Abstract: Vibratory finishing apparatus comprising: a receptacle to receive media; a first fixture to: support an object within the receptacle; and move the object relative to the receptacle in at least a first direction; and a first guide to move relative to the receptacle to direct movement of the media within the receptacle to a predetermined part of the object.

Abstract: A size-adjustable online wheel deburring device for removing burs from wheels, including a machine frame, a synchronous clamping and rotating system that enables the wheels to rotate in a clamped state, and a brush adjustment system, the clamping and rotating system and the brush adjustment system being arranged in the machine frame. The brush adjustment system includes a left brush adjustment system including a left brush and a right brush adjustment including a right brush, the left brush adjustment system and the right brush adjustment being arranged in symmetry. The left brush and the right brush are separately adjusted to desired positions through a left gear rack and a right gear rack according to detected diameters of the wheels, the left gear rack being fixed on a side face of the left supporting block and the right gear rack being connected with a right fixing block below the right brush.

Abstract: The polishing apparatus has: a polishing pad that has a polishing surface to polish a semiconductor wafer; a polishing table to which a back surface of the polishing pad on an opposite side of the polishing surface can be attached; a top ring that is opposed to the polishing surface, and can hold the semiconductor wafer; and an eddy current sensor that is arranged in the polishing table, and detects an end point of polishing. The polishing table has on an attachment surface a projection member projecting from the attachment surface to which the polishing pad is attached. The back surface of the polishing pad has a concave portion in a portion opposed to the projection member, and at least a part of the eddy current sensor is arranged inside the projection member.

Abstract: A method of removing an alpha case from a rotor blade by directing a water jet to mill a surface of a rotor blade spar to remove an Alpha-case therefrom.

Abstract: A polishing unit of a polishing apparatus according to an embodiment includes: a polishing head having a pressing member configured to hold a polishing tape and press the polishing tape against a peripheral portion of a substrate from above; a tape supply and recovery mechanism configured to supply the polishing tape to the polishing head and recover the polishing tape from the polishing head; a first moving mechanism configured to move the polishing head in a radial direction of the substrate; and a second moving mechanism configured to move the tape supply and recovery mechanism in the radial direction of the substrate. The positioning unit includes a positioning block having a contacting surface, and alignment of the polishing tape is conducted by the second moving mechanism moving the tape supply and recovery mechanism so that a substrate-side edge of the polishing tape makes contact with the contacting surface.

Abstract: The present invention relates to a composite wheel deburring device, which is composed of a stand, servo motors, guide rails, a first brush system, a second brush system, and a synchronous clamping rotary system. During use, the first servo motor drives first brush to rotate, and a second servo motor drives a second brush to rotate; the second brush starts to remove rim corner burrs at flanges of the wheel; right servo electric cylinder enables the first brush to move to an appropriate position, and jacking cylinder enables the first brush to perpendicularly come in contact with window rim corners at the roots of the flanges by a second guide rail, so that rim corner burrs at the position can be well removed; and upper servo electric cylinder adjusts the angle of the second brush to an appropriate angle, so that rim corner burrs of wheel rims are removed.

Abstract: The present invention relates to the field of grinding machines. In one of its embodiments, this disclosure presents a grinding machine casing (30) for a grinding machine (100). The grinding machine casing (30) comprises a first casing part (10), which is mounted to a second casing part (20). The first casing part (10) is provided with a set of brackets. Each bracket of a set of brackets comprises a hole which is adapted to receive a cylindrical end of a support bar (60) such that the support bar (60) can be releasably connected to the first casing part (10). Still further, one bracket in each set of brackets comprises a hole, the cross-section of which is non-circular.

Abstract: A bench grinder safety and monitoring system for maintaining worker safety while using a bench grinder having a contactor wheel, a tool rest proximate the contactor wheel defining a tool rest gap and having a tongue guard proximate the contactor wheel defining a tongue guard gap. The system includes a first optical sensor situated within in the tool rest gap having an emitter portion coupled to the tool rest adjacent a first side of the contactor wheel and a receiver portion coupled to the tool rest adjacent a second side of the contactor wheel, the emitter portion configured to project a beam of light across the tool rest gap toward the receiver portion. A controller in data communication with the receiver portion of the first optical sensor, is configured to determine if the light beam is received by the receiver portion and, if so, to de-energize the motor.

Abstract: The present disclosure provides a monitoring device, a monitoring method and a device for cutting a display substrate. The monitoring device includes an infrared temperature detection module configured to detect a temperature at a contacting position where a cutter wheel is in contact with the display substrate when cutting the display substrate with the cutter wheel, so as to acquire a temperature parameter at the contacting position; and a processing module configured to generate, based on the temperature parameter, a corresponding control parameter for controlling the process of cutting the display substrate.

Abstract: A method for producing a silicon ingot, provided with symmetrical grain boundaries, including at least steps made of: (i) providing crucible with longitudinal axis, bottom of which includes a paving formed from monocrystalline cuboid silicon seeds with a square or rectangular base and arranged contiguously, the paving, when viewed according to axis, being in shape of a grid of orthogonal directions (x) and (y) parallel to edges of seeds; and (ii) proceeding with controlled solidification of silicon by growth on seeds in a growth direction collinear to axis; wherein paving in step (i) is produced from identical silicon seeds, with two seeds contiguous in direction (x) being images of each other by turning axis (y) and two seeds contiguous in direction (y) being images of each other by turning axis (x), and misorientation 2? between crystalline arrays of two contiguous seeds being greater than 4°.

Abstract: A method for manufacturing a silicon cylinder by growth on seeds in a directed solidification furnace, including at least the following steps: (i) providing a crucible having a longitudinal axis (Z), in which the bottom is covered with a layer of seeds of monocrystalline silicon in a right prism shape; and (ii) proceeding with directed solidification of silicon by growth on seeds, in a direction of growth that is co-linear with the axis (Z) and with a concave solidification front, spatially or temporally; characterized in that the layer in step (i) of: one or more central seeds Gc; and one or more peripheral seeds Gp contiguous to the seed(s) Gc, the peripheral seeds Gp having a specific size.

Abstract: Disclosed herein is a grinding wheel including a wheel base to be fixed to a spindle, a plurality of abrasive members fixed to the wheel base, and a plurality of grinding water supply holes for supplying a grinding water to the abrasive members. Each abrasive member is formed as a segment abrasive having an outer surface extending downward from the lower surface of the wheel base so as to be inclined radially outward. The plural abrasive members are arranged annularly at given intervals. The plural grinding water supply holes are formed on the lower surface of the wheel base in the vicinity of the abrasive members so as to each correspond to the abrasive members in the condition where each grinding water supply hole lies on a line connecting the corresponding abrasive member and the axis of rotation of the wheel base.

Abstract: A size-adjustable adaptive online wheel deburring device, including a synchronous clamping and rotating system for fixing and rotating a wheel, a left brush system, and a right brush system. The left brush system includes a first belt-type brush with a T-shaped synchronous belt at its inner side and bristles at its outer side, and a first automatically adjusting mechanism for changing a shape of the first brush by engaging the T-shaped synchronous belt so that the shape of the first brush is able to match different back cavity shapes of the wheel during burr removal. The right brush system includes a second belt-type brush and a second automatically adjusting mechanism for changing a shape of the second brush so that the second brush is constantly in three-point contact with a position of the wheel to be deburred during the burr removal.

Abstract: A tool (1) for mechanochemical treatment comprises a shaft (10), a number n of working ledges (20), n?1, and a force application arrangement (2). The force application arrangement (2) is configured for applying a working force (F) on the working ledges (20). The working ledges (20) comprises wear-resistant material with a Vickers number above 800 HV and a Young modulus above 200 GPa. Each working ledge (20) has a contact surface (22) facing away from a main axis (11) and having a surface roughness Ra below I ?m. The contact surface (22) has a convex curvature which has a radius of curvature that is at most equal to a closest distance from that point to the main axis. A width of the contact surface (22) is less than r/2n. The working force applied on each working ledge (20) is at least P?L?r/2n, where P=107 Pa and L is the contact surface length.

Abstract: An abrasive disc for use with a sanding tool having a plurality of dust collection holes includes a hole pattern consisting of six openings arranged for substantial alignment with the dust collection holes provided in the sanding tool.

Abstract: A sublimating and abrasive media blasting system including an air compressor, a sublimating blasting unit operably connected to the air compressor and configured to supply a sublimating material, and an abrasive media container operably connected to the air compressor and configured to supply an abrasive media. The blasting system also includes a blasting applicator assembly operably connected to the abrasive media container and to the sublimating blasting unit such that the blasting applicator receives the sublimating material and the abrasive media. The blasting applicator assembly includes an applicator operably connected to the sublimating blasting unit, a first trigger configured to control a flow of the sublimating material and a second trigger configured to control a flow of the abrasive media, an injector, and a nozzle.

Abstract: A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface.

Abstract: A chemical mechanical polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising a curative and a polyisocyanate prepolymer having an unreacted isocyanate (NCO) concentration of from 8.3 to 9.8 wt. % and formed from a polyol blend of polypropylene glycol (PPG) and polytetramethylene ether glycol (PTMEG) and containing a hydrophilic portion of polyethylene glycol or ethylene oxide repeat units, a toluene diisocyanate, and one or more isocyanate extenders, wherein the polyurethane reaction product exhibits a wet Shore D hardness of from 10 to 20% less than the Shore D hardness of the dry polyurethane reaction product.

Abstract: The invention relates to obtaining an abrasive product comprising a backing layer and an abrasive layer, wherein the backing layer comprises propylene homopolymer or copolymer.

Abstract: A cam grinding method using a cam grinding device includes: an intermediate-cam lift-data generating step of, based on first lift data of a first cam and second lift data of a second cam, generating imaginary intermediate cam lift data of a spline curve that contains profiles of both cams; a first cam grinding step of grinding the first cam; a second cam grinding step of grinding the second cam; and an intermediate-cam grinding step of removing an unground portion generated at a boundary portion between the first cam and the second cam by plunge grinding or spark-out grinding on the basis of the intermediate-cam lift data after the second cam grinding step.