Patents Examined by Hung Nguyen
  • Patent number: 10782618
    Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: September 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jorge Alberto Vieyra Salas, Auke Juriaan Been, Victor Manuel Blanco Carballo
  • Patent number: 10782248
    Abstract: Embodiments of the present disclosure relate to a measuring method and device for measuring surface defects of a cambered optical element, which belongs to the field of photoelectric detection technology. The device includes a sensor measuring head, a rotatable workpiece table, an automatic sampling device, and a spraying device. The sensor measuring head includes an illumination sub-system and a line scan imaging sub-system, the illumination sub-system provides an illumination of high uniformity and high brightness for a surface of a sample to be detected, the rotatable workpiece table and the imaging sub-system are configured for performing a ring belt scanning and a high resolution scatter imaging to the defects on an optical surface region.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: September 22, 2020
    Assignee: The Institute of Optics and Electronics, The Chinese Academy of Sciences
    Inventors: Haiyang Quan, Fuchao Xu, Taotao Fu, Xiaochuan Hu, Gaofeng Wu, Xi Hou, Fan Wu, Sheng Li
  • Patent number: 10775702
    Abstract: Disclosed is a lithography process on a sample with at least one emitter, the process including: putting at least one layer of resist above the sample; exciting one selected emitter with light through the at least one layer of resist; detecting light emitted by the excited selected emitter and determining a position of the selected emitter; and curing with a light beam a part of the at least one layer of resist above the position of the selected emitter, the light beam being a shaped light beam having a cross-section, this cross-section having a central part, an intermediate part surrounding the central part and a border part surrounding the intermediate part, the intensity of the shaped light beam on the at least one layer of resist reaching a maximum at the intermediate part.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: September 15, 2020
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, SORBONNE UNIVERSITE, UNIVERSITE DE PARIS
    Inventors: Agnès Maitre, Amit Raj Dhawan, Pascale Senellart, Cherif Belacel
  • Patent number: 10775706
    Abstract: A method of lithography includes obtaining a profile of a single field of a substrate that having a photoresist layer thereon, in which the profile includes a first feature and a second feature having different heights. A depth of focus distribution map is generated according to the profile. A project lens is tuned based on the generated depth of focus distribution map, such that the project lens provides a first focus length in a first project pixel of the project lens and a second focus length in a second project pixel of the project lens, wherein the first focus length and the second focus lengths. The single field of the substrate is exposed by using the tuned project lens.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: September 15, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Hung Liao, Min-Cheng Wu
  • Patent number: 10777441
    Abstract: A measurement system to be used in a manufacturing line for micro-devices is provided independently from an exposure apparatus. The measurement system has measurement devices that each performs measurement processing on substrates (e.g., substrates that have gone through at least one processing but before being coated with a sensitive agent), and a carrying system for performing delivery of substrates to/from the measurement devices. The measurement devices include a first measurement device that acquires position information on a plurality of marks formed on a substrate under a setting of a first condition, and a second measurement device that acquires position information on a plurality of marks formed on another substrate (e.g., another substrate included in the same lot as the substrate on which acquiring position information is performed under the setting of the first condition in the first measurement device) under a setting of a first condition.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: September 15, 2020
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Tomonori Dosho
  • Patent number: 10775707
    Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Güneş Nakìbo{hacek over (g)}lu, Manon Elise Will, Sander Catharina Reinier Derks, Johannes Wilhelmus Mollen
  • Patent number: 10768537
    Abstract: A liquid immersion exposure apparatus is disclosed. It includes a projection system having a final element and a liquid immersion member that in turn includes a first member, which surrounds the final element and has a liquid supply port and a liquid suction port, and a second member, which is movable with respect to the first member and has a lower part under which a portion of a liquid immersion space is formed. During exposure of a plurality of shot regions of a substrate, the immersion space covers a portion of a surface of the substrate, and the first shot region is exposed while moving the substrate in a first scanning direction. After the exposure of the first shot region, the second shot region is exposed while moving the substrate in a second scanning direction.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: September 8, 2020
    Assignee: NIKON CORPORATION
    Inventor: Shinji Sato
  • Patent number: 10768049
    Abstract: A high resolution inspection apparatus using a terahertz Bessel beam. The high resolution inspection apparatus comprises a terahertz wave generating unit for generating a terahertz wave; a Bessel beam forming unit for forming a terahertz Bessel beam at an inspection target object using a terahertz wave incident from the terahertz wave generating unit; a first lens for changing an angle of the terahertz wave radiated, when the terahertz Bessel beam is transmitted through the inspection target object, to be smaller; a second lens for concentrating the terahertz wave passing through the first lens and toward a detection unit; and a terahertz wave detection unit for detecting the terahertz wave concentrated by the second lens.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: September 8, 2020
    Assignee: KOREA RESEARCH INSTITUTE
    Inventors: Gyeong-Sik Ok, Sung-Wook Choi, Hyun-Joo Chang
  • Patent number: 10761435
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: September 1, 2020
    Assignee: ASML Holding N.V.
    Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
  • Patent number: 10761433
    Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: September 1, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
  • Patent number: 10761032
    Abstract: Methods of and apparatus for inspecting composite layers of a first material formed on a second material are provided including providing an illumination source, illuminating at least a portion of the composite at the layer, receiving light reflected from the sample, determining a spectral response from the received light, and comparing the received spectral response to an expected spectral response.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: September 1, 2020
    Assignees: BWXT Nuclear Operations Group, Inc., BWXT NOG Technologies, Inc.
    Inventors: Aaron C. Havener, James D. Jogerst, Thomas C. Mohr, Keith B. Rider
  • Patent number: 10761436
    Abstract: An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: September 1, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ralf Zweering, Steffen Fritzsche, Hendrik Wagner, Florian Ahles, Jens Prochnau, Michael Erath, Viktor Kulitzki, Marwène Nefzi
  • Patent number: 10761438
    Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: September 1, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens
  • Patent number: 10752271
    Abstract: A system and method for monitoring a track and/or rail employs one or more imagers mounted to a railcar and directed to image the track and/or rails wherein the images are geo-tagged with location data. Geo-tagged images are processed to determine at least track gauge and/or at least rail fastener integrity. The system and method may also determine other track and/or rail integrity issues including, e.g., rail fastener integrity, rail profile, rail alignment, center point dip, cross level, rail cant, wheel wear, wheel integrity, rail wear, rail defects, and/or rail temperature. The system and method may also determine when inspection and/or maintenance of the track is indicated, and provide selected records of where and/or when such inspection and/or maintenance is indicated.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: August 25, 2020
    Assignee: Avante International Technology, Inc.
    Inventors: Kevin Kwong-Tai Chung, Yulin Huang, Dexi Zhu, Victor Dong, Xinjun Dong
  • Patent number: 10747010
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: August 18, 2020
    Assignee: ASML Holding N.V.
    Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
  • Patent number: 10747127
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: August 18, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
  • Patent number: 10747125
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: August 18, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
  • Patent number: 10746529
    Abstract: To suppress an erroneous measurement of a measuring object in an optical displacement meter of a light sectioning method. The optical displacement meter includes an image sensor, a cover glass arranged obliquely relative to a light receiving surface of the image sensor, and a housing which houses the image sensor and the cover glass.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: August 18, 2020
    Assignee: Keyence Corporation
    Inventor: Yutaka Miyagawa
  • Patent number: 10744648
    Abstract: A carrier system and method carries a plate-like object to an object mounting member provided with an object mounting section. The system includes an adjustment device that changes a shape of the plate-like object into a predetermined shape before the plate-like object is mounted onto the object mounting section. The plate-like object whose shape is changed into the predetermined shape is mounted onto the object mounting section.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: August 18, 2020
    Assignee: NIKON CORPORATION
    Inventor: Hideaki Hara
  • Patent number: 10739681
    Abstract: An image exposure device (10) includes an image display device (20) having a pixel (21), a photosensitive recording medium support portion that supports a photosensitive recording medium (40) in which an image of the image display device (20) is recorded in a state in which an exposure surface (40A) of the photosensitive recording medium (40) faces the image display device (20), a collimation portion (50) that is provided between the image display device (20) and the photosensitive recording medium (40) and makes light from the pixel (21) into parallel light, and an absorption layer (60) that is provided between the image display device (20) and the photosensitive recording medium (40) and has a light transmittance for the light from the pixel (21) of 50% or less.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: August 11, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Yoshihisa Usami, Shinichiro Sonoda, Hirotoshi Yoshizawa