Patents Examined by Eliza W Osenbaugh-Stewart
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Patent number: 12272518Abstract: A method of evaluating a region of interest of a sample including: positioning the sample within in a vacuum chamber of an evaluation tool that includes a scanning electron microscope (SEM) column and a focused ion beam (FIB) column; acquiring a plurality of two-dimensional images of the region of interest by alternating a sequence of delayering the region of interest with a charged particle beam from the FIB column and imaging a surface of the region of interest with the SEM column; generating an initial three-dimensional data cube representing the region of interest by stacking the plurality of two-dimensional images on top of each other in an order in which they were acquired; identifying distortions within the initial three-dimensional data cube; and creating an updated three-dimensional data cube that includes corrections for the identified distortions.Type: GrantFiled: June 22, 2023Date of Patent: April 8, 2025Assignee: APPLIED MATERIALS ISRAEL LTD.Inventor: Ilya Blayvas
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Patent number: 12266501Abstract: A nanoscale positioning system for positioning a positionable component includes a motion platform including a first end, a second end, a shuttle positioned between the first end and the second end and configured to support the positionable component, a flexure member, and a fluid passage extending through the flexure member from the first end to the second end of the motion platform, and a pressure controller coupled to the motion platform and fluidically connected to the fluid passage, wherein the pressure controller is configured to selectably provide a fluid pressure in the fluid passage to flex the flexure member whereby the shuttle is displaced along a motion axis of the motion platform.Type: GrantFiled: November 27, 2020Date of Patent: April 1, 2025Assignee: The Texas A&M University SystemInventor: ChaBum Lee
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Patent number: 12265043Abstract: Provided is an inspection apparatus including: an irradiation source irradiating an electron beam to a pattern of an inspection target object, the inspection target object having a first surface and a second surface having the pattern; a first voltage application circuit applying a first voltage to the first surface; a second voltage application circuit applying a second voltage to the second surface; and a detector for acquiring an inspection image generated from the pattern by irradiating the electron beam, wherein |Vacc?VL|=|V2|<|V1| is satisfied, when an acceleration voltage of an electron included in the electron beam is Vacc, an incident voltage of the electron reaching the second surface is denoted by VL, the first voltage is denoted by V1, and the second voltage is denoted by V2.Type: GrantFiled: June 7, 2022Date of Patent: April 1, 2025Assignee: NuFlare Technology, Inc.Inventor: Riki Ogawa
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Patent number: 12255042Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.Type: GrantFiled: August 15, 2020Date of Patent: March 18, 2025Assignee: ASML Netherlands B.V.Inventors: Thomas Jarik Huisman, Shakeeb Bin Hasan
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Patent number: 12249481Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.Type: GrantFiled: November 24, 2021Date of Patent: March 11, 2025Assignee: ASML Netherlands B.V.Inventors: Mark Henricus Wilhelmus Van Gerven, Johannes Hubertus Antonius Van De Rijdt, Michaël Johannes Christiaan Ronde, Niels Johannes Maria Bosch
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Patent number: 12247911Abstract: An apparatus for artificial weathering or lightfastness testing of samples comprises a weathering chamber, a first light source provided in the weathering chamber, the first light source comprising one or more fluorescent UV lamps each comprising an emission spectrum with a maximum wavelength below a predetermined wavelength, and a second light source provided in the weathering chamber, the second light source comprising one or more light emitting diodes each comprising an emission spectrum with a maximum wavelength above the predetermined wavelength.Type: GrantFiled: March 31, 2022Date of Patent: March 11, 2025Assignee: ATLAS Material Testing Technology GmbHInventors: Matt McGreer, Oliver Rahäuser, Jörn Jahnke
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Patent number: 12235238Abstract: A method of separating ions according to their ion mobility using an ion mobility separation device including a first section and a second section is disclosed, comprising: urging ions through the first section against a first opposing electric field using a first driving force provided by a first set of time varying voltage(s) or voltage waveform(s); progressively reducing the magnitude of the first opposing electric field and/or progressively increasing the magnitude of the first driving force; and driving ions through the second section against a second opposing electric field using a second drive force provided by a second set of time-varying voltage(s) or voltage waveform(s); wherein the magnitude of the second opposing electric field is progressively reduced and/or the magnitude of the second driving force is progressively increased in tandem with reducing the magnitude of the first opposing electric field and/or increasing the magnitude of the first driving force.Type: GrantFiled: September 17, 2020Date of Patent: February 25, 2025Assignee: Micromass UK LimitedInventor: John Brian Hoyes
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Patent number: 12228484Abstract: Systems and methods for operating a broad ion beam (BIB) polisher in a sample preparation workflow having improved uptime, are disclosed. An example method for operating a broad ion beam (BIB) polisher having improved uptime according to the present invention comprises causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher while the first BIB source is in emitting the first broad ion beam towards the sample, removing a second BIB source from the BIB polisher that is configured to emit a second broad ion beam towards the sample when in use.Type: GrantFiled: May 19, 2022Date of Patent: February 18, 2025Assignee: FEI CompanyInventors: Michal Hrouzek, Krishna Kanth Neelisetty, Petr Wandrol, Libor Novak
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Patent number: 12224170Abstract: Components of scientific analytical equipment and to complete items of analytic equipment. An apparatus and methods useful for detecting an ion in mass spectrometry applications are provided. The apparatus may include an electron multiplier having a high sensitivity and low sensitivity sections, or the combination of an electron multiplier with a separately powered conversion dynode (and particularly a high energy conversion dynode), or the combination of a conversion dynode that is physically incorporated within or about an electron multiplier.Type: GrantFiled: June 1, 2018Date of Patent: February 11, 2025Assignee: ADAPTAS SOLUTIONS PTY LTDInventors: Wayne Sheils, Richard Stresau, Kevin Hunter
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Patent number: 12208286Abstract: Techniques for closed-loop feedback beam control in particle therapy delivery system can include receiving treatment plan beam parameters, receiving a determined output beam current of a present spot, generating an adjusted source beam current set point based on the treatment plan beam parameters and the determined output beam current of the present spot, and adjusting an output beam current of the present spot based on the adjusted source beam current.Type: GrantFiled: January 10, 2022Date of Patent: January 28, 2025Assignee: VARIAN MEDICAL SYSTEMS PARTICLE THERAPY GMBH & CO. KGInventors: Jay Steele, Manuel Schedler
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Patent number: 12195331Abstract: An embodiment of the present disclosure relates to an apparatus for synthesizing nanoparticles by irradiating, with an electron beam, a nanoparticle aqueous solution in a reaction vessel provided inside a shielding chamber, and more particularly, to an apparatus for synthesizing nanoparticles, which is capable of preventing radiation generated in a shielding chamber from leaking out, and facilitating maintenance and repair.Type: GrantFiled: June 30, 2022Date of Patent: January 14, 2025Assignee: KORENS RTX Co., Ltd.Inventors: Jong Min Shin, Dae Soo Yang, Ki Baek Song, Yeong Cheol Yoon, Hyean Yeol Park, So Yeon Lim
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Patent number: 12196767Abstract: A method of detecting vitamin D in blood using laser desorption/ionization mass spectrometry (LDI-MS) and an apparatus therefor according to the present invention are not complicated in a measurement, do not require a number of measurement steps, and allow for easy measurement and collection of results in real time with a quick analysis. In addition, precise analysis may be performed even at a lower concentration of a sample, such that sensitivity and precision are excellent, various subtypes of vitamin D may be simultaneously detected, a throughput is high, and structural analysis and quantitative analysis of vitamin D that has undergone a metabolic process in blood may be accurately performed without a matrix interference.Type: GrantFiled: November 11, 2019Date of Patent: January 14, 2025Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCEInventors: Tae Geol Lee, Jin Gyeong Son, Sunho Joh
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Patent number: 12198891Abstract: A difference between a calculated amount of drift and an actual amount of drift is reduced.Type: GrantFiled: July 12, 2022Date of Patent: January 14, 2025Assignee: NuFlare Technology, Inc.Inventor: Taku Yamada
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Patent number: 12196651Abstract: The present invention provides a method for measuring a distribution of pores in an electrode for a secondary battery, which can easily measure a distribution of pores inside the electrode for a secondary battery.Type: GrantFiled: May 29, 2018Date of Patent: January 14, 2025Assignee: LG Energy Solution, Ltd.Inventor: Jung Hoon Han
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Patent number: 12194317Abstract: There is provided a charged particle beam irradiation apparatus that performs irradiation of a charged particle beam, the apparatus including: an accelerator that accelerates a charged particle to generate the charged particle beam; an irradiator that includes a gantry rotatable around a rotation axis, and performs irradiation of the charged particle beam generated by the accelerator; and a transporter that includes an energy degrader provided outside the irradiator to reduce an energy of the charged particle beam generated by the accelerator, and transports the charged particle beam, which is generated by the accelerator, to the irradiator. The transporter transports the charged particle beam to the irradiator while maintaining an energy distribution of the charged particle beam that is reduced in energy by the energy degrader.Type: GrantFiled: March 30, 2021Date of Patent: January 14, 2025Assignee: Sumitomo Heavy Industries, Ltd.Inventor: Kenzo Sasai
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Patent number: 12191117Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.Type: GrantFiled: October 17, 2021Date of Patent: January 7, 2025Assignee: Applied Materials, Inc.Inventors: Costel Biloiu, Jay R. Wallace, Solomon Belangedi Basame, Kevin R. Anglin, Tyler Rockwell
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Patent number: 12193136Abstract: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. The target droplet source further includes a sleeve disposed in the chamber distal to the nozzle. The sleeve is configured to provide a path for the target droplets in the chamber.Type: GrantFiled: July 19, 2023Date of Patent: January 7, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wei-Chih Lai, Han-Lung Chang, Chi Yang, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
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Patent number: 12183541Abstract: In the present invention, an overlay misalignment is quickly measured. An image generation unit generates an image on the basis of signals from a detector. A matching processing unit identifies, by means of matching processing with a template image, the position of an overlay measurement pattern in the image generated by the image generation unit. A line profile generation unit generates, by scanning the overlay pattern, a first line profile pertaining to a secondary electron signal and a second line profile pertaining to a backscattered electron signal. An overlay misalignment measurement unit identifies the position of a first pattern in the overlay measurement pattern from the first line profile, identifies the position of a second pattern in the overlay measurement pattern from the second line profile, and measures an overlay misalignment in a sample on the basis of the position of the first pattern and the position of the second pattern.Type: GrantFiled: August 28, 2019Date of Patent: December 31, 2024Assignee: Hitachi High-Tech CorporationInventor: Takuma Yamamoto
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Patent number: 12170184Abstract: A transmission electron microscope capable of obtaining a hollow-cone dark-field image and visually displaying irradiation conditions thereof includes an irradiation unit for irradiating a specimen with an electron beam, an objective lens for causing the electron beam transmitted through the specimen to form an image, beam deflectors positioned higher than a position where the specimen is placed, an objective movable aperture for passing only a portion of the electron beam transmitted through the specimen, and a deflection coil control unit. The deflection coil control unit controls a deflection angle of the electron beam using the beam deflectors such that the specimen is irradiated with the electron beam at a predetermined angle with respect to an optical axis while the electron beam is moving in a precessional manner and only a diffracted wave and/or a scattered wave having a desired angle passes through the objective movable aperture.Type: GrantFiled: April 26, 2019Date of Patent: December 17, 2024Assignee: Hitachi High-Tech CorporationInventors: Toshie Yaguchi, Keiji Tamura, Hiromi Mise, Yasuyuki Nodera, Akiko Wakui, Keisuke Igarashi
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Patent number: 12167953Abstract: An animal irradiation system includes a radioactive source and an irradiation fixing apparatus having irradiated bodies. The radioactive source includes a beam outlet having a first central axis. Radioactive rays generated by the radioactive source exit from the beam outlet and irradiate the irradiated bodies. The radioactive rays define a main axis around the first central axis. The irradiation fixing apparatus includes a box body, which is divided into multiple accommodating chambers around a second central axis. Each accommodating chamber accommodates an irradiated body. Multiple first irradiation holes corresponding to the accommodating chambers are formed on the box body. The radioactive rays pass through the first irradiation holes and then irradiate the irradiated bodies. A maximum distance from an inner wall of each first irradiation hole to the first central axis is less than a minimum distance from an inner wall of the beam outlet to the first central axis.Type: GrantFiled: October 27, 2022Date of Patent: December 17, 2024Assignee: NEUBORON MEDTECH LTD.Inventors: Dong-chun Wang, Yuan-hao Liu, Hong-feng Ji, Fa-zhi Yan