrate represented by MM?ON, wherein M is a metal element, M? is an element different from M, N is nitrogen, and O is oxygen; and an upper electrode on the dielectric layer.

Abstract: A semiconductor capacitor array layout generates parasitic capacitance toward an edge of the layout so as to reduce a capacitance difference between an outer capacitor unit and an inner capacitor unit. The semiconductor capacitor array layout includes a first conductive structure and a second conductive structure. The first conductive structure includes: longitudinal first conductive strips disposed in a first integrated circuit (IC) layer; and lateral first conductive strips disposed in a second IC layer. The longitudinal and lateral first conductive strips jointly form well-type structures including outer wells and inner wells that are electrically connected. The second conductive structure includes second conductors disposed in the first IC layer. The second conductors include outer conductors and inner conductors that are electrically disconnected and respectively disposed in the outer wells and the inner wells. The outer wells and the closest inner conductors jointly generate parasitic capacitance.

Abstract: A method for producing a 3D semiconductor device including: providing a first level including a first single crystal layer; forming a first metal layer on top of the first level; forming a second metal layer on top of the first metal layer; forming at least one second level above the second metal layer; performing a first lithography step on the second level; forming a third level on top of the second level; performing processing steps to form first memory cells within the second level and form second memory cells within the third level, where the first memory cells include at least one second transistor, and the second memory cells include at least one third transistor; and then at performing at least one deposition step which deposits gate electrodes for both the second and the third transistors, and forming at least four independent memory arrays.

Abstract: An embodiment relates to a n-type planar gate DMOSFET comprising a Silicon Carbide (SiC) substrate. The SiC substrate includes a N+ substrate, a N? drift layer, a P-well region and a first N+ source region within each P-well region. A second N+ source region is formed between the P-well region and a source metal via a silicide layer. During third quadrant operation of the DMOSFET, the second N+ source region starts depleting when a source terminal is positively biased with respect to a drain terminal. The second N+ source region impacts turn-on voltage of body diode regions of the DMOSFET by establishing short-circuitry between the P-well region and the source metal when the second N+ source region is completely depleted.

Abstract: A capacitor includes: a lower electrode including a metal nitride represented by MM?N, wherein M is a metal element, M? is an element different from M, and N is nitrogen; a dielectric layer on the lower electrode; an interfacial layer between the lower electrode and the dielectric layer and including a metal nitrate represented by MM?ON, wherein M is a metal element, M? is an element different from M, N is nitrogen, and O is oxygen; and an upper electrode on the dielectric layer.

Abstract: A method for isolating at least one conductive via from a surrounding glass substrate is provided. A support layer is formed over at least one surface of the glass substrate. Thereafter, the glass substrate is removed. As a result, the at least one conductive via can be analyzed without interference from the glass substrate.

Abstract: A system includes a non-transitory storage medium encoded with a set of instructions and a processor. The processor is configured to execute the set of instructions. The set of instructions is configured to cause the processor to: obtain, based on a netlist of a circuit, values each corresponding to one of transistors included in the circuit; compare the values with a threshold value; in response to a comparison, generate an adjusted netlist of the circuit by adding redundant transistors; and determine, based on the adjusted netlist, one of layout configurations for the circuit. The layout configurations include first cell rows each having a first row height and second cell rows each having a second row height different from the first row height.

Abstract: A semiconductor device comprises a first gate structure extending in a first direction and including a first gate electrode and a first gate capping pattern, a second gate structure spaced apart from the first gate structure and extending in the first direction, and including a second gate electrode and a second gate capping pattern, an active pattern extending in a second direction, the active pattern below the second gate structure, an epitaxial pattern on one side of the second gate structure and on the active pattern, a gate contact connected to the first gate electrode, and a node contact connected to the second gate electrode and to the epitaxial pattern. An upper surface of the gate contact is at a same level as the first gate capping pattern, and an upper surface of the node contact is lower than the upper surface of the first gate capping pattern.

Abstract: A semiconductor device includes a first package component and a second package component. The first package component has a first die formed on a first substrate. A second package component has a second die formed on a second substrate. A thermal isolation material is attached on the first die, wherein the thermal isolation material thermally insulates the second die from the first die, and the thermal isolation material has a thermal conductivity of from about 0.024 W/mK to about 0.2 W/mK. A first set of conductive elements couples the first package component to the second package component.

Abstract: Integrated circuits and methods for overlap measure are provided. In an embodiment, an integrated circuit includes a plurality of functional cells including at least one gap disposed adjacent to at least one functional cell of the plurality of functional cells and a first overlay test pattern cell disposed within the at least one gap, wherein the first overlay test pattern cell includes a first number of patterns disposed along a first direction at a first pitch. The first pitch is smaller than a smallest wavelength on a full spectrum of humanly visible lights.

Abstract: A memory cell including a set of active regions that overlay a set of gate regions to form a pair of cross-coupled inverters. A first active region extends along a first axis. A first gate region extends transversely to the first active region and overlays the first active region to form a first transistor of the pair of cross-coupled inverters. A second gate region extends transversely to the first active region and overlays the first active region to form a second transistor of the pair of cross-coupled inverters. A second active region extends along a second axis and overlays the first gate region to form a third transistor of the pair of cross-coupled inverters. A fourth active region extending along a third axis and overlays a gate region to form a transistor of a read port.

Abstract: A ceramic article. In some embodiments, the ceramic article includes a ceramic body composed of a ceramic material; and a first conductive trace, the first conductive trace having a first portion entirely within the ceramic material, the first portion having a length of 0.5 mm and transverse dimensions less than 500 microns, the ceramic material including a plurality of ceramic particles in a ceramic matrix.