Abstract: A method includes moving a plurality of sensors along a translation path with respect to an ion beam, acquiring sensor signals produced by the plurality of sensors, converting the acquired sensor signals into a data set representative of a two-dimensional (2D) profile of the ion beam, generating a plurality of first one-dimensional (1D) profiles of the ion beam from the data set, generating a plurality of second 1D profiles of the ion beam by spatially inverting each of the plurality of first 1D profiles, generating a plurality of third 1D profiles of the ion beam by superposing first current density values of each of the plurality of first 1D profiles with second current density values of a corresponding one of the plurality of second 1D profiles and determining whether to continue an implantation process with the ion beam in accordance with the plurality of third 1D profiles.

Abstract: An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an electron beam in response to receiving excitation light emitted from the light source, and an anode. The main body section includes an objective lens that converges an electron beam emitted from the electron gun section. The control unit controls at least convergence power of the objective lens in accordance with a size of an electron beam emitted from the photocathode.

Abstract: Inspection systems and methods are disclosed. An inspection system may include a first energy source configured to provide a first landing energy beam and a second energy source configured to provide a second landing energy beam. The inspection system may also include a beam controller configured to selectively deliver one of the first and second landing energy beams towards a same field of view, and to switch between delivery of the first and second landing energy beams according to a mode of operation of the inspection system.

Abstract: An extreme ultraviolet (EUV) source includes a collector associated with the vessel. The extreme ultraviolet (EUV) source includes a plurality of vanes along walls of the vessel. Each vane includes a stacked vane segment, and the stacked vane segments for each vane are stacked in a direction of drainage of tin (Sn) in the vessel. The EUV source includes a thermal control system comprising a plurality of independently controllable heating elements, where a heating element is configured to provide localized control for heating of a vane segment of the stacked vane segments.

Abstract: Systems and methods are provided for obtaining raw mass spectrometry data from samples, determining signals present across the samples, and separating the raw mass spectrometry data into discrete intervals in each of the samples. At each interval of the discrete intervals of the raw mass spectrometry data, a local highest intensity signal, relative to any other signal within each interval, is determined, and a frequency of occurrence of each local highest intensity signal across the samples is determined. A subset of local highest intensity signals is retrieved based on respective frequencies of occurrence of the local highest intensity signals. The subset of the local highest intensity signals is ingested into a machine learning model.

Abstract: Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on a specimen to be tested; a first detector arranged between the first beam guide and the first control electrode, configured to receive the backscattered electrons generated by the electron beam acting on the specimen to be tested.

Abstract: Provided is an operation procedure of a positioning device of a radiation therapy system. The radiation therapy system includes a radiation generation device used to generate therapeutic radiation, an irradiation chamber used to accommodate an irradiation subject receiving the radiation, a management chamber used to achieve irradiation control, and a support device used to transport and support the irradiation subject. The support device includes a support member supporting the irradiation subject, an adjustment assembly for adjusting a spatial position of the support member, and a joining assembly fixedly connecting the support member and the adjustment assembly together in a detachable manner. The support member at least includes a first support member and a second support member having a different size and/or shape from the first support member. The invention allows switching between support members having different sizes and/or shapes according to an actual use requirement.

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract: Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

Abstract: A multiple particle beam microscope and an associated method set a desired focal plane with an optical resolution and set a telecentric irradiation with the plurality of the primary beams. A method determines an optimal setting plane, into which an object surface is brought. Further, a system provides an improved resolution and telecentric irradiation for a large number of primary beams. Targeted selection and targeted individual influencing of individual primary beams and/or a mechanism means for influencing the plurality of primary beams in collective fashion can be implemented.

Abstract: The present invention relates to a micro-optomechanical system (500) and to a method for the production thereof.

Abstract: A device for immobilization of a patient body part for radiotherapy applications includes at least one flanged support member and at least one support member fixation means for mounting the at least one flanged support member to a fixation surface at a distance from said fixation surface. The at least one flanged support member is adapted to receive and retain a first and optionally a second frame. The curved extension is adapted to retain the first frame or the first frame and the second frame. The invention also relates to a system, a method and a kit.

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

Abstract: A method of evaluating a region of interest of a sample including: positioning the sample within in a vacuum chamber of an evaluation tool that includes a scanning electron microscope (SEM) column and a focused ion beam (FIB) column; acquiring a plurality of two-dimensional images of the region of interest by alternating a sequence of delayering the region of interest with a charged particle beam from the FIB column and imaging a surface of the region of interest with the SEM column; generating an initial three-dimensional data cube representing the region of interest by stacking the plurality of two-dimensional images on top of each other in an order in which they were acquired; identifying distortions within the initial three-dimensional data cube; and creating an updated three-dimensional data cube that includes corrections for the identified distortions.

Abstract: A nanoscale positioning system for positioning a positionable component includes a motion platform including a first end, a second end, a shuttle positioned between the first end and the second end and configured to support the positionable component, a flexure member, and a fluid passage extending through the flexure member from the first end to the second end of the motion platform, and a pressure controller coupled to the motion platform and fluidically connected to the fluid passage, wherein the pressure controller is configured to selectably provide a fluid pressure in the fluid passage to flex the flexure member whereby the shuttle is displaced along a motion axis of the motion platform.

Abstract: Provided is an inspection apparatus including: an irradiation source irradiating an electron beam to a pattern of an inspection target object, the inspection target object having a first surface and a second surface having the pattern; a first voltage application circuit applying a first voltage to the first surface; a second voltage application circuit applying a second voltage to the second surface; and a detector for acquiring an inspection image generated from the pattern by irradiating the electron beam, wherein |Vacc?VL|=|V2|<|V1| is satisfied, when an acceleration voltage of an electron included in the electron beam is Vacc, an incident voltage of the electron reaching the second surface is denoted by VL, the first voltage is denoted by V1, and the second voltage is denoted by V2.

Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.

Abstract: An apparatus for artificial weathering or lightfastness testing of samples comprises a weathering chamber, a first light source provided in the weathering chamber, the first light source comprising one or more fluorescent UV lamps each comprising an emission spectrum with a maximum wavelength below a predetermined wavelength, and a second light source provided in the weathering chamber, the second light source comprising one or more light emitting diodes each comprising an emission spectrum with a maximum wavelength above the predetermined wavelength.

Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.

Abstract: A method of separating ions according to their ion mobility using an ion mobility separation device including a first section and a second section is disclosed, comprising: urging ions through the first section against a first opposing electric field using a first driving force provided by a first set of time varying voltage(s) or voltage waveform(s); progressively reducing the magnitude of the first opposing electric field and/or progressively increasing the magnitude of the first driving force; and driving ions through the second section against a second opposing electric field using a second drive force provided by a second set of time-varying voltage(s) or voltage waveform(s); wherein the magnitude of the second opposing electric field is progressively reduced and/or the magnitude of the second driving force is progressively increased in tandem with reducing the magnitude of the first opposing electric field and/or increasing the magnitude of the first driving force.