Abstract: There are provided an optical-fiber connector endface inspection microscope system and a method for inspecting an endface of an optical-fiber connector. The inspection microscope device is releasably connectable to an adapter tip configured to interface with the optical-fiber connector to inspect the endface thereof. The adapter tip is one among a plurality of adapter tip types adapted to inspect respective types of optical-fiber connectors. The optical-fiber connector endface inspection microscope system comprises a tip detection system adapted to recognize the type of the adapter tip among the plurality of adapter tip types; and is configured to analyze inspection images to produce an inspection result for the endface, at least partly based on a fiber type corresponding to the recognized adapter tip and/or other information read by the tip detection system.

Abstract: The disclosure belongs to the technical field related to on-line measurement in manufacture of integrated circuit, which discloses a snapshot type overlay error measuring device and a measuring method thereof. The measuring method includes: the detection light is subjected to polarization and retardation in sequence to obtain measurement spectrum; Fourier analysis is performed on the measurement spectrum to obtain the frequency-domain signal of the measurement spectrum, and sub-channel frequency-domain analysis is performed on the frequency-domain signal to obtain the linear combination of the non-diagonal Mueller matrix elements of the overlay error sample to be tested; the linear combination of the non-diagonal Mueller matrix elements are processed to obtain the overlay error of the overlay sample under test. This disclosure does not need to measure all 16 Mueller matrix elements, the measurement is carried out on only a few non-diagonal Mueller matrix elements which are sensitive to overlay error.

Abstract: A super class of polarized transverse vector vortex photon beams patterns are mathematically represented here, which are Majorana-like among them are the radial and azimuthal Laguerre-Gaussian, hybrid ?-vector beams, and Airy beams. These optical beams are consider spin-orbit coupled beams based on OAM and SAM parts of light. A Majorana photon is a photon that is identical to its anti-photon. It has within itself both chirality, right and left-handed twist in polarization (SAM) and wavefront (OAM). Applications using Majorana photons improve optical deeper imaging, higher resolution imaging, Nonlinear Optics effects (SHG, SRS, SC), optical communication in free space and fibers, quantum computer as basic qubit, and entanglement for security.

Abstract: A detection apparatus according to an embodiment of the present technology includes: an imaging unit; an illumination unit; a polarization control unit; and a generation unit. The imaging unit generates image data on the basis of incident light. The illumination unit illuminates a subject with linearly polarized light. The polarization control unit controls a polarization state of light to be detected, the light to be detected travelling toward the imaging unit. The generation unit generates information regarding a degree of linear polarization of the light to be detected, on the basis of image data regarding the light to be detected, the polarization state of the light to be detected having been controlled, the image data regarding the light to be detected being generated by the imaging unit.

Abstract: An apparatus and associated a method are described for performing gas analysis on a gas sample. The method comprising exciting the gas sample with one or more electromagnetic energy sources and obtaining optical absorption signals associated with the gas sample prior to application of a catalytic process to the gas sample as well as during and/or after application of the catalytic process to the gas sample. The obtained optical absorption signals may then be processed using differential calculation approaches to derive information associated with the gas sample, which may include for example information conveying concentrations of certain specific gases in the gas sample. In some implementations, the optical absorption measurement system is configured to use the one or more electromagnetic energy sources to excite the gas sample to produce first optical absorption signals.

Abstract: An OVNA system employing an array of reference delays to estimate distance-variant phase distortion in probe light during an optical-frequency sweep thereof. The estimated distance-variant phase distortion is then used to perform a phase correction for the digital electrical signals generated in response to the probe light being passed through a device under test (DUT) during the same optical-frequency sweep. Advantageously, the performed phase correction enables the OVNA system to provide a more-accurate determination of certain optical characteristics of the DUT than that achievable without such phase correction.

Abstract: A lensmeter system may include a mobile device having a camera. The camera may capture a first image of a pattern through a lens that is separate from the camera, while the lens is in contact with a pattern. The mobile device may determine the size of the lens based on the first image and known features of the pattern. The camera may capture a second image of the pattern, while the lens is at an intermediate location between the camera and the pattern. The second image may be transformed to an ideal coordinate system, and processed determine a distortion of the pattern attributable to the lens. The mobile device may measure characteristics of the lens based on the distortion. Characteristics of the lens may include a spherical power, a cylinder power, and/or an astigmatism angle.

Abstract: Embodiments of the present disclosure provide an alignment mark evaluation method and an alignment mark evaluation system. The alignment mark evaluation method includes: setting a process step code of a wafer with an alignment mark to be evaluated as an evaluation code; obtaining a current process step code of the wafer; if it is detected that the current process step code is the evaluation code, switching a step to be executed to an alignment mark evaluation step; and executing the alignment mark evaluation step to evaluate the alignment mark to be evaluated.

Abstract: An optical detector system provides beam positioning data to an optical tracking system to facilitate optical communications. The optical detector system comprises a plurality of optical photodetectors. For example, a two-by-two array may be used. Incoming light passes through one or more optical elements, such as a lens and a dispersive optical element. A first portion of the beam entering the optical elements is directed into a first spot having a first area on the array. A second portion of the beam entering the optical elements is dispersed to form a second spot having a second area on the array that is larger than the first area. This combination of first portion and second portion of the beam incident on the array provides unambiguous information in the output of the photodetectors that is indicative of a position of the incoming beam with respect to the array.

Abstract: Methods of measuring an anomaly, any induced change in physical parameters such as strain, temperature, and so forth, in an optical fiber. One method may include launching a plurality of probe pulses from a probe source; recording a Brillouin scattering spectrum from a plurality of reflection signals generated in the optical fiber, responsive to the plurality of probe pulses; determining a relative motion between the optical fiber and the anomaly during the recording the Brillouin back-scattering spectrum; and dynamically adjusting the Brillouin back-scattering spectrum according to the relative motion, or performing an adjustment of the Brillouin back-scattering spectrum after acquisition of the Brillouin back-scattering spectrum.

Abstract: A semiconductor structure and a method for managing semiconductor wafer stress are disclosed. The semiconductor structure includes a semiconductor wafer, a first stress layer disposed on and in contact with a backside of the semiconductor wafer, and a second stress layer on and in contact with the first stress layer. The first stress layer exerts a first stress on the semiconductor wafer and the second layer exerts a second stress on the semiconductor wafer that is opposite the first backside stress. The method includes forming a first stress layer on and in contact with a backside of a semiconductor wafer, and further forming a second stress layer on and in contact with the first stress layer. The first stress layer exerts a first stress on the semiconductor wafer and the second stress layer exerts a second stress on the semiconductor wafer that is opposite to the first stress.

Abstract: There is provided a method of detecting a change of a state of a liquid comprising the steps of: •providing a liquid detection medium (12) comprising a liquid and having a plurality of anisotropic magnetic particles suspended therein; •applying a modulated magnetic field across at least a portion of the liquid detection medium (12), wherein the magnetic field induces an alignment of the magnetic particles; •introducing electromagnetic radiation (22) into the liquid detection medium (12); •detecting a variable which is modulated by the applied magnetic field, wherein the variable is associated with the interaction of the electromagnetic radiation (22) with the magnetic particles and wherein the change in the state of the liquid causes a variation in the detected variable; and •correlating the variation in the detected variable with the change in the state of the liquid.

Abstract: The present invention relates to a secondary battery and an apparatus and method for measuring a dimension of the secondary battery. The secondary battery according to the present invention comprises: an electrode assembly in which an electrode and a separator are alternately laminated to be combined with each other; a pouch accommodating the electrode assembly therein; and a fluorescent reference marker applied to a portion of an outer surface of the pouch and comprising a fluorescent material, wherein the fluorescent reference marker emits fluorescence when an electromagnetic wave is irradiated so that the fluorescent reference marker serves as a reference point for measuring a dimension of the secondary battery.

Abstract: The invention encompasses analyzers and analyzer systems that include a single molecule analyzer, methods of using the analyzer and analyzer systems to analyze samples, either for single molecules or for molecular complexes. The single molecule uses electromagnetic radiation that is translated through the sample to detect the presence or absence of a single molecule. The single molecule analyzer provided herein is useful for diagnostics because the analyzer detects single molecules with zero carryover between samples.

Abstract: An optical inspection apparatus includes an illumination assembly, configured to direct optical radiation to illuminate a semiconductor wafer on which first and second patterned layers have been deposited in succession, including a first target feature in the first patterned layer and a second target feature in the second patterned layer, such that at least one of the first and second target features has at least one dimension in the plane of the wafer that is less than an optical diffraction limit of the apparatus. An imaging assembly is configured to capture at least one image of the wafer, and a controller is configured to process the at least one image in order to identify respective locations of the first and second target features in the at least one image and to measure an overlay error between the first and second patterned layers responsively to a displacement between the respective locations.

Abstract: An optoelectronic chip includes optical inputs having different passbands, a photonic circuit to be tested, and an optical coupling device configured to couple said inputs to the photonic circuit to be tested.

Abstract: According to one embodiment, an optical test apparatus includes a first aperture, a second aperture, an image sensor, and a first lens. The first aperture includes a first aperture plane provided with a first wavelength selecting region. The second aperture includes a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region. The image sensor is configured to image a light beam passing through the first aperture plane and the second aperture plane and reaching an imaging plane. The first lens is configured to make a light beam passing through the first aperture plane and the second aperture plane be incident on the imaging plane.

Abstract: A distance measurement device includes a light-emitting-unit that emits irradiation light toward an object; a light-receiving unit that receives reflected light from the object; a distance-calculation unit that calculates a distance to the object based on a transmission time of the reflected light received; a posture-adjustment mechanism that adjusts a posture of at least the light-receiving-unit; and a posture-controller that drives the posture-adjustment mechanism. The light-receiving unit is formed of a two-dimensional sensor in which a plurality of pixels are two-dimensionally arrayed, and the distance-calculation unit calculates two-dimensional distance data from received light data in each of the pixels of the two-dimensional sensor.

Abstract: A metrology tool may include an illumination sub-system to illuminate sample within two or more acquisition fields with two or more illumination beams, where the two or more acquisition fields are distributed along a scan direction in a non-overlapping configuration, and where a translation stage translates a metrology target on the sample along the scan direction sequentially through the two or more acquisition fields. The metrology tool may further include an imaging sub-system to image the two or more acquisition fields while the sample is scanned along the scan direction. The imaging sub-system may include a field-repositioning optical relay to relay images of the two or more acquisition fields to a scanning detector including one or more pixel columns distributed along a column direction, where the field-repositioning optical relay positions the images of the two or more acquisition fields on the scanning detector along the column direction.

Abstract: A 3D sensor for monitoring a monitored zone is provided, wherein the 3D sensor has at least one light receiver for generating a received signal from received light from the monitored zone and has a control and evaluation unit that is configured to detect objects in the monitored zone by evaluating the received signal and to determine the shortest distance of the detected objects from at least one reference volume, and to read at least one distance calculated in advance from the reference value from a memory for the determination of the respective shortest distance of a detected object.