Abstract: The invention provides methods of detecting an analyte by multi-stage mass spectrometry with improved S/N ratio. An analyte is labeled with a positively-charged mass tag to form a precursor ion that leads by anchimeric assistance to a greatly enhanced, analyte-characteristic first product ion that can, in turn, lead to a greatly enhanced, analyte-characteristic second product ion in a mass spectrometer. Either a three stage mass spectrometer (true MS3) or a two-stage mass spectrometer (MS2) operated in a pseudo MS3 mode can be used. The precursor ion is split via an anchimeric-assisted reaction to form a first product ion, which in turn can be fragmented to form the second product ion. The methods offer extreme ultrasensitivity, at the low amol level. The invention also provides anchimeric mass tags for use in the methods. A wide variety of previously undetectable analytes of biological or environmental origin can be detected and quantified.

Abstract: An ion implantation system has an ion source forming an ion beam. An mass analyzer defines and varies a mass analyzed beam along a beam path. A moveable mass resolving aperture assembly has a resolving aperture whose position is selectively varied in response to the variation of the beam path by the mass analyzer. A deflecting deceleration element positioned selectively deflects the beam path and selectively decelerate the mass analyzed beam. A controller selectively operates the ion implantation system in both a drift mode and decel mode. The controller passes the mass analyzed beam along a first path through the resolving aperture without deflection or deceleration in the drift mode and deflects and decelerates the beam along a second path in the decel mode. The position of the resolving aperture is selectively varied based on the variation in the beam path through the mass analyzer and the deflecting deceleration element.

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

Abstract: A dielectric barrier discharge lamp assembly for a fluid treatment system. The lamp assembly can include an inductive secondary, first and second electrodes coupled to the inductive secondary, and a lamp including a dielectric barrier interposed between the first and second electrodes. The dielectric barrier can define a discharge chamber including a discharge gas, and one of the first and second electrodes can extend within the discharge chamber. The inductive secondary can be adapted to receive power from a nearby inductive primary to promote a dielectric barrier discharge in the discharge chamber. The resulting dielectric barrier discharge can generate ultraviolet light for the treatment of air or water, or for other applications.

Abstract: The present invention relates to an electron bean injection control of a mass spectrometer. A mass spectrometer of the present invention includes: a reference waveform generator configured to generate a reference waveform signal having one type of a square wave and a sine wave, a waveform generator configured to generate a sync signal synchronized with the reference waveform signal; an RF module configured to generate an RF voltage signal from the reference waveform signal and apply the RF voltage signal to an RF electrode in the ion trap, an electron beam generator configured to control an operation of an ultraviolet (UV) diode for generating an electron beam injected into the ion trap according to an input control signal, and a control circuit configured to generate the control signal by using the square wave signal.

Abstract: One object is to provide an electron beam sterilization apparatus for sterilizing a preform product (P) by applying an electron beam while conveying the preform product (P), the apparatus comprising: an input star wheel (21) configured to convey the preform product (P) in a circular path; and an outer-surface electron beam application device and an inner-surface electron beam application device configured to apply an electron beam to the preform product (P) being conveyed by the input star wheel (21). A blocking short tube (31) is provided on a lower surface of the star wheel plate (22) of the input star wheel (21) so as to block radioactive rays produced by application of the electron beam and surround a central axis (1v) of the input star wheel (21). The blocking short tube (31) includes a ventilation space (34) formed therein.

Abstract: Multiplexed ion mobility spectrometry (IMS), mass spectrometry (MS) such as time-of-flight mass spectrometry (TOFMS), or hybrid IM-MS is carried out on a sample, and the resulting measurement data are deconvoluted. A pulse sequence controlling ion pulsing is utilized in conjunction with the multiplexing. The pulse sequence may be modified based on the raw measurement data acquired. A demultiplexing matrix based on the modified pulse sequence is utilized to improve deconvolution.

Abstract: A method of ion mapping is disclosed comprising depositing a sample onto a target surface and separating the sample on the target surface according to a first physico-chemical property in a first dimension and according to a second physico-chemical property in a second dimension. The method further comprises ionising and mass analysing multiple separate regions of the sample so as to generate an ion map of at least a portion of the sample deposited upon the target surface. The sample is deposited onto and separated on the target surface by mechanical, hydrodynamic and/or aerodynamic means.

Abstract: A method of determining the structure of a macromolecular assembly (MMA) comprises the steps of (a) generating precursor ions of an MMA species to be investigated; (b) transporting the MMA precursor ions to a fragmentation zone; (c) carrying out pulsed fragmentation of the MMA precursor ions in the fragmentation zone; (d) for a first plurality of MMA precursor ions, detesting both a spatial distribution of the resultant MMA fragment ions, and an m/z distribution of the MMA fragment ions; (e) analyzing the spatial and m/z distributions of fragment ions formed from the said first plurality of precursor ions of the MMA species to be investigated, to determine the relative positions of those fragment ions within the structure of the precursor MMA; and (f) reconstructing the three dimensional (3D) structure of the MMA from the analysis of the spatial and m/z distributions of fragment ions.

Abstract: The invention comprises a method and apparatus for treating a tumor with protons using multiple beamline positions not having an isocenter, including the steps of: (1) delivering the protons from a synchrotron along a redirectable beam transport path to yield a plurality of incident vectors, each of the plurality of incident vectors directed toward the treatment room and (2) redirecting the protons traveling along each of the plurality of incident vectors, with an output nozzle, to the tumor, where a first vector, of the plurality of incident vectors, comprises a first direction intersecting the tumor and where a second vector, of the plurality of incident vectors, comprises a second direction passing by the tumor without entering the tumor. The step of redirecting directs the protons traveling along the first and second incident vectors, respectively, to a first and second path intersecting a front and the back of the tumor.

Abstract: An edge-curing device may comprise a cylindrical lens, a linear array of light-emitting elements, and an aperture, each aligned symmetrically about a longitudinal plane in a housing, wherein the cylindrical lens is positioned between the linear array of light-emitting elements and the aperture, the aperture spans the length of the cylindrical lens and is positioned directly adjacent to an emitting face of the cylindrical lens, and light emitted from the linear array of light-emitting elements and passing through the cylindrical lens is emitted from the emitting face and focused by the aperture within a beam width centered about the longitudinal plane.

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

Abstract: Disclosed herein are embodiments of a system and method for preparing matrix-coated samples for analysis using mass spectrometry. In particular disclosed embodiments, the system and methods of using the system utilize an electric field to enhance results obtained from mass spectrometric analysis of the matrix-coated samples. The methods disclosed herein can be used to prepare biological samples that have improved characteristics facilitating the detection, localization, and/or identification of biomarkers for disease.

Abstract: A system and method for using a high-performance photoionization subsystem are disclosed. Embodiments of the present disclosure employ narrow bandwidth laser radiation to selectively excite ionizing resonant states of gaseous atoms in electric fields. This subsystem and method may be incorporated in an ion source producing ions by photoionizing gaseous atoms; the resultant ions may be employed to efficiently produce an ion beam of high brightness.

Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.

Abstract: An ion filter and a method of manufacturing an ion filter. The method including providing a monolithic structure; selectively removing regions of the structure, to form a pair of electrodes defining at least one ion channel therebetween. The electrodes are preferably mechanically connected at one or more locations by a portion of the structure; wherein the connecting portion of the structure provides a higher electrical impedance than the filter would provide without such a mechanical connection, to thereby electrically separate the electrodes.

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

Abstract: A method for acquiring an image, in which an image of an image acquiring region is acquired by radiating an ion beam to a sample having a conducting part with a linear edge on a dielectric substrate, includes performing an equal-width scan of the ion beam in a first direction that obliquely intersects the linear edge and sweep in a second direction intersecting the first direction. The ion beam is sequentially scanned in different patterns on different scan regions of parallelogram shape, each of which includes the image acquiring region. Secondary charged particles are detected to generate image data of all the scan regions, and image data of the scan regions are calculated to generate image data of the image acquiring region. The image data of the image acquiring region are synthesized to display the image data of the image acquiring region.

Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.

Abstract: Apparatuses having an ultraviolet light lamp are disclosed, where ultraviolet light is projected exterior to the apparatus and, in some embodiments, to a region 2-4 feet from a floor of a room in which the apparatus is arranged. In some cases, an apparatus includes a mobile carriage supporting the lamp and the apparatus is configured such that the lamp is not moveable beyond vertical planes aligned with a casing of the mobile carriage. Additional or alternative embodiments of apparatuses include a housing transparent to ultraviolet light surrounding the lamp and an exhaust duct extending from a gas outlet of the housing into a support structure that has an outlet disposed along its lower half portion or its bottom surface. Other embodiments of apparatuses include a pulsed ultraviolet light lamp and a sensor system to monitor and determine when to replace the pulsed lamp based on pulse count.