Abstract: Control of an amplitude of a signal applied to rods of a quadrupole is described. In one aspect, a mass spectrometer includes a quadrupole mass analyzer and a resonant circuit to generate a radio frequency (RF) signal applied to rods of the quadrupole mass analyzer. An amplitude control circuit can be inductively coupled with inductors of the resonant circuit to selectively discharge energy from the resonant circuit and, therefore, adjust the amplitude of the signal in particular situations.

Abstract: A scanning force microscope and method for operating the scanning force microscope uses an enclosed chamber to create a reduced damping environment with a damping-reducing gas at a pressure below one atmospheric pressure to engage a sample of interest.

Abstract: The MALDI mass spectrometry method comprises the provision of a test composition comprising an analyte, a matrix material, a solvent for the matrix material and an antisolvent, which facilitates crystallization of the matrix material on the analyte subsequent to droplet generation. Due to the crystallization, a non-spherical particle morphology of the test sample is obtained. The test sample with a non-spherical particle morphology can be distinguished from test samples with an at least substantially spherical particle morphology by sensing a morphology parameter. Based on the sensing result, test samples with a non-spherical particle morphology are selected for ionization and mass spectrometry. The antisolvent is for instance water, and the solvent is an organic solvent. The formed crystals are in one embodiment crystallized in a hydrate form. As a result, a signature-rich spectrum is obtained.

Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.

Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.

Abstract: A deflector for multiple electron beams includes a first electrode substrate, second to fourth electrode substrates disposed in order in parallel to each other in a first same plane which is orthogonal to the substrate surface of the first electrode substrate, a fifth electrode substrate disposed opposite to the first electrode substrate, and sixth to eighth electrode substrates disposed in order in parallel to each other in a second same plane such that they are opposite to the second to fourth electrode substrates, wherein the first to eighth electrode substrates are disposed such that they surround a space through which multiple electron beams pass.

Abstract: Certain configurations of devices are described herein that include a DC multipole that is effective to doubly bend the ions in an entering particle beam. In some instances, the devices include a first multipole configured to provide a DC electric field effective to direct first ions of an entering particle beam along a first internal trajectory at an angle different from the entry trajectory of the particle beam. The first multipole may also be configured to direct the ions in the first multipole along a second internal trajectory that is different than the angle of the first internal trajectory of the particle beam.

Abstract: The charged particle beam device includes a charged particle source and a beamlet-forming multiaperture plate. The device also includes a precompensator for reducing aberrations of the beamlets at a target, a scanner for scanning each of the beamlets, an objective lens for focusing each beamlet onto the target, and a controller configured to synchronize the precompensator and the scanner. The precompensator includes: at least one “radially variable” multiaperture electrode in which the diameter of each aperture thereof scales with the distance of the aperture from the optical axis, z; and at least one “cartesianally variable” multiaperture electrode in which the diameter of each aperture thereof scales with an x component of the position of the aperture.

Abstract: A dryer, sanitizer, and disinfecting device for make-up brushes includes an outer housing having an upper surface defining a plurality of openings therein with the plurality of openings arranged in a linear array; an inner housing including a retainer having a plurality of recesses corresponding to the plurality of openings defined in the outer housing; and a sterilizing component supported within at least one of the outer housing or the inner housing, wherein the sterilizing component effects the cleaning chamber, and wherein the sterilizing component includes a UV light bulb.

Abstract: A method includes controlling a multi-scanning electron microscope, mSEM, to capture a first image of a wafer attached to a motorized handling stage while the motorized handling stage is in a first position. The first image includes at least a part of a notch of the wafer. The method also includes determining a radial axis of the wafer based on the first image, and controlling the motorized handling stage to shift the wafer along the radial axis by half a diameter of the wafer so that the motorized handling stage is in a second position. The method further includes controlling the mSEM to capture a second image of the wafer while the motorized handling stage is in the second position. The second image includes wafer structures.

Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.

Abstract: The present inventors have recognized that more accurate measurements can be taken with less drift due to thermal expansion by precisely controlling insulated heating and cooling modules abutting one another in substantial alignment to rapidly heat a sample to be scanned by a Scanning Probe Microscope (SPM) with minimal temperature variation. The heating and cooling modules can be “flat-packed,” with parallel surfaces of each module in contact with one another, to more efficiently heat a sample that is positioned in axial alignment with the heating and cooling modules. This can allow heating the sample to at least 250 degrees Celsius in less than 5 seconds, continuously maintaining a temperature of the sample to within ±0.001 degree Celsius, and maintaining a drift of less than 0.1 nanometers per minute in the z direction.

Abstract: Disclosed are a multimethod ionization device (MID) to utilize at least chemical ionization and a system further utilizing such a device provided with a reaction chamber for ion formation of reagent species for adduct formation from at least one analyte to be characterized as based on mass to charge ratio for the analyte identification.

Abstract: Computed tomographic method and apparatus includes an electron or ion beam having a beam axis, a refractory metal disk; at least one slit in the refractory metal disk that receive the beam, wherein the slit is at an angle to the beam axis; a beam entrance opening in the slit that allows the beam to enter; an effective beam exit opening in the slit that allow the beam to exit, wherein the beam effective exit opening is smaller than the beam entrance opening; and a system for moving the beam across the refractory metal disk, wherein the beam enters the slit through the beam entrance opening and exits the slit through the effective beam exit opening; and a computed tomographic device for measuring the beam that enters and exits the slit for analyzing the beam.

Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.

Abstract: A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.

Abstract: A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.

Abstract: A multipurpose membraneless sample platform for supporting a target material, includes a substrate; a dielectric layer formed over a side of the substrate; first and second electrodes formed over the dielectric layer; and a window formed through the substrate and the dielectric layer. There is no material covering the window.

Abstract: A data processing device for a scanning probe microscope, the data processing device processing biaxial data indicating a change in a second physical quantity with respect to a change in a first physical quantity, the biaxial data being acquired for each of a plurality of measurement points on a sample surface by scanning the sample surface with a probe using a scanning probe microscope, the data processing device includes: a feature amount calculator 41 that acquires one or a plurality of types of feature amounts from the biaxial data at each measurement point; a feature amount selector 42 that causes a user to select one of the one or the plurality of types of feature amounts; a two-dimensional mapping image display unit 43 that displays the feature amount on a screen as a two-dimensional mapping image with each measurement point as one pixel based on selection of the feature amount by the user; and a biaxial data display unit 44 that, when the user selects one of the pixels in the two-dimensional mapping i

Abstract: A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.