Patents Examined by Eliza W Osenbaugh-Stewart
  • Patent number: 10446381
    Abstract: A method of introducing and ejecting ions from an ion entry/exit device (4) is disclosed. The ion entry/exit device (4) has at least two arrays of electrodes (20,22). The device is operated in a first mode wherein DC potentials are successively applied to successive electrodes of at least one of the electrode arrays ((20,22) in a first direction such that a potential barrier moves along the at least one array in the first direction and drives ions into and/or out of the device in the first direction. The device is also operated in a second mode, wherein DC potentials are successively applied to successive electrodes of at least one of the electrode arrays (20,22) in a second, different direction such that a potential barrier moves along the array in the second direction and drives ions into and/or out of the device in the second direction. The device provides a single, relatively simple device for manipulating ions in multiple directions.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: October 15, 2019
    Assignee: Micromass UK Limited
    Inventors: Kevin Giles, David J. Langridge, Jason Lee Wildgoose
  • Patent number: 10431419
    Abstract: Sparse sampling approaches and probe systems for analytical instruments are disclosed providing for effective sub-sampling of a specimen and inpainting to reconstruct representations of actual information. The sub-sampling involves serial acquisition of contiguous measured values lying at positions along a scan path extending in a line toward a first direction and having random perturbations in a second direction. The perturbations are limited within a predetermined distance from the line. Inpainting techniques are utilized among the measured values to reconstruct a representation of actual information regarding the specimen.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: October 1, 2019
    Assignee: Battelle Memorial Institute
    Inventors: Libor Kovarik, Andrew J. Stevens, Andrey V. Liyu, Nigel D. Browning
  • Patent number: 10433412
    Abstract: This disclosure provides systems, methods, and apparatus related to laser plasma accelerators. In one aspect a block of material defines a gas inlet, a chamber in fluid communication with the gas inlet, a throat in fluid communication with the chamber, a channel in fluid communication with the throat, and a gas outlet in fluid communication with the channel. The throat is configured to generate a supersonic flow of a gas when the gas flows through the throat. The channel includes a ramp that is positioned proximate the gas outlet, with the ramp being inclined at an angle with respect to a direction of a flow of the gas proximate a surface of the channel prior to the ramp at the gas outlet.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: October 1, 2019
    Assignee: The Regents of the University of California
    Inventors: Hann-Shin Mao, Wim Leemans, Stepan Bulanov
  • Patent number: 10401615
    Abstract: A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: September 3, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Yoshiaki Kurosawa, Takashi Suganuma
  • Patent number: 10391189
    Abstract: Methods and systems are provided which project germicidal light from a lamp toward an individual donned in outerwear to disinfect the outerwear. In specific embodiments, germicidal light is projected toward an individual situated greater than approximately 1 foot from the light source. Some systems include sensor/s for detecting presence of an individual within a target area a set distance from the disinfection apparatus comprising the light source and program instructions for commencing operation of the disinfection apparatus based on information from the sensor/s. In addition or alternatively, some systems include reflective panel/s exhibiting greater than approximately 85% reflectance.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: August 27, 2019
    Assignee: Xenex Disinfection Services, LLC.
    Inventors: Mark A. Stibich, Sarah E. Simmons, Edward C. Guerrero, Jr., Paul P. Froutan
  • Patent number: 10395907
    Abstract: A generator of an ion beam is provided, including an ionization chamber provided with an inlet of a fluid to be ionized; a source of ionizing particles configured to impact the fluid in an impact zone of the ionization chamber so as to generate ions; and an extractor of ions generated in a direction of an outlet zone of the generator, the extractor including at least two electrodes, a first electrode referred to as input electrode laterally bordering the impact zone, and at least one second electrode referred to as intermediate electrode located in the impact zone, the at least two electrodes being configured to generate a voltage gradient in the impact zone, with the voltage gradient being configured to direct the generated ions to the outlet zone of the generator.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: August 27, 2019
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Thomas Alava, Hadley Videlier, Frederic Progent, Laurent Duraffourg, Sebastien Vigne, Romain Mahieu
  • Patent number: 10377643
    Abstract: Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: August 13, 2019
    Assignee: RayVio Corporation
    Inventors: Douglas A. Collins, Yitao Liao, Robert S. West
  • Patent number: 10376608
    Abstract: Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.
    Type: Grant
    Filed: December 1, 2016
    Date of Patent: August 13, 2019
    Assignee: RayVio Corporation
    Inventors: Douglas A. Collins, Yitao Liao, Robert S. West
  • Patent number: 10381215
    Abstract: A target for ultraviolet light generation 20A includes a sapphire substrate 21 that transmits ultraviolet light UV, an interlayer 22 that is in contact with the sapphire substrate 21, includes oxygen atoms and aluminum atoms in a composition, and transmits ultraviolet light UV, and a luminous layer 23 that is provided on the interlayer 22, includes oxide crystals containing rare earth elements to which an activator agent is added, and receives electron beams EB so as to generate ultraviolet light UV.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: August 13, 2019
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Kohei Ikeda, Norio Ichikawa, Hiroyuki Taketomi
  • Patent number: 10380731
    Abstract: A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: August 13, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Wei Fang, Jack Jau
  • Patent number: 10381214
    Abstract: A linear ion trap includes at least two discrete trapping regions for processing ions and at least one gas pulse valve for applying pulses of gas to dynamically control pressure in the at least two discrete trapping regions. A RF electrical potential generator produces two RF waveforms, each applied to a pair of pole electrodes of the linear ion trap forming a RF trapping field component to trap ions radially. A multi-output DC electrical potential generator produces multiple DC field components superimposed to the RF trapping field component and distributed across the length of the linear ion trap to control ions axially. A control unit is configured to switch the DC electrical potentials and corresponding DC field components collectively forming a first trapping region of the at least two discrete trapping regions that is populated with ions to alter ion potential energy from a first level to a second level, and to enable at least a first ion processing step in at least one of the first and second levels.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: August 13, 2019
    Inventors: Dimitris Papanastasiou, Emmanuel Raptakis
  • Patent number: 10370267
    Abstract: In various embodiments, a fluid is treated by flowing the fluid through a flow cell having (i) a fluid entry, (ii) a fluid exit, (iii) a treatment region disposed between the fluid entry and exit, and (iv) an interior surface reflective to ultraviolet (UV) light, and diffusively reflecting UV light emitted from one or more UV light sources to illuminate the treatment region substantially uniformly, thereby treating the fluid.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: August 6, 2019
    Assignee: Crystal IS, Inc.
    Inventors: Jianfeng Chen, Rajul V. Randive, Craig Moe
  • Patent number: 10369521
    Abstract: An embodiment of a method for real time material identification is described that comprises determining an approximate mass value for an unknown material from spectral information derived from mass spectral analysis of the unknown material; retrieving profile models that correspond to a known material from a data structure using the approximate mass value; fitting a sample profile for the unknown material from the spectral information to the profile models to generate a fit score for each fit, wherein the lowest fit score corresponds to the best fit; calculating a mass value from the best fitting profile model and the sample profile.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: August 6, 2019
    Assignee: THERMO FINNIGAN LLC
    Inventors: Scott R. Kronewitter, James L. Stephenson, Jr., Ping F. Yip
  • Patent number: 10373798
    Abstract: A multi charged particle beam inspection apparatus includes a plurality of sensors, arranged inside or on a periphery of a secondary electron image acquisition mechanism, to measure a plurality of interfering factors, a determination circuit to determine, for each interfering factor, whether change exceeding a corresponding threshold is a first case which returns to the original state within a predetermined time period, or a second case which does not return to the original state even if the predetermined time period has passed, and a comparison circuit to input a reference image of a region corresponding to the secondary electron image acquired, and compare the secondary electron image with the reference image, wherein in the case where change of the second case occurs, the secondary electron image acquisition mechanism suspends the acquisition operation of the secondary electron image, and calibrates a change amount of the multiple charged particle beams.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: August 6, 2019
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventor: Hidekazu Takekoshi
  • Patent number: 10366912
    Abstract: An object of the invention is to provide a stage apparatus that realizes compatibility between long stroke driving and reduction of a burden on a drive mechanism. In order to achieve the above object, there is suggested a stage apparatus including a first table that moves a sample in a first direction, a second table that moves the first table in a second direction different from the first direction, moving mechanisms that move the tables, respectively, a movable body that supports a moving mechanism, and a third moving mechanism that moves the movable body so as to follow the second table.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: July 30, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Naruo Watanabe, Hironori Ogawa, Takanori Kato, Akira Nishioka
  • Patent number: 10363330
    Abstract: A solution for disinfecting electronic devices is provided. An ultraviolet radiation source is embedded within an ultraviolet absorbent case. While the electronic device is within the ultraviolet absorbent case, ultraviolent radiation is directed at the electronic device. A monitoring and control system monitors a plurality of attributes for the electronic device, which can include: a frequency of usage for the device, a biological activity at a surface of the device, and a disinfection schedule history for the device. Furthermore, the monitoring and control system can detect whether the device is being used. Based on the monitoring, the monitoring and control system controls the ultraviolet radiation directed at the electronic device.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: July 30, 2019
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
  • Patent number: 10361075
    Abstract: A system and a process for measuring, by glow discharge spectrometry, the elemental and/or molecular chemical composition of an organic solid sample (10). The sample (10) is positioned so as to seal a glow discharge plasma reactor (2), a gaseous mixture including at least one inert gas and gaseous oxygen is injected into the reactor (2), the concentration of gaseous oxygen being between 0.1% and 15% by weight of the gaseous mixture, an electric discharge of radiofrequency type is applied to the electrodes of the plasma reactor (2) in order to generate a glow discharge plasma, and the solid sample (10) is exposed to the plasma so as to etch an erosion crater in the solid sample (10); at least one signal representative of an ionized species of negative charge is selected and measured using a mass spectrometer (4).
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: July 23, 2019
    Assignee: HORIBA JOBIN YVON SAS
    Inventors: Patrick Chapon, Agnes Tempez, Sebastien Legendre
  • Patent number: 10361062
    Abstract: A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is inserted; a light guide which guides light generated by the scintillator; a conductive layer provided on a sensitive surface of the scintillator; and a conductive member provided in the scintillator, wherein the shortest distance between the liner tube and the conductive member is shorter than the shortest distance between the liner tube and the conductive layer, a voltage for accelerating electrons is applied to the conductive layer, and the conductive layer and the conductive member have a same potential.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: July 23, 2019
    Assignee: JEOL Ltd.
    Inventors: Tatsuru Kuramoto, Yuichiro Ohori, Yoshinori Matsuda, Makoto Aoshima
  • Patent number: 10340117
    Abstract: Since a diffraction phenomenon occurs in the electron beam passing through a differential evacuation hole, an electron beam whose probe diameter is narrowed cannot pass through a hole having an aspect ratio of a predetermined value or more, and accordingly, a degree in vacuum on the electron beam side cannot be improved. By providing a differential evacuation hole with a high aspect ratio in an ion beam device, it becomes possible to obtain an observed image on a sample surface, with the sample being placed under the atmospheric pressure or a pressure similar thereto, in a state where the degree of vacuum on the ion beam side is stabilized. Moreover, by processing the differential evacuation hole by using an ion beam each time it is applied, both a normal image observation with high resolution and an image observation under atmospheric pressure or a pressure similar thereto can be carried out.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: July 2, 2019
    Assignee: Hitachi, Ltd.
    Inventors: Shinichi Matsubara, Hiroyasu Shichi, Takashi Ohshima
  • Patent number: 10290481
    Abstract: A mass spectrometry data analysis method for analyzing a specimen having a composition where two different reference chemical structures A and B that are each repeated, includes acquiring exact mass information of each peak in a mass spectrum of the specimen by mass spectrometry, acquiring Kendrick mass defect information DA and DB where a decimal number part has been extracted from mass information obtained by performing Kendrick mass conversion computation processing on exact mass information of each peak, acquiring mass defect information dB and dA where a decimal number part has been extracted from mass information of B based on A and A based on B of the reference chemical structures A and B, calculating nA=DB/dA,nB=DA/dB regarding DA, DB, dA, and dB, and obtaining degree-of-polymerization information nA and nB, and displaying plots corresponding to each peak on two-dimensional coordinates where nA and nB are axes.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: May 14, 2019
    Assignee: JEOL Ltd.
    Inventor: Ayumi Kubo