Abstract: The invention provides an exposure device that can conduct digital exposure with high precision and with a high light-use efficiency using evanescent light. Light that is modulated by a DMD and condensed by a microlens array is incident at corresponding optical fiber cores arranged in a matrix in an evanescent array head, and is guided through the insides of the optical fibers. Because the light condensed by the microlens array is incident at the optical fiber cores corresponding to the microlenses, the light can be efficiently incident. Evanescent light leaks out from micro-openings formed in emission-side end portions of the optical fibers, and a photosensitive material is exposed by this evanescent light.

Abstract: A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.

Abstract: An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

Abstract: A temperature adjusting system includes a chamber, a cooler which cools an inert gas to be supplied to the chamber, a circulating path which circulates the inert gas through the chamber and the cooler, a shut-off valve arranged in the circulating path between the chamber and an outlet port of the cooler, and a shut-off valve arranged in the circulating path between the chamber and an inlet port of the cooler.

Abstract: Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.

Abstract: A driving unit includes an actuator for actuating a target and a magnetic dampener for controlling a vibration of the target, wherein the driving unit controls the vibration of the target, which is generated by the actuation of the actuator, by using the magnetic dampener.

Abstract: A position measurement unit measures the position of an object to be position controlled. A microprocessor performs a plurality of types of operations on the basis of the obtained position signal and outputs the operation result as a control signal that pertains to position control of the object to be position controlled. The microprocessor performs a difference operation, which calculates the difference signal of the position signal at the first sampling frequency and performs operations other than difference operation at the second sampling frequency lower than the first sampling frequency.

Abstract: An interface unit for transferring objects, such as substrates, is presented. The interface unit includes a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, wherein the interface unit is also provided with a second object transfer path extending through a closable transfer opening to an external space to transfer objects between the external space and the lithographic exposure unit. Furthermore, the invention relates to a lithographic apparatus provided with a lithographic exposure unit and an interface unit according to the invention.

Abstract: A lithographic method and apparatus used to pattern an object. An illumination source supplies a beam of radiation. A pattern generator forms a pattern to pattern a beam of radiation using the pattern data. A projection system projects the patterned beam onto a target portion of a substrate supported by a stage during an exposure operation. A control module determines a respective maximum operational parameter for the illumination source, the pattern generator, and/or the stage.

Abstract: A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam.

Abstract: A spatial light modulating method performs spatial light modulation of light produced by a light source. The method includes forming an image of a two-dimensional pattern of the light, which has been obtained from the spatial light modulation, on a photosensitive material, using an image-sided telecentric optical system. The method further includes altering an axial air separation, upstream of the photosensitive material, to thereby adjust a focusing point at the time of the formation of the image of the two-dimensional pattern of the light.

Abstract: A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of a shot region of the exposure apparatus, having at least two different heights located on the substrate. Additionally, the method for testing an exposure apparatus includes using the exposure apparatus to perform an exposure process on the testing device or on the testing device having a photoresist layer thereon, and testing the performance of the exposure apparatus through comparing surface information of the testing device computed by the exposure apparatus with actual surface information of the testing device or through examining photoresist patterns formed on the testing device.

Abstract: There is provided an illumination system for microlithography with wavelengths?193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The first raster elements that are imaged into the image plane are illuminated almost completely.

Abstract: A position detector for detecting a relative positional relationship between an original form that has a position detecting mark, and a stage that supports the original form and has a reference mark. The position detector includes an illumination optical system for illuminating the position detecting mark or the reference mark using illumination light, a detection optical system for introducing reflection light that is reflected from the position detecting mark or the reference mark, to an image pickup unit, and a controller for varying at least one of a numerical aperture of the detection optical system, a numerical aperture of the illumination optical system and a wavelength of the illumination light to control contrast of a mark signal that is detected by the image pickup unit and indicates the position detecting mark or the reference mark.

Abstract: A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a position sensitive detector, and a light directing arrangement for directing a first portion of light from the light source to the position sensitive detector. The light directing arrangement further directs a second portion of light from the light source into the projection system and, after the second portion of light has traveled through the projection system to the substrate and back through the projection system to the light directing arrangement, the second portion of light is directed onto the position sensitive detector.

Abstract: A reticle stage grid and yaw in a projection imaging tool is determined by exposing a first portion of a reticle pattern onto a substrate with a recording media thereby producing a first exposure. The first portion of the reticle pattern includes at least two arrays of alignment attribute that have features complementary to each other. The reticle stage is then shifted and a second portion of the reticle pattern is exposed. The first and second exposures overlap and interlock to create completed alignment attributes. Measurements of positional offsets of the completed alignment attributes are used to determine the reticle stage grid and yaw.

Abstract: The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with an exchangeable object loading station and a support, the exchangeable object handling apparatus including three or more end-effectors each capable of exchanging an exchangeable object with one of the supports. Such lithographic apparatus is in particular suited for the streaming of subsequent double exposure jobs.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that includes a radiation source and an illumination system that supplies a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, an electrode, and a voltage source that applies an electric field between the radiation source and the electrode to generate a discharge between the radiation source and the electrode.

Abstract: An exposure device that sequentially projects and repeatedly transfers a predetermined pattern formed on a reticule onto wafers via an optical projection system, the exposure device including a movement unit that positions a current shot region on a wafer in the focal position of the optical projection system, a detection unit that detects tilting on an exposure surface of the current shot region with respect to an image plane of the optical projection system, and a plurality of first piezoelectric elements that correct the tilting on the current shot region with respect to the optical axis, based upon the detection results of the detection unit, so that the exposure surface of the current shot region will substantially match the image plane.

Abstract: An exposure method that can conduct digital exposure with high precision and with a high light-use efficiency using evanescent light. Light that is modulated by a DMD and condensed by a microlens array is incident at corresponding optical fiber cores arranged in a matrix in an evanescent array head, and is guided through the insides of the optical fibers. Because the light condensed by the microlens array is incident at the optical fiber cores corresponding to the microlenses, the light can be efficiently incident. Evanescent light leaks out from micro-openings formed in emission-side end portions of the optical fibers, and a photosensitive material is exposed by this evanescent light.