Patents Examined by James J. Leybourne
  • Patent number: 6800846
    Abstract: A mass spectrometer is disclosed comprising a gas collision cell, reaction cell or collisional cooling cell comprising a plurality of electrodes. DC potentials are progressively applied to the cell so that ions are urged along the cell.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: October 5, 2004
    Assignee: Micromass UK Limited
    Inventors: Robert Harold Bateman, Kevin Giles, Steve Pringle
  • Patent number: 6797955
    Abstract: The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: September 28, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: David L. Adler, Luca Grella, Gabor D. Toth
  • Patent number: 6797956
    Abstract: In a transmission electron microscope with phase contrast imaging, the illumination of the object to be imaged takes place with an annular illuminating aperture. An annular phase-shifting element with a central aperture is arranged in a plane Fourier transformed with respect to the object plane. The annular phase-shifting element confers a phase shift of &pgr;/2 on a null beam, while the radiation of higher diffraction orders diffracted at the object in the direction of the optical axis passes through the central aperture of the annular phase-shifting element and consequently is not affected, or only slightly affected, by the phase-shifting element. The annular illuminating aperture is preferably produced sequentially in time by a deflecting system, which produces a beam tilt in a plane conjugate to the object plane.
    Type: Grant
    Filed: January 9, 2003
    Date of Patent: September 28, 2004
    Assignee: Leo Elektronenmikroskopie GmbH
    Inventor: Gerd Benner
  • Patent number: 6794641
    Abstract: A mass spectrometer is disclosed wherein ions from a pulsed ion source are dispersed in a drift region so that the ions become separated according to their mass to charge ratios. The ions are then received by an ion guide in which multiple trapping regions are created and wherein the multiple trapping regions are translated along the length of the ion guide. The ion guide receives the ions so that all the ions trapped in a particular trapping region have substantially the same or similar mass to charge ratios. The ions are released from the exit of the ion guide and the pusher/puller electrode of an orthogonal acceleration Time of Flight mass analyzer is arranged to be energised in synchronization with the ions emerging from the ion guide. The trapping regions may be translated along the ion guide with a velocity which becomes progressively slower and the delay time of the pusher/puller electrode may be progressively increased.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: September 21, 2004
    Assignee: Micromass UK Limited
    Inventors: Robert Harold Bateman, Kevin Giles, Steve Pringle
  • Patent number: 6794643
    Abstract: A system and method of processing signals generated at a detector of a mass spectrometer prior to signal conversion in which a pre-ADC offset is applied to the signals that is adjustable in polarity and magnitude in accordance with a user-selected mode. According to a first mode, a positive offset is applied to the signals to improve quantitation accuracy and in a second mode, a negative offset is applied to the signals to improve resolution and mass assignment.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: September 21, 2004
    Assignee: Agilent Technologies, Inc.
    Inventors: Charles William Russ, IV, William D. Frazer
  • Patent number: 6794648
    Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer. The present invention exists in an ultimate analyzer comprising a scattered electron beam detector for detecting an electron beam scattered by an object to be analyzed; an electron spectrometer for energy dispersing an electron beam transmitted through the object to be analyzed; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements of the object to be analyzed based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: September 21, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Patent number: 6787774
    Abstract: The corotron wire of a corotron device is introduced with a retainer element, such as in a printer or copier. At least one corotron wire is held by the retainer element and the carrier material for a latent image residing there opposite is conducted past the corotron wire. The carrier material and the corotron wire lie in planes arranged substantially parallel to one another. The retainer element lies on bearings at at least two bearing points, the bearings being rigidly connected to the guide element and pressed onto the bearings with a spring power. A method is also provided for introducing the corotron wire of a corotron device with assistance of the retainer element.
    Type: Grant
    Filed: July 25, 2002
    Date of Patent: September 7, 2004
    Assignee: Océ Printing Systems GmbH
    Inventors: Peter Rumpel, Hartmut Gack
  • Patent number: 6781122
    Abstract: Mass spectrometry apparatus 105 comprises a serial arrangement of an ion source 110, first time of flight means, a field free region 120, means to fragment the molecules, a second time of flight means and a large area detector 160 The second time of flight means includes an ion mirror 150, the ion mirror 150 being arranged to produce a reflecting substantially quadratic field. The first time of flight means is arranged to provide spatial focusing concomitant with time focusing of ions at or near the entrance to the ion mirror 150. The means provided to fragment the ions from the first time of flight means can be a collision cell 140 or in the field free region 220 or in the first time of flight means. The means to fragment the molecules has a potential which is different from the potential at the entrance to the ion mirror 150, and the detecting surface of the detector 160 is mounted in the time focal surface of the ion mirror 150.
    Type: Grant
    Filed: November 25, 2002
    Date of Patent: August 24, 2004
    Assignee: University of Warwick
    Inventors: Alexander William Colburn, Peter John Derrick, Anastassios Giannakopulos
  • Patent number: 6777677
    Abstract: A pattern inspection system for inspecting a substrate surface on which a predetermined pattern is formed with radiation of an electron beam and an optical beam. the pattern inspection system includes a radiation and which radiates an electron beam to the substrate, a detection unit which detects a secondarily generated signal attributable to the radiation of the electron beam, a retrieval unit which retrieves an image from the signal detected by the detection unit, and an image processing unit which classifies the retrieved image depending on a type of the image.
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: August 17, 2004
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Mari Nozoe, Hidetoshi Nishiyama, Shigeaki Hijikata, Kenji Watanabe, Koji Abe
  • Patent number: 6777694
    Abstract: An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, an electron lens section having a plurality of apertures for passing a plurality of electron beams and focusing the plurality of electron beams independently, and a magnetic field formation section provided at least one of the plurality of apertures and forming a magnetic field in a direction substantially perpendicular to the irradiating direction of an electron beam passing through the aperture.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: August 17, 2004
    Assignee: Advantest Corporation
    Inventor: Takeshi Haraguchi
  • Patent number: 6777674
    Abstract: We disclose a method for analyzing the composition of a microscopic particle resting on a first sample surface. The method comprises positioning a micro-manipulator probe near the particle; attaching the particle to the probe; moving the probe and the attached particle away from the first sample surface; positioning the particle on a second sample surface; and, analyzing the composition of the particle on the second sample surface by energy-dispersive X-ray analysis or detection of Auger electrons. The second surface has a reduced or non-interfering background signal during analysis relative to the background signal of the first surface. We also disclose methods for adjusting the electrostatic forces and DC potentials between the probe, the particle, and the sample surfaces to effect removal of the particle, and its transfer and relocation to the second sample surface.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: August 17, 2004
    Assignee: Omniprobe, Inc.
    Inventors: Thomas M. Moore, John M. Anthony
  • Patent number: 6777702
    Abstract: The present disclosure provides a device and method for exposing a substrate to ultraviolet radiation emitted from a discharge lamp having regions of varying intensity along its length. The discharge lamp includes, inter alia, an elongated vitreous tube, first and second electrode assemblies and a coating on the interior the interior of the tube. The elongated vitreous tube has an outer periphery and axially opposed first and second ends which define an axial length for the tube therebetween. The outer periphery has a plurality of regions defined along said axial length, wherein a first region extends over a predetermined first portion of said axial length and has a helical groove path defining a series of axially spaced apart grooves formed therein. The first region emits ultraviolet radiation having an intensity greater than that emitted from a second region of the outer periphery.
    Type: Grant
    Filed: February 15, 2002
    Date of Patent: August 17, 2004
    Assignee: Voltarc Technologies, Inc.
    Inventors: Joseph D. Laudano, Prasad S. Sastry, Albert Louis Winkler, Michael G. Manning
  • Patent number: 6774359
    Abstract: In a sample-introduction tool in which an end of a passage is connected to a reservoir for storing a mobile phase solution, a sample-dropping orifice is provided at the passage and the mobile phase solution and a sample running off from the other end of the passage are introduced into a mass spectrometer by generating a high-speed gas stream around the other end of the passage. The mobile phase solution and the sample are nebulized by the high-speed gas stream, and the injected sample is ionized.
    Type: Grant
    Filed: February 6, 2001
    Date of Patent: August 10, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Yukiko Hirabayashi, Atsumu Hirabayashi, Akihiko Okumura, Hideaki Koizumi
  • Patent number: 6771012
    Abstract: Apparatus for producing a flux of charge carriers that may be used in many applications including imaging and lithography comprises an electron source which includes an emitter with a tip radius of about one nanometer and a closely configured extractor, together with a specimen for receiving an electron beam from the source. The apparatus may operate in air under atmospheric conditions and at a much reduced operating voltage.
    Type: Grant
    Filed: March 12, 2001
    Date of Patent: August 3, 2004
    Assignee: Hitachi Europe, Ltd.
    Inventors: Haroon Ahmed, David Hasko, Alex Driskill-Smith, David Arfon Williams
  • Patent number: 6770873
    Abstract: A method is provided for the quantitative analysis by ion mobility spectrometry of the concentration of carbon monoxide, methane and higher hydrocarbon species in an oxygen stream. The method includes converting these species present in the oxygen stream into carbon dioxide, measuring the concentration of the carbon dioxide, and deducing from this measurement the initial concentration of the oxidizable species.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: August 3, 2004
    Assignee: Saes Getters S.p.A.
    Inventors: Luca Pusterla, Marco Succi
  • Patent number: 6768121
    Abstract: An ion source (10) for an ion implanter is provided, comprising: (i) an ionization chamber (14) defined at least partially by chamber walls (12), and having an inlet (45) into which a sputtering gas may be injected and an aperture (18) through which an ion beam (B) may be extracted: (ii) an ionizing electron source (44) for ionizing the sputtering gas to form a sputtering plasma; and (iii) a sputterable repeller (100). The sputterable repeller both (a) repels electrons emitted by the electron source, and (b) provides a source of sputtered material that can be ionized by the electron source. the sputterable repeller (100) comprises a slug (108) of sputterable material, and further comprises mounting structure (102, 104) for removably mounting the slug within the ionization chamber (14), so that the slug is made removably detachable from the mounting structure.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: July 27, 2004
    Assignee: Axcelis Technologies, Inc.
    Inventors: Thomas N. Horsky, Tommy D. Hollingsworth
  • Patent number: 6762414
    Abstract: Disclosed is an apparatus for generating ultraviolet rays and ozone using microwaves to sterilize water in a swimming pool or potable liquids such as purified water, milk and juice and to eliminate impure organic matters contained in the water. The apparatus includes a housing (10) having an upper liquid inlet (12) and a lower liquid outlet (14), and defining a sterilization chamber (16) therein. The housing (10) includes therein a transparent partition wall (18), which is spaced from a side vertical wall of the housing (10) to serve as a side wall of the sterilization chamber (16). The transparent partition wall (18) is provided with several electrodeless ultraviolet lamps (20). Wave guides (22) are attached to the back faces of the electrodeless ultraviolet lamps (20), respectively, which are widened toward the ultraviolet lamps (20). Microwave generator units (24) are attached to back ends of the wave guides (22), respectively.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: July 13, 2004
    Assignee: Dae-won Paptin Foam Co. Ltd.
    Inventors: Bang-Uk Hur, Yoo-Byung Park
  • Patent number: 6759653
    Abstract: A scanning type microscope that captures substance information of the surface of a specimen by the tip end of a nanotube probe needle fastened to a cantilever, in which an organic gas is decomposed by a focused ion beam in a focused ion beam apparatus, and the nanotube is bonded to the cantilever with a deposit of the decomposed component thus produced. With this probe, the quality of the nanotube probe needle can be improved by removing an unnecessary deposit adhering to the nanotube tip end portion using a ion beam, by cutting an unnecessary part of the nanotube in order to control length of the probe needle and by injecting ions into the tip end portion of the nanotube.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: July 6, 2004
    Assignees: Yoshikazu Nakayama, Daiken Chemical Co., Ltd., Seiko Instruments Inc.
    Inventors: Yoshikazu Nakayama, Seiji Akita, Akio Harada, Takashi Okawa, Yuichi Takano, Masatoshi Yasutake, Yoshiharu Shirakawabe
  • Patent number: 6756597
    Abstract: A fluid sterilization apparatus including a sterilization chamber having a cavity therein, and a nozzle for receiving pressurized fluid and directing a spray of the fluid into the cavity. An electron beam generator having an exit window is mounted to the sterilization chamber for directing a beam of electrons through the exit window and into the cavity of the sterilization chamber to irradiate the spray of fluid. The nozzle is configured to direct the spray of fluid substantially parallel and proximate to the exit window.
    Type: Grant
    Filed: December 4, 2001
    Date of Patent: June 29, 2004
    Assignee: Advanced Electron Beams, Inc.
    Inventors: Tzvi Avnery, Kenneth P Felis
  • Patent number: 6750459
    Abstract: The present invention provides an apparatus for hardening a metal article, comprising a holding device, an energy beam generator pointed at the holding device for directing energy beams at the holding device, and an auxliary heating device engaging the holding device, wherein the auxiliary heating device heats the metal article independently from the energy beam. The apparatus includes an energy beam delivery instrument system positioned between the energy beam generator and the holding device so that the energy an energy beam delivery instrument directs the energy beam to the holding device. Also, the apparatus also includes a transport system supporting the holding device, wherein the transport system varies the location of the holding device relative to the energy beam generator.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: June 15, 2004
    Assignee: Allasso Industries, Inc.
    Inventor: Walter J. Chappas