Abstract: A semiconductor chip includes a main surface having a plurality of sides, a plurality of signal electrodes formed on the main surface along the sides, the signal electrodes along one of the sides being disposed in a first area having a first length. The chip further includes a power supply electrode formed on the main surface along the sides, the power supply electrode along the one of the sides being disposed in a second area having the second length, which is longer than the first length, between the one of sides and the signal electrodes.

Abstract: Temporary connections to spring contact elements extending from an electronic component such as a semiconductor device are made by urging the electronic component, consequently the ends of the spring contact elements, vertically against terminals of an interconnection substrate, or by horizontally urging terminals of an interconnection substrate against end portions of the spring contact elements. A variety of terminal configurations are disclosed.

Abstract: A method of forming a semiconductor device having reduced interconnect-line parasitic capacitance is provided. The method includes the following steps. First, a substrate is provided and a plurality of interconnect lines are formed on the substrate. A barrier layer is then formed. Next, the barrier layer is hardened and thinned so as to make the barrier layer having a thin-film attribute. Following that, a separation layer is formed by filling the space between and above the interconnect lines with a dielectric. Then, the dielectric is foamed. After that, an insulating layer is formed. Finally, the dielectric is condensed such that air gaps are formed in the separation layer.

Abstract: A semiconductor device is provided which is highly reliable and operable at fast speed and low noises. In this semiconductor device, there are provided a power wiring section 1003a, a ground wiring section 1003b and a signal wiring section 1003c are formed on one level. The power wiring section or the ground wiring section is formed adjacently on both sides of at least one part of the signal wiring section.

Abstract: A MEMS device with a flap having one or more conductive landing areas electrically isolated from the flap and electrically coupled to a landing surface to reduce stiction. The device may be formed from a device layer of a silicon-on-insulator (SOI) substrate with conductive landing pads fabricated by forming one or more vias through the device layer, an underlying sacrificial layer etched to form one or more depressions at locations corresponding the vias and filled with a conductive landing pad material to form a structure having one or more electrically isolated landing pad areas on an underside of the device layer. A method for operating a MEMs device in an equipotential stiction reduction mode is also provided.

Abstract: In a method for the production of a portable integrated circuit electronic device, an integrated circuit chip is transferred onto a dielectric support and connected to a metal grid comprising contact pads and connection pads. A housing is created for the chip on a metal grid by arching the grid. The dimensions of the housing enable the housing to accommodate the thickness of the card and the contact pads thereof. The grid is laminated on the dielectric support, whereby each contact pad of the card can be placed opposite to and in contact with the connection pads of the grid.

Abstract: A microwave transistor structure comprising: (a) a SiC substrate having a top surface; (b) a silicon semiconductor material of a first conductivity type overlaying the top surface of the semiconductor substrate and having a top surface; (c) a conductive gate overlying and insulated from the top surface of the silicon semiconductor material; (d) a channel region of the first conductivity type formed completely within the silicon semiconductor material including a channel dopant concentration; (e) a drain region of the second conductivity type formed in the silicon semiconductor material and contacting the channel region; (f) a body region of the first conductivity type and having a body region dopant concentration formed in the silicon semiconductor material under the conductive gate region; (g) a source region of the second conductivity type and having a source region dopant concentration formed in the silicon semiconductor material within the body region; (h) a shield plate region being adjacent and being pa

Abstract: A dielectric insulating composite for insulating a floating gate from a control gate in a non-volatile memory is described. A material, such as an undoped polysilicon, amorphous silicon, or amorphous polysilicon or a silicon rich nitride, is inserted in the gate structure. The oxide film that results from the oxidation of these films is relatively free from impurities. As a result, charge leakage between the floating gate and control gate is reduced.

Abstract: In the present invention, memory chips are stuck together in stacked fashion by TAB (tape automated bonding), and a multiple memory chip and lead complex like an SOP (small out-line package) is formed of the chips and leads, whereby a memory module of high packaging density can be realized by a flat packaging technique.

Abstract: The shielding device described is distinguished by the fact that it has a coating that at least partially surrounds the element that is to be electromagnetically shielded. As a result, the elements that are to be electromagnetically shielded can be optimally shielded with minimal outlay.

Abstract: Inter power supply surge voltage transmitting diode element is formed by a buried layer formed in a semiconductor substrate, a well region formed on the buried layer with its bottom portion being in contact with the buried layer, and impurity regions of mutually different conductivity types formed apart from each other at the surface of the well region. One of the impurity regions is electrically coupled to a first power supply line on which a surge voltage generates, and the other is electrically coupled to a second power supply line absorbing the surge voltage. The surge transmitting element includes a plurality of elements arranged parallel to each other between the first and second power supply lines. The second power supply line supplies the power supply voltage to an internal circuitry which consumes relatively small current.

Abstract: A semiconductor package includes: a substrate having an upper surface and a lower surface; an integrated circuit chip having bond pads; a lid attached on the upper surface of the substrate so as to cover the chip; and one or more projections that electrically connect the lid to a plurality of ground patterns. The substrate has substrate pads formed on the upper surface, and one or more of the substrate pads extend to form the ground patterns. The chip is bonded on the upper surface of the substrate. One or more of the bond pads are ground bond pads, and the bond pads are electrically connected to the corresponding substrate pads. An electrically nonconductive adhesive is used for the attachment of the lid to the substrate, and the projections are connected to the ground patterns by an electrically conductive adhesive. The ground projections are positioned at four corners of a cavity that is formed between the substrate and the lid.

Abstract: A simplified process for flip-chip attachment of a chip to a substrate is provided by pre-coating the chip with an encapsulant underfill material having separate discrete solder columns therein to eliminate the conventional capillary flow underfill process. Such a structure permits incorporation of remeltable layers for rework, test, or repair. It also allows incorporation of electrical redistribution layers. In one aspect, the chip and pre-coated encapsulant are placed at an angle to the substrate and brought into contact with the pre-coated substrate, then the chip and pre-coated encapsulant are pivoted about the first point of contact, expelling any gas therebetween until the solder bumps on the chip are fully in contact with the substrate. There is also provided a flip-chip configuration having a complaint solder/flexible encapsulant understructure that deforms generally laterally with the substrate as the substrate undergoes expansion or contraction.

Abstract: A semiconductor device includes interconnected conductor lines comprising a lower Interlayer Dielectric (ILD) layer having a top surface formed on a substrate. Several lower conductor lines are formed on the top surface of the lower ILD layer surrounded by an insulator formed on the lower ILD layer. Each of a set of resistive studs has sidewalls, a lower end and an upper end and it is joined to the top of the lower conductor line at the lower end. There are several intermediate conductor lines formed between the resistive studs separated from adjacent studs by a liner layer and a capacitor dielectric layer. Upper conductor lines are formed on a upper level. Each has a bottom surface in contact with a corresponding one of the resistive studs. A central ILD layer is formed below the intermediate conductor to electrically insulate and separate the intermediate conductor lines from the lower conductor lines.

Abstract: A ball grid array assembly includes a package cover that encapsulates a die and a portion of a substrate to which the die is attached, including an edge of the substrate. Encapsulation of the substrate edge by the cover reduces penetration of moisture or other contaminants into the substrate. The cover includes a rib that extends to contact a circuit board to which the ball grid array assembly is connected. With such a rib, planarity between the circuit board and the substrate is maintained during soldering.

Abstract: A method for inhibiting damage caused to semiconductor die packages during a molding process, and the semiconductor die packages formed therefrom, is described. One or more openings are provided in a die carrier which are filled with a material which is more resistant to compressive forces than the carrier.

Abstract: A method of fabricating relaxed SiGe buffer layers with low threading dislocation densities on silicon-on-insulator (SOI) substrates is provided. The relaxed SiGe buffer layers are fabricated by the epitaxial deposition of a defect-free Stranski-Krastanov Ge or SiGe islands on a surface of the SOI substrate; the capping and planarizing of the islands with a Si or Si-rich SiGe layer, and the annealing of the structure at elevated temperatures until intermixing and thereby formation of a relaxed SiGe layer on the insulating layer (i.e., buried oxide layer) of the initial SOI wafer is achieved. The present invention is also directed to semiconductor structures, devices and integrated circuits which include at least the relaxed SiGe buffer layer mentioned above.

Abstract: A semiconductor device includes at least first and second lower layer wirings provided on a surface of an insulator on a semiconductor substrate, a first interlayer film provided on the insulator to cover surfaces of the first and second lower layer wirings, first and second connection wirings which are provided on the first interlayer film and include first and second films contacting the first and second lower layer wirings respectively, and a plate electrode which is continuously provided on the second connection wiring and includes at least the first film.

Abstract: A board for connecting a bare semiconductor die with a bond pad arrangement which does not conform to a master printed circuit board with a specific or standardized pin out, connector pad, or lead placement arrangement. The board comprises a printed circuit board including first elements, such as minute solder balls, pins, or bond wires, for making electrical contact between the board and the master board, and second elements, such as minute solder balls, pins, or bond wires, for making electrical contact between the semiconductor die and the board. The board has circuit traces for electrical communication between the board/master board electrical contact elements, and the semiconductor die board electrical contact elements.

Abstract: A first element electrode and a second element electrode connected electrically to a semiconductor element on a substrate are formed, and then an insulating film is formed on the substrate including the element electrodes. Thereafter, a first opening for exposing the first element electrode and a second opening for exposing the second element electrode are formed on the insulating film. Then, a first external electrode connected to the first element electrode via the first opening is formed immediately above the first element electrode. Furthermore, a second external electrode and a connecting wire having one end connected to the second element electrode via the second opening and the other end connected to the second external electrode are formed on the insulating film.