Abstract: An object of the present invention is to provide an optical pulse test apparatus and an optical pulse test method that are capable of determining a change in state of an optical fiber connection portion without the need for reference and without being affected by changes in gap interval before and after the change in state. The optical pulse test apparatus according to the present invention is configured to perform an OTDR measurement by using test optical pulses having spectral widths of from several nm to several hundred nm arranged at intervals of several ten nm to several hundred nm, calculate a reflection peak value caused by the Fresnel reflection at the connection portion from the obtained OTDR waveform, and determine a state such as water immersion of the optical fiber connection portion based on the value.

Abstract: Disclosed herein is a method including: providing a light guiding arrangement (LGA) configured to redirect light, incident thereon in a direction perpendicular to an external surface of the sample, into or onto the sample, such that light impinges on an internal facet of the sample nominally normally thereto; generating a first incident light beam (LB), directed at the external surface normally thereto, and a second incident LB, parallel to the first incident LB and directed at the LGA; obtaining a first returned LB by reflection of the first incident LB off the external surface, and a second returned LB by redirection by the LGA of the second incident LB into or onto the sample, reflection thereof off the internal facet, and inverse redirection by the LGA; measuring an angular deviation between the returned LBs and deducing therefrom an actual inclination angle of the internal facet relative to the external surface.

Abstract: A high-sensitivity optical system to determine and/or control spatial displacement and position of objects applicable to various situations when a contact measurement cannot be performed, such as in high-vacuum or ultra-high vacuum chambers, at high temperatures, in aggressive chemical environments, etc. A laser beam is directed at a low glancing angle to a screen secured to an object. The screen's surface is normal to a motion direction of interest. A location of the bright laser beam spot on the screen surface is acquired and the displacement thereof is analyzed and quantified based on the change in distance from the laser beam spot to a reference element which is arranged on the screen and creates a variation in the acquired image brightness. A feedback loop control mechanism is provided which returns the displaced object to its original position.

Abstract: An optical test instrument, in combination with a removable connector cartridge is provided. A method of replacing a damaged or worn optic fiber interface is also provided. The optical test instrument has casing having a cartridge receiving cavity therein with an inner end provided with a test instrument optical port; and an outer end provided with a cartridge receiving opening. The connector cartridge is sized and configured to be inserted in the cartridge receiving cavity. The connector cartridge has a cartridge inner end for facing the test instrument optical port when in use, and a cartridge outer end for receiving an optic fiber from a device under test (DUT). The connector cartridge houses a fiber optic cable extending between the cartridge inner end and the cartridge outer end. The connector cartridge is removably connectable to the instrument casing to allow replacement of the connector cartridge when the cartridge outer end is worn or damaged.

Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.

Abstract: A measurement apparatus comprises optical components arranged to provide parallel measurements of a biological sample. The parallel sample measurements provide improved accuracy with lower detection limit thresholds. The parallel measurements may comprise one or more of Raman spectroscopy measurements or infrared spectroscopy measurements. The parallel measurements can be combined with a light source. In many embodiments, the light source comprises one or more wavelengths corresponding to resonance frequencies of one or more molecules of the sample, such as wavelengths of ultraviolet light. The wavelengths of light corresponding to resonance frequencies can provide an increased signal to noise ratio. The parallel array optical configuration can be combined with wavelengths of light corresponding to resonance frequencies in order to provide increased measurement accuracy and detection of metabolites.

Abstract: Disclosed are a device and a method for measuring a fretting displacement in a power cycling of a press-pack insulated gate bipolar transistor (IGBT). The IGBT includes: a bracket; slide bars slidably mounted on the bracket and are arranged at least four along a circumferential direction of the bracket; sensors respectively slidably installed on the bracket and the slide bars; and a power cycling experiment device arranged inside the bracket.

Abstract: The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels, and a control unit configured to adjust the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from a first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from a second image capturing region falls within an allowable range.

Abstract: Disclosed herein include systems, devices, computer readable media, and methods for subsampling flow cytometric event data. First and second flow cytometric event data can be transformed into a lower-dimensional space, associated with a plurality of bins, and assigned to a first bin and a second bin. Subsampled flow cytometric event data comprising the first flow cytometric event data can be generated. The subsampled flow cytometric event data can comprise the second flow cytometric event data if the first bin and the second bin are different. The subsampled flow cytometric event data may not comprise the second flow cytometric event data if the first bin and the second bin are identical.

Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

Abstract: Methods for characterizing spillover spreading originating from a first fluorochrome in fluorescent flow cytometer data collected for a second fluorochrome are provided. In some embodiments, methods include partitioning the fluorescent flow cytometer data according to the intensity of the data relative to the first fluorochrome. In embodiments, methods also include estimating with a first linear regression a zero-adjusted standard deviation for the intensity of light collected from the second fluorochrome for each of the partitioned quantiles based on the assumption that the intensity of light collected from the first fluorochrome is zero, and obtaining with a second linear regression a spillover spreading coefficient from the zero-adjusted standard deviations. Systems and computer-readable media for characterizing spillover spreading originating from a first fluorochrome in fluorescent flow cytometer data collected for a second fluorochrome are also provided.

Abstract: An optical position-measuring device includes a scale and a scanning unit. The scale is connected to a first object, extends along a measurement direction and includes a first track having an incremental measuring graduation, and a second track having an absolute measuring graduation. The scanning unit is connected to a second object and includes a light source, a detector having an absolute detector arrangement configured to detect an aperiodic light pattern transmitted from the absolute measuring graduation onto a detection plane and an incremental detector arrangement configured to detect a periodic light pattern transmitted from the incremental measuring graduation onto a detection plane, and a fiber-optic plate arranged as a continuous component in front of the absolute detector arrangement and the incremental detector arrangement, wherein both absolute track information and incremental track information in the respective detection planes are transmitted via the fiber-optic plate in this manner.

Abstract: There are provided methods and systems that enable the use of the backscattering pattern produced by an optical fiber in an OTDR trace as a signature (also referred to herein as the “RBS fingerprint”) to recognize an optical fiber. It was found that it may be difficult to obtain repeatable signatures as those are sensitive to the wavelength of the OTDR laser source and the temperature of the fiber. OTDR methods and systems that are adapted to compare the backscattering pattern in a more repeatable manner are therefore provided. Once the repeatability issue is overcome, such signature can be used for identification purposes and enable new applications.

Abstract: In some examples, an optical time-domain reflectometer (OTDR) device may include a laser source to emit a plurality of laser beams. Each laser beam may include a different pulse width. A control unit may analyze, for each laser beam, a backscattered signal from a device under test (DUT). The control unit may generate, for each backscattered signal, a trace along the DUT. Further, the control unit may generate, based on an analysis of each trace along the DUT, a combined trace that identifies optical events detected along the DUT.

Abstract: A method for analyzing an interaction between a sample surface and a drop of liquid comprises applying the drop of liquid to the sample surface and illuminating the drop of liquid using at least two light sources. The at least two light sources are each arranged at a light source position surrounding the drop of liquid. Light reflected from the drop of liquid detecting and a sensor position on a sensor of a camera is determined for each detected light reflection. Light source positions are assigned to individual light source positions. A position of the drop of liquid is calculated relative to the sensor and an item of size information of the drop of liquid is determined. The position and the item of size information are calculated from the pairs of one sensor position and one associated light source position.

Abstract: A novel class of imaging systems that combines diffractive optics with 1D line sensing is disclosed. When light passes through a diffraction grating or prism, it disperses as a function of wavelength. This property is exploited to recover 2D and 3D positions from line images. A detailed image formation model and a learning-based algorithm for 2D position estimation are disclosed. The disclosure includes several extensions of the imaging system to improve the accuracy of the 2D position estimates and to expand the effective field-of-view. The invention is useful for fast passive imaging of sparse light sources, such as streetlamps, headlights at night and LED-based motion capture, and structured light 3D scanning with line illumination and line sensing.

Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure having a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.

Abstract: It is desirable to provide an information processing apparatus, an information processing method, a program, and a monitoring system capable of monitoring a condition of a measured surface highly accurately and using the monitoring result effectively. To attain the aforementioned object, according to a mode of the present invention, an information processing apparatus includes an obtaining module and a generating module. The obtaining module obtains measuring data about a measured surface. The generating module generates covering material information about a covering material that covers the measured surface based on a feature of the obtained measuring data.

Abstract: A method of processing a wafer is provided. The method includes providing a reference plate below the wafer. The reference plate includes a reference pattern. The reference plate is imaged to capture an image of the reference pattern by directing light through the wafer. A first pattern is aligned using the image of the reference pattern. The first pattern is applied to a working surface of the wafer based on the aligning.

Abstract: A method for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit is disclosed. The method comprises the following steps: At least a predefined portion of the optical projection unit is illuminated so that an image is generated by at least two channels of the predefined portion of the multi-channel optical projection unit. At least one characteristic quantity is determined based on the analysis of the image, wherein a value of the characteristic quantity is associated with a characteristic feature of the projection unit, a defect of the projection unit and/or a defect class of the projection unit. The quality of the projection unit is assessed based on the at least one characteristic quantity. Moreover, a test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit and a computer program are disclosed.