Abstract: A spatial light modulator for use in a photolithography system includes light modulation elements configured to photolithographically transfer an image onto a substrate using an optical oversampling technique to reduce defects in the transferred image. A first set of the light modulation elements is operable to photolithographically transfer a portion of the image onto an area of a substrate, and a second set of the light modulation elements is operable to photolithographically transfer the portion of the image onto the area of the substrate. The spatial light modulator further includes memory elements in communication with respective light modulation elements for storing data representing the portion of the image.

Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.

Abstract: An illumination apparatus for illuminating a mask having a pattern, using light from a light source, includes a generating section for generating an effective light source distribution for a modified illumination to the mask, a polarization setting section for setting a predetermined polarization state in plural areas in the effective light source distribution, and an adjusting section for commonly controlling a polarization state of each area.

Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: Disclosed is a scan type exposure apparatus for exposing a substrate, placed on an exposure plane, to a pattern of a mask with light from a light source. In one preferred embodiment, the apparatus includes a stop member for restricting an exposure range on the exposure plane, a measuring system for measuring an illuminance distribution which is produced on a predetermined plane displaced from the exposure plane in an optical axis direction and by a predetermined amount and which is provided by light passed through an opening of the stop member and projected or to be projected at a predetermined position on the exposure plane, and a calculating device for calculating an angular characteristic of light projected or to be projected on the exposure plane, on the basis of integrating illuminance distributions which are defined by lights incident at plural positions along a scan direction upon the exposure plane and which are measured by the measuring system.

Abstract: Methods and apparatuses for controlling characteristics of radiation directed to a microlithographic workpiece are disclosed. An apparatus in accordance with one embodiment of the invention includes a source of radiation positioned to direct a radiation beam having an amplitude distribution, a phase distribution, and a polarization distribution, toward a workpiece. An adaptive structure can be positioned in a path of the radiation beam and can have a plurality of independently controllable and selectively radiation transmissible elements, each configured to change at least one of the amplitude distribution, the phase distribution and the polarization distribution of the radiation beam. A controller can be operatively coupled to the adaptive structure to direct the elements of the adaptive structure to change from one state to any of a plurality of available other states.

Abstract: A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10?6/K.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

Abstract: An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method may direct exposure light having a wavelength ? through a projection optical system that is at least partially immersed in liquid and has a numerical aperture of no·sin ?NA greater than 0.9 in order to transfer a pattern formed on a mask onto an object to be exposed, wherein no is a refractive index of the liquid, ?n is the fluctuation of the refractive index of the liquid, ?NA is the largest angle common to the liquid and a resist material applied to the object to be exposed, and d is a thickness of the liquid in an optical-axis direction of the projection optical system which satisfies d?(0.03?) cos ?NA/?n.

Abstract: An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.

Abstract: A position measurement apparatus for measuring a position of a mark includes an image capturing unit, a calculating unit which obtains variation in image data captured by the image capturing unit, and a setting unit which sets a parameter concerning a light receiving amount of the image capturing unit based on variations respectively obtained by the calculating unit with respect to a plurality of image data acquired by the image capturing unit at different light receiving amounts.

Abstract: A method and a device are provided for automating receipt of orders for additional printing of a photographic print, including order information relating to desired image processing. In a print order receiving machine, when a photographic print is inserted, an image of the photographic print is read and displayed on a monitor (steps 150, 152). When order conditions are inputted, an image which is processed on the basis of the order conditions is displayed on the monitor (steps 154 through 158). Further, when input of the order conditions is completed, the order conditions and order information based on the order conditions are set. The set order information is printed onto a photographic print as an invisible two-dimensional bar code. Copying processing of the photographic print is carried out on the basis of the order information which is read from the photographic print.

Abstract: A method for aligning a substrate in a lithographic apparatus is presented. The substrate includes a plurality of alignment marks. The alignment marks have been defined by a second lithographic apparatus and are arranged to provide a substrate grid as a coordinate system that includes a first and a second direction, substantially perpendicular to the first direction.

Abstract: A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

Abstract: A projection exposure apparatus includes a diaphragm controlling unit controlling one or more of an diaphragm, an iris diaphragm, and a relay lens system. In addition, the projection exposure apparatus also includes a line width calculator which calculates a bias, which is a difference between a line width in a dense part and a line width in an isolated part, based on information regarding a mask pattern, the wavefront aberration of a lens, the effective light source of an illumination optical system, the half-width of a laser, the temperature change in a projection optical system due to exposure, etc. When the bias is out of a tolerance range, the line width calculator calculates a correction value for the diaphragm of the projection optical system or a correction value for the effective light source of the illumination optical system in accordance with the bias which is to be corrected. Then, the diaphragm controlling unit is driven in accordance with the calculation results.

Abstract: To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal containing the liquid.

Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck for supporting the object, a frame for supporting the chuck, and a chuck support structure for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element, which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

Abstract: An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

Abstract: A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.