Patents Examined by John A. McPherson
  • Patent number: 10705387
    Abstract: A substrate for a liquid crystal display device includes: a substrate; and an alignment film on the substrate, the alignment film including an alignment material of a photo alignment material and a conductive particle.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: July 7, 2020
    Assignee: LG DISPLAY CO., LTD.
    Inventors: Han-Jin Ahn, Dong-Jin Kim, Hyun-Sook Jeon
  • Patent number: 10696901
    Abstract: Provided are a method of manufacturing a liquid crystal alignment layer, a liquid crystal alignment layer manufactured by using the same, and a liquid crystal display device including the liquid crystal alignment layer. More specifically, provided are the method of manufacturing the liquid crystal alignment layer with enhanced alignment property and stability, in which a liquid crystal aligning agent is applied onto a substrate, and after drying, alignment treatment is immediately performed by light irradiation while omitting a high-temperature heat treatment process, and then the alignment-treated coating film is cured by heat treatment, thereby reducing light irradiation energy required in the process and simplifying the process by omitting the high-temperature heat treatment process before light irradiation, the liquid crystal alignment layer, and the liquid crystal display device including the same.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: June 30, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Jung Ho Jo, Hang Ah Park, Soon Ho Kwon, Hee Han, Jun Young Yoon, Hyeong Seuk Yun
  • Patent number: 10684729
    Abstract: The composition contains a compound represented by Formula 1, a binder polymer, a photopolymerization initiator, and a monomer having a carboxy group, in which the content of the compound represented by Formula 1 is 5% by mass or more and less than 50% by mass with respect to the total mass of monomer components, and in Formula 1, Q1 and Q2 each represent a (meth)acryloyloxy group, and R1 represents a divalent linking group having a chain-like structure.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: June 16, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Aridomi, Kentaro Toyooka
  • Patent number: 10678130
    Abstract: A photosensitive composition and a quantum dot-polymer composite pattern formed from the photosensitive composition are disclosed, and the photosensitive composition includes: a plurality of quantum dots; a color filter material including an absorption dye, an absorption pigment, or a combination thereof; a polymer binder; a photopolymerizable monomer having a carbon-carbon double bond; a photoinitiator; and a solvent, wherein in a normalized photoluminescence spectrum of the quantum dot and a normalized ultraviolet-visible absorption spectrum of the color filter material, a photoluminescence peak wavelength (PL peak wavelength) of the quantum dot and a wavelength of maximum absorbance of the color filter material do not overlap with each other, and the color filter material is included in an amount of less than or equal to 1 part by weight per 10 parts by weight of the plurality of quantum dots.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: June 9, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG DISPLAY CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Hyeyeon Yang, Tae Hyung Kim, Shang Hyeun Park, Shin Ae Jun, Yong Seok Han, Eun Joo Jang, Deukseok Chung
  • Patent number: 10678124
    Abstract: Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: June 9, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Xiongzhou Wei, Min Li, Qiang Xiong, Jiaqi Pang, Chao Liu, Bin Wan, Hongyu Sun, Ruilin Bi
  • Patent number: 10680177
    Abstract: The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a laser-processed pattern by irradiating a laser beam from above a base; and forming a wet-etched pattern that continues from the laser-processing pattern, by performing wet etching from above the base or from below the base on which the laser-processed pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: June 9, 2020
    Assignee: AP SYSTEMS INC.
    Inventors: Jong-Kab Park, Bo-Ram Kim, Jun-Gyu Hur, Doh-Hoon Kim
  • Patent number: 10670957
    Abstract: During reactive sputtering using a silicon-containing target, an inert gas, and a nitrogen-containing reactive gas, a hysteresis curve is drawn by sweeping the flow rate of the reactive gas, and plotting the sputtering voltage or current during the sweep versus the flow rate of the reactive gas. In the step of sputtering in a region corresponding to a range from more than the lower limit of reactive gas flow rate providing the hysteresis to less than the upper limit, the target power, the inert gas flow rate and/or the reactive gas flow rate is increased or decreased continuously or stepwise. The halftone phase shift film including a layer containing transition metal, silicon and nitrogen is improved in in-plane uniformity of optical properties.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: June 2, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuro Kosaka, Yukio Inazuki, Hideo Kaneko
  • Patent number: 10670962
    Abstract: A photosensitive composition, a quantum dot polymer composite pattern prepared therefrom, and a layered structure and an electronic device including the same. The photosensitive composition includes a quantum dot; a carboxylic acid group-containing binder; a multi-thiol compound including a thiol group at each terminal end of the multi-thiol compound; a photopolymerizable monomer including a carbon-carbon double bond; a metal oxide fine particle; a polymeric stabilizer; a photoinitiator; and a solvent, wherein the polymeric stabilizer includes a polymer including —RO—, —R1COO—, —R1OCO—, —CR1R2—CAR—, —OCONH—R—NHCOO—R?—, or a combination thereof, as a repeating unit.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: June 2, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG DSPLAY CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Shang Hyeun Park, Shin Ae Jun
  • Patent number: 10670927
    Abstract: A liquid crystal polymer composition comprising a liquid crystal, acrylic monomers including an acrylic monomer group (A) including a cyclic ring and an acrylic monomer group (B) including a chain structure or a cyclohexanol, and a photo initiator.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: June 2, 2020
    Assignee: LG Display Co., Ltd.
    Inventors: Wonjin Choi, Geesung Chae, Dongcheon Shin, Jinki Kim, Hyesun Son, Sejin Jang
  • Patent number: 10663860
    Abstract: A photosensitive composition including a quantum dot; a carboxylic acid group-containing binder; a multi-thiol compound including at least two thiol groups at its terminal ends; a photopolymerizable monomer including a carbon-carbon double bond; a metal oxide fine particle including an organic compound represented by Chemical Formula 1 or a moiety derived from the organic compound at a surface of the metal oxide fine particle; a polymeric stabilizer; a photoinitiator; and a solvent, a production method thereof, a quantum dot polymer composite prepared therefrom, and a layered structure and an electronic device including the same are disclosed: (AnSiR)4-n??Chemical Formula 1 wherein n, A, and R are the same as defined in the specification.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: May 26, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ha Il Kwon, Tae Gon Kim, Jongmin Lee, Shin Ae Jun
  • Patent number: 10663801
    Abstract: In one aspect, provided herein is a method comprising: (a) (i) determining cytolytic activity in a tumor from the subject; and/or (ii) determining genetic alterations associated with cytolytic activity in the tumor; and (b) administering an immunotherapeutic agent to the subject if (i) cytolytic activity is detected in the tumor and/or (ii) a genetic alteration associated with induction of cytolytic activity, tumor resistance to cytolytic activity and/or suppression of cytolytic activity is detected in the tumor.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: May 26, 2020
    Assignee: BOE Technology Group Co., Ltd.
    Inventor: Xin Gu
  • Patent number: 10665785
    Abstract: A method of manufacturing a mask includes attaching a first mask base substrate and a second mask base substrate to opposite sides of an adhesive layer, forming a photoresist layer on the first and second mask base substrates, exposing and developing the photoresist layer to remove the photoresist layer on effective area at centers of surfaces of the first and second mask base substrates such that the first photoresist layer remains on non-effective areas at edges of surfaces of the first mask base substrate and the second mask base substrate, etching the effective area to form a stepped groove on the first and second mask base substrates, separating the first and second mask base substrates from the adhesive layer, and forming a pattern hole in the effective area of first and second mask base substrates, each with the first stepped groove thereon.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: May 26, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Youngdae Kim, Sangjin Park, Minjae Jeong
  • Patent number: 10656446
    Abstract: Disclosed is a method for manufacturing a flat liquid crystal display device film. According to the method for manufacturing the flat liquid crystal display device film, influence of a wiring thickness on topography of array film can be reduced. Without affecting a qualified rate of a product, a low-resistance wiring can be realized, and thus an RC delay during signal transmission of a large-sized panel can be reduced. Meanwhile, when the method is applied, a metal layer with a larger thickness relative to that of a metal layer made by a conventional method can be made. Therefore, wiring load of a large-sized panel can be reduced, resistance of signal line can be reduced. RC delay can be decreased, and display quality can be improved.
    Type: Grant
    Filed: January 16, 2017
    Date of Patent: May 19, 2020
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Shouzhen Yue, Mengmeng Zhang
  • Patent number: 10649331
    Abstract: The composition includes a compound represented by Formula 1, a binder polymer, and a photopolymerization initiator, in Formula 1, Q1 and Q2 each independently represent a (meth)acryloyloxy group or a (meth)acryloyloxyalkyl group; and R1 represents a divalent hydrocarbon group.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Aridomi, Kentaro Toyooka
  • Patent number: 10641935
    Abstract: Provided are a coloring composition capable of producing a film having fewer defects generated, and the like even in a case where the coloring composition is stored for a long period of time in an environment with variations in temperature, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a heterocycle-containing coloring agent such as a compound represented by Formula (1), a phthalimide compound, a solvent, and a resin. In Formula (1), R1 to R13 each independently represent a hydrogen atom or a substituent, and adjacent groups of R1 to R8 may be bonded to each other to form a ring, provided that at least one of the pairs of adjacent two groups of R1 to R8 is bonded to each other to form an aromatic ring.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: May 5, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Naotsugu Muro, Seongmu Bak, Akiko Yoshii, Yoshinori Taguchi, Yousuke Murakami
  • Patent number: 10634999
    Abstract: There is provided a resin composition for forming a color filter underlayer film that can form a cured film having excellent solvent resistance, heat resistance, and transparency and can reduce generation of the color resist residue at the time of formation of a color filter on the cured film. The resin composition for forming a color filter underlayer film comprising: a homopolymer or a copolymer having a structure unit of Formula (1); an acid compound; a solvent; and a crosslinking agent in an amount of 0% by mass to 35% by mass based on a content of a solid content of the resin composition: (where R0 is a hydrogen atom or methyl group; R1 is a C1-6 hydrocarbon group having at least one hydroxy group as a substituent; and the C1-6 hydrocarbon group further optionally has an ether bond).
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: April 28, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Sakaguchi, Isao Adachi
  • Patent number: 10634997
    Abstract: Provided is a coloring composition capable of producing a cured film having suppressed color unevenness even in a case where the coloring composition is used after being stored for a long period of time. In addition, provided are a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a halogenated zinc phthalocyanine pigment, a maleimide compound, a curable compound other than the maleimide compound, and a solvent, in which the molecular weight of the maleimide compound is 100 to 400, and the content of the maleimide compound is 0.08 to 0.8 parts by mass with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: April 28, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Seongmu Bak, Naotsugu Muro, Yoshinori Taguchi, Akiko Yoshii, Yousuke Murakami
  • Patent number: 10620538
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: April 14, 2020
    Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 10620535
    Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: April 14, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Daisuke Hamada, Shunsuke Kitajima, Hirokazu Kyota, Kaoru Aoyagi, Mitsuji Yoshibayashi
  • Patent number: 10620526
    Abstract: A mask, a manufacturing method thereof, and a patterning method employing the mask. In the mask, a plurality of masks can be combined into one mask. The pattern area (01) of the mask is provided with a first pattern section (10) and a second pattern section (20) which are not overlapped with each other; light of a first wavelength can run through the first pattern section (10) but light of a second wavelength cannot run through the first pattern section; the light of the second wavelength can run thorough the second pattern section (20) but the light of the first wavelength cannot run through the second pattern section; and the light of the first wavelength and the light of the second wavelength can run through the non-pattern area, or any of the light of the first wavelength and the light of the second wavelength cannot run through the non-pattern area. The mask is obtained by combining a plurality of masks.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: April 14, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Zhichao Zhang, Tsung Chieh Kuo, Zheng Liu, Shoukun Wang