Patents Examined by Eliza W Osenbaugh-Stewart
  • Patent number: 11515121
    Abstract: In an electron beam device provided with two columns including an irradiation optical system and an imaging optical system, a photoelectron image for use in adjusting the irradiation optical system is made sharper. The electron beam device includes: an irradiation optical system which irradiates a sample placed on a stage with an electron beam; a light irradiation unit 50 which irradiates the sample with light containing ultraviolet rays; a sample voltage control unit 44 which applies a negative voltage to the sample so that, before the electron beam reaches the sample, the electron orbit inverts; and an imaging optical system which acquires a mirror electron image by forming an image of mirror electrons reflected by application of the negative voltage.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: November 29, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Tomohiko Ogata, Hisaya Murakoshi, Masaki Hasegawa, Noriyuki Kaneoka, Katsunori Onuki
  • Patent number: 11511006
    Abstract: A LED ultraviolet germicidal lamp includes a bracket, a power box, a driving light source, a heat sink, an ultraviolet light source, a lampshade, a quartz glass, a catalyst gauze, and a lamp frame. The bracket is connected to the heat sink, and the power box and the driving light source are provided in the bracket in sequence from outside to inside. The driving light source is provided in the power box and is connected to the power box by bolts. The heat sink is connected to the power box and is provided at a lower end of the power box. Titanium dioxide is used as the catalyst and is catalyzed by the UVC light source. Hydroxyl radicals produced when nanoscale titanium dioxide catalyst gauze is exposed to the UVC light source destroy bacteria and viruses.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: November 29, 2022
    Inventors: Zhigang Liang, Bing Li
  • Patent number: 11508551
    Abstract: A detection and correction method for an electron beam system are provided. The method includes emitting an electron beam towards a specimen; modulating a beam current of the electron beam to obtain a beam signal. The method further includes detecting, using an electron detector, secondary and/or backscattered electrons emitted by the specimen to obtain electron data, wherein the electron data defines a detection signal. The method further includes determining, using a processor, a phase shift between the beam signal and the detection signal. The method further includes filtering, using the processor, the detection signal based on the phase shift.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: November 22, 2022
    Inventors: Henning Stoschus, Stefan Eyring, Christopher Sears
  • Patent number: 11488800
    Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: November 1, 2022
    Assignee: FEI Company
    Inventors: Pavel Potocek, Remco Schoenmakers, Maurice Peemen, Bert Henning Freitag
  • Patent number: 11483918
    Abstract: A method for generating light is provided. The method further includes measuring a period of time during which one of targets from a fuel target generator passes through two detection positions. The method also includes exciting the targets with a laser generator so as to generate plasma that emits light. In addition, the operation of exciting the targets with the laser generator includes: irradiating a pre-pulse laser on the targets to expand the targets; detecting conditions of expanded targets; and adjusting at least one parameter of the laser generator according to the measured period of time and the conditions when the measured period of time is different from a predetermined value. The parameter of the laser generator which is adjusted according to the measured period of time includes a frequency for generating a laser for illuminating the targets.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: October 25, 2022
    Inventors: Chieh Hsieh, Shang-Chieh Chien, Chun-Chia Hsu, Bo-Tsun Liu, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 11480719
    Abstract: A short wavelength infrared (SWIR) energy emitting system or material for producing SWIR energy from an emission source emitting electromagnetic energy. The SWIR energy system or material comprises a phosphor material, an electromagnetic energy blocking member, a substrate for delivering the system or material to an electromagnetic energy emission source, and optionally, a securing member. The SWIR energy system or material may be in the form of a tape, sheet, or other laminar material capable of producing short wave infrared emission when excited at wavelengths shorter than that of the emission.
    Type: Grant
    Filed: July 28, 2020
    Date of Patent: October 25, 2022
    Assignee: Cyalume Technologies, Inc.
    Inventors: William R. Palmer, Stephen L. Palmer
  • Patent number: 11476079
    Abstract: Methods include providing a multi-pillar sample including at least a first pillar and a second pillar parallel with the first pillar, directing a charged particle beam to the first pillar, imaging the first pillar at a plurality of rotational positions by rotating the multi-pillar sample about a first pillar axis of the first pillar, directing the charged particle beam to the second pillar, and imaging the second pillar at a plurality of rotational positions by rotating the multi-pillar sample about a second pillar axis of the second pillar. Related apparatus for performing disclosed methods are disclosed. Multi-pillar samples are also disclosed.
    Type: Grant
    Filed: March 31, 2021
    Date of Patent: October 18, 2022
    Assignee: FEI Company
    Inventors: Jakub Kuba, Tomas Vystavel, Magda Zaoralova
  • Patent number: 11476778
    Abstract: An ion pulse generator (100) includes a triboelectric generator (110), an ion emitter (132) and a conductive surface (134). The triboelectric generator (110) includes a first electrode (114), a spaced apart second electrode (120) and a first triboelectric layer (116). The triboelectric generator (110) generates a predetermined amount of charge as a result of relative movement of the first triboelectric layer (116). The ion emitter (132) is electrically coupled to the first electrode (114). The conductive surface (134) is electrically coupled to the second electrode (120) and is spaced apart from the ion emitter (132) at a predetermined distance. Generation of the predetermined amount of charge causes formation of ions between the ion emitter (132) and the conductive surface (134).
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: October 18, 2022
    Assignee: Georgia Tech Research Corporation
    Inventors: Anyin Li, Facundo Martin Fernandez, Yunlong Zi
  • Patent number: 11458219
    Abstract: A UV light and sterilization system. The UV light includes: a base, a reflex lamp housing and several UV modules; the reflex lamp housing is provided on the base, the periphery of the reflex lamp housing is provided with several containing grooves, and the inner wall of each of the containing grooves is provided as a reflective panel; several the UV modules are provided on the base and connect to the base electrically, and each of the UV modules is contained in a the containing groove. The UV light provides UV illumination and improves sterilization effects.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: October 4, 2022
    Inventors: Qing Lan, Ligen Liu, Shoubao Chen, Tianlong Dai, Buyuan Peng
  • Patent number: 11448664
    Abstract: A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: September 20, 2022
    Assignee: Bruker Nano, Inc.
    Inventor: Jeffrey Wong
  • Patent number: 11448663
    Abstract: This invention is directed to a pattern height information correction system which includes a contour line information of a pattern extracted from an acquired image including at least an AFM (atomic force microscope) module, a design information database that stores design information including at least layer information, and a computer system that divides the extracted pattern into regions based on the design information stored in the design information database relating to the extracted pattern and associates the divided regions with layer information, in which the computer system specifies a horizontal region designated as horizontal in advance from the divided regions, creates an approximated curved surface based on the specified horizontal region corresponding to the same layer information, and corrects height information of the extracted pattern using the approximated curved surface.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: September 20, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Kenji Yamasaki, Hiroyuki Shindo, Taeko Kashiwa, Ryugo Kagetani
  • Patent number: 11443915
    Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: September 13, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Joe Wang, Chia Wen Lin, Zhongwei Chen, Chang-Chun Yeh
  • Patent number: 11424099
    Abstract: In order to control a charge amount on a sample surface to a desired value before calculating a frame integration image, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a deflector configured to scan an observation region of the sample with the charged particle beam; a detector configured to detect a charged particle emitted from the sample due to scanning with the charged particle beam; an image generation unit configured to generate a frame image of the observation region based on an observation signal output from the detector; and a scanning suspension time setting unit configured to set a scanning suspension time, which is a time during which scanning of the observation region with the charged particle beam is suspended after a frame image is generated, in which the image generation unit calculates a frame integration image by integrating frame images generated with the scanning suspension time i
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: August 23, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hiroki Kannami, Hironori Itabashi, Ichiro Fujimura
  • Patent number: 11417497
    Abstract: The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; and acquiring an EELS spectrum for each of said plurality of sample positions. According to the method, it comprises the further steps of scanning, once more, said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum. With this, it is possible to acquire rapid information on the sample being investigated, allowing for faster processing of samples.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: August 16, 2022
    Assignee: FEI Company
    Inventors: Remco Schoenmakers, Jaydeep Sanjay Belapure
  • Patent number: 11417496
    Abstract: The problem addressed by the present disclosure is to provide a stage device, a charged particle beam device, and a vacuum device, with which it is possible to increase the speed and the acceleration of positioning and to suppress the leakage of a magnetic field. As a means to resolve this problem, a stage device 100 comprises a support stage 10, a floating mechanism 20, and a movement stage 30. The movement stage 30 has a propulsion-applying unit 36, and the support stage 10 has a propulsion-receiving unit 11. The stage device 100 is configured so that when the movement stage 30 moves and the propulsion-applying unit 36 contacts or approaches the propulsion-receiving unit 11, the propulsion-applying unit 36 applies propulsion in the movement direction to the propulsion-receiving unit 11.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: August 16, 2022
    Assignee: Hitachi, Ltd.
    Inventors: Motohiro Takahashi, Takanori Kato, Naruo Watanabe, Hironori Ogawa
  • Patent number: 11413474
    Abstract: A method is proposed for evaluating the robustness of a radiotherapy treatment plan. The method comprises, defining a number of scenarios, each comprising one or more errors for each fraction of the plan, including interfractional and/or intrafractional errors, and calculating a dose distribution resulting from the scenario; The robustness of the plan is then evaluated based at least one of the following i. the probability of fulfilling a set of clinical goals estimated as the clinical goal fulfilment over the scenarios ii. the range of DVH values over the scenarios iii. dose statistics for dose distributions defined as voxel-wise aggregates over the scenario doses.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: August 16, 2022
    Assignee: RaySearch Laboratories AB
    Inventor: Albin Fredriksson
  • Patent number: 11402404
    Abstract: A method of operating a scanning probe microscope, wherein a control loop is provided which is configured for controlling one or more feedback parameters of the scanning probe microscope. One or more system identification measurements are performed during operation of the control loop, wherein during the one or more system identification measurements an excitation signal with a plurality of frequency components is introduced in the control loop and a resulting response signal indicative of a cantilever displacement or a stage-sample distance between a sensor device and a sample is measured. A model response function is identified using said excitation signal and said resulting response signal, wherein one or more settings and/or input signals are adapted in the control loop based on the identified model response function. The scanning probe microscope is used for characterization of the sample using the adapted one or more settings and/or input signals.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: August 2, 2022
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Jan Jacobus Benjamin Biemond, Lukas Kramer, Jasper Winters
  • Patent number: 11398365
    Abstract: An apparatus is provided for microscopy, inspection, or analysis of a sample. The apparatus has a vacuum chamber and a charged-particle beam column in the vacuum chamber to direct a charged-particle beam onto a sample. The charged-particle beam column includes a charged-particle beam source to generate a charged-particle beam and charged-particle beam optics to direct the charged-particle beam onto the sample. The apparatus has a detector to detect radiation emanating from the sample to generate an image. A cartridge is provided to support the sample in the path of the charged-particle beam in the vacuum chamber. The cartridge is mechanically decoupled from the environment external to the vacuum chamber. A controller is provided to analyze the detected radiation to generate an image of the sample.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: July 26, 2022
    Assignee: Mochii, Inc.
    Inventor: Christopher Su-Yan Own
  • Patent number: 11393667
    Abstract: A sample support body includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and to a third surface of the conductive layer which is locate at a side opposite to the substrate, are provided in the substrate and the conductive layer. A protective film having a higher affinity with water than the substrate is provided on the second surface, the third surface, and each inner surface of the plurality of through-holes.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: July 19, 2022
    Inventors: Yasuhide Naito, Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11380515
    Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: July 5, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Keiichiro Hosobuchi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Takaaki Kikuchi