Patents Examined by Hung Nguyen
  • Patent number: 11143502
    Abstract: In one embodiment, a system for determining the proper positioning of a test strip includes a test strip having a first reading window and a strip holder. The system further includes a meter, the meter receiving and configured to receive the test strip, the meter having a first light source of a first color and a second light source of a second color and a first read window. The meter is configured to illuminate the first light source; detect a first reflectance with the meter through the first read window; and determine if the first reflectance is greater than a no-strip value.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 12, 2021
    Assignee: POLYMER TECHNOLOGY SYSTEMS, INC.
    Inventors: Steven Zucker, Donnie Smith, Christopher Dailey, Jonathan Broadwell
  • Patent number: 11143598
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Grant
    Filed: October 14, 2020
    Date of Patent: October 12, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Shunichi Matsumoto, Masami Makuuchi, Yuta Urano, Keiko Oka
  • Patent number: 11137694
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: October 5, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N V.
    Inventors: Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls, Peter Conrad Kochersperger
  • Patent number: 11137673
    Abstract: Provided are an extreme ultraviolet (EUV) exposure apparatus for improving an overlay error in a EUV exposure process, and an overlay correction method and a semiconductor device fabricating method using the exposure apparatus. The EUV exposure apparatus includes an EUV light source; a first optical system configured to emit EUV light from the EUV light source to an EUV mask; a second optical system configured to emit EUV light reflected from the EUV mask to a wafer; a mask stage; a wafer stage; and a control unit configured to control the mask stage and the wafer stage, wherein, based on a correlation between a first overlay parameter, which is one of parameters of overlay errors between layers on the wafer, and a second overlay parameter, which is another parameter, the first overlay parameter is corrected through correction of the second overlay parameter.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: October 5, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Doogyu Lee, Seungyoon Lee, Jeongjin Lee, Chan Hwang
  • Patent number: 11131935
    Abstract: An information processing apparatus outputs correction data using a first system that outputs the correction data for correcting a condition defining processing to be performed in a lithography apparatus that forms a pattern onto a substrate. The first system includes a first model that outputs the correction data in case where a processing result indicating a result of the processing is input, and a second model that outputs the processing result in case where the condition is input. The first system corrects the condition using the correction data output from the first model, and outputs the correction data based on the processing result output by inputting the corrected condition to the second model.
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: September 28, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kenji Yamamoto, Mitsuhiro Masuda
  • Patent number: 11131924
    Abstract: A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: September 28, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Sato, Hiroshi Morohoshi
  • Patent number: 11126096
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: September 21, 2021
    Assignee: Onto Innovation, Inc.
    Inventors: Elvino Da Silveira, Keith Frank Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
  • Patent number: 11126007
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: September 21, 2021
    Assignee: ASML Holding N.V.
    Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
  • Patent number: 11119419
    Abstract: A target for use in the optical measurement of misregistration in the manufacture of semiconductor devices, the target including a first periodic structure formed on a first layer of a semiconductor device and having a first pitch along an axis and a second periodic structure formed on a second layer of the semiconductor device and having a second pitch along the axis, different from the first pitch, the second periodic structure extending beyond the first periodic structure along the axis.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: September 14, 2021
    Assignee: KLA-Tencor Corporation
    Inventor: Mark Ghinovker
  • Patent number: 11119418
    Abstract: A focus compensation method and apparatus thereof are provided. The focusing compensation method includes steps of: (S11) providing an exposure lens set; (S12) providing an object, measuring line-widths of the object at points of line segments along an axial direction by different focusing conditions, to obtain measured values, and obtaining at least one line-width curve from the measured values; and (S13) calibrating a focusing operation of the exposure lens set according to the at least one line-width curve. Line-widths of a product are measured, and fed back to an exposure machine to calibrate the focusing operations of the exposure machine, thereby improving the focusing accuracy of the exposure machine.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: September 14, 2021
    Assignee: Wuhan China Star Optoelectonics Technology Co., Ltd.
    Inventor: Yuchang Gui
  • Patent number: 11106139
    Abstract: An optical path compensation apparatus includes a wedge assembly, a driving mechanism and a preload unit. The wedge assembly includes a movable wedge and a fixed wedge. The movable wedge and the fixed wedge having equal wedge angles and respective wedge surfaces inclined in opposite directions. The preload unit is configured to elastically press the movable wedge on the fixed wedge, and the driving mechanism is configured to cause relative movement between the wedge surface of the movable wedge and the wedge surface of the fixed wedge. This optical path compensation apparatus is capable of achieving effective position correction of a focal plane of a measurement system for focusing and leveling in a smooth, convenient and precise way while not causing any error in other directions.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: August 31, 2021
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Shurong Li, Hailin Cheng
  • Patent number: 11106140
    Abstract: A method for taking heat away from the photomask includes driving a working fluid to flow between a photomask and a fluid retaining structure and through a first slit of the fluid retaining structure, such that a boundary of the working fluid is confined between the photomask and the fluid retaining structure; and generating a light to irradiate the photomask through a light transmission region of the fluid retaining structure.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: August 31, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Ming Chang, Chiu-Hsiang Chen, Ru-Gun Liu
  • Patent number: 11106146
    Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: August 31, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hao-Yu Lan, Po-Chung Cheng, Ching-Juinn Huang, Tzung-Chi Fu, Tsung-Yen Lee
  • Patent number: 11107718
    Abstract: A measurement system to be used in a manufacturing line for micro-devices is provided independently from an exposure apparatus. The measurement system has measurement devices that each performs measurement processing on substrates (e.g., substrates that have gone through at least one processing but before being coated with a sensitive agent), and a carrying system for performing delivery of substrates to/from the measurement devices. The measurement devices include a first measurement device that acquires position information on a plurality of marks formed on a substrate under a setting of a first condition, and a second measurement device that acquires position information on a plurality of marks formed on another substrate (e.g., another substrate included in the same lot as the substrate on which acquiring position information is performed under the setting of the first condition in the first measurement device) under a setting of a first condition.
    Type: Grant
    Filed: May 7, 2020
    Date of Patent: August 31, 2021
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Tomonori Dosho
  • Patent number: 11106144
    Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: August 31, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Hubertus Petrus Koller, Johannes Jacobus Matheus Baselmans, Bartolomeus Petrus Rijpers
  • Patent number: 11099139
    Abstract: A photolithography method includes dispensing a first liquid onto a first target layer formed over a first wafer through a nozzle at a first distance from the first target layer; capturing an image of the first liquid on the first target layer; patterning the first target layer after capturing the image of the first liquid; comparing the captured image of the first liquid to a first reference image to generate a first comparison result; responsive to the first comparison result, positioning the nozzle and a second wafer such that the nozzle is at a second distance from a second target layer on the second wafer; dispensing a second liquid onto the second target layer formed over the second wafer through the nozzle at the second distance from the second target layer; and patterning the second target layer after dispensing the second liquid.
    Type: Grant
    Filed: June 1, 2020
    Date of Patent: August 24, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Hung Liao, Wei Chang Cheng
  • Patent number: 11097426
    Abstract: A carrier system and method carries a plate-like object to an object mounting section. The system imparts vibration to the object that has been moved such that the object is vibrating when the object is placed onto the mounting section.
    Type: Grant
    Filed: July 10, 2020
    Date of Patent: August 24, 2021
    Assignee: NIKON CORPORATION
    Inventor: Hideaki Hara
  • Patent number: 11092892
    Abstract: Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: August 17, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Min-Cheng Wu, Chi-Hung Liao
  • Patent number: 11086239
    Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Miao Yu, Petrus Martinus Gerardus Johannes Arts, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Maarten Holtrust, Han Henricus Aldegonda Lempens, Ferdy Migchelbrink, Theodorus Wilhelmus Polet, Gheorghe Tanasa
  • Patent number: 11086055
    Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: August 10, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Peter Huber