Abstract: A method for generating light is provided. The method further includes measuring a period of time during which one of targets from a fuel target generator passes through two detection positions. The method also includes exciting the targets with a laser generator so as to generate plasma that emits light. In addition, the operation of exciting the targets with the laser generator includes: irradiating a pre-pulse laser on the targets to expand the targets; detecting conditions of expanded targets; and adjusting at least one parameter of the laser generator according to the measured period of time and the conditions when the measured period of time is different from a predetermined value. The parameter of the laser generator which is adjusted according to the measured period of time includes a frequency for generating a laser for illuminating the targets.

Abstract: An ion pulse generator (100) includes a triboelectric generator (110), an ion emitter (132) and a conductive surface (134). The triboelectric generator (110) includes a first electrode (114), a spaced apart second electrode (120) and a first triboelectric layer (116). The triboelectric generator (110) generates a predetermined amount of charge as a result of relative movement of the first triboelectric layer (116). The ion emitter (132) is electrically coupled to the first electrode (114). The conductive surface (134) is electrically coupled to the second electrode (120) and is spaced apart from the ion emitter (132) at a predetermined distance. Generation of the predetermined amount of charge causes formation of ions between the ion emitter (132) and the conductive surface (134).

Abstract: Methods include providing a multi-pillar sample including at least a first pillar and a second pillar parallel with the first pillar, directing a charged particle beam to the first pillar, imaging the first pillar at a plurality of rotational positions by rotating the multi-pillar sample about a first pillar axis of the first pillar, directing the charged particle beam to the second pillar, and imaging the second pillar at a plurality of rotational positions by rotating the multi-pillar sample about a second pillar axis of the second pillar. Related apparatus for performing disclosed methods are disclosed. Multi-pillar samples are also disclosed.

Abstract: A UV light and sterilization system. The UV light includes: a base, a reflex lamp housing and several UV modules; the reflex lamp housing is provided on the base, the periphery of the reflex lamp housing is provided with several containing grooves, and the inner wall of each of the containing grooves is provided as a reflective panel; several the UV modules are provided on the base and connect to the base electrically, and each of the UV modules is contained in a the containing groove. The UV light provides UV illumination and improves sterilization effects.

Abstract: A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.

Abstract: This invention is directed to a pattern height information correction system which includes a contour line information of a pattern extracted from an acquired image including at least an AFM (atomic force microscope) module, a design information database that stores design information including at least layer information, and a computer system that divides the extracted pattern into regions based on the design information stored in the design information database relating to the extracted pattern and associates the divided regions with layer information, in which the computer system specifies a horizontal region designated as horizontal in advance from the divided regions, creates an approximated curved surface based on the specified horizontal region corresponding to the same layer information, and corrects height information of the extracted pattern using the approximated curved surface.

Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.

Abstract: In order to control a charge amount on a sample surface to a desired value before calculating a frame integration image, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a deflector configured to scan an observation region of the sample with the charged particle beam; a detector configured to detect a charged particle emitted from the sample due to scanning with the charged particle beam; an image generation unit configured to generate a frame image of the observation region based on an observation signal output from the detector; and a scanning suspension time setting unit configured to set a scanning suspension time, which is a time during which scanning of the observation region with the charged particle beam is suspended after a frame image is generated, in which the image generation unit calculates a frame integration image by integrating frame images generated with the scanning suspension time i

Abstract: The problem addressed by the present disclosure is to provide a stage device, a charged particle beam device, and a vacuum device, with which it is possible to increase the speed and the acceleration of positioning and to suppress the leakage of a magnetic field. As a means to resolve this problem, a stage device 100 comprises a support stage 10, a floating mechanism 20, and a movement stage 30. The movement stage 30 has a propulsion-applying unit 36, and the support stage 10 has a propulsion-receiving unit 11. The stage device 100 is configured so that when the movement stage 30 moves and the propulsion-applying unit 36 contacts or approaches the propulsion-receiving unit 11, the propulsion-applying unit 36 applies propulsion in the movement direction to the propulsion-receiving unit 11.

Abstract: A method is proposed for evaluating the robustness of a radiotherapy treatment plan. The method comprises, defining a number of scenarios, each comprising one or more errors for each fraction of the plan, including interfractional and/or intrafractional errors, and calculating a dose distribution resulting from the scenario; The robustness of the plan is then evaluated based at least one of the following i. the probability of fulfilling a set of clinical goals estimated as the clinical goal fulfilment over the scenarios ii. the range of DVH values over the scenarios iii. dose statistics for dose distributions defined as voxel-wise aggregates over the scenario doses.

Abstract: The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; and acquiring an EELS spectrum for each of said plurality of sample positions. According to the method, it comprises the further steps of scanning, once more, said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum. With this, it is possible to acquire rapid information on the sample being investigated, allowing for faster processing of samples.

Abstract: A method of operating a scanning probe microscope, wherein a control loop is provided which is configured for controlling one or more feedback parameters of the scanning probe microscope. One or more system identification measurements are performed during operation of the control loop, wherein during the one or more system identification measurements an excitation signal with a plurality of frequency components is introduced in the control loop and a resulting response signal indicative of a cantilever displacement or a stage-sample distance between a sensor device and a sample is measured. A model response function is identified using said excitation signal and said resulting response signal, wherein one or more settings and/or input signals are adapted in the control loop based on the identified model response function. The scanning probe microscope is used for characterization of the sample using the adapted one or more settings and/or input signals.

Abstract: An apparatus is provided for microscopy, inspection, or analysis of a sample. The apparatus has a vacuum chamber and a charged-particle beam column in the vacuum chamber to direct a charged-particle beam onto a sample. The charged-particle beam column includes a charged-particle beam source to generate a charged-particle beam and charged-particle beam optics to direct the charged-particle beam onto the sample. The apparatus has a detector to detect radiation emanating from the sample to generate an image. A cartridge is provided to support the sample in the path of the charged-particle beam in the vacuum chamber. The cartridge is mechanically decoupled from the environment external to the vacuum chamber. A controller is provided to analyze the detected radiation to generate an image of the sample.

Abstract: A sample support body includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and to a third surface of the conductive layer which is locate at a side opposite to the substrate, are provided in the substrate and the conductive layer. A protective film having a higher affinity with water than the substrate is provided on the second surface, the third surface, and each inner surface of the plurality of through-holes.

Abstract: A method, a non-transitory computer readable medium and a system for focusing an electron beam. The method may include focusing the electron beam on at least one evaluated area of a wafer, based on a height parameter of each one of the at least one evaluated area. The wafer includes a transparent substrate. The height parameter of each one of the at least one evaluated area is determined based on detection signals generated as a result of an illumination of one or more height-measured areas of the wafer with a beam of photons. The illumination occurs while one or more supported areas of the wafer contact one or more supporting elements of a chuck, and while each one of the one or more height-measured areas are spaced apart from the chuck by a distance that exceeds a depth of field of the optics related to the beam of photons.

Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.

Abstract: A multi-beam electron source is disclosed. The multi-beam source includes an electron source, a grid lens assembly, and a multi-lens array assembly. The multi-lens array assembly includes a set of lenses disposed across a substrate. The grid lens assembly is configured to cause a primary electron beam from the electron beam source to land on the multi-lens array assembly telecentrically. The multi-lens array assembly is configured to split the electron beam from the electron beam source into a plurality of primary electron beams. The grid lens assembly includes a first lens element and a second lens element, wherein the first lens element and the second lens element are separated by a gap of a selected distance. The grid lens assembly further includes a grid element including a set of apertures, wherein the grid element is disposed within the gap between the first lens element and the second lens element.

Abstract: Provided is a sample support body that includes a substrate and an ionization substrate. The ionization substrate has a measurement region for dropping a sample on a second surface. A plurality of through-holes that open in a first surface and the second surface are formed in at least the measurement region of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes on at least the second surface. At least a part of the substrate which is adjacent to the ionization substrate is formed to enable the sample to move to the inside of the substrate.

Abstract: Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.