Abstract: A microelectronic substrate patterning system and method uses two or more copies of a mask pattern in the radiation path between the radiation source and the microelectronic substrate. The two or more copies are axially displaced from one another along the radiation path and are in axial alignment with each other along the radiation path. Thus, the mask pattern is imaged onto the microelectronic substrate as a result of interaction of the radiation with the multiple copies of the mask pattern in the radiation path. The mask pattern thereby images at an increased depth to focus compared to a single copy of the mask pattern. The two or more copies of the mask pattern may be used to increase the depth of focus of transmissive and reflective microelectronic substrate imaging systems. The mask copies may be identical or may be biased relative to the desired feature dimensions.

Abstract: Relative ion abundances in ion cyclotron resonance mass spectrometry are determined utilizing wavelet transforms to isolate the intensity of a particular ion frequency as a function of position or time within the transient ion cyclotron resonance signal. The wavelet transform intensity corresponding to the frequency of each ion species as a function of time can be determined, an exponential decay curve fitted to such data, and the decay curves extrapolated back in time to the end of the excitation phase to determine accurate values for the relative abundances of the various ions in a sample. By determining the abundances of ions at a point in time at or near the end of excitation, the effects of different rates of decay of the intensity of the signal from different ions species can be reduced, and more accurate ion abundance measurements obtained.

Abstract: An electron linear accelerator for use in industrial material processing, comprises an elongated, resonant, electron accelerator structure defining a linear electron flow path and having an electron injection end and an electron exit end, an electron gun at the injection end for producing and delivering one or more streams of electrons to the electron injection end of the structure during pulses of predetermined length and of predetermined repetition rate, the structure being comprised of a plurality of axially coupled resonant microwave cavities operating in the .pi./2 mode and including a graded-.beta. capture section at the injection end of the structure for receiving and accelerating electrons in the one or more streams of electrons, .beta.

Abstract: During the production of intensive cluster rays of high boiling point substances for depositing thin layers by the expansion of vapor of the substance to be clustered through a nozzle, a nozzle admission pressure of at least 200 hectopascals is set when the nozzle has a throat width in the range of 0.2 to 1 mm and a divergent outlet portion with an opening angle between about 3.degree. and 30.degree.. Thermal radiation losses from the throat region of the nozzle, which can lead to the undesired emission of larger droplets, are minimized by a heated cover connected to the outlet portion of the nozzle.

Abstract: A scan control for use with an ion implantation system. A servo motor having an output shaft scans a wafer support through an ion beam to controllably treat the wafer. A digital signal processor monitors an encoder output corresponding to motor shaft orientation and compares this position with a desired position of the wafer support. An error signal modifies a motor energization signal based on this comparison. Velocity damping based upon sensed motor speed and wafer support speed smooths the scan motion via a second motor energization correction.

Abstract: A charged particle beam-exposure method in which a subject is exposed to a pattern via a charged particle beam having an on/off exposure characteristic. A blanking aperture array has n open/close devices which individually/correspond to respective scan positions of the charged particle beam and operate to control the on/off exposure characteristic of the charged particle beam.

Abstract: An exposure apparatus comprises a light source emitting light of the ultraviolet region; an illuminating system for introducing the light from the light source into a mask bearing a predetermined pattern; an exposure unit for forming the image of the mask pattern on a photosensitive substrate; a chamber accommodating the light source, the illuminating system and the exposure unit; and an impurity eliminating device for eliminating at least an organic impurity inducing a photochemical reaction with the light of the ultraviolet region.

Abstract: A low voltage vacuum field emission device and method for manufacturing is provided. The devices are fabricated by anodizing a heavily doped silicon wafer substrate (12) in concentrated HF solution, forming extremely sharp silicon tips (18) at the silicon to porous silicon interface. The resulting porous silicon layer is then oxidized, and a metal film (22) is deposited by evaporation on the porous silicon. Silicon substrate (12) is the cathode, and metal film dots (22) are the anodes. The I-V characteristics for the field emission devices follow Fowler-Nordheim curves over three decades of current. The I-V characteristics are also utterly independent of temperature up to 250.degree. C. When the oxidized porous silicon layer (OPSL) is about 5000 .ANG., substantial current is obtained with less than 10 volts. Recent experiments leave no doubt that the charge transport is in the vacuum of the pores.

Abstract: An aerosol mass spectrometer and method for classifying aerosol particles according to specific mass wherein an outer cylinder (1) and an inner cylinder (14) are concentrically and radially spaced relative to each other to provide an annular operating space (24) between the cylinders for the passage therethrough of the sample aerosol. Outer cylinder 1 is mounted on rotor 2 to be rotatably driven thereby and has a bearing (6) at the upper end for supporting an aerosol inlet tube (8). The inner cylinder has upper and lower bearings (20, 22) in the upper and lower ends thereof for supporting an aerosol outlet tube (38). A voltage source (28) is connected between the inner and outer cylinders via brushes (30, 32) to produce a radially inward electrostatic force across the annular gap (24) to oppose centrifugal force on the particles during rotation of the cylinders.

Abstract: An ultraviolet curing device comprising a housing having a wave guide disposed within one end thereof. Disposed within the housing and reciprocally movable between focused and unfocused positions therewithin is a reflector member which is oriented relative the light source so as to be operable to reflect ultraviolet light from the light source to the wave guide. When the reflector member is in the focused position, ultraviolet light is reflected from the light source to the wave guide in a manner facilitating the passage of a desired frequency of the ultraviolet light through the wave guide. When the reflector member is in the unfocused position, ultraviolet light is reflected from the light source to the wave guide in a manner preventing the passage of the desired frequency of the ultraviolet light through the wave guide.

Abstract: A large-nanostructure probe with optically guided macroscopic scanning is disclosed for high-resolution imaging and characterization of nanostructures. The invention contemplates the use of a course positioning system, which comprises one or more quadratic index fiber optic lenses in conjunction with an optical microscope. A magnifying probe is placed in close proximity to a sample under inspection. The fiber optic lenses of the coarse positioning system are used to noninvasively carry the image of a sample-to-probe junction to the optical microscope. The optical microscope further magnifies the image, allowing for precise positioning of the probe tip to within 1 .mu.m of a desired feature on the sample surface. For ease of viewing, the magnified image from the microscope may be displayed on a monitor using a charge coupled device ("CCD") camera, if so desired. Also disclosed is a long-range probing system wherein the probe tip may be one of a variety of measurement or probing apparatus.

Abstract: Background of the invention is the isotope ratio analysis of carbon and nitrogen as components of hydrocarbon compounds. The separation into individual components takes place in a gas chromatograph and oxydation in a downstream combustion oven, into, inter alia CO.sub.2 and N.sub.2. In general CO.sub.2 is present in a much larger quantity than N.sub.2. The measurement values on the mass spectrometer have accordingly different dimensions. In order to approximate the peak values, a dilution with additional helium as a carrier gas takes place in the analysis of CO.sub.2. This has the additional advantage that the helium as a carrier gas, which is present anyway, as a result is present in approximately equal quantities relative to the CO.sub.2 and N.sub.2 in the ion source of the mass spectrometer. The dilution takes place in the region of a so-called open split (18).

Abstract: The invention overcomes the problems with conventional solutions by utilizing natural (copied) scatter surfaces, dielectric spine (sensilla) forms, correct pumping radiations and correct vibratory modulating frequency to generate coherent or semi-coherent radiation frequencies to control or attract insects. Such control acting either as an attractant (e.g., for trapping) radiation or a frequency quenching (i.e., jamming) radiation for insects.

Abstract: High density optical information recording even at room temperature is achieved by control of the diameter of crystalline portions exhibiting quantum size effects of fine semiconductor particles distributed in a dielectric matrix, using the non-crystalline to crystalline phase transition of the fine particles. The quantum size effects mean that the optical properties of the medium depend on the diameter of the crystalline portions. Various methods of recording, reproducing and erasing information using this optical recording medium are possible. The invention is applicable to other optical devices.

Abstract: A structure and method of accurately positioning and aligning an extraction member aperture (arc slit) and an extraction electrode gap with a predetermined beam line in an ion implantation apparatus is disclosed. The extraction member aperture is positioned with respect the ion beam source housing thereby eliminating cumulative tolerance errors which plague prior art ion implantation apparatuses. A removable alignment fixture is used in conjunction with a self-centering clamping assembly to accurately position the extraction member aperture in alignment with the predetermined beam line. The extraction member is secured to a support ring of the clamping assembly and the clamping assembly is mounted to the alignment fixture. The alignment fixture is mounted to the source housing precisely aligning the extraction member aperture with the predetermined beam line. The split ring of the clamping assembly is secured to a support tube surrounding the ion generating arc chamber.

Abstract: A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.

Abstract: An ion implanter is provided having a modulator which provides a variable frequency modulated scan signal. The modulator ensures that the scan signal will not retrace substantially upon itself during a scan cycle, and during subsequent scan cycles. Minimization of retrace allows for a more uniform dopant placed across the upper surface of the wafer and thereby eliminates or minimizes underdoping areas often arising between retraced beam widths when heavy atomic species are implanted.

Abstract: An apparatus and method for scanning a probe over a surface to either produce a measurement of the surface representative of a parameter other than the topography of the surface or to perform a task on the surface. The scanning operation is divided into two parts and with a first scan to obtain and store topographical information and with a second scan to measure the parameter of the surface other than topography or to perform the task while the probe height is controlled using the stored topographic information.

Abstract: This invention relates to compositions, methods of production and uses of materials for shielding against nuclear radiation. These materials are made of a low density solid hydrogenous material which binds a powder of medium density materials. They are particularly effective for shielding against fission and high energy neutrons, as well as against a combined radiation of neutrons and photons.

Abstract: An apparatus is provided for moving shielding plugs into and out of holes in concrete shielding walls in hot cells for handling radioactive materials without the use of external moving equipment. The apparatus provides a means whereby a shield plug is extracted from its hole and then swung approximately 90 degrees out of the way so that the hole may be accessed. The apparatus uses hinges to slide the plug in and out and to rotate it out of the way, the hinge apparatus also supporting the weight of the plug in all positions, with the load of the plug being transferred to a vertical wall by means of a bolting arrangement.