Abstract: Components of scientific analytical equipment, such as electron multipliers and modifications thereto, for extending the operational lifetime or otherwise improving performance by way of improved construction. A detector includes one or more electron emissive surfaces and one or more detector elements configured to define on one side an environment internal the detector and on the other side an environment external the detector. The one or more detector elements are configured to inhibit or prevent flow of a gas from the environment external the detector to the environment internal the detector. Such detectors may be used in a mass spectrometry instrument, for example.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

Abstract: A charged particle beam device which prevents an appearance of a shading contrast due to azimuth discrimination and obtains a clear magnetic domain contrast image with a high resolution and a high throughput. The charged particle beam device includes an electron beam source; a sample stage; an objective lens configured to focus electron beams on a sample; a detector that is mounted on a charged particle beam source side with respect to the objective lens and separately detects secondary electrons emitted in azimuth angle ranges of two or more different azimuths for the same observation region; an image processing and image management device including an image processing unit configured to perform synthesis after performing shading correction and contrast adjustment on an image obtained by detecting a first emission azimuth and an image obtained by detecting a second emission azimuth; an image database; and an image display unit.

Abstract: A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses, but other applications are contemplated. In particular, tips with aspect ratios greater than 2:1 can be made for imaging, for example, semiconductor samples. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.

Abstract: A method for demodulation including the following steps: exciting a vibrationally mounted, at least sectionally bar-shaped oscillating element for oscillating in the range of a resonance frequency of the oscillating element, wherein a temporally varying, in particular periodic, excitation signal is used for excitation, and wherein at least the temporal variation of the excitation signal is known or determined; detecting a modulated oscillation of the oscillating element by means of at least one sensor, wherein the sensor supplies a sensor measurement variable that varies versus time as a function of an amplitude and a phase of the modulated oscillation of the oscillating element. According to the present teaching, it is provided that the method includes the following step: generate a first comparison signal by amplitude modulating a known temporally varying, in particular periodic, demodulation signal by means of the temporally varying sensor measurement variable.

Abstract: A sample analyzing method and a sample preparing method are provided. The sample analyzing method includes a sample preparing step, a placing step, and an analyzing step. The sample preparing step includes an obtaining step implemented by obtaining an identification information; and a marking and placing step implemented by placing a sample carrying component having a sample disposed thereon into a marking equipment, allowing the marking equipment to utilize the identification information to form an identification structure on the sample carrying component, and placing the sample carrying component into one of the accommodating slots according to the identification information. The placing step is implemented by taking out the sample carrying component from one of the accommodating slots and placing the sample carrying component into an electron microscope equipment. The analyzing step is implemented by utilizing the electron microscope equipment to photograph the sample to generate an analyzation image.

Abstract: A sterilizing device includes a pipe having an inlet and an outlet and allowing fluid to move therethrough and a light source provided on one side of the pipe and providing light to the fluid. At least a portion of the pipe is provided in a spiral shape and the inlet and/or the outlet are arranged in a light emitting region.

Abstract: In an example, a substrate is oriented to a target axis, wherein a residual angular misalignment between the target axis and a preselected crystal channel direction in the substrate is within an angular tolerance interval. Dopant ions are implanted into the substrate using an ion beam that propagates along an ion beam axis. The dopant ions are implanted at implant angles between the ion beam axis and the target axis. The implant angles are within an implant angle range. A channel acceptance width is effective for the preselected crystal channel direction. The implant angle range is greater than 80% of a sum of the channel acceptance width and twofold the angular tolerance interval. The implant angle range is smaller than 500% of the sum of the channel acceptance width and twofold the angular tolerance interval.

Abstract: Active cantilever probes having a thin coating incorporated into their design are disclosed. The probes can be operated in opaque and/or chemically harsh environments without the need of a light source or optical system and without being significantly negatively impacted by corrosion. The probes include a substrate that has a cantilever, a thermomechanical actuator associated with the cantilever, a piezoresistive stress sensor disposed on the cantilever, and a thin coating disposed on the cantilever and the piezoresistive stress sensor. The coating is bonded to the substrate, is thermally conductive, and has a low thermal resistance. Further, the thin coating is configured to have little to no impact on one or more of a mass of the active probe, a residual stress of the cantilever, or a stiffness of the active probe. Techniques for performing topography and making other measurements in an opaque and/or chemically harsh environment are also provided.

Abstract: A beam injector may include a cathode emitter to emit electrons and an electrode to bias at least a portion of the electrons to remain on the cathode emitter and focus the emitted electrons into an electron beam. The beam injector may also include a resistor coupled between the cathode emitter and the electrode and configured to allow self-regulation of a voltage potential on the electrode based at least in part on a current of the electron beam.

Abstract: Invention relates to air cleaning systems, particularly to electric air cleaners, and may be used for decontamination of air in different industries. Invention is directed to attaining a technical effect of providing an air cleaning device, where air is cleaned owing to action of corona discharge streamers on air molecules and contamination particles. Technical effect is attained by air cleaning device that contains a high-voltage pulse generator, an outer electrode provided as a grounded metal tube, and an inner electrode rigidly secured along the tube axis by a fastening member and provided in form of a metal rod and configured so as pulsed corona discharge streamers are formed in between the inner and outer electrodes, wherein the inner electrode is spaced by a gap from an output electrode of high-voltage pulse generator and size of the gap assures breakdown of the gap with pulses formed by high-voltage pulse generator.

Abstract: Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

Abstract: A device capable of simultaneous independent motion measurement of multiple probes in an atomic force microscope includes at least two cantilever arms arranged in parallel. The end of each cantilever arm is provided with a needle tip. The surface of each cantilever arm is provided with a grating structure with a periodic distribution rule for reflecting laser irradiated on the grating structure and receiving the laser through reflected light detectors. The discrimination and motion measurement includes the steps of irradiating the measurement laser of different wavelengths on the back surfaces of multiple probes through the same light path at the same time, adopting the grating structures of different feature sizes as physical labels of the multiple probes and reflecting high-order reflected light of the laser of different wavelengths by the grating structures at different angles to separate the light path.

Abstract: Embodiments may include methods, systems, and apparatuses for correcting a response function of an electron beam tool. The correcting may include modulating an electron beam parameter having a frequency; emitting an electron beam based on the electron beam parameter towards a specimen, thereby scattering electrons, wherein the electron beam is described by a source wave function having a source phase and a landing angle; detecting a portion of the scattered electrons at an electron detector, thereby yielding electron data including an electron wave function having an electron phase and an electron landing angle; determining, using a processor, a phase delay between the source phase and the electron phase, thereby yielding a latency; and correcting, using the processor, the response function of the electron beam tool using the latency and a difference between the source wave function and the electron wave function.

Abstract: A fluid metering system for gas independent pressure and flow control through an electron microscope sample holder includes: a pressure control system that supplies gas; an inlet line providing gas from the pressure control system to the sample holder; an outlet line receiving gas from the sample holder; and a variable leak valve that controls gas flow in the outlet line. The gas flows from an upstream tank of the pressure control system through the sample holder and variable leak valve to a downstream tank of the pressure control system due to the pressure difference of the two tanks as the variable leak valve meters flow in the outlet line. Flow rates are established by monitoring pressure changes at source and collection tanks of known volumes with gas independent pressure gauges. A method of directing the gas flow to a residual gas analyzer (RGA) is also presented.

Abstract: Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.

Abstract: A method for detecting a rare stochastic defect, the method may include searching for a rare stochastic defect in a dense pattern of a substrate, wherein the rare stochastic defect is (a) of nanometric scale, (b) appears in a functional pattern of the substrate with a defect density that is below 10?9, and (c) appears in the dense pattern with a defect density that is above 10?7; wherein the dense pattern is a dense representation of the functional pattern that differs from the functional pattern by at least one out of (a) a distance between features of the dense pattern, and (b) a width of the features of the dense pattern; and estimating the occurrence of the rare stochastic defect within the functional pattern based on an outcome of the searching.

Abstract: Illustrative embodiments provide an apparatus comprising a substrate comprising a cantilever, a bottom electrode on the substrate, a bottom piezoelectric transducer on the bottom electrode such that the bottom electrode is between the substrate and the bottom piezoelectric transducer, a middle electrode on the bottom piezoelectric transducer such that the bottom piezoelectric transducer is between the bottom electrode and the middle electrode, a top piezoelectric transducer on the middle electrode such that the middle electrode is between the bottom piezoelectric transducer and the top piezoelectric transducer, and a top electrode on the top piezoelectric transducer, such that the top piezoelectric transducer is between the middle electrode and the top electrode. Illustrative embodiments also provide a method of making the apparatus and a method of using the apparatus for atomic force microscopy.

Abstract: The invention offers high resolution and accuracy for nanoscale device characterization from ultraviolet through microwave wavelengths. Instead of collecting light after emission in near-field that decays to far-field, the present invention directly couples the near-field waves to a polaritonic-coated probe. The polaritonic coating can be formed on an wavelength tuned optical fiber to receive the coupled emission and form polaritons, including plasmons, phonons, and magnons, using the polaritonic material. The polaritons propagate along the probe decay back into the fiber core without substantial losses to far-field and are transmitted to a detector, such as a spectroscope. The coupling of the near-field energy to emission detected through the tip apex of fiber can be expressed as emission spectra. Through mapping with other spatial points, multi-dimensional displays and other information can be provided. The resolution can be less than 100 nanometers, including an order of magnitude less than 100 nanometers.