Abstract: In one aspect, the present invention provides a method of managing fluctuations in power supplied to a semiconductor processing apparatus that includes monitoring the power supplied to the apparatus to detect the occurrence of a power fluctuation event during a semiconductor processing session. Upon detection of a power fluctuation event, the semiconductor processing can be interrupted. After the end of the power fluctuation event, at least one operational parameter of the apparatus, e.g., vacuum level in an evacuated processing chamber, can be measured, and the semiconductor processing can be resumed when the measured operational parameter is within an acceptable range. The measured operational parameter can preferably include a parameter that recovers more slowly than others when adversely affected by a power fluctuation event.

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: Spherical aberration correction optics are offered which have an auxiliary function of determining control parameters easily and at any time while canceling deflecting and quadrupole fields in the instrument. The correction optics have a control unit for determining the parameters of the aberration correction optics and parameters for canceling the deflecting and quadrupole fields, a power supply for applying electric potentials or magnetic potentials to the aberration correction optics based on a signal from the control unit, and a period-varying circuit positioned between the control unit and the power supply to add a signal whose amplitude is varied continuously at frequency f with respect to real time t.

Abstract: A system and method for calibration of nanolithography includes fabricating a nanoscale test pattern, measuring a parameter of the test pattern, and calculating a calibration coefficient from the measured parameter. The calculated calibration coefficient is then used for nanolithography. Nanolithography can be carried out with nanoscopic tips depositing patterning compounds on a substrate.

Abstract: A scan data collection operation includes performing a scanning operation using a scan path that includes a directional component that is additional to a data collection directional component. The collected scan data is mapped to another set of locations, thus allowing for detection of surface features using fewer scans.

Abstract: A charged particle buncher with a series of spaced apart electrodes 1 arranged to generate a shaped electric field, the series comprising a first electrode 1a, a last electrode 1b and one or more intermediate electrodes, wherein the shaped electric field is generated substantially without free charges being transferred onto or away from the intermediate electrode or electrodes. The first and last electrodes may be connected to means for transferring charged on to or off the electrode. The first, intermediate and last electrodes may be connected in serried with capacitors.

Abstract: A method and apparatus for weakening a strong focus effect of an acceleration-deceleration column of an ion implanter during a deceleration mode are disclosed. The apparatus includes a tube lens surrounding the ion beam adjacent to a deceleration lens of the acceleration-deceleration column. The tube lens causes a defocusing of the ion beam at the entrance of the tube lens, which reduces the ion dispersion problem generated by the column. The invention also includes an accel-decel column and ion implanter incorporating the tube lens. An additional deceleration-suppression electrode may also be added subsequent to the tube lens for confining electrons within the tube lens.

Abstract: There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one particle beam passing the beam splitter. The beam splitter is, in first order, free of dispersion, astigmatism and distortion.

Abstract: Disclosed are a method and an apparatus for generating and collecting a secondary compound that includes daughter isotope, such as 68Ga, resulting from the decay of a parent isotope, such as 68Ge, present in a precursor compound. The apparatus includes a generator system comprising a collector vessel, a cold trap and a pump, that are operatively connected to sources for introducing a precursor compound and an eluant solution, and optionally purging gases and oxygen scavengers, into the generator system. In a generation mode a substantial portion of the precursor compound is maintained in or flows through the collector vessel while in recovery mode substantially all of the precursor compound is confined in the cold trap while the collector vessel is flushed with an eluant to remove the collected secondary compound.

Abstract: The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source comprising a plurality of converter elements at an element distance from each other for converting a light beamlet impinging onto it into an electron beamlet directed towards and focussed on an object plane, said lithography system further comprising control means for manipulating the mutual positions of the light beamlets with respect to the converter elements. These control means can be of optical, thermal, mechanical or magnetical nature, and work on for instance the micro lens array, the converter plate, and the mask.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.

Abstract: A first manual input device for inputting an irradiation ready state is provided in each treatment room or a control room formed corresponding to the treatment room. A safety device confirms that preparations for generation of an ion beam in an accelerator are completed and preparations for transport of the ion beam in a beam transport system for introducing the ion beam to an irradiation unit in the treatment room selected in response to a ready signal from the first manual input device are completed, followed by outputting ready information. A ready state display unit for displaying the ready information is provided. In the treatment room or the control room, a second manual input device is provided for inputting an irradiation start instruction when the ready information is displayed by the ready state display unit.

Abstract: An x-ray or neutron apparatus for the transmission of x-ray or neutron images is described, which includes x-ray- or neutron-three-dimensional (3-D) arrays or mosaics, including a plurality of x-ray or neutron lenses positioned so that they form a two-dimensional (2-D) mosaic of compound refractive lenses to provide a plurality of separate x-ray or neutron paths between an object and an image at an x-ray- or neutron-detector. The apparatus is so constructed that it permits separate parts of an object to be imaged such that a total composite image is formed from these various parts. An imaging apparatus of the detection of carcinoma in breast tissue is formed using such an apparatus. Methods of microscopy and imaging are obtained using this apparatus.

Abstract: The present invention is directed to modulating ion beam current in an ion implantation system to mitigate non-uniform ion implantations, for example. Multiple arrangements are revealed for modulating the intensity of the ion beam. For example, the volume or number of ions within the beam can be altered by biasing one or more different elements downstream of the ion source. Similarly, the dosage of ions within the ion beam can also be manipulated by controlling elements more closely associated with the ion source. In this manner, the implantation process can be regulated so that the wafer can be implanted with a more uniform coating of ions.

Abstract: The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.

Abstract: To measure the intensity profile of an electron beam the electron beam is conducted on to a measuring structure having areas with different back-scattering properties, and back-scattered electrons which are produced by scanning of the measuring structure by the electron beam by means of a deflector unit are measured by a sensor ring. The measuring structure can preferably be installed into and removed from an electron-beam welder and consists of a graphite slab from which a tungsten needle projects perpendicularly.

Abstract: An ion-trap mass analyzing apparatus having means for generating ion-capture electric fields asymmetrical with respect to a reference plane containing a central point of a ring electrode and perpendicular to a central axis of the ring electrode in the inside of an ion trap to resonantly amplify ions rapidly to emit the ions from the ion trap in a short time to thereby permit high-sensitive high-accurate mass analysis stably regardless of the structural stability of ions as a subject of analysis.

Abstract: Microfluidic nozzle array devices are provided with the body of each device having at least one nozzle extending outwardly from one surface of the body. Each nozzle includes a tip opening having a diameter of equal to or less than about 100 ?m, preferably 50 ?m, and more preferably 20 ?m and an outer diameter of nozzle is equal to or less than about 150 ?m, preferably 100 ?m, and more preferably 50 ?m. The microfluidic nozzle array devices are fabricated using an injection molding process and find particular utility in a wide range of applications, including but not limited to nanospray/electrospray applications, mass spectrometer applications, optical spectrometry applications, spotting applications (i.e., DNA or protein array), etc.

Abstract: This invention comprises an apparatus and method for generating sample ions from sample molecules in which a mixture of a sample and a matrix are vaporized by a laser beam and Subsequently ionized by reagent corona ions. The decoupling of the vaporization and ionization steps allows each process to be separately optimized. The vaporization step can be done in a sub-atmospheric pressure region. Alternatively, the vaporization and ionization steps can be done in a higher pressure region. In addition, the reagent corona ions can be generated in a vacuum chamber or a chamber at atmospheric pressure. Alternatively, the reagent ions can be generated in a sub-atmospheric region while the laser desorption occurs in an atmospheric region.