Abstract: A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1–L16) sequentially arranged along an optical axis (16), a means for creating radially polarized light arranged at a given location in that region extending up to the last of said imaging optical components, and a crystalline-quartz plate employable in such a system. A polarization rotator (14) for rotating the planes of polarization of radially polarized light and transforming same into tangentially polarized light, particularly in the form of a crystalline-quartz plate as noted above, is provided at a given location within a region commencing where those imaging optical components that follow said means for creating radially polarized light in the optical train are arranged. The optical imaging system is particularly advantageous when embodied as a microlithographic projection exposure system.

Abstract: An apparatus is disclosed. The apparatus includes a compartment for containing a high vacuum environment. The compartment is partly defined by and/or includes a surface that has a subsurface that includes a first zone and a second zone. The second zone is located between the first zone and the surface. The first zone includes a metal or alloy that has a composition which differs from stainless steel. Diffusion is more difficult in the second zone than in the first zone, so that gaseous molecules are inhibited from escaping from the subsurface into the high vacuum environment.

Abstract: A lithography device including a first revolver, a second revolver and a driving device. The first revolver includes a transmittance control filter. The second revolver includes transmittance profile filter. The driving device is capable of rotating the second revolver. The first revolver is for positioning the at least one transmittance control filter in the light path. The second revolver is for positioning the at least one transmittance profile filters in the light path.

Abstract: A lithography apparatus including a reticle stage, a wafer stage, and an actuator. The reticle stage is operable to project an original image. A final image corresponding to the original image is formed on the wafer stage. The actuator is operable to actuate the reticle stage at a first acceleration and the wafer stage at a second acceleration. The first acceleration and the second acceleration are in colinear and opposite directions.

Abstract: A lithographic exposing system having an optical system including a light source, a lens, a mirror and a filter, and transferring patterns formed on a reticle to a substrate. The method includes a device for lowering the energy of the light from the light source below a threshold energy, an equipment for making the light that has passed through the device a light source for measuring alignment marks formed on the substrate, and a light path controlling device for directing the light from the light source toward the optical system in an exposing process and for making the light from the light source toward said the alignment mark measuring equipment.

Abstract: Excellent exposure performance is achieved by disposing a shade system in the vicinity of a mask. An exposure apparatus exposes a mask mounted on a first table using an illumination apparatus. The illumination apparatus illuminates the mask with light from a light source. The first table is provided with a shade system including shades formed of a material absorbing EUV light. The shade system obstructs unnecessary light that does not contribute to the exposure.

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Abstract: An exposure assembly and an exposure installation for exposing a double-sided printed circuit panel to light through a first and a second artwork, including at least one exposure assembly having a frame, a first and a second artwork support, means for moving closer/separating for the artwork supports, and means for holding the printed circuit panel. The installation furthermore includes an optical detection device for detecting position errors, a light source, and an optical device for directing a light beam emitted by said light source. The exposure assembly furthermore has a common displacement device making it possible to jointly displace the artwork supports, and a separate displacement device making it possible to displace the second artwork support with respect to the first artwork support.

Abstract: An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.

Abstract: A system and method include a pattern generating portion that is used to pattern an object via a projection system. The pattern generating portion includes active and inactive areas. The pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards inactive areas away from the object.

Abstract: Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes at least one integrated spring.

Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract: Reduction Talbot interference imaging is carried out using a glass or fused silica prism, where at least two surfaces within the prism allow for an increase in the propagating ray angles at the image plane compared to the object (the photomask) plane. Furthermore, by adding a second orthogonal pair of surfaces, X and Y order recombination is made possible thus allowing for the imaging in an orthogonal direction with a two-order interference scheme as well as repeating checkerboard (island and hole) patterns with a four-order interference scheme. A benefit of the invention is the reduced requirements of the photo mask, allowing for diffraction limited imaging with UV wavelengths in a media with index of unity (air) or larger (an immersion fluid). The prism interferometer is known as a Smith-Talbot prism lens.

Abstract: Methods and apparatus for collecting heat within a precision stage system substantially without introducing significant disturbance forces to the system are disclosed. According to one aspect of the present invention, a method for substantially removing heat from a first location within an overall stage apparatus includes providing the heat from the first location to a heat transferring mechanism that carries the heat away from the first location. The heat is transferred from the heat transferring mechanism to a second location associated within the stage apparatus. The second location includes a material that is arranged to store the transferred heat. The method also includes storing the heat substantially within the material. In one embodiment, the heat is generated at the first location.

Abstract: A lithographic apparatus having a positioning device that facilitates the maintenance of a conditioned environment, is presented. Embodiments of the invention include a combination of a first drive unit and a second drive unit for positioning an object table in a lithographic apparatus. The first drive unit has a first part connected to the object table and a second part connected to a first part of the second drive unit. First and second part of the first drive unit are separated from each other by a wall. Maintaining a conditioned environment surrounding the object is thereby facilitated.

Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

Abstract: In one embodiment, a pulse-to-pulse dose reproducibility of a radiation system for use in maskless lithography is improved by providing a plurality of lasers and combining the radiation beams produced by each to form a single projection beam of radiation.

Abstract: Disclosed is a holding system and an exposure apparatus having the same, wherein deformation of an optical member resulting from its thermal expansion and causing degradation of imaging performance can be reduced to assure desired imaging performance. The holding system for holding an optical member includes a barrel for at least partially surrounding the optical member and/or a heat source, an average of radiation coefficient of an inside surface of the barrel is not less than 0.8.