Abstract: A multi-beam scanning electron microscopy (SEM) system is disclosed. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron-optical elements configured to generate a flood electron beam from the source electron beam. The system includes a multi-beam lens array with a plurality of electron-optical pathways configured to split the flood electron beam into a plurality of primary electron beams, and a plurality of electrically-charged array layers configured to adjust at least some of the plurality of primary electron beams. The system includes a set of electron-optical elements configured to direct at least some of the plurality of primary electron beams onto a surface of a sample secured by a stage. The system includes a detector array configured to detect a plurality of electrons emanated from the surface of the sample in response to the plurality of primary electron beams.

Abstract: The invention is directed at a positioning arm for positioning of a scan head of a surface scanning measurement device—such as a scanning probe microscopy device—relative to a surface. The positioning arm comprises a base at a first end thereof for mounting the arm with the base to a static reference structure. The positioning arm further comprises a first and a second arm member extending from the base, the second arm member extending parallel to the first arm member. The arm comprises a bridge member at a second end thereof, connecting the first and the second arm members. The first and the second arm member are respectively connected to each one of said base and said bridge member by means of a hingeable connection.

Abstract: A scanning probe microscope, in particular an atomic force microscope, for analyzing a sample by moving a probe and the sample relative to one another, wherein the scanning probe microscope includes a detection unit with a side view camera arranged and configured for detecting an image of the sample in a substantially horizontal side view, and a determining unit for determining information indicative of a profile of at least part of a surface of the sample based on the detected image.

Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.

Abstract: A method for generating light is provided. The method includes generating targets with a fuel target generator. The method further includes measuring a period of time during which one of the targets passes through two detection positions on a path along which the targets move. The method also includes exciting the targets with a laser generator so as to generate plasma that emits light. In addition, the method includes adjusting at least one parameter of the fuel target generator or the laser generator according to the measured period of time, when the measured period of time is different from a predetermined value.

Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.

Abstract: A multiple charged particle beam writing apparatus includes a circuitry to calculate, for each of the plurality of combinations, a first distribution coefficient for each of the three beams configuring the combination concerned, for distributing a dose to irradiate the design grid concerned to the three beams such that the gravity center position of each distributed dose coincides with the position of the design grid concerned and the sum of the each distributed dose coincides with the dose to irradiate the design grid concerned; and a circuitry to calculate, for each of the four or more beams, a second distribution coefficient of each of the four or more beams relating to the design grid concerned by dividing the total value of at least one first distribution coefficient corresponding to the beam concerned in the four or more beams by the number of the plurality of combinations.

Abstract: In one embodiment, a charged particle beam writing apparatus includes a blanking circuit applying a blanking voltage to a blanking deflector, a stage on which a substrate is placed, a mark on the stage, a detector detecting an irradiation position of the charged particle beam based on irradiation of the mark with the charged particle beam, and a diagnostic electric circuitry that causes the charged particle beam to enter a predetermined defocused state relative to the mark, obtains a difference between a first irradiation position when the mark is scanned under first irradiation conditions and a second irradiation position when the mark is scanned under second irradiation conditions in which at least either of irradiation time and settling time in the first irradiation conditions is varied, and determines occurrence of a failure of the blanking circuit when the difference is a predetermined value or more.

Abstract: An electron beam irradiation apparatus includes a first electrode being annular, arranged along the optical axis of the electron beam, at the downstream from the deflector, and in the magnetic field of the objective lens, to which a first potential being positive is variably applied, a second electrode being annular, arranged in the magnetic field of the objective lens and between the deflector and the first electrode, to which a second potential being positive and higher than the first potential is applied, and a third electrode being annular, arranged in the magnetic field of the objective lens and to be opposite to the second electrode with respect to the first electrode, to which a third potential lower than the first potential is applied.

Abstract: Provided is a process for lamella thinning and endpointing that substitutes a series of automated small angle tilts for the motions in the conventional endpointing sequence. STEM images or through-surface BSE scans are acquired at each tilt. The results are analyzed automatically to determine feature depths, and an intervention request is made requesting a user decision based on marked-up images and summary information displayed.

Abstract: An apparatus for inspecting a sample includes a sample holder for holding the sample; a multi beam charged particle generator for generating an array of primary charged particle beams; an electro-magnetic lens system for directing the array of primary charged particle beams into an array of separate focused primary charged particle beams on the sample; a multi-pixel photon detector arranged for detecting photons created by the focused primary charged particle beams when the primary charged particle beams impinge on the sample or after transmission of said primary charged particle beams through the sample; and an optical assembly for conveying photons created by at least two adjacent focused primary charged particle beams of the array of separate focused primary charged particle beams to distinct and/or separate pixels or to distinct and/or separate groups of pixels of the multi-pixel photon detector.

Abstract: A scanning probe microscopy system for mapping nanostructures on a surface of a sample, comprises a metrology frame, a sensor head including a probe tip, and an actuator for scanning the probe tip relative to the sample surface. The system comprises a clamp for clamping of the sample, which clamp is fixed to the metrology frame and arranged underneath the sensor head. The clamp is arranged for locally clamping of the sample in a clamping area underneath the probe tip, the clamping area being smaller than a size of the sample such as to clamp only a portion of the sample. Moreover, a metrology frame for use in scanning probe microscopy system as described includes a clamp for clamping of a sample, wherein the clamp is fixed to the metrology frame such as to be arranged underneath the sensor head.

Abstract: A method of introducing and ejecting ions from an ion entry/exit device (4) is disclosed. The ion entry/exit device (4) has at least two arrays of electrodes (20,22). The device is operated in a first mode wherein DC potentials are successively applied to successive electrodes of at least one of the electrode arrays ((20,22) in a first direction such that a potential barrier moves along the at least one array in the first direction and drives ions into and/or out of the device in the first direction. The device is also operated in a second mode, wherein DC potentials are successively applied to successive electrodes of at least one of the electrode arrays (20,22) in a second, different direction such that a potential barrier moves along the array in the second direction and drives ions into and/or out of the device in the second direction. The device provides a single, relatively simple device for manipulating ions in multiple directions.

Abstract: This disclosure provides systems, methods, and apparatus related to laser plasma accelerators. In one aspect a block of material defines a gas inlet, a chamber in fluid communication with the gas inlet, a throat in fluid communication with the chamber, a channel in fluid communication with the throat, and a gas outlet in fluid communication with the channel. The throat is configured to generate a supersonic flow of a gas when the gas flows through the throat. The channel includes a ramp that is positioned proximate the gas outlet, with the ramp being inclined at an angle with respect to a direction of a flow of the gas proximate a surface of the channel prior to the ramp at the gas outlet.

Abstract: Sparse sampling approaches and probe systems for analytical instruments are disclosed providing for effective sub-sampling of a specimen and inpainting to reconstruct representations of actual information. The sub-sampling involves serial acquisition of contiguous measured values lying at positions along a scan path extending in a line toward a first direction and having random perturbations in a second direction. The perturbations are limited within a predetermined distance from the line. Inpainting techniques are utilized among the measured values to reconstruct a representation of actual information regarding the specimen.

Abstract: A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.

Abstract: A generator of an ion beam is provided, including an ionization chamber provided with an inlet of a fluid to be ionized; a source of ionizing particles configured to impact the fluid in an impact zone of the ionization chamber so as to generate ions; and an extractor of ions generated in a direction of an outlet zone of the generator, the extractor including at least two electrodes, a first electrode referred to as input electrode laterally bordering the impact zone, and at least one second electrode referred to as intermediate electrode located in the impact zone, the at least two electrodes being configured to generate a voltage gradient in the impact zone, with the voltage gradient being configured to direct the generated ions to the outlet zone of the generator.

Abstract: Methods and systems are provided which project germicidal light from a lamp toward an individual donned in outerwear to disinfect the outerwear. In specific embodiments, germicidal light is projected toward an individual situated greater than approximately 1 foot from the light source. Some systems include sensor/s for detecting presence of an individual within a target area a set distance from the disinfection apparatus comprising the light source and program instructions for commencing operation of the disinfection apparatus based on information from the sensor/s. In addition or alternatively, some systems include reflective panel/s exhibiting greater than approximately 85% reflectance.

Abstract: A linear ion trap includes at least two discrete trapping regions for processing ions and at least one gas pulse valve for applying pulses of gas to dynamically control pressure in the at least two discrete trapping regions. A RF electrical potential generator produces two RF waveforms, each applied to a pair of pole electrodes of the linear ion trap forming a RF trapping field component to trap ions radially. A multi-output DC electrical potential generator produces multiple DC field components superimposed to the RF trapping field component and distributed across the length of the linear ion trap to control ions axially. A control unit is configured to switch the DC electrical potentials and corresponding DC field components collectively forming a first trapping region of the at least two discrete trapping regions that is populated with ions to alter ion potential energy from a first level to a second level, and to enable at least a first ion processing step in at least one of the first and second levels.

Abstract: A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.