Abstract: Apparatuses and methods of overlay measurement are disclosed. An example apparatus includes first and second layers. The first layer includes a first alignment pattern that includes a first line extending in a first direction. The first line includes first, second and third segments. The second layer above the first layer includes a second alignment pattern including: a second line extending in the first direction above the first segment and having a first offset from the first segment in a second direction perpendicular to the first direction; a third line extending in the first direction above the second segment and having a second offset from the second segment in the second direction; and a fourth line extending in the first direction above the third segment and having a third offset from the third segment in the second direction. The first, second and third offsets are different from one another.

Abstract: A wafer surface defect inspection method and a wafer surface defect inspection apparatus are provided. The method includes the following steps. Scanning information of a wafer is received, and the scanning information includes multiple scanning parameters. At least one reference point of the scanning information is determined, and path information is generated according to the at least one reference point and a reference value. Multiple first scanning parameters corresponding to the path information in the scanning parameters are obtained according to the path information to generate a curve chart. According to the curve chart, it is determined whether the wafer has a defect, and a defect type of the defect is determined.

Abstract: A method for calibrating a CNC processing apparatus is provided that can significantly reduce the amount of operation time required for sensor calibration. A method of the present invention for calibrating a non-contact sensor in a CNC processing apparatus 1 includes a first step, a second step and a third step. In the first step, the center coordinates of a reference instrument are measured with a contact probe and thereby the machine coordinates of the center of the reference instrument are determined. In the second step, after a non-contact sensor 110 is mounted onto a spindle 26, the center coordinates of the reference instrument are measured only one time with the non-contact sensor 110, and thereby the non-contact sensor coordinates of the center of the reference instrument are determined.

Abstract: An optical inspection device for an optical performance test of a display device including a lens part configured to transmit external light, a phase film part configured to change a phase difference of the external light and transmit the external light, and an image processor configured to obtain electrical information of the external light, in which a phase difference of the phase film part is at least 7000 nm.

Abstract: Methods and systems for non-contact temperature measurement of an object on which is attached or etched a diffraction grating. The diffraction grating expands and contracts as the object expands and contracts upon there being a change in temperature of the object. Upon a light beam being received on the diffraction grating, the diffraction grating produces a pair of complementary light beams and one of the light beams is reflected back onto the diffraction grating and then onto the other light beam in a manner that causes the reflected light beam to propagate alongside and non-parallel to the other light beam. The resultant two light beams are thereafter impinged onto a camera at respective first and second impingement locations. The temperature of the object is then determined based on the separation distance between the first and second impingement locations.

Abstract: A measuring device for determining a course of a bonding wave in a gap between a first substrate and a second substrate, and a method for determining a course of a bonding wave in a gap between a first substrate and a second substrate.

Abstract: An optical pulse tester includes an optical divider configured to cause a return light to divide into first divided light and second divided light, a first optical receiver configured to receive the first divided light and output a first optical receiver signal, a second optical receiver configured to receive the second divided light and output a second optical receiver signal, and a signal processor configured to obtain a waveform indicating an intensity distribution of the return light in a longitudinal direction of the optical fiber by performing level conversion of the first optical receiver signal and the second optical receiver signal on the basis of a divided ratio of the optical divider and optical receiver sensitivities of the first optical receiver and the second optical receiver and synthesizing the first optical receiver signal and the second optical receiver signal which have been subjected to the level conversion.

Abstract: Disclosed herein include systems, devices, computer readable media, and methods for subsampling flow cytometric event data. First and second flow cytometric event data can be transformed into a lower-dimensional space, associated with a plurality of bins, and assigned to a first bin and a second bin. Subsampled flow cytometric event data comprising the first flow cytometric event data can be generated. The subsampled flow cytometric event data can comprise the second flow cytometric event data if the first bin and the second bin are different. The subsampled flow cytometric event data may not comprise the second flow cytometric event data if the first bin and the second bin are identical.

Abstract: A target for determining a performance parameter of a lithographic process, the target comprising a first sub-target formed by at least two overlapping gratings, wherein the underlying grating of the first sub-target has a first pitch and the top lying grating of the first sub-target has a second pitch, at least a second sub-target formed by at least two overlapping gratings, wherein the underlying grating of the second sub-target has a third pitch and the top lying grating of the second sub-target has a fourth pitch.

Abstract: An object of the present invention is to provide an optical fiber test method, an optical fiber test apparatus, and a program, capable of detecting a boundary of an optical fiber line facility regardless of a change in a noise amount. A change amount (a differential value) of an OTDR waveform increases toward a distal end due to noise effects, making it difficult to determine a boundary of the optical fiber using the change amount. Therefore, in the present invention, a dispersion of the OTDR waveform, which increases toward a distal end due to noise effects, is also used to determine the boundary of the optical fiber. In other words, in the present invention, the noise amount is expressed by the dispersion, and the dispersion is compared with the change amount such as a differential value as a threshold, to determine the boundary of the optical fiber.

Abstract: A measurement system is presented configured for integration with a processing equipment for applying optical measurements to a structure.

Abstract: The present disclosure describes a method and apparatus for enabling an imaging sensor to perform Time-of-Flight measurements while requiring less histogram memory and in many cases less power consumption. A light source is operated to cause multiple light emissions and a coarse/estimated distance is determined based on a first echo received based on the first light emission. A histogram is saved and a fine distance is calculated from the coarse distance and data derived from the echo of a second light emission.

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

Abstract: Methods for characterizing spillover spreading originating from a first fluorochrome in fluorescent flow cytometer data collected for a second fluorochrome are provided. In some embodiments, methods include partitioning the fluorescent flow cytometer data according to the intensity of the data relative to the first fluorochrome. In embodiments, methods also include estimating with a first linear regression a zero-adjusted standard deviation for the intensity of light collected from the second fluorochrome for each of the partitioned quantiles based on the assumption that the intensity of light collected from the first fluorochrome is zero, and obtaining with a second linear regression a spillover spreading coefficient from the zero-adjusted standard deviations. Systems and computer-readable media for characterizing spillover spreading originating from a first fluorochrome in fluorescent flow cytometer data collected for a second fluorochrome are also provided.

Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.

Abstract: The present disclosure provides a measurement method including providing a base, a device disposed on the base, and a lid disposed over the base and the device; irradiating a top surface of the device through an opening of the lid to obtain a first focal plane associated with a top surface of the device; irradiating the lid at the lower end of the opening to obtain a second focal plane associated with the lid at the lower end of the opening; and deriving a distance between the top surface of the device and an interior surface of the lid facing the top surface of the device based on a difference between a level of the first focal plane and a level of the second focal plane. The present disclosure also provides a package structure for the measurement.

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

Abstract: A vehicle wheel assembly position measurement apparatus measures, at each of at least three measurement positions in a circumferential direction, a distance in a vehicle width direction between each of plural measurement points located on a specified line that crosses a lateral surface of a tire section from an inner circumferential end to an outer circumferential end and a respective one of distance measuring instruments, calculates an approximate curve indicating a relationship between a position in an extending direction of the specified line and the distance of each of the measurement points at the respective measurement position, calculates a rotation center position of a wheel assembly from a specific position of the approximate curve at the measurement position, and calculates a height position of the wheel assembly relative to a vehicle body from the rotation center position and a height position of a specified portion of the vehicle body.

Abstract: Light detection systems for measuring light (e.g., in a flow stream) are described. Light detection systems according to embodiments include a light scatter detector, a brightfield photodetector and an optical adjustment component configured to convey light to the light scatter detector and to the brightfield photodetector. Systems and methods for measuring light emitted by a sample (e.g., in a flow stream) and kits having a light scatter detector, a brightfield photodetector and a beam splitter component are also provided.

Abstract: A reference core position calculation device 100 that calculates a reference core position of an elevator shaft in which an elevator is to be installed includes a measurement unit 101 and a calculation unit 112. The measurement unit 101 measures a dimension of each portion of the elevator shaft. The calculation unit 112 calculates portion dimension values of the elevator shaft based on the reference core position and the dimension of each portion measured by the measurement unit 101. When the reference core position is a first reference core position, the calculation unit 112 determines whether portion dimension values of the elevator shaft calculated based on the first reference core position satisfy a predetermined specification.