Abstract: Methods, devices, and systems for amplifying laser pulses having different wavelengths in a drive laser assembly for an extreme ultraviolet (EUV) radiation generating device are provided. The drive laser assembly includes a radiation source configured to generate a first laser pulse having a first wavelength and a second laser pulse having a second wavelength, and an amplifier assembly having at least one optical amplifier for amplifying the first laser pulse and the second laser pulse. The amplifier assembly has at least one wavelength-selective optical element configured to attenuate the first laser pulse at the first wavelength more strongly than the second laser pulse at the second wavelength.

Abstract: An ionization method selection assisting image includes a coefficient axis indicating the magnitude of a partition coefficient, a plurality of method indicators representing a plurality of coefficients or a plurality of coefficient ranges corresponding to a plurality of ionization methods, and a sample marker representing the partition coefficient specified for a sample. The ionization method selection assisting image is displayed to a user. A partition coefficient may be specified for a sample after derivatization.

Abstract: By switching between a plurality of image transfer units based on a state of a stage and using the switched image transfer unit, traceability of stage movement and tolerance to communication failure can be improved. A first image transfer protocol is a protocol of which reliability is higher than reliability of a second image transfer protocol, and a switch unit may select a first image transfer unit in a case where it is determined that a state of a stage is a state in which the stage is stopping. A second image transfer unit is a protocol of which a transfer speed is higher than a transfer speed of the first image transfer protocol, and the switch unit may select the second image transfer unit in a case where it is determined that the state of the stage is a state in which the stage is moving.

Abstract: A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.

Abstract: A calibration apparatus for a tip-enhanced Raman microscope includes a substrate; a two-dimensional Raman scatterer that is mounted on an upper surface of the substrate; and a well-defined topographic structure that is formed at the upper surface of the substrate. The topographic structure may include convex geometric shapes such as triangles and squares arranged in one or more periodic lattices. Calibration is via adjusting a focal length of a laser beam until a signal from a spectrometer repeatedly exhibits a stepped response when a focal point of the laser beam traverses an edge of a two-dimensional Raman scatterer, then adjusting the relative lateral positions of a scanning probe microscope probe tip and the focal point until the signal from the spectrometer and a signal from the scanning probe microscope repeatedly change within an acceptable time delay while the focal point and the probe tip traverse edges of the topographic structure.

Abstract: A solution for disinfecting electronic devices is provided. An ultraviolet radiation source is embedded within an ultraviolet absorbent case. While the electronic device is within the ultraviolet absorbent case, ultraviolet radiation is directed at the electronic device. A monitoring and control system monitors a plurality of attributes for the electronic device, which can include: a frequency of usage for the device, a biological activity at a surface of the device, and a disinfection schedule history for the device. Furthermore, the monitoring and control system can detect whether the device is being used. Based on the monitoring, the monitoring and control system controls the ultraviolet radiation directed at the electronic device.

Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column irradiating a sample S using an electron beam; and a focused ion beam column irradiating the sample S using a focused ion beam. The apparatus includes an electrode member displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus includes a driving unit displacing the electrode member; a power source applying a negative voltage to the electrode member; and an insulation member electrically insulating the sample chamber the driving unit from the electrode member.

Abstract: The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a back end, and a top portion. A cavity is formed within the two opposed side portions, front end, back end, and top portion. At least one electrode is positioned within the cavity, and an engagement device is engaged to the front end and/or an engagement device engaged to the back end for allowing one or more modular ion generator devices to be selectively secured to one another.

Abstract: An apparatus includes at least one transmitter configured to transmit wireless signals that heat objects in a scene and cause the objects to radiate thermal energy and create a pattern of thermal radiation in the scene. The apparatus also includes at least one controller configured to control the at least one transmitter in order to control the creation of the pattern of thermal radiation in the scene. The pattern of thermal radiation in the scene could include a camouflage pattern that increases clutter in an infrared image of the scene, at least one temporary infrared marker, or at least one false shape in an infrared image of the scene. The pattern of thermal radiation in the scene could reduce a contrast between a cold infrared background in the scene and one or more targets in the scene.

Abstract: A Time of Flight mass spectrometer is disclosed wherein a fifth order spatial focusing device is provided. The device which may comprise an additional stage in the source region of the Time of Flight mass analyser is arranged to introduce a non-zero fifth order spatial focusing term so that the combined effect of first, third and fifth order spatial focusing terms results in a reduction in the spread of ion arrival times ?T of ions arriving at the ion detector.

Abstract: In one embodiment, a charged particle beam writing apparatus includes a writer writing a pattern on a substrate on a stage with a charged particle beam, a mark substrate disposed on the stage and having a mark, an irradiation position detector detecting an irradiation position of the charged particle beam on a mark surface, a height detector detecting a surface height of the substrate and the mark substrate, a drift correction unit calculating an amount of drift correction, and a writing control unit correcting the irradiation position of the charged particle beam by using the amount of drift correction. The mark substrate has a pattern region with a plurality of marks and a non-pattern region with no pattern therein, and at least part of the non-pattern region is disposed between different portions of the pattern region. The height detector detects a height of a detection point in the non-pattern region.

Abstract: An ion transfer device includes a tube, a resistive layer on an inside surface of the tube, and a dielectric layer on the resistive layer. The device defines a conduit providing a transfer path for gas and ions. The conduit is surrounded by the dielectric layer. The dielectric layer protects the resistive layer from the chemical environment in the conduit, while being thin enough to allow charges to pass through the dielectric layer and be dissipated by the resistive layer.

Abstract: There is provided an energy filter capable of being simplified in structure and of achieving low aberrations. The energy filter (100) includes a first sector magnet (10) and a second sector magnet (20). The first and second magnets (10, 20) are configured mirror-symmetrically with respect to a symmetry plane (M). There are one focal point of crossover in the X direction and one focal point of crossover in the Y direction. The focal point of crossover in the X direction and the focal point of crossover in the Y direction are at an energy dispersive plane (S2). There are two focal points of image in the X direction and two focal points of image in the Y direction. The focal points of image in the X direction and the focal points of image in the Y direction are at the symmetry plane (M) and at an achromatic plane (A2).

Abstract: A sample holder, a member mounting device, and a charged particle beam apparatus are able to secure a compatible configuration for the transfer of a sample between different-type charged particle beam apparatuses without an increase in equipment costs. The charged particle beam apparatus includes a holder unit for removably fastening a sample holder for receiving a sample, and a sample stage unit for loading the holder unit in a sample chamber. The sample holder includes a sample holding member for receiving a sample, a support section for supporting the sample holding member, and a clip disposed on the support section at a position where the sample holding member is disposed.

Abstract: A probe for atomic force microscopy comprises a tip for atomic force microscopy oriented in a direction referred to as the longitudinal direction and protrudes from an edge of a substrate in the longitudinal direction, wherein the tip is arranged at one end of a shuttle attached to the substrate at least via a first and via a second structure, which structures are referred to as support structures, at least the first support structure being a flexible structure, extending in a direction referred to as the transverse direction, perpendicular to the longitudinal direction and anchored to the substrate by at least one mechanical linkage in the transverse direction, the support structures being suitable for allowing the shuttle to be displaced in the longitudinal direction. An atomic force microscope comprising at least one such probe is also provided.

Abstract: A light source apparatus comprises a main body, a plurality of light source modules and a processor. The main body includes a plurality of configuration areas distributed on a surface of the main body. The plurality of configuration areas is oriented towards different directions, respectively. The plurality of light source modules is located in the plurality of configuration areas, respectively. Each of the plurality of light source modules includes a circuit substrate and an ultraviolet emitting device. The processor is electrically connected to the plurality of light source modules. The processor is adapted to drive the ultraviolet emitting device of each of the plurality of light source modules. A method of using a light source apparatus is also provided.

Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column for irradiating a sample with an electron beam; and a focused ion beam column for irradiating the sample with a focused ion beam. The apparatus includes a displacement member having an open/close portion displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage, and a withdrawal position away from the insertion position, and a contact portion provided at a contact position capable of contacting the sample before the beam emitting end portion during operation of the sample stage. A driving unit displaces the displacement member, and a conduction sensor detects whether the sample is in contact with the contact portion.

Abstract: An extreme ultraviolet radiation source is provided, including a droplet generator and a droplet catcher. The droplet generator is configured to output a plurality of target droplets along a target droplet path that is parallel to a horizontal direction. The droplet catcher includes an open end substantially aligned with the target droplet path, and an enclosed end that is opposite to the open end. The droplet catcher also includes a pipe wall disposed between the open end the enclosed end. The pipe wall includes a first pipe wall portion having an inner top surface parallel to the horizontal direction and an inner bottom surface inclined relative to the inner top surface. In addition, the droplet catcher includes at least one gutter formed on the inner bottom surface and having a long axis extending along the horizontal direction.

Abstract: Disclosed herein is charged particle beam device and a a method of operating a charged particle beam device, comprising forming a plurality of focused charged particle beamlets. Charged particles are directed from a charged particle source to a multi-aperture plate. A plurality of beamlets are passed through a plurality of apertures of the multi-aperture plate. The beamlets include an inner beamlet of charged particles and a plurality of outer beamlets of charged particles. The outer beamlets are focused to form a plurality of outer focal points on a virtual ring having a center along an optical axis, the outer beamlets subjected to a field curvature aberration, such that the virtual ring is axially displaced relative to a virtual focal point of an uncompensated inner beamlet. A compensated inner beamlet is focused to a compensated focal point. The inner beamlet is compensated to form the compensated inner beamlet; and the compensated focal point is coplanar with the virtual ring.

Abstract: In beta emission imaging, magnetic lensing allows a lower resolution detector to detect the spatial distribution of emissions at a higher resolution. The sample is placed in a magnetic field with field lines at a given density, and the detector is placed away from the sample where the magnet field lines diverge, resulting in a lesser density. Since the beta emissions travel along the field lines, the divergence of the field lines from the sample to the detector result in lensing or magnification. Using positron attenuation tomography to detect annihilation in the detector allows for correction due to self-absorption by the sample. The correction and lensing are used together or may be used independently.