Patents Examined by Hung Nguyen
  • Patent number: 11360397
    Abstract: An image-based overlay metrology system is disclosed. The system includes a controller couplable to a metrology sub-system. The controller is configured to receive a set of image signals of a first metrology target disposed on the sample from the metrology sub-system and determine a plurality of harmonic detectivity metric values by calculating a harmonic detectivity metric value for each of the plurality of image signals. The controller is also configured to identify a set of optical measurement conditions of the metrology sub-system based on the plurality of harmonic detectivity metric values, wherein the set of optical measurement conditions define a recipe for optical metrology measurements of the metrology sub-system. The controller then provides the recipe to the metrology sub-system for execution of one or more optical metrology measurements of one or more additional metrology targets.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: June 14, 2022
    Assignee: KLA Corporation
    Inventors: Gil Drachuck, Tom Leviant, David Gready
  • Patent number: 11353800
    Abstract: An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: June 7, 2022
    Assignee: Onto Innovation Inc.
    Inventors: J. Casey Donaher, Edward J. Ficarra, Christopher J. McLaughlin
  • Patent number: 11347143
    Abstract: A method for cleaning a reflective photomask is provided. The method includes: disposing the reflective photomask in a chamber; providing hydrogen radicals to the chamber; and exposing the reflective photomask to the hydrogen radicals. A method of manufacturing a semiconductor structure and system for forming a semiconductor structure are also provided.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: May 31, 2022
    Inventors: Wu-Hung Ko, Chung-Hung Lin, Chih-Wei Wen
  • Patent number: 11340533
    Abstract: The inventive concept provides a substrate treating apparatus and a substrate treating method. The sub substrate treating apparatus may include a support unit that supports a substrate, a liquid supply unit that supplies a liquid onto the substrate supported by the support unit, and a controller that controls the liquid supply unit and the support unit, the liquid supply unit may include a pre-treatment nozzle that discharges a first treatment liquid in a stream scheme, and a main nozzle that discharges a second treatment liquid in a liquid curtain scheme, and the controller may control the support unit such that a rotational direction of the substrate when the first treatment liquid is discharged from the main nozzle and a rotational direction of the substrate when the second treatment liquid is discharged from the pre-treatment nozzle are opposite to each other.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: May 24, 2022
    Assignee: Semes Co., Ltd.
    Inventors: Min Jung Park, Jung Yul Lee, Choongki Min, Kyungjin Seo
  • Patent number: 11320314
    Abstract: A method and an apparatus for determining the heating state of an optical element in a microlithographic optical system involves at least one contactless sensor which is based on the reception of electromagnetic radiation from the optical element. The radiation range captured by the sensor is varied for the purposes of ascertaining a temperature distribution in the optical element.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: May 3, 2022
    Assignees: Carl Zeiss SMT GmbH
    Inventors: Toralf Gruner, Joachim Hartjes, Markus Hauf, Gerhard Beurer
  • Patent number: 11320737
    Abstract: According to aspects of the embodiments, there is provided a method of measuring the amount of fountain solution using a hot wire anemometer. Fountain solution thickness is measured using the flow rate of vaporized fountain solution and comparing to baseline air only flow rate. The vaporized measurement is correlated with the baseline utilizing specific heat, density and enthalpy values and keeping velocity of fluid constant. Changes in the measurement will then be related to the specific heat, density and enthalpy. Density can be back calculated to yield volume and knowing the area of the image being printed give a real time thickness value.
    Type: Grant
    Filed: December 30, 2020
    Date of Patent: May 3, 2022
    Assignee: Xerox Corporation
    Inventors: Christopher Mieney, David A. Vankouwenberg, Martin L. Frachioni, David M. Gurak, Stuart A. Schweid
  • Patent number: 11320747
    Abstract: Photolithography apparatus includes a radiation source, a mask to modify radiation from the radiation source so the radiation exposes photoresist layer disposed on a semiconductor substrate in patternwise manner, a wafer stage, and a controller. The wafer stage supports the semiconductor substrate. The controller determines target total exposure dose for the photoresist layer and target focus position for the photoresist layer; and controls exposure of first portion of the photoresist layer to first exposure dose of radiation at first focus position using first portion of the mask, moving the semiconductor substrate relative to the mask; and exposure of the first portion of the photoresist layer to second exposure dose of radiation using second portion of the mask at second focus position, and exposure of second portion of the photoresist layer to the second exposure dose at the second focus position using the first portion of the mask.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: May 3, 2022
    Inventors: Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou, Chin-Hsiang Lin
  • Patent number: 11320749
    Abstract: An actuator device for aligning an element includes at least one first actuator unit, which is secured to a support structure, for a first setting range and a second actuator unit, which is able to be secured to the element, for a second setting range. The second actuator unit is connected to an output element of the first actuator unit so that the positioning of the second actuator unit is adjustable by an adjustment of the output element. The first actuator unit has an adjusting element and a fixing element, which is able to be secured to the support structure. The fixing element secures the output element in a force-locking manner in an operating state of the element. The fixing element is furthermore configured to release the force-locking connection in a setting state of the element to enable an adjustment of the output element via the adjusting element.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: May 3, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Boaz Pnini
  • Patent number: 11313758
    Abstract: An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The techniques described use relatively simple optical detectors and data acquisition electronics that are capable of monitoring the distortion in real time, during operation of the lithography equipment. Time-varying anisotropic distortion of a reticle can be measured by directing slit patterns of light having different orientations to the reticle and detecting reflected, transmitted or diffracted light from the reticle. In one example, corresponding segments of successive time measurements of secondary light signals are compared as the reticle scans a substrate at a reticle stage speed of about 1 m/s to detect temporal offsets and other features that correspond to spatial distortion.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: April 26, 2022
    Assignee: Nikon Corporation
    Inventor: Michael Sogard
  • Patent number: 11307502
    Abstract: Embodiments and implementations of the present disclosure provide assistant pattern configuration methods, masks and forming methods thereof, and related devices.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: April 19, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Feng Bai, Wanjuan Zhang, Yibin Huang, Yao Xu, Fan Zhang
  • Patent number: 11300714
    Abstract: The present invention provides a photo-substrate for printing of lenticular images that comprises a lenticular lens array, and an energy-reactive material adhered to the backside of the lenticular lens array. According to the methods of the present invention, the lenticular image is printed directly through the lenticular lens array onto the energy-reactive material, using, for example, collimated light or laser. The photo-substrate of the present invention can be adapted for large scale or industrial production to print lenticular images on a wide array of substrates, including such things as packaging and clothing.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: April 12, 2022
    Assignee: Sun Chemical Corporation
    Inventors: Bo Sun, Jerome Moyer, Philippe Schottland, Danny Rich
  • Patent number: 11294292
    Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: April 5, 2022
    Inventors: Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Chia-Jen Chen, Hsin-Chang Lee
  • Patent number: 11287750
    Abstract: A lithographic apparatus includes a machine table, a base, a placement table, a first baffle plate, a first driving device, and a transporting device. The machine table has a cavity formed by a side surface, a top surface, and a bottom surface. A conveying door is arranged on the side surface. A transferring device in the cavity can extend out from or retract back into the cavity through the conveying door. The placement table is configured to bear a mask carrier, and can at least extend out from or retract back to a bearing surface of the base. The first driving device is configured to drive the placement table to reciprocate between a first position and a second position.
    Type: Grant
    Filed: August 18, 2021
    Date of Patent: March 29, 2022
    Inventor: Shuping Li
  • Patent number: 11287749
    Abstract: A mask chuck may include a base plate including a central region and an edge region surrounding the central region, a head part including a first surface connected to the edge region of the base plate and configured to move on the edge region to be close to the central region or away from the central region, and a pad part disposed on a second surface of the head part opposite to the first surface of the head part. The edge region may include a first edge region extending in a first direction, a second edge region extending in the first direction and spaced apart from the first edge region in a second direction crossing the first direction, a third edge region extending in the second direction, and a fourth edge region extending in the second direction and spaced apart from the third edge region in the first direction.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: March 29, 2022
    Inventors: Junho Jo, Youngho Park, Seungyong Song, Youngchul Lee, Youngsuck Choi
  • Patent number: 11287753
    Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.
    Type: Grant
    Filed: January 22, 2019
    Date of Patent: March 29, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Marcus Adrianus Van de Kerkhof
  • Patent number: 11281105
    Abstract: The invention provides a light generating method and system, the method including: generating first light, the first light being capable of forming a first area, a second area, and a third area, and intensity of the first light in the first area being higher than that in the second area and the third area, respectively; generating second light, the second light being capable of simultaneously irradiating the first area and the second area; generating third light, the third light being capable of simultaneously irradiating the first area and the third area; and controlling intensity of the second light and the third light, respectively.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: March 22, 2022
    Assignee: Shanghai Bixiufu Enterprise Management Co., Ltd.
    Inventors: Lijiang Wang, Wei Wang, Song Zhu
  • Patent number: 11281113
    Abstract: A method for determining a stack configuration for a substrate subjected to a patterning process. The method includes obtaining (i) measurement data of a stack configuration with location information on a printed substrate, (ii) a substrate model configured to predict a stack characteristic based on a location of the substrate, and (iii) a stack map including a plurality of stack configurations based on the substrate model. The method iteratively determines values of model parameters of the substrate model based on a fitting between the measurement data and the plurality of stack configurations of the stack map, and predicts an optimum stack configuration at a particular location based on the substrate model using the values of the model parameters.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: March 22, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Danying Li, Chi-Hsiang Fan, Abdalmohsen Elmalk, Youping Zhang, Jay Jianhui Chen, Kui-Jun Huang
  • Patent number: 11275312
    Abstract: The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: March 15, 2022
    Assignee: Waymo LLC
    Inventors: James Dunphy, Hongqin Shi, David Hutchison, Yeh-Jiun Tung, Eric Copenhaver, Nao Chuei
  • Patent number: 11275310
    Abstract: In one embodiment, a semiconductor manufacturing apparatus includes a stage on which a substrate is to be installed. The apparatus further includes a light source configured to generate light. The apparatus further includes a shaper including a rotating portion provided with an opening configured to shape the light from the light source, the shaper being configured to irradiate a photomask with the light which has passed through the opening. The apparatus further includes a controller configured to change a width of the light passing through the opening by rotating the rotating portion while scanning the substrate by the light which has passed through the photomask.
    Type: Grant
    Filed: December 9, 2020
    Date of Patent: March 15, 2022
    Assignee: Kioxia Corporation
    Inventor: Sho Kawadahara
  • Patent number: 11275313
    Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: March 15, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Paul William Scholtes-Van Eijk, Ronald Franciscus Herman Hugers