Patents Examined by Hanway Chang
  • Patent number: 11195691
    Abstract: A method of automatically focusing a charted particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: December 7, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Robert Trauner, Bernhard Schüler, Bernhard G. Mueller, Nikolai Knaub, Kulpreet Singh Virdi
  • Patent number: 11191495
    Abstract: A system of shields designed to provide substantially greater protection, head to toe, against radiation exposure to health care workers in a hospital room during procedures which require real-time imaging. The shields are placed around the patient and the x-ray table and provide protection even when the x-ray tube is moved to various angles around the patient.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: December 7, 2021
    Assignee: Egg Medical, Inc.
    Inventors: Robert F. Wilson, Uma S. Valeti, John P. Gainor
  • Patent number: 11189476
    Abstract: Provided is a sample support body for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, a first conductive layer provided on the first surface, and a second conductive layer provided on the second surface. A plurality of through-holes opening on the first surface and the second surface are formed in a predetermined region of the substrate, the predetermined region being for ionizing components of the sample. A width of a first opening on the first surface side is larger than a width of a second opening on the second surface side in each of the plurality of through-holes.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 30, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11189474
    Abstract: A sample support body is for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, and a conduction layer provided at least on the first surface. A plurality of through-holes opening on the first surface and the second surface are formed in an effective region of the substrate, the effective region being for ionizing components of the sample. A width of a first opening on the first surface side is larger than a width of a second opening on the second surface side in each of the plurality of through-holes.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 30, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11179118
    Abstract: A radiation shield assembly includes a shield configured to block radiation and a rail assembly configured to position the shield in between the radiation table and a radiation source. The shield is movable between a retracted position and an extended position along a length of the rail assembly. In the extended position, the shield extends along a portion of a radiation table and blocks radiation from the radiation source to the portion of the radiation table. In the retracted position, the shield exposes at least some of the portion of the radiation table to the radiation.
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: November 23, 2021
    Assignee: Norad Designs LLC
    Inventors: John Barry Egolf, Scott Pollak
  • Patent number: 11177111
    Abstract: A defect observation device is configured to include a charged particle microscope and a controller including a control unit that controls the charged particle microscope, a storage unit, and an arithmetic unit, in which the control unit controls the charged particle microscope under a first condition to acquire a first image of an observation target region of the sample, the arithmetic unit extracts first position information of the observation target region from the obtained first image, the control unit controls the charged particle microscope under a second condition to acquire a second image of the observation target region of the sample, and the arithmetic unit performs an image quality conversion process to match the image quality of the acquired second image with the image quality of the first image using the image quality conversion process parameters to process the second image subjected to the image quality conversion process.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: November 16, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akira Ito, Minoru Harada, Yohei Minekawa, Takehiro Hirai
  • Patent number: 11175590
    Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: November 16, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Fei Wang, Wei Fang, Kuo-Shih Liu
  • Patent number: 11170985
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: November 9, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11164715
    Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: November 2, 2021
    Assignee: Carl Zeiss MultiSEM GmbH
    Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
  • Patent number: 11164104
    Abstract: A system for applying orbital angular momentum (OAM) to electrons of a semiconductor material comprises a light source generator for generating a plane wave light beam. Orbital angular momentum (OAM) processing circuitry applies at least one orbital angular momentum to the plan wave light beam to generate an OAM light beam. The OAM processing circuitry controls transitions of electrons between quantized states within the semiconductor material to perform quantum entanglement within the semiconductor material responsive to the at least one orbital angular momentum applied to the plane wave light beam. A transmitter transmits the OAM light beam at the semiconductor material to induce the transitions of the electrons between the quantize states and perform the quantum entanglement within the semiconductor material.
    Type: Grant
    Filed: July 27, 2020
    Date of Patent: November 2, 2021
    Assignee: NxGen Partners IP, LLC
    Inventor: Solyman Ashrafi
  • Patent number: 11158493
    Abstract: An organic silica thin film including: organic silica having a light absorbable organic group in a skeleton, wherein the organic group has a local maximum absorption wavelength in a wavelength range of 200 to 1200 nm, a content ratio of silicon and the organic group which constitute the organic silica is in a range of 0.05 to 0.50 based on a ratio of a mass of the silicon to a mass of the organic group ([mass of the silicon]/[mass of the organic group]), the thin film has a textured structure, and an axis direction of the textured structure is a direction substantially perpendicular to a surface opposite to a surface of the organic silica thin film having the textured structure formed therein.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: October 26, 2021
    Assignee: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
    Inventors: Norihiro Mizoshita, Yuri Sasaki, Yasutomo Goto, Shinji Inagaki
  • Patent number: 11150559
    Abstract: A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror.
    Type: Grant
    Filed: July 27, 2020
    Date of Patent: October 19, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chansyun David Yang, Keh-Jeng Chang, Chan-Lon Yang
  • Patent number: 11145499
    Abstract: The invention relates to the preparation of samples for mass spectrometric analyses with matrix-assisted ionization (e.g. MALDI), particularly using the matrix material 2,5-dihydroxyacetophenone (DHAP), and comprises sample preparation in microvessels with the addition of beads or other solid bodies. In this way, particularly thorough mixing can be achieved by shaking (“vortexing”) the microvessels, on the one hand, while crystallization of the matrix material can be initiated in the liquid, on the other hand. It is sufficient to have around 5 to 15 glass beads, 0.5 millimeters in diameter, which scrape against each other and against the vessel wall, and thus cause a DHAP solution to start becoming turbid after one to two minutes by forming tiny crystal nuclei. This allows simultaneous, fully automated preparation of, in particular, a large number of samples, including pipetting onto sample support plates by means of a pipetting and shaking robot.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: October 12, 2021
    Inventor: Waltraud Evers
  • Patent number: 11145502
    Abstract: An ion source assembly is described that includes an electron source configured to inject electrons into an ion volume to ionize an atom or molecule in the ion volume, wherein the electron source includes a filament. A lens electrode is positioned adjacent the electron source and includes an opening configured to pass electrons therethrough from the electron source into the ion volume. A supply voltage source is coupled to the filament and configured to supply a first voltage to the filament, wherein the first voltage is operable to ionize the molecules in the ion volume. Further, a bias voltage source is coupled to the supply voltage source and configured to supply a bias voltage to the lens electrode. Electrons striking the lens electrode are thereafter returned to the filament.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: October 12, 2021
    Assignee: THERMO FINNIGAN LLC
    Inventors: Lawrence G. Baldwin, Johnathan Wayne Smith, Edward B. McCauley
  • Patent number: 11139145
    Abstract: A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: October 5, 2021
    Assignee: Entegris, Inc.
    Inventors: Ying Tang, Sharad N. Yedave, Joseph R. Despres, Joseph D. Sweeney, Oleg Byl
  • Patent number: 11133171
    Abstract: A MALDI ion source for tandem mass spectrometers includes a pulsed energy source that generates a pulse of ions from a sample on a sample plate. An ion accelerator includes an input that receives the pulse of ions from the pulsed energy source and generates an electric field that accelerates the pulse of ions. An ion decelerator that generates an electric field that is a mirror image of the electric field generated by the ion accelerator that accelerates the pulse of ions so that the ion decelerator decelerates the accelerated pulse of ions and transmits the decelerated pulse of ions through an exit aperture.
    Type: Grant
    Filed: July 29, 2020
    Date of Patent: September 28, 2021
    Assignee: Virgin Instruments Corporation
    Inventors: Marvin L. Vestal, Sicheng Li
  • Patent number: 11127578
    Abstract: The ion guiding device comprises a first electrode assembly comprising two parallel electrode units arranged along a spatial axis; a second electrode assembly comprising at least two non-parallel electrode units arranged in a plane between the parallel electrode units along the spatial axis, wherein a space enclosed by the first electrode assembly and second electrode assembly forms an ion transmission channel along the spatial axis; and, a power supply device, which is configured to apply RF voltages with different polarities to the first electrode assembly and the second electrode assembly to generate a RF electric field in the directions perpendicular to the spatial axis to confine ions, and separately apply DC voltages to the first electrode assembly and the second electrode assembly to generate a certain DC voltage difference, to generate a DC electric field along the spatial axis to control the movement of ions.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: September 21, 2021
    Assignee: SHIMADZU CORPORATION
    Inventors: Yupeng Cheng, Xiaoqiang Zhang, Wenjian Sun
  • Patent number: 11127577
    Abstract: A laser desorption/ionization method includes a first process of preparing a sample support body. The sample support body includes a substrate, an ionization substrate, and a support that supports the ionization substrate with respect to the substrate such that a first surface of the ionization substrate is separated from the substrate. A plurality of through-holes are formed at least in measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. Further, the laser desorption/ionization method includes a second process of dropping the sample on the measurement regions of the ionization substrate, and a third process of, after the sample has infiltrated into the ionization substrate, ionizing components of the sample by applying a laser beam to the second surface while applying a voltage to the conductive layer.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: September 21, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11120982
    Abstract: A monitoring method based on the detection of human ingested substances, comprises: acquiring the mass spectrum in the terminal of each matrix assisted laser ionization analysis time-of-flight mass spectrometer, and storing each mass spectrum and its corresponding identity information, sampling time and residence information when sampling in the database; obtaining the mass spectrum characteristic ion peaks of known substances and/or unknown substances in each mass spectrum; and counting the frequency of the mass spectrum characteristic ion peak of the known substance and/or the unknown substance, and early warning of the mass spectrum characteristic ion peak whose frequency is greater than the first threshold.
    Type: Grant
    Filed: March 16, 2020
    Date of Patent: September 14, 2021
    Assignee: XIAMEN LISI TECH SERVICE CO., LTD.
    Inventors: Zhiyin Zeng, Kongtao Zhu, Hui Wu, Jiansheng Zeng, Henglin Luo, Mingyi Hong
  • Patent number: 11120980
    Abstract: The present disclosure relates to a method of manufacturing a specimen of a poorly water-soluble material having a uniform thickness by using a sample plate comprising a substrate and a plurality of protrusions located on one surface of the substrate, the protrusion having a flat surface for receiving a force when pressed from the top, and a method for quantitative analysis of a poorly water-soluble material through MALDI mass spectrometry for the specimen.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: September 14, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Yongjin Bae, Young Hee Lim, Yeu Young Youn