Patents Examined by Jack Berman
  • Patent number: 8989345
    Abstract: Disclosed are a method for evaluating a local density profile in a carbon/carbon material and a method for producing a standard density test block capable of quantitatively evaluating the density profile in the carbon/carbon material, wherein the method for evaluating the density profile includes a first step of preparing a standard density test block to be inserted in the carbon/carbon material, wherein the standard density test block is produced by using the same type of material as the carbon/carbon material and thereafter inserted in the carbon/carbon material, a second step of radiating X-rays onto the carbon/carbon material having the standard density test block inserted so as to obtain and correct computed tomographic image, and a third step of measuring a physical density by use of a linear attenuation coefficient of the computed tomographic image, whereby the local density profile can accurately be evaluated by use of a nondestructive testing and additionally such method can be utilized as an excelle
    Type: Grant
    Filed: July 12, 2010
    Date of Patent: March 24, 2015
    Assignee: Agency for Defense Development
    Inventors: Dong Ryun Kim, Nam Gyun Yun
  • Patent number: 8987681
    Abstract: A method for ionizing, using pulses of ionization radiation, an analyte to be examined by way of ion mobility spectrometry using a pulse sequence is modulated with a known time-variable impression pattern is provided. An ionization device for carrying out the method and an ion mobility spectrometry method and an ion mobility spectrometry device that use the ionization method and/or the ionization device are also provided.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: March 24, 2015
    Assignee: EADS Deutschland GmbH
    Inventors: Johann Goebel, Andreas Langmeier, Matthias Kessler
  • Patent number: 8989353
    Abstract: A conductive substrate (18) and an etching substrate (20) are bonded to each other. An etch mask (25) is formed on the etching substrate (20) using a photolithography technique. On the etching substrate (20), grooves (20a) and X-ray transmitting sections (14b) are formed by dry etching using Bosch process. The grooves (20a) are filled with Au (27) by an electroplating method using the conductive substrate (18) as an electrode. Thus, X-ray absorbing sections (14a) are formed.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: March 24, 2015
    Assignee: Fujifilm Corporation
    Inventor: Yasuhisa Kaneko
  • Patent number: 8981316
    Abstract: A system and method for sterilization of medical devices includes methods for reducing the variance in dose levels over the medical device by either varying the dose levels for each pass before a radiation source, such as an electron beam, or by increasing the number of passes before a radiation source.
    Type: Grant
    Filed: April 2, 2010
    Date of Patent: March 17, 2015
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Gregory Scott Simmons, Brian Riggs
  • Patent number: 8975580
    Abstract: An orthogonal pulse accelerator for a Time-of-Flight mass analyzer includes an electrically-conductive first plate extending in a first plane, and a second plate spaced from the first plate. The second plate includes a grid that defines a plurality of apertures each having a first dimension extending in a first direction and a second dimension orthogonal to the first dimension, the first and second dimensions lying in the second plane and the second dimension begin larger than the first dimension. The first and second plates are positioned in the Time-of-Flight mass analyzer to receive, during operation of the mass analyzer, an ion beam propagating in the first direction in a region between the first and second plates, and the orthogonal pulse accelerator directs ions in the ion beam through the apertures.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 10, 2015
    Assignee: PerkinElmer Health Sciences, Inc.
    Inventor: David G. Welkie
  • Patent number: 8978161
    Abstract: A mechanism is provided for sequencing a biopolymer. The biopolymer is traversed from a first medium to a second medium. The biopolymer includes bases. As the biopolymer traverses from the first medium to the second medium, different forces are measured corresponding to each of the bases. The bases are distinguished from one another according to the different measured forces which are measured for each of the bases.
    Type: Grant
    Filed: June 11, 2013
    Date of Patent: March 10, 2015
    Assignee: International Business Machines Corporation
    Inventors: Venkat K. Balagurusamy, Stanislav Polonsky
  • Patent number: 8975596
    Abstract: Water purifying drink containers include a liquid container, a cap assembly removably coupled to the liquid container, and a purification assembly that emits ultraviolet (UV) light in the germicidal spectrum to purify a volume of drink liquid held in the liquid container. In some embodiments, the purification assembly includes a UV bulb positioned within a recess of the cap assembly facing the internal compartment of the liquid container. In some embodiments, the UV bulb further emits light in the visible spectrum and the drink container includes an indicator that becomes illuminated with visible light to indicate to a user when the UV bulb is emitting UV light.
    Type: Grant
    Filed: July 20, 2012
    Date of Patent: March 10, 2015
    Assignee: Meridian Design, Inc.
    Inventors: Dan Richard Matthews, Kurt Kuhlmann
  • Patent number: 8975579
    Abstract: A mass spectrometer having a mass filter which applies a transient voltage profile to accelerate ion packets. The voltage profile is chosen to have a functional form which imparts each ion species with a kinetic energy which is larger the larger the mass-to-charge ratio and a velocity which is smaller the larger the mass-to-charge ratio. The ions are detected in an ion detector which discriminates between different ion species based on their kinetic energy and taking account of the functional form of the voltage profile. Suitable voltage profiles include periodic functions such as sinusoids, triangles and sawtooths, which allow the amplification of drive pulses in the mass filter to be carried out with narrow band amplification stages, which are simple and inexpensive to construct.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: March 10, 2015
    Assignee: Ilika Technologies Limited
    Inventors: David Bream, Christopher Newman, Brian Christopher Webb
  • Patent number: 8969799
    Abstract: A mass spectrometer is disclosed comprising a time of flight mass analyzer. The time of flight mass analyzer comprises an ion guide comprising a plurality of electrodes which are interconnected by a series of resistors forming a potential divider. Ions are confined radially within the ion guide by the application of a two-phase RF voltage to the electrodes. A single phase additional RF voltage is applied across the potential divider so that an inhomogeneous pseudo-potential force is maintained along the length of the ion guide.
    Type: Grant
    Filed: November 14, 2013
    Date of Patent: March 3, 2015
    Assignee: Micromass UK Limited
    Inventors: Martin Raymond Green, Jason Lee Wildgoose
  • Patent number: 8970125
    Abstract: In a memory unit 6, there is stored a correction table for each candidate value of an output set value of each of LED units 2. If UV rays have ever been emitted so far by the LED units 2, each of which is formed of a plurality of LED chips 8, then a PLC 5 acquires, upon setting of a output set value by an operation unit 53, a correction value corresponding to a cumulative emission time up to a previous emission, from the correction table of the output set value. Thereafter, the PLC 5 sets the magnitude of the power supplied to each of the LED units 2 using the acquired correction value. If an output set value different from a previous output set value is set, the PLC 5 obtains the correction value starting from the cumulative emission time upon modification. As a result, the UV irradiation apparatus enables power consumption necessary for emission of UV rays to be reduced, and UV ray output to be kept constant regardless of the cumulative emission time, even if the output set value is modified.
    Type: Grant
    Filed: December 2, 2009
    Date of Patent: March 3, 2015
    Assignee: Panasonic Industrial Devices Sunx Co., Ltd.
    Inventors: Tsuyoshi Inui, Hideo Kado
  • Patent number: 8963107
    Abstract: Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: February 24, 2015
    Assignee: Axcelis Technologies, Inc.
    Inventors: Edward C. Eisner, Bo H. Vanderberg
  • Patent number: 8963078
    Abstract: The present invention provides an ion group irradiation device which includes: an ion source which generates an ion; and an ion group selecting unit which selects an ion group containing a cluster ion from ions released from the ion source, in an ion group irradiation device for irradiating a sample with the ion group, wherein the ion source has a pressure gradient forming unit for changing a pressure with which a material of the cluster ion is jetted, with time, the ion group selecting unit has a chopper which performs a chopping operation of selecting the ion group by passing and blocking the cluster ions in a traveling direction by the opening and closing of the chopper, and the chopper performs two or more times of the chopping operations per one time of a pressure gradient forming operation by the pressure gradient forming unit.
    Type: Grant
    Filed: June 18, 2014
    Date of Patent: February 24, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yohei Murayama, Kota Iwasaki, Masafumi Kyogaku
  • Patent number: 8963111
    Abstract: The present invention relates to a method for obtaining a shielding element for minimizing the penumbra of a beam of hadrons outside a target area, the hadron beam being guided in a longitudinal direction by an irradiation unit, and the beam having a width (?). The method includes: (i) defining a closed or open contour of said target area; (ii) providing a block having a longitudinal thickness capable of blocking the passage of said beam and having a lateral surface perpendicular to said longitudinal thickness; (iii) forming an aperture of a shape similar to said contour and crossing said longitudinal thickness of said block for letting through said beam, said aperture forming a longitudinal internal surface; and (iv) trimming said block so as to form a longitudinal external surface around said longitudinal internals surface, said longitudinal internal and longitudinal external surfaces delimiting a side wall.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: February 24, 2015
    Assignee: Ion Beam Applications S.A.
    Inventors: Yves Claereboudt, Thomas Colmant, Michel Closset
  • Patent number: 8963110
    Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: February 24, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Layton Hale, Francis Chilese, Qiang Q. Zhang
  • Patent number: 8957371
    Abstract: Producing images of a specimen includes introducing a specimen into a specimen chamber of a particle-beam device, selecting a specific position on the surface of the specimen, supplying a contrast-agent precursor on the specific position, providing a particle beam and/or a light beam, guiding the particle beam and/or the light beam onto the specific position, applying a contrast-agent layer to the specific position as a result of the interaction of the particle beam and/or the light beam with the contrast-agent precursor, leaving the contrast-agent layer on the surface of the specimen for a predetermined amount of time. During the predetermined amount of time, a first part of the contrast-agent layer diffuses into the specimen and a second part of the contrast-agent layer remains on the surface of the specimen. The specimen is imaged using an optical device and/or a particle-optical device and/or using the particle beam.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: February 17, 2015
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Elke Haustein, Wolfram Bühler, Camille Stebler, Holger Dömer
  • Patent number: 8957393
    Abstract: A scanning power source that outputs the excitation current for a scanning electromagnet and an irradiation control apparatus that controls the scanning power source; the irradiation control apparatus is provided with a scanning electromagnet command value learning generator that evaluates the result of a run-through, which is a series of irradiation operations through a command value for the excitation current outputted from the scanning power source, that updates the command value for the excitation current, when the result of the evaluation does not satisfy a predetermined condition, so as to perform the run-through, and that outputs to the scanning power source the command value for the excitation current such that its evaluation result has satisfied the predetermined condition.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: February 17, 2015
    Assignee: Mitsubishi Electric Corporation
    Inventor: Takaaki Iwata
  • Patent number: 8957394
    Abstract: One embodiment relates to a high-voltage electron gun including an insulator stand-off having a resistive layer. The resistive layer is at least on an interior surface of the insulator stand-off. A cathode holder is coupled to one end of the insulator 115 stand-off, and an anode is coupled to the other end. The resistive layer advantageously increases the surface breakdown field strength for the insulator stand-off and so enables a compact design for the high-voltage electron gun. Other embodiments, aspects and feature are also disclosed.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: February 17, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Alan D. Brodie, Joseph Maurino, Mark A. McCord, Paul F. Petric
  • Patent number: 8957389
    Abstract: There is provided an electromagnetic lens which includes an electromagnetic coil wound to be rotationally symmetrical about an optical axis of an electron beam, and a pole piece covering the electromagnetic coil, in which: a gap is integrally formed in either one of an inner wall formed at an inner circumference side of the pole piece and a lower end wall formed in an end portion at an emission side of the electron beam, or a boundary portion between the two walls; the inner wall is formed to be thinnest at a portion close to the gap and to gradually become thicker as a distance from the gap increases; and the electromagnetic lens is formed such that a width in a radial direction thereof is more increased as being closer to the gap along with the change of the thickness of the inner wall.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: February 17, 2015
    Assignee: Advantest Corp.
    Inventor: Akio Yamada
  • Patent number: 8952342
    Abstract: The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: February 10, 2015
    Assignee: Mapper Lithography IP B.V.
    Inventors: Jerry Peijster, Aditya Mehendale, Andre Johannes Maria Hilderink
  • Patent number: 8952346
    Abstract: The subject matter described herein provides methods for developing an IMRT treatment plan for a radiotherapy system. In one aspect, the method can include providing initial treatment parameters. These parameters can include a number of isotopic beams, a transmission angle for each beam, a prescribed dose for a target, and dose volume histogram constraints. The method can further include determining an initial fluence map including one or more beamlets. The initial fluence map can specify a fluence value for each beamlet. The method can further include determining a delivery sequence for the fluence values in the initial fluence map. The delivery sequence can include one or more apertures formed by the leaves of a collimator. These apertures can have a specified size constrained to substantially less than a maximum size associated with the collimator, when the isotopic beam is near a critical structure. Related apparatus and systems are also described.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: February 10, 2015
    Assignee: ViewRay Incorporated
    Inventors: James F. Dempsey, Iwan Kawrykow