Patents Examined by John A. McPherson
  • Patent number: 11269256
    Abstract: A method includes providing a layered structure on a substrate, the layered structure including a bottom layer formed over the substrate, a hard mask layer formed over the bottom layer, a material layer formed over the hard mask layer, and a photoresist layer formed over the material layer, exposing the photoresist layer to a radiation source, developing the photoresist layer, where the developing removes portions of the photoresist layer and the material layer in a single step without substantially removing portions of the hard mask layer, and etching the hard mask layer using the photoresist layer as an etch mask. The material layer may include acidic moieties and/or acid-generating molecules. The material layer may also include photo-sensitive moieties and crosslinking agents.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: March 8, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: An-Ren Zi, Wei-Han Lai, Ching-Yu Chang
  • Patent number: 11249384
    Abstract: A method of manufacturing an extreme ultraviolet (EUV) lithography mask includes forming an image pattern in an absorption layer of EUV mask blank. The EUV mask blank includes: a multilayer stack including alternating molybdenum (Mo) and silicon (Si) layers disposed over a first surface of a mask substrate, a capping layer disposed over the multilayer stack, and an absorption layer disposed over the capping layer. A border region surrounds the image pattern having a trench wherein the absorption layer, the capping layer and at least a portion of the multilayer stack are etched. Concave sidewalls are formed in the border region or an inter-diffused portion is formed in the multilayer stack of the trench.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: February 15, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Pei-Cheng Hsu, Chi-Ping Wen, Tzu Yi Wang, Ta-Cheng Lien, Hsin-Chang Lee
  • Patent number: 11249396
    Abstract: A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent and a method of forming patterns using the resist underlayer composition: In Chemical Formula 1, at least one of A1 and A2 is a group represented by Chemical Formula A:
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: February 15, 2022
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Hyeon Park, Yoojeong Choi, Soonhyung Kwon, Shinhyo Bae, Jaeyeol Baek
  • Patent number: 11221556
    Abstract: Disclosed is a method for fabricating a spherical concave mirror in an optical waveguide based on ultraviolet (UV) grayscale lithography. A key component is a specially designed mask pattern composed of a rectangle as well as a semicircle adjacent to the rectangle, where a rectangular area has no grayscale distribution, and UV light penetrating through different portions of the rectangular area has the same intensity; a semicircular area has the grayscale distribution, and the UV light penetrating through the semicircular area with the grayscale distribution is changed in intensity from the center of a circle in the radius direction according to a special function distribution law; an interlayer photoresist in the rectangular area is irradiated by the UV light penetrating through a mask plate and is developed to form an optical waveguide core.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: January 11, 2022
    Assignee: SHANGHAI UNIVERSITY
    Inventors: Tingyun Wang, Chuanlu Deng, Xueting Wang, Yi Huang, Xiaobei Zhang
  • Patent number: 11221558
    Abstract: [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 100 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: January 11, 2022
    Assignee: Merck Patent GmbH
    Inventors: Hiroshi Hitokawa, Tetsumasa Takaichi, Shunji Kawato, Tomohide Katayama
  • Patent number: 11215925
    Abstract: A method of forming a resist pattern includes: a step of forming a resist film using a positive resist composition containing a solvent and a polymer including monomer units represented by the following formulae (I) and (II), respectively; an exposure step; a development step; and a step of rinsing the developed resist film using a rinsing liquid having a surface tension of 20.0 mN/m or less. In formula (I), R1 is an organic group including 3 to 7 fluorine atoms. In formula (II), R2 is a hydrogen atom, a fluorine atom, or an unsubstituted or fluorine atom-substituted alkyl group, R3 is a hydrogen atom or an unsubstituted or fluorine atom-substituted alkyl group, p and q are each an integer of 0 to 5, and p+q=5.
    Type: Grant
    Filed: January 21, 2019
    Date of Patent: January 4, 2022
    Assignee: ZEON CORPORATION
    Inventor: Manabu Hoshino
  • Patent number: 11215922
    Abstract: A method for manufacturing a color slide for an automobile projection lamp includes: forming a plurality of same color pattern units on a glass substrate, each of the color pattern units being composed of a plurality of color coating layers. The plurality of color coating layers are formed by sequentially depositing materials having different colors on a surface of the glass substrate in accordance with different colors. Finally, the glass substrate is cut and separated in unit of one color pattern unit to form an independent color slide with the color pattern. The color slide can be mounted to an automobile projection lamp system for projecting the color pattern.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: January 4, 2022
    Assignee: E-LAN CAR COMPONENTS (USA) INC.
    Inventor: Keng-Sheng Chen
  • Patent number: 11209733
    Abstract: Oxime ester compounds of the formula I, II, III, IV or V wherein Z is for example Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: December 28, 2021
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 11209582
    Abstract: Provided are a composition that has excellent pigment dispersibility without affecting the color of a pigment in a visible range, a curable composition, a cured film, a near infrared cut filter, an infrared transmitting filter; a solid image pickup element, an infrared sensor, and a camera module. The composition includes: a pigment; a pigment derivative that includes a compound represented by Formula (1); and a solvent, in which R1 and R2 represent an aryl group or the like, R3 to R6 represent a cyano group, a heteroaryl group, or the like, R7 and R8 each independently represent —BR9R10 or the like, R9 and R10 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, L represents a single bond or a linking group, X represents an acidic group or the like, m represents an integer of 1 to 10, and n represents an integer of 1 to 10.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: December 28, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Arayama, Takuya Tsuruta, Yuki Hirai, Kazutaka Takahashi, Tokihiko Matsumura, Suguru Samejima
  • Patent number: 11209734
    Abstract: Oxime ester compounds of the formula I, II, III, IV or V wherein Z is for example Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted C1-
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: December 28, 2021
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 11205571
    Abstract: There is provided a mask forming method, including: forming a photosensitive organic film on a workpiece; generating a first region and a second region in the photosensitive organic film by performing a selective exposure and a post-exposure baking on the photosensitive organic film, the first region having an acidic functional group in the photosensitive organic film, and the second region having a protective group in which the acidic functional group is protected; forming a salt in the first region by causing a basic substance to permeate into the first region using a substance staying in a gaseous state or a solid state; and removing the first region by dissolving the salt in a developer.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: December 21, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hidetami Yaegashi, Soichiro Okada
  • Patent number: 11204554
    Abstract: Oxime ester compounds of the formula I, II, III, IV or V wherein Z is for example Z1 for is NO2, unsubstituted or substituted C7-C20 aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted C1
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: December 21, 2021
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 11194251
    Abstract: A resist underlayer film-forming composition for lithography capable of being dry-etched during pattern transfer from the upper layer or during substrate processing and capable of being removed with an alkaline aqueous solution after the substrate processing. The composition includes a polymer (A) having an acrylamide structure or an acrylic acid ester structure; a polymer (B) having a blocked isocyanate structure; and a solvent (C). The polymer (A) is a polymer including a unit structure of Formula (1). The polymer (B) is a polymer including a unit structure of Formula (2). A method for manufacturing a semiconductor device includes steps for: forming a resist pattern; etching an inorganic hard mask layer with use of the resist pattern; etching a resist underlayer film with use of the pattered inorganic hard mask layer; and processing a semiconductor substrate with use of the pattered resist underlayer film.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: December 7, 2021
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryo Karasawa, Tokio Nishita, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto
  • Patent number: 11187980
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a divalent hydrocarbon group and a carboxylate, fluorine-free sulfonamide, sulfonamide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: August 27, 2019
    Date of Patent: November 30, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 11181848
    Abstract: A liquid developer containing a liquid carrier and a toner particle that is insoluble in the liquid carrier, wherein a particular substructure is bonded through a covalent bond to a surface of the toner particle, and a method of producing a liquid developer containing a liquid carrier and a toner particle that is insoluble in the liquid carrier, the method comprising a step (I) of covalently bonding, to a surface of the toner particle, a compound having a particular substructure.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: November 23, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kouichirou Ochi, Yuzo Tokunaga, Tomoyo Miyakai, Akifumi Matsubara, Takashi Hirasa, Hayato Ida, Yasutaka Akashi
  • Patent number: 11181823
    Abstract: A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: November 23, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Patent number: 11175442
    Abstract: The present disclosure provides a color filter substrate and a display panel. The color filter substrate is divided into a display region and a non-display region around the display region, and includes a base and a color filter layer on the base. The color filter layer includes a plurality of columns of color resists arranged at intervals, any two adjacent columns of color resists in the display region define one of a plurality of first openings, any two adjacent color resists in the non-display region define one of a plurality of second openings, and a width of an orthographic projection of the second opening on the base is greater than a width of an orthographic projection of the first opening on the base.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: November 16, 2021
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Chunhong Ma, Baojie Zhao, Wei Wang, Xiongwei Wang, Xiang Hui, Yan Zhao, Yanbin Zhang, Li Wang
  • Patent number: 11175580
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: November 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Patent number: 11169442
    Abstract: An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: November 9, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Patent number: 11169439
    Abstract: Provided are a coloring composition capable of producing a film with suppressed occurrence of striation, and a method for producing a film. The coloring composition includes a coloring agent A, a resin B, a polymerizable compound C, a photopolymerization initiator D, and an organic solvent E, in which the organic solvent E includes an ester-based solvent E1 having a surface tension at 25° C. of from 25 mN/m to 35 mN/m, an organic solvent E2 having a surface tension at 25° C. of less than 25 mN/m, a ratio of a mass of the ester-based solvent E1 to the mass of the organic solvent E2 is 80:20 to 30:70 in terms of the ratio of the mass of the ester-based solvent E1:the mass of the organic solvent E2, and the organic solvent E contains 50% by mass or more of a combination of the ester-based solvent E1 and the organic solvent E2 with respect to the total mass of the organic solvent E.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: November 9, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Hisamitsu Tomeba, Kaoru Aoyagi