Patents Examined by James Beyer
  • Patent number: 5594243
    Abstract: A laser desorption ionization instrument for measuring the molecular weight of large organic molecules includes a time of flight (TOF) mass spectrometer. The time of flight mass spectrometer includes a sample lock for holding, under vacuum, a plurality of samples to be analyzed. A sample may be inserted into and removed from the sample lock and into the mass spectrometer without breaking vacuum in the spectrometer. Signal processing electronics of the LDIM instrument include means for identifying quasi-molecular species of a molecule being measured. The instrument includes improvements in ion optics, microchannel plate detectors, laser irradiation of samples, and preparation of samples for measurement.
    Type: Grant
    Filed: March 4, 1993
    Date of Patent: January 14, 1997
    Assignee: Hewlett Packard Company
    Inventors: Scot R. Weinberger, Robert W. Egan, Thomas W. Hoppe, deceased, Ernst Gassmann, Martin M. Schar, Klaus O. Bornsen, E. Rocco Tarantino
  • Patent number: 5574280
    Abstract: A sample semiconductor device which is processed and/or observed with the focused liquid metal ion beam can be returned again to the manufacturing process in this invention. The metal ions used in this apparatus are generally Ga ions. Ga ions contaminate a semiconductor device and a semiconductor manufacturing apparatus by auto-doping. An area which is irradiated with a focused liquid metal ion is doped by the metal ions which are subsequently removed by irradiation with a gas ion beam or covered by hard fusing metal.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: November 12, 1996
    Assignee: Seiko Instruments Inc.
    Inventors: Toshiaki Fujii, Tatsuya Adachi
  • Patent number: 5532495
    Abstract: A method and apparatus for treating material surfaces using a repetitively pulsed ion beam. In particular, a method of treating magnetic material surfaces in order to reduce surface defects, and produce amorphous fine grained magnetic material with properties that can be tailored by adjusting treatment parameters of a pulsed ion beam. In addition to a method of surface treating materials for wear and corrosion resistance using pulsed particle ion beams.
    Type: Grant
    Filed: October 4, 1994
    Date of Patent: July 2, 1996
    Assignee: Sandia Corporation
    Inventors: Douglas D. Bloomquist, Rudy Buchheit, John B. Greenly, Dale C. McIntyre, Eugene L. Neau, Regan W. Stinnett
  • Patent number: 5504335
    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described.
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: April 2, 1996
    Assignee: Trojan Technologies, Inc.
    Inventor: Jan M. Maarschalkerweerd
  • Patent number: 5504327
    Abstract: An improved electrospray ionization (ESI) system source and method is presented including an electrospray ionization source for introducing an ionized molecular sample into a mass spectrometer for analysis. The ESI source is constructed in the configuration of a probe that makes use of a standard 0.5 inch (13 mm) vacuum lock commonly found on conventional mass spectrometers. The ESI probe comprises a desolvation tube, a voltage source for applying a voltage to the desolvation tube, a resistance coil for heating the desolvation tube, a sensor for measuring the temperature of the desolvation tube, a skimmer positioned downstream of the desolvation tube for directing the ions to the lens stack of the mass spectrometer, a voltage source for applying a voltage to the skimmer, a spacer lens positioned upstream of the skimmer for focusing the ions prior to their entering the skimmer, and an evacuable dielectric encasement for housing the components of the probe assembly.
    Type: Grant
    Filed: November 4, 1993
    Date of Patent: April 2, 1996
    Assignee: hv ops, Inc. (h-nu)
    Inventors: Norman Sproch, Terry L. Kruger
  • Patent number: 5486702
    Abstract: During ion implantation, beam heating of the substrates must be reduced to eliminate self-annealing of the wafers during implant and to eliminate damager to masking materials, principally photoresist, that is mounted on the surface of the wafers. In this work, we describe a technique which may be used with both single-wafer and batch ion implantation systems to reduce transient wafer temperatures during implant.
    Type: Grant
    Filed: September 21, 1993
    Date of Patent: January 23, 1996
    Assignee: Genus, Inc.
    Inventors: John P. O'Connor, John W. Smith
  • Patent number: 5481117
    Abstract: A shipping container is provided for a hexagonal nuclear fuel assembly including a top nozzle having a top end, an outer barrel, an external shoulder, and an inner barrel; a plurality of grids which support fuel rods; and a bottom nozzle having an internal shoulder within a recess, a spherical taper, and a bottom end. The container may include a housing, a support for the fuel assembly, a top nozzle holder secured to the support, plural grid supports secured to the support, plural clamping frames for clamping the grids, plural guide plates for guiding the fuel assembly between adjacent grid supports, and a bottom nozzle holder secured to the support. The top nozzle holder may include a shoulder holder for holding the external shoulder, an end holder for enclosing and holding the top end, and a shoulder clamp for clamping the shoulder holder to the support.
    Type: Grant
    Filed: September 1, 1994
    Date of Patent: January 2, 1996
    Assignee: Westinghouse Electric Corporation
    Inventors: Charles B. Gilmore, Nick W. Hille
  • Patent number: 5477056
    Abstract: A small-sized circular accelerator capable of generating radiation of high brightness, an operation method of the circular accelerator, and a semiconductor irradiation system capable of using radiation of high brightness. An electron beam emitted from a pre-accelerator is injected to the inside of the storage ring by an injector, and accelerated and stored. Thereafter, each of insertion devices respectively disposed in linear orbit sections between main bending magnets and auxiliary bending magnets are excited to generate an alternating field therein. A meandering or spiral movement of the electron beam is caused by this alternating field. By superposing radiations emitted from vertexes of the meandering orbit or the spiral orbit, radiation having high brightness is generated.
    Type: Grant
    Filed: August 6, 1993
    Date of Patent: December 19, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Junichi Hirota, Kazuo Hiramoto, Masatsugu Nishi
  • Patent number: 5473165
    Abstract: Methods and apparatus for thermally altering the near surface characteristics of a material are described. In particular, a repetitively pulsed ion beam system comprising a high energy pulsed power source and an ion beam generator are described which are capable of producing single species high voltage ion beams (0.25-2.5 MeV) at 1-1000 kW average power and over extended operating cycles (10.sup.8). Irradiating materials with such high energy, repetitively pulsed ion beams can yield surface treatments including localized high temperature anneals to melting, both followed by rapid thermal quenching to ambient temperatures to achieve both novel and heretofore commercially unachievable physical characteristics in a near surface layer of material.
    Type: Grant
    Filed: November 16, 1993
    Date of Patent: December 5, 1995
    Inventors: Regan W. Stinnett, John B. Greenly
  • Patent number: 5471058
    Abstract: The invention provides an anesthesia monitor being able to directly make a separation and a determination in real time all components of a gas in which components having the same integer molecular weight exists, more particularly an expiration gas and an inspiration gas as the object of analysis. The monitor has a small size, a low price and a operational facility. A microscopic quantity of the expiration gas is introduced from a circular route of an anesthesia circuit for an inhalation anesthesia to the anesthesia monitor through a material pipe-line. A gas portion is transmitted by a rotary pump through valves and opening and closing valves to a measurement cell within a vacuum chamber arranged in a gap of between magnetic poles of permanent magnets in a Fourier transformation mass analyzer so that the expiration gas is subjected to a high speed sampling. An ionization of the ions is carried out within the measurement cell.
    Type: Grant
    Filed: January 27, 1993
    Date of Patent: November 28, 1995
    Assignee: Nikkiso Co., Ltd.
    Inventors: Kazuo Nakagawa, Yuichi Iritani, Hiromi Yamazaki, Yasushi Takakuwa
  • Patent number: 5471059
    Abstract: A multiple charged-particle detector system includes a plurality of charged-particle detector assemblies (10-12) which are each made up of a first arm (19-22) and a second arm (24-27) extending at an angle to each other. Charged particles (4-7) enter an aperture (14-18) at the entrance of the first arm (19-22) of each detector assembly (10-12) and strike a dynode (30-33) positioned at the intersection of the two arms causing electrons to be emitted by the dynode (30-33). Some of the electrons pass into the second arms (24-27) of the detector assemblies (10-12) and are detected by a continuous-dynode electron multiplier (35-38). The first arms (19-22) are narrower than the detectors (35-38), and the detector assemblies (10-12) are arranged in such a way that the minimum separation at which charged-particle beams (4-7) can be detected is determined by the widths of the said first arms (19-22) of the detector assemblies (10-12), and not by the widths of the detectors (35-38) themselves.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: November 28, 1995
    Assignee: Fisons PLC
    Inventors: Philip A. Freedman, Edward F. H. Hall
  • Patent number: 5471063
    Abstract: A fluid disinfection unit comprising a fluid treatment housing, an electrical supply module and electrical connection means connecting the fluid treatment housing and the electrical supply module;the fluid treatment housing comprising a fluid inlet and a fluid outlet in communication with a reaction chamber, an ultraviolet radiation lamp disposed in the reaction chamber and having a first electrical connection receiving means at a first end thereof and a second end thereof being closed, the second end of the ultraviolet radiation lamp being received and held in place by fixture means;the electrical supply module comprising ballast means and a second electrical connection receiving means; andthe electrical connection means comprising lamp receptacle connector means at one end thereof for removable connection to the ultraviolet radiation lamp and electrical connection receiving means for connection to the electrical supply module.
    Type: Grant
    Filed: January 13, 1994
    Date of Patent: November 28, 1995
    Assignee: Trojan Technologies, Inc.
    Inventors: Stewart J. Hayes, Richard Pearcey, Philip T. White
  • Patent number: 5468959
    Abstract: A microscope comprises a cantilever having a distal end equipped with an electrically conductive probe allowing current to flow and having a fine tip whose voltage is controllable, a position control mechanism for controlling position of a sample with respect to a base end of the cantilever, a small displacement measuring mechanism for measuring a deflection amount of the cantilever, and a deflection control mechanism for controlling deflection of the cantilever so as to adjust a distance between the fine tip of the probe and the sample.
    Type: Grant
    Filed: March 18, 1994
    Date of Patent: November 21, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takao Tohda, Hiroyuki Kado, Shinichi Yamamoto
  • Patent number: 5468958
    Abstract: An ion trap is provided in which higher multipole field fractions can be switched on and off and, in addition, can be electrically tuned. Specifically, the electrodes of an ideally shaped ion trap are divided into rotationally symmetrical component electrodes positioned facing the interior of the ion trap on a hyperboloidal surface with rotationally symmetry.
    Type: Grant
    Filed: July 20, 1994
    Date of Patent: November 21, 1995
    Assignee: Bruker-Franzen Analytik GmbH
    Inventors: Jochen Franzen, Yang Wang
  • Patent number: 5468957
    Abstract: The invention relates to an improved method and an apparatus for the mass-sequential ejection of ions from an RF quadrupole ion trap by electrical alternating fields which are generated in addition to the quadrupolar RF storage field and with different frequencies to it. In contrast to the already known ejection by a pure dipole field, the ions are here essentially ejected by a quadrupole field. The ions leave the ion trap through a perforated end cap and can be detected outside it with conventional means. A weak dipole field undertakes only excitation of the secular oscillation at the center, the amplitude increasing in linear manner in the stationary case. The more intense quadrupole field undertakes further widening of the oscillations with exponential growth in amplitudes. The dipole field is generated by an alternating voltage between the two end caps, while the quadrupole field is generated by an alternating voltage between the end caps on the one hand and the ring electrode on the other.
    Type: Grant
    Filed: May 19, 1994
    Date of Patent: November 21, 1995
    Assignee: Bruker Franzen Analytik GmbH
    Inventor: Jochen Franzen
  • Patent number: 5468966
    Abstract: A tomographic technique for measuring the current density distribution in electron beams using electron beam profile data acquired from a modified Faraday cup to create an image of the current density in high and low power beams. The modified Faraday cup includes a narrow slit and is rotated by a stepper motor and can be moved in the x, y and z directions. The beam is swept across the slit perpendicular thereto and controlled by deflection coils, and the slit rotated such that waveforms are taken every few degrees form to and the waveforms are recorded by a digitizing storage oscilloscope. Two-dimensional and three-dimensional images of the current density distribution in the beam can be reconstructed by computer tomography from this information, providing quantitative information about the beam focus and alignment.
    Type: Grant
    Filed: August 1, 1994
    Date of Patent: November 21, 1995
    Assignee: Regents of the University of California
    Inventors: John W. Elmer, Alan T. Teruya, Dennis W. O'Brien
  • Patent number: 5468969
    Abstract: Electron beam lithography for exposure of a group of elemental openings in a collective-exposure shaping diaphragm is intended to correct the positional deviation of the group of elemental openings quickly and economically.A rectangular beam is formed by rectangle openings made in a rectangle forming diaphragm and a group of elemental openings in a collective-exposure shaping diaphragm and used for irradiating a reference mark on a workpiece stand. Electrons reflected from the reference mark are detected by a reflecting electron detector to calculate errors in the configuration and position of the rectangular beam. The results of calculation are fed back to a shaping deflector and a positioning deflector to correct errors in the configuration and position of the rectangular beam, respectively.
    Type: Grant
    Filed: November 17, 1993
    Date of Patent: November 21, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Itoh, Hideo Todokoro, Yasunari Sohda, Yoshinori Nakayama
  • Patent number: 5468967
    Abstract: A parabolic reflector and an inclined planar light reflector in a cathodoluminescence detector are integrated with a set of photo-sensitive solid-state detector cells mounted in quadrature on a supporting plate, and supported by an electron microscope vacuum chamber specimen stage adaptor unit. Designed for CL emission operation in an electron microscope, the parabolic light reflector, the inclined planar light reflector and the photo-sensitive, solid-state detector cells are optically aligned and mechanically combined through the supporting plate of the detector cells. A readily exchangeable unit is thus obtained. The unit is further supported by the specimen stage adaptor unit so as to obtain a mechanical unit which can easily be mounted in and removed from any standard electron microscope vacuum chamber stage as a single integrated unit.
    Type: Grant
    Filed: August 26, 1994
    Date of Patent: November 21, 1995
    Assignee: National University of Singapore
    Inventors: Daniel S. H. Chan, Kin Leong, Jacob C. H. Phang
  • Patent number: 5466931
    Abstract: A mass spectrometry method in which notch-filtered noise is applied to an ion trap to resonate all ions except selected parent ions out of the region of the trapping field. Preferably, the trapping field is a quadrupole trapping field defined by a ring electrode and a pair of end electrodes positioned symmetrically along a z-axis, and the filtered noise is applied to the ring electrode(rather than to the end electrodes) to eject unwanted ions in radial directions (toward the ring electrode) rather than toward a detector mounted along the z-axis. Application of the filtered noise to the trap in this manner can significantly increase the operating lifetime of such an ion detector. Also preferably, the trapping field has a DC component selected so that the trapping field has both a high frequency and low frequency cutoff, and is incapable of trapping ions with resonant frequency below the low frequency cutoff or above the high frequency cutoff.
    Type: Grant
    Filed: August 30, 1994
    Date of Patent: November 14, 1995
    Assignee: Teledyne ET a div. of Teledyne Industries
    Inventor: Paul E. Kelley
  • Patent number: 5463221
    Abstract: When an image display unit displays a magnified image of an object being examined, a measuring unit automatically computes the dimensions of the image at the preset position. A tolerance range setting unit has been supplied with an upper and a lower limit value according to which it can judge the dimensions of the object at the preset position to be normal, whereas a comparison-decision unit decides that the dimensions thus computed are held between the upper and lower limit values. When the measured result is found outside the range of upper to lower limit values, the right-or-wrong decision data is stored in a memory and is redisplayed in the form of an image by the image display unit at proper timing.
    Type: Grant
    Filed: March 23, 1994
    Date of Patent: October 31, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Otaka, Hiroyoshi Mori, Hideo Todokoro