Abstract: A dual-mode water inlet dishwasher includes a shell, an inner container, a spraying arm, a washing pump, a heating washing pump, and a respirator water tank which are provided in the shell. A water trough is provided in the inner container. A water inlet of the water trough is connected to the respirator water tank. A water outlet of the water trough is connected to the heating washing pump. The heating washing pump is connected to the spraying arm. The respirator water tank is provided with a respirator body and a water tank body. A tap water inlet, a water-tank water inlet, and a washing water port are provided on the respirator body or the water tank body. The tap water inlet is connected to tap water by means of a solenoid valve. The water-tank water inlet is connected to the water tank by means of a water pump.

Abstract: A cleaning system and a cleaning method configured for cleaning task of solar panels are provided. The cleaning system includes an operation region, cleaning robots, shuttle robots, and a data processing system. The cleaning method includes a first carrying step, a cleaning step, and a second carrying step.

Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a dissolving solution onto a rotating substrate; and supplying, after the supplying a dissolution solution, a treating liquid including a polymer onto the rotating substrate to form a liquid film.

Abstract: A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.

Abstract: A temperature control method includes a switchover process, an ignition process, a slope calculation process, a first and a second control processes. In the switchover process, a heat medium to be supplied into a flow path is switched from a heat medium of a first temperature supplied from a first temperature controller to a heat medium of a second temperature supplied from a second temperature controller. In the slope calculation process, a slope of temperature change of the heat medium is calculated based on a temperature of the heat medium at an outlet side of the flow path. In the first control process, the second temperature controller is controlled until the temperature of the heat medium is stabilized to a temperature lower than a set value. In the second control process, the second temperature controller is controlled such that the temperature of the heat medium reaches the set value.

Abstract: A method of operating an ultra-high pressure liquid jet system includes positioning, relative to a rail, a translatable frame having a liquid jet processing head fluidly connected to an ultra-high pressure liquid pump. The method also includes providing, to the liquid jet processing head, via the ultra-high pressure liquid pump, a pressurized fluid forming a liquid jet that contacts the rail such that the pressurized fluid is at least 20,000 PSI during a rail cutting operation or a re-profiling operation. Steps of the method include providing an abrasive feed system coupled to the liquid jet processing head to provide an abrasive to the liquid jet and translating the liquid jet processing head relative to the rail, thereby performing a processing operation on a linear length of the rail along a direction of translation of the rail.

Abstract: An example system to clean a continuous substrate includes: one or more high pressure nozzles configured to spray a high pressure, low flow spray of a first cleaning fluid at the continuous substrate to remove particulate matter from the continuous substrate; an agitation bath and a plurality of rollers configured to transport the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having the agitation bath; an agitator in the agitation bath, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and a vacuum roller configured to vacuum moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; a dryer configured to dry the continuous substrate.

Abstract: An energy production device for a chargeable energy storage is arranged on a fluid conduit of an existing fluid circuit in a device through which a fluid flows. The fluid flow in the fluid conduit primarily serves a predetermined purpose different from that of the energy production device. The energy production device is arranged to produce energy from the kinetic energy of the fluid flow to charge the chargeable energy storage. A module insertable into the device may include the energy production device. The device may be a washer disinfector for processing medical instruments, systems and/or products that include at least one handpiece having a chargeable energy storage. The energy storage is configured as a rechargeable battery or as a power cell and is adapted to be processed together with the handpiece in the washer disinfector.

Abstract: An extractor includes a fluid recovery system including a suction nozzle, a recovery tank assembly, and a suction source having an inlet fluidly connected to the recovery tank assembly and the suction nozzle through an air conduit and adapted to draw liquid through the suction nozzle and deposit the liquid in the recovery tank assembly. The extractor includes a body provided with the air conduit for movement between a first position wherein suction is unreduced and a second position wherein suction is reduced. The extractor includes a fluid delivery system including a solution supply tank assembly, a fluid distributor, and a conduit for depositing fluid onto a surface. The extractor includes a hydraulic connector operably coupled to the body and adapted to move the body between the first and second positions.

Abstract: A method for cleaning a cooking range exhaust system includes, in response to receipt of a start signal at a control box of a cooking range exhaust cleaning system to initiate a cleaning operation, causing a cleaning solution comprising a mixture of detergent and water having a ratio based on a target mixing ratio to be provided to a supply line, and causing an electronically-controlled valve to open to facilitate provision of the cleaning solution to a nozzle coupled to the electronically-controlled valve via a conduit for a predetermined period of time, wherein the nozzle is arranged to spray a zone of the cooking range exhaust system.

Abstract: The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.

Abstract: A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a first position and a second, different position of the substrate in the cleaning device; a first dilution water control box controlling flow rates of the dilution water supplied to the first and second mixers; third and fourth mixers respectively mixing second, different chemical liquid with the dilution water and respectively supplying to third and fourth nozzles for respectively supplying the second chemical liquid adjusted to desired flow rates and concentrations to a third position and a fourth, different position of the substrate in the cleaning device; and a second dilution water control box controlling flow rates of the dilution water supplied to the third and fourth mixers.

Abstract: A method of restoring a material surface utilizes a first composition (referred to herein as Composition A) and a second composition (referred to herein as Composition B). Methodologies guide application of Composition A and optionally Composition B to enact various restoration advantages to existing or new material surfaces. Composition A may be first applied to a material surface to remove surface contaminants and lift stains. During the described methodology, a user must wait a predetermined amount of time for Composition A to permeate the material surface. Optionally, Composition B may be subsequently applied to bond voids and damages areas of the material surface, or to add a new surface altogether above the original surface. A user may wait a predetermined amount of time for Composition B to cure.

Abstract: An apparatus for cleaning a fluid conduit in a hydrocarbon production installation is described. The apparatus comprises a flexible hose comprising a bore and at least one outlet; a pressure control device; a coupling for an opening of a fluid conduit system; at least one feeding module for engaging the flexible hose and imparting a pushing and/or pulling force on the flexible hose to introduce it through the pressure control device and into or out of the fluid conduit system; and a pump configured to pump a cleaning fluid into the bore of the flexible hose and expel the cleaning fluid into the conduit through the at least one outlet in the flexible hose.

Abstract: The substrate processing method includes a hydrophilization step of hydrophilizing a surface of a substrate, a processing liquid supplying step of supplying a processing liquid to the hydrophilized surface of the substrate, a processing film forming step in which the processing liquid supplied to the surface of the substrate is solidified or cured to form a processing film on the surface of the substrate, and a peeling step in which a peeling liquid is supplied to the surface of the substrate to peel the processing film from the surface of the substrate. The peeling step includes a penetrating hole forming step in which the processing film is partially dissolved in the peeling liquid to form a penetrating hole in the processing film.

Abstract: A substrate cleaning method includes: arranging a substrate within a processing container; spraying gas from a spray port of a gas nozzle arranged within the processing container; causing vertical shock waves, generated by spraying the gas from the gas nozzle, to collide with a main surface of the substrate; and removing particles adhering to the main surface of the substrate, by causing the vertical shock waves to collide with the main surface of the substrate.

Abstract: Techniques for depowdering additively fabricated parts are described. The techniques utilize various mechanisms to separate powder from parts. For instance, techniques for depowdering described herein may include fabrication of auxiliary structures in addition to fabrication of parts. Certain auxiliary structures may aid with depowdering operations, and may be fabricated along with parts during an additive fabrication process. The auxiliary structures may be shaped and/or have positional and/or geometrical relationships to the parts during fabrication. For instance, an auxiliary structure may include a cage structure fabricated around one or more parts.

Abstract: A method for cleaning a semiconductor wafer to clean a semiconductor wafer after polishing, including: performing a first ozone-water treatment step of cleaning the polished semiconductor wafer with ozone water to form an oxide film; performing a brush cleaning step of brush-cleaning the semiconductor wafer with carbonated water after the first ozone-water treatment step; and then performing a second ozone-water treatment step including cleaning the semiconductor wafer with hydrofluoric acid to remove the oxide film, followed by cleaning with ozone water to form an oxide film again. This second ozone-water treatment step is performed one or more times.

Abstract: A method for rinsing an overflow chamber at the bath-side end of a snout of a device for hot-dip coating a metal strip is presented. The snout guides the metal strip in a protective gas atmosphere before the metal strip is coated with a metal melt. A rinsing cycle is carried out in the overflow chamber of the snout by feeding metal melt from the molten bath into the overflow chamber and at the same time, sucking and pumping said melt out of the overflow chamber back into the molten bath. This rinsing cycle can be performed even when the snout has been retracted from the melt by supplying the melt from the molten bath to the overflow chamber with a delivery pump.

Abstract: An apparatus for removing a layer of sediment which has settled on the bottom of a large water body that includes a structural frame configured to contain a bottom water flow and avoid a re-suspension of sediment outside the vicinity of the structural frame. The structural frame has a control zone configured for containing liquid and suspended particles dispersed during removal of bottom sediment in a suctioning area that is at least about 3 square feet. A sediment removing vacuum unit is operably associated with the structural frame to conduct a suctioned bottom water flow.