Abstract: A system for defining flexible regions on a sample is disclosed. The system includes an inspection system configured to acquire one or more swath images. The system includes a controller communicatively coupled to the inspection system, the controller configured to: generate one or more median reference die (MRD) images based on the one or more swath images; generate one or more flexible region masks based on the one or more MRD images; identify a set of alignment sites on the one or more flexible region masks based on one or more coordinates of the one or more MRD images; perform patch-to-mask alignment between the one or more flexible region masks and one or more scan images by aligning the scan images and the one or more MRD images at the identified set of alignment sites; and position the one or more flexible region masks on the scan images.

Abstract: A precision edge detection system and sensor assembly is provided that uses a reflection technique to provide an energy efficient device that can be achieved using a relatively small form factor. There is provided an optical reflective sensor assembly that includes a light source, an optical element positioned to collimate and focus light from the light source to generate a focused beam, and at least one photodetector positioned adjacent the light source. The at least one photodetector is configured to detect light from the focused beam that has been reflected by an object positioned opposite the light source.

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: Methods and apparatus (100) for profiling a beam of a light emitting semiconductor device. The apparatus comprises a light emitting semiconductor device (102) comprising an active region (108) formed on a substrate (104) and configured to generate light when a suitable electrical current is applied to contacts on an upper surface of the device and a light emitting surface (110) defined by a lower surface of the substrate opposite the contacts. The apparatus further comprises a transmission medium (112) comprising a first surface (114) in contact with at least part of the light emitting surface of the semiconductor device and a diffusion surface (116), opposite the first surface, and configured to diffuse light emitted from the micro-LED and transmitted through the transmission medium.

Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.

Abstract: A substrate has first and second target structures formed thereon by a lithographic process. Each target structure has two-dimensional periodic structure formed in a single material layer on a substrate using first and second lithographic steps, wherein, in the first target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a first bias amount that is close to one half of a spatial period of the features formed in the first lithographic step, and, in the second target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a second bias amount close to one half of said spatial period and different to the first bias amount.

Abstract: A high-resolution real-time time-frequency domain measuring device includes a light splitting unit used to split signal light to be measured, a time lens unit used to perform time domain amplification on the signal light to be measured, a dispersion Fourier transform unit used to perform Fourier transform on the signal light to be measured, and a detection unit used to receive and detect measured data. The time lens and the dispersion Fourier transform technology are used to realize the real-time measurement of sub-picosecond transient characteristics of the ultra-short pulse to accurately obtain the time-frequency domain information of the ultra-short pulse.

Abstract: Systems for detecting light (e.g., in a flow stream) are described. Light detection systems according to embodiments include two or more photodetector arrays and an optical adjustment component positioned in an optical path between the photodetector arrays. Systems and methods for measuring light emitted by a sample (e.g., in a flow stream) and kits having two or more photodetector arrays and an optical adjustment component are also provided.

Abstract: The invention relates to a device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography, comprising an optical element, a diffractive structure which has a locally varying grating period, and an intensity sensor arrangement, wherein electromagnetic radiation diffracted at the diffractive structure during operation of the optical system, in at least one order of diffraction, is directed to the intensity sensor arrangement by way of total internal reflection effected in the optical element.

Abstract: The device is formed in a casing including a support, a spacer body, and a mirror element fixed together. A light-emitting element and a light-receiving element are arranged on a bearing surface of the support and face a reflecting surface of the mirror element. The light-emitting element is configured to generate infrared radiation, and the light-receiving element is configured to receive light radiation reflected by the reflecting surface. The spacer body has an emission opening housing the light-emitting element and a reception opening housing the light-receiving element; the reception opening comprises a radiation-limitation portion configured to enable entry of reflected light radiation having an angle, with respect to a normal to the bearing surface, of less than a preset value.

Abstract: A focal-length measuring apparatus for a sub-wavelength optical imaging device includes a laser, a beam-expanding and collimating system, a sub-wavelength optical imaging device, and a nanoscale stepped height standard sample block. The nanoscale stepped height standard sample block is connected to a power device, and the power device is connected to a computer control system. The nanoscale stepped height standard sample block is coated with a photoresist and includes a plurality of steps arranged at equal intervals Among all the steps, the heights of the steps gradually increase from a middle step to an upper side, and the values of the corresponding focal lengths decrease. While, the heights of the steps gradually decrease from the middle step to a lower side, and values of corresponding focal lengths increase. A wavelength of the laser is equal to a designed wavelength of an input light source of the sub-wavelength optical imaging device.

Abstract: A particle detector formed by a body defining a chamber and housing a light source and a photodetector. A reflecting surface is formed by a first reflecting region and a second reflecting region that have a respective curved shape. The curved shapes are chosen from among portions of ellipsoidal, paraboloidal, and spherical surfaces. The first reflecting region faces the light source and the second reflecting region faces the photodetector. The first reflecting region has an own first focus, and the second reflecting region has an own first focus. The first focus of the first reflecting region is arranged in an active volume of the body, designed for detecting particles, and the photodetector is arranged on the first focus of the second reflecting region.

Abstract: A hydrogen storage metal is disposed on a base material in a predetermined shape and a predetermined size such that hydrogen is detected based on surface plasmon resonance induced by incident light. The hydrogen storage metal is formed of a film body containing palladium and a noble metal. A spectrum of the light having passed through the hydrogen storage metal in which hydrogen is stored has a peak in a wavelength band separated from an absorption spectrum C1 of carbon dioxide with respect to the light and an absorption spectra H1 to H3 of water with respect to the light.

Abstract: Correction information is acquired for compensating for a measurement error of a second encoder system that occurs due to a displacement between four sections of a scale member of the second encoder system, based on measurement information of the second encoder system obtained in a fifth area in which four heads of the second encoder system that are provided on a second stage, which holds a substrate, respectively face the four sections of the scale member.

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

Abstract: A method and an apparatus for beam analysis in an optical system are disclosed, wherein a plurality of beam parameters of a beam propagating along an optical axis are ascertained. The method includes: splitting the beam into a plurality of partial beams which have a focus offset in the longitudinal direction in relation to the optical axis; recording a measurement image produced by these partial beams; carrying out a forward simulation of the beam in the optical system on the basis of estimated initial values for the beam parameters in order to obtain a simulated image; and calculating a set of values for the beam parameters on the basis of the comparison between the simulated image and the measurement image.

Abstract: A generalized feed-forward method for accurate tunable laser absorption spectroscopy includes generating a laser beam. The generated laser beam is directed down a reference path and a test/sample path. One or more parameters are extracted from the reference path. The one or more parameters, extracted from the reference path, are used as feed-forward, to adjust spectral analysis of the test/sample path to detect a composition and/or concentration of an analyte gas within the test/sample path. The extraction of the one or more parameters from the reference path and the spectral analysis of the test/sample path are performed substantially concurrently.

Abstract: The apparatus includes a standard computer processor in operation receiving a plurality of stimulus-value signals. The apparatus includes a standard computer-readable medium storing instructions that, when executed by the processor, cause the processor to carry out a method for identifying at least one chemical of interest. The method includes the following. A chromaticity chart including a plurality of chemical groupings is generated. The at least one chemical of interest is classified as belonging to a respective chemical grouping of the plurality of chemical groupings based on the chromaticity chart and the plurality of stimulus-value signals. Optionally, the chromaticity chart includes a molecular vibrational chart.

Abstract: An embodiment provides a method, including: obtaining, from a multi-sensor pipe inspection robot that traverses through the interior of a pipe, sensor data, such as structured laser light sensor data and Light Detection and Ranging (LIDAR) sensor data, for the interior of the pipe; identifying a pipe feature using one or more of the sensor data types; selecting an image processing technique based on the pipe feature identified using a stored association between the pipe feature and an image processing technique; and forming an image of the interior of the pipe by implementing the selected image processing technique. Other embodiments are described and claimed.

Abstract: Disclosed embodiments may relate generally to a micro airflow generator which does not use fan(s) or a heater to generate airflow (for example in a compact optical PM sensor). Rather, disclosed embodiments typically may use induced movement of a membrane/diaphragm element to generate air flow (wherein movement of the membrane in turn induces movement in air). For example, a membrane or diaphragm element could be driven by an (electronic) actuator element, such as an electro-magnetic actuator or piezo disc bender (or some other means of vibrating/moving the membrane element in a way which induced airflow). In some embodiments, the electro-magnetic actuator itself may include a membrane (such that the electro-magnetic actuator might encompass the membrane and the electronic actuator element, such as a magnet and corresponding coil) and/or the piezo disc bender might serve as both the membrane/diaphragm and the electronic actuator element.