Patents Examined by Helen F. Lee
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Patent number: 5430102Abstract: Disclosed are thermoplastic resin compositions having improved heat resistance, e.g., IR soldering and HDT; increased ductility and flowability; and reduced flash. In particular, the thermoplastic resin compositions have at least one high heat amorphous resin, at least one polysulfide; and, optionally, at least one reinforcing filler and/or at least one polyolefin. The high heat amorphous resin is preferably a polyetherimide and the polyolefin is preferably a high crystalline polyethylene. The compositions of the invention are particularly well suited for preparing no flash high heat electrical connectors.Type: GrantFiled: March 8, 1993Date of Patent: July 4, 1995Assignee: General ElectricInventors: Raymond H. Glaser, Darryl Nazareth, Jerry J. Yang
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Patent number: 5411776Abstract: A sealant comprising a mercapto-terminal liquid oligomer containing plasticizers, fillers and additives wherein the improvement comprises as curing agent an acrylic or methacrylic compound with at least two acrylic or methacrylic groups per molecule and a guanidine derivative as a curing catalyst having good chemical and weathering stability, low water vapor permeability and long-term elasticity properties.Type: GrantFiled: March 25, 1994Date of Patent: May 2, 1995Assignee: Morton International, Inc.Inventors: Gerald Schmidt, Rainer Jung
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Patent number: 5409984Abstract: The invention relates to pollutant-resistant compositions containing organopolysiloxanes. They are used for producing impermeable walls and similar ground seals introduced into the earth. This pollutant-resistant organopolysiloxane-containing composition comprises(A) a salt of organic or inorganic acid and organopolysiloxane which has SiC-attached radicals containing basic nitrogen in amounts of at least 0.5% by weight of basic nitrogen, based on the weight of this organopolysiloxane,(B) organosilicon compound containing basic nitrogen in amounts of from 0 to 0.5% by weight, based on the weight of this organosilicon compound,(C) swellable clay minerals and(D) hydraulic binder.Type: GrantFiled: December 9, 1993Date of Patent: April 25, 1995Assignee: Wacker-Chemie GmbHInventors: Dieter Gerhardinger, Karl-Heinz Felix, Johann Mittermeier
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Patent number: 5409996Abstract: A thermoplastic resin composition comprising (a) 50-99% by weight of a polyarylenesulfide resin and (b) 50-1% by weight of a norbornene-type resin as essential components is disclosed. This resin composition possesses excellent stiffness properties and high heat resistance, and exhibits only small anisotropic properties and superior moldability during the molding operation, and is useful for molding various electronic parts, household electric or electronic parts and articles. Those having a Vicut softening point of 200.degree. C. or higher are especially useful for sealing electronic parts or photo-semiconductors.Type: GrantFiled: February 23, 1994Date of Patent: April 25, 1995Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Hironobu Shinohara, Yoshinobu Suzuki, Kazuhiko Yamamoto
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Patent number: 5408014Abstract: Disclosed herein are an aromatic thioether ketone/thioether sulfone random copolymer comprising phenylene thioether ketone recurring units (I) and phenylene thioether sulfone recurring units (II), (a) the compositional ratio (I:II) of the recurring units (I) to the recurring units (II) ranging from 98:2 to 65:35, (b) the solution viscosity (.eta..sub.inh) being at least 0.3 dl/g, (c) the melt crystallization time (.tau.) being at least 3 minutes, (d) the melting point (Tm) being 300.degree.-350.degree. C., (e) the glass transition temperature being at least 125.degree. C., (f) the retention (400.degree. C./20 min) of melt crystallization enthalpy (.DELTA.Hmc) being at least 60%, and (g) the average particle size being at least 0.1 mm, and the production process thereof.Type: GrantFiled: July 29, 1994Date of Patent: April 18, 1995Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yukichika Kawakami, Zenya Shiiki
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Patent number: 5393860Abstract: The present invention provides new polymer compositions which contain novel substituted pyrazines or pyrazine derivatives ("NPD") which are functional and have useful application as a monomer (co-monomer) for a variety of high performance polymers such as polyester, polyarylate, polycarbonate, polyetherketones, epoxides, polyimides, polyamides, and polyamides-imides. These NPD have the general formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are defined herein.Type: GrantFiled: February 4, 1994Date of Patent: February 28, 1995Assignee: Hoechst Celanese CorporationInventors: George Kvakovszky, Richard Vicari, Olan S. Fruchey, Ahmed M. Tafesh, Charles B. Hilton
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Patent number: 5393861Abstract: The polysulfide polyether of the present invention has in a main chain (i) a polyether moiety represented by --(R.sub.1 O)--.sub.n ; (ii) structural units represented by--(C.sub.2 H.sub.4 O CH.sub.2 O C.sub.2 H.sub.4 --S.sub.x)--, and--(CH.sub.2 CH (OH) CH.sub.2 --S.sub.x --);and at both ends (iii) a thiol group represented by--C.sub.2 H.sub.4 O CH.sub.2 O C.sub.2 H.sub.4 --SH, and/or--CH.sub.2 CH (OH) CH.sub.2 --SH.When mixed with epoxy resins, etc., this polymer is cured at a controlled speed.Type: GrantFiled: April 11, 1994Date of Patent: February 28, 1995Assignee: Toray Thiokol Co., Ltd.Inventors: Kazuhisa Sakae, Kouki Echigoya, Mitsuhiro Okajima
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Patent number: 5391646Abstract: Disclosed herein are a poly(arylene thioether-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone) segment having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other and (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone) segment (A) ranging from 0.05 to 5 by weight, (b) the number-average polymerization degree of the poly(arylene thioether) segment (B) being higher than 1 but lower than 10, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone) copolymer.Type: GrantFiled: May 20, 1993Date of Patent: February 21, 1995Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Yasuhiro Suzuki
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Patent number: 5391645Abstract: Disclosed herein are a poly(arylene thioether-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone) segment having predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- are in the para position to each other, and (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone) segment (A) ranging from 0.05 to 5 by weight, (b) the number-average polymerization degree of the poly(arylene thioether) segment (B) being higher than 1 but lower than 10, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 350.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone) copolymer.Type: GrantFiled: May 20, 1993Date of Patent: February 21, 1995Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Yasuhiro Suzuki
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Patent number: 5384391Abstract: A process for preparing polyarylene sulfides which comprises providing at least one cyclic arylene sulfide oligomer of the formula ##STR1## wherein S represents a sulfur atom, groups Ar, which may be the same or different, represent each an arylene radical having 6-24 carbon atoms, groups R, which may be the same or different, represent each a C.sub.1 -C.sub.12 alkyl radical, or a C.sub.1 -C.sub.12 alkoxy radical, or a primary or secondary amino group, n is an integer of from 2 to 50, and m is an integer of from 0 to 15, and heating said cyclic oligomer I in the presence of a ring opening polymerization catalyst so as to form polyarylene sulfide. The process produces polyarylene sulfides improved in chemical, physical and mechanical properties.Type: GrantFiled: December 27, 1993Date of Patent: January 24, 1995Assignee: Tosoh CorporationInventors: Hiroshi Miyata, Hiroshi Inoue, Akira Akimoto
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Patent number: 5384392Abstract: The invention is a new process to produce polyparaphenylene vinylene or polyparathienylene vinylene polymers using a sulfonium-based polyelectric precursor. This precursor is treated directly with acid to obtain the polymers required. These polymers have high molecular weights and are particularly advantageous in the plastics transformation field.Type: GrantFiled: June 17, 1992Date of Patent: January 24, 1995Assignee: Thomson-CSFInventors: Olivier Sagnes, Jean-Claude DuBois, Valerie Massardier, Tran van Hoang, Alain Guyot
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Patent number: 5380799Abstract: A resin composition moldable at room temperature comprising a thermosetting unsaturated polyester resin, a mixture of thermoplastic polymers of vinyl acetate and an epoxy compound having at least one 1,2-epoxy group per molecule, a dialkyl-p-toluidine accelerator, a low temperature free radical peroxide initiator such as a blend of cumene hydroperoxide and acetyl acetone peroxide, and an alkali metal or transition metal compound capable of reacting with the free radical initiator to initiate polymerization of the unsaturated polyester resin.Type: GrantFiled: December 30, 1993Date of Patent: January 10, 1995Assignee: Reichhold Chemicals, Inc.Inventors: Dean H. Wiseman, Masamichi Togo
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Patent number: 5380811Abstract: A room temperature curable fluorine-containing organopolysiloxane composition comprising:(A) a fluorine-containing organosilicon compound having the general formula (1):R.sup.2 --NHCO--[Rf--CONH--R.sup.1 --Q--R.sup.1 --NHCO].sub.a --Rf--CONH--R.sup.2 (1)wherein a is an integer of 0 or more, Rf is a divalent perfluoroalkylene group or a divalent perfluoropolyether group, R.sup.1 is a divalent hydrocarbon group, R.sup.2 is a monovalent aliphatic unsaturated group-containing hydrocarbon group, and Q is a divalent siloxane group(B) a hydrogenorganopolysiloxane containing at least two Si--H groups in its molecule, and(C) a platinum family metal catalyst. The cured product of this composition exhibits good solvent resistance against non-polar solvents as well as polar solvents, in addition to good chemical resistance, heat resistance, release properties and water repellency.Type: GrantFiled: June 2, 1993Date of Patent: January 10, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Shinichi Sato, Noriyuki Koike, Takashi Matsuda
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Patent number: 5378772Abstract: Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioetherketoneketone) block having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioetherketoneketone) block (A) being within a range of 0.1-9 by weight, (B) the weight average molecular weight of the poly(arylene thioether) block (B) being at least 1,000, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the block copolymer.Type: GrantFiled: March 30, 1993Date of Patent: January 3, 1995Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Shinji Yamamoto
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Patent number: 5378770Abstract: Disclosed herein is a poly(arylene thioether-ketone-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone-ketone) segment having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone-ketone) segment (A) ranging from 0.1 to 9 by weight, (b) the weight-average molecular weight of the poly(arylene thioether) segment (B) being at least 200 but lower than 1000, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone-ketone) copolymer.Type: GrantFiled: March 23, 1993Date of Patent: January 3, 1995Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Jiro Masuko
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Patent number: 5378771Abstract: Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioetherketoneketone) block having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioetherketoneketone) block (A) being within a range of 0.1-9 by weight, (B) the weight average molecular weight of the poly(arylene thioether) block (B) being at least 1,000, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the block copolymer.Type: GrantFiled: March 30, 1993Date of Patent: January 3, 1995Assignee: Kureha Kagaku Kogyo K.K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Shinji Yamamoto
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Patent number: 5378749Abstract: The invention relates to polyarylene sulfides (PAS), more particularly polyphenylene sulfides (PPS), showing reduced flash formation.Type: GrantFiled: September 10, 1993Date of Patent: January 3, 1995Assignee: Bayer AktiengesellschaftInventors: Burkhard Kohler, Bahman Sarabi
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Patent number: 5378763Abstract: Blends of an aromatic polysulfone (PSF) and aromatic alkyl methacrylates (PAAM) form thermodynamically miscible mixtures. They exhibit only one glass transition over a wide range of compositions and show marked improvement in mechanical and thermal properties compared to binary mixtures of PSF and other methacrylate or styrenic polymers. Furthermore, they possess better processing and workability without unwanted thermal decomposition owing to better flow properties at relatively lower temperatures.Type: GrantFiled: October 30, 1992Date of Patent: January 3, 1995Assignee: Enichem S.p.A.Inventor: Michael A. Drzewinski
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Patent number: 5374692Abstract: Disclosed herein is a poly(arylene thioether-ketone-ketone) copolymer comprising (A) at least one poly(arylene thioether-ketone-ketone) segment having predominant recurring units of the formula ##STR1## (B) at least one poly(arylene thioether) segment having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) segment (B) to the total amount of the poly(arylene thioether-ketone-ketone) segment (A) ranging from 0.1 to 9 by weight, (b) the weight-average molecular weight of the poly(arylene thioether) segment (B) being at least 200 but lower than 1000, and (c) said copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the poly(arylene thioether-ketone-ketone) copolymer.Type: GrantFiled: March 23, 1993Date of Patent: December 20, 1994Assignee: Kureha Kagaku Kogyo K.K.Inventors: Yoshikatsu Satake, Yoshiyuki Inaguma, Jiro Masuko
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Patent number: 5371161Abstract: A method for the preparation of organopolysiloxanes containing SiH groups from the appropriate organopolysiloxanes containing silicon halide groups by reaction with metal hydrides, wherein, as metal hydride, a compound of the general formula ##STR1## is used, and the reaction is carried out in this ether as solvent within a temperature range from 0.degree. to 20.degree. C. The method proceeds selectively with retention of any alkenyl groups present.Type: GrantFiled: November 18, 1993Date of Patent: December 6, 1994Assignee: Th. Goldschmidt AGInventor: Wilfried Knott