Abstract: Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces and enhance protein removal from the treated surfaces. Beneficially the detergent compositions have a concentrate pH less than about 11.5. The detergent compositions are used with a sanitizer to employ the low alkaline detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the low alkaline detergent compositions are also provided.

Abstract: The present disclosure relates to a method for removing a hard mask consisting essentially of TiN, TaN, TiNxOy, TiW, W, Ti and alloys of Ti and W from a semiconductor substrate. The method comprising contacting the semiconductor substrate with a removal composition. The removal composition comprises 0.1 wt % to 90 wt % of an oxidizing agent; 0.0001 wt % to 50 wt % of a carboxylate; and the balance up to 100 wt % of the removal composition comprising deionized water.

Abstract: The invention involves liquid cleaning compositions that are cocamide DEA free. According to the invention, nonionic surfactants can be used as rheology modifiers in combination with various coupling agents to provide an environmentally friendly alternative for traditional liquid cleaning compositions that rely on cocamide DEA thickening agents.

Abstract: A rapid drying cleaning solution comprises a chelating agent, a detergent, base, alcohol, and water. This cleaning solution can optionally contain fragrances and coloring agents, and can clean a variety of surfaces including natural and engineered wood, ceramic, cement, natural stone, man-made composites, porcelain floors, and other surfaces such as steel, stainless steel, other metallic compositions, ceramic, porcelain, wood and engineered wood countertops, followed by rapid drying of the surface being cleaned.

Abstract: Provided are azeotrope-like compositions comprising tetrafluoropropene and hydrofluorocarbons and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.

Abstract: Surfactant systems and compositions incorporating the same are disclosed for use as rinse aids on plastics and other wares. The surfactant systems and compositions include both liquid and solid formulations, along with methods of use for treating plastics and other wares. The surfactant systems and compositions provide synergistic combinations allowing lower actives in composition formulations of the plastic-compatible surfactant systems providing good sheeting, wetting and drying properties.

Abstract: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.

Abstract: Treatment compositions and methods of treating the surface of a substrate by using the treatment composition, and a semiconductor or MEMS substrate having the treatment composition thereon.

Abstract: A semiconductor processing composition and method for removing photoresist, polymeric materials, etching residues and copper oxide from a substrate comprising copper, low-k dielectric material and TiN, TiNxOy or W wherein the composition includes water, at least one halide anion selected from Cl? or Br?, and, where the metal hard mask comprises only TiN or TiNxOy, optionally at least one hydroxide source.

Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.

Abstract: Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces. The detergent compositions are used with a sanitizer to employ the caustic-free detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the caustic-free detergent compositions are also provided.

Abstract: This disclosure relates to photoresist stripping compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one alcohol solvent; 3) at least one quaternary ammonium hydroxide; 4) water; 5) at least one copper corrosion inhibitor selected from 6-substituted-2,4-diamino-1,3,5-triazines; and 6) optionally, at least one defoaming surfactant.

Abstract: Disclosed are compositions useful in a wide variety of applications, including heat transfer fluids which possess a highly desirable and unexpectedly superior combination of properties, and heat transfer systems and methods based on these fluids. The preferred heat transfer fluid comprises from about 1 to about 40 percent, on a weight basis, of carbon dioxide (CO2) and from about 99 to about 60 percent, on a weight basis, of a compound having the Formula I XCFzR3-z (I), where X is a C2 or a C3 unsaturated, substituted or unsubstituted, alkyl radical, each R is independently Cl, F, Br, I or H, and z is 1 to 3. A preferred compound of Formula I is tetrafluoropropene, particularly 1,1,1,3-tetrafluoropropene and/or 1,1,1,3-tetrafluoropropene.

Abstract: According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of organic solvents and/or amine solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures and pH conditions that conventional caustic-based adhesive removal compositions.

Abstract: A cleaning mixture comprising polymeric resin pellets having a Rockwell R hardness of 85 to 140, water, and a surfactant salt comprising at least one of sulfonate salts, C6 to C36 carboxylic acid salts, or mixtures thereof, is used to purge the mixing device. The cleaning mixture has a pH of 6.0 to 9.0.

Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.

Abstract: Disclosed are compositions comprising 90 to 99 weight percent trans-1,2-dichloroethylene, from 0.1 to 8 weight percent methylperfluoroheptene ethers and from 0.5 to 2.0 weight percent of a fluorocarbon selected from the group consisting of Z-1,1,1,4,4,4-hexafluoro-2-butene, 1,3,4,4,4-pentafluoro-3-trifluoromethy-1-butene, 1,1,1,4,4,5,5,5-octafluoro-2-pentene, perfluorobutyl methyl ether, perflurobutyl ethyl ether, perfluoroisopropylmethyl ether, perfluoroethyl isopropyl ketone, heptafluorocyclopentane, and E-1,1,1-trifluoro-3-chloro-2-propene, wherein the composition is non-flamable.

Abstract: A cleaner and method for maintaining bearings, bushings, linkage pins and chains used in various types of machinery, including industrial machinery is disclosed. The cleaner is effective to rejuvenate spent grease and includes a polar fraction, a miscible non-polar fraction, and a non-ionic surface activating agent.

Abstract: A nonflammable solvent composition, a method of cleaning a surface, and a method of coating a substrate with a material using the solvent composition are provided. The nonflammable solvent composition includes about 70 wt. % or more of trans-1,2-dichloroethylene (t-DCE) and about 0.1 to about 30 wt. % of one or more of hydrofluoroether (HFE) and n-propyl bromide. The method of cleaning a surface includes applying the solvent composition to the surface and spreading or rubbing the composition on the surface. The method of coating a substrate with a material includes dissolving one or more material in the solvent composition, applying the solvent composition containing the one or more material to a substrate, and evaporating the solvent composition from the substrate.

Abstract: A liquid semiconductor device cleaning composition used in a process of fabricating a semiconductor integrated circuit, for removing a hard mask or a dry etch residue while suppressing damage to a low-dielectric-constant interlayer dielectric film and cobalt or a cobalt alloy, where the liquid semiconductor device cleaning composition contains hydrogen peroxide at 10-30% by mass, potassium hydroxide at 0.005-0.7% by mass, aminopolymethylene phosphonic acid at 0.00001-0.01% by mass, at least one selected from amines and azoles at 0.001-5% by mass and water. A semiconductor device can be cleaned by bringing the liquid cleaning composition into contact with the semiconductor device.