Patents Examined by John A. McPherson
  • Patent number: 11029600
    Abstract: A resist composition including a resin component having more than 30 mol % of a structural unit represented by formula (a0-1), and an acid generator represented by formula (b1) in which R01 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Va01 represents an alkylene group; Ra01 represents an acid dissociable group; Rb01 represents an cyclic hydrocarbon group; Lb01 represents —O—C(?O)— or —C(?O)—O—; Yb01 represents a divalent linking group or a single bond; Vb01 represents a fluorinated alkylene group; Rb02 represents a fluorine atom or a hydrogen atom; provided that the total number of fluorine atoms contained in Vb01 and Rb02 is 2 or 3; and Mm+ represents an m-valent organic cation.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 8, 2021
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehito Seo, Tomoyuki Hirano, Yuta Iwasawa, Yusuke Itagaki
  • Patent number: 11022876
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: June 1, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Vibhu Jindal
  • Patent number: 11016382
    Abstract: A mask blank including a phase shift film is provided, wherein the phase shift film has a transmittance with respect to exposure light of an ArF excimer laser of not less than 10% and not more than 20% and is configured to transmit the exposure light to have a phase difference of not less than 150 degrees and not more than 190 degrees with respect to exposure light transmitted through the air for the same distance as a thickness of the phase shift film. A ratio of the metal content to the total content of the metal and silicon in the phase shift film is not less than 5% and not more than 10%, the oxygen content in the phase shift film is 10 atom % or more, and the silicon content in the phase shift film is three times or more the oxygen content.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: May 25, 2021
    Assignee: HOYA CORPORATION
    Inventors: Atsushi Kominato, Osamu Nozawa
  • Patent number: 11016384
    Abstract: Provided are a photosensitive resin composition including (A) a photo-conversion material; (B) a binder resin including an acryl-based repeating unit including one or more thiol groups at the terminal end; (C) a photopolymerization initiator; and (D) a solvent, a photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: May 25, 2021
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jinsuop Youn, Misun Kim, Jiyoung Jeong, Obum Kwon, Jonggi Kim, Hojeong Paek, Bumjin Lee, Jihyeon Yim, Hyunjoo Han
  • Patent number: 11009739
    Abstract: Provided are a photosensitive composition capable of forming a cured film having excellent adhesiveness and pattern forming properties, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The photosensitive composition includes a photopolymerization initiator I, a polymerizable monomer M having two or more groups having an ethylenically unsaturated double bond, and a halogenated zinc phthalocyanine, in which the polymerizable monomer M contains a polymerizable monomer M1 having three groups having an ethylenically unsaturated double bond, the photopolymerization initiator I contains a photopolymerization initiator I1 having a molar light absorption coefficient at a wavelength of 365 nm of 12,000 L·mol?1·cm?1 or more, and the ratio of the mass of the photopolymerization initiator I to the mass of the polymerizable monomer M is 0.15 or less in terms of the mass of the photopolymerization initiator I/the mass of the polymerizable monomer M.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: May 18, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Shunsuke Kitajima
  • Patent number: 11009633
    Abstract: A COA substrate, a display panel, and a display device are provided. A pixel photoresist layer is arranged on a passivation layer of the COA substrate; an organic layer and a pixel electrode layer are sequentially arranged on the pixel photoresist layer; and each pixel electrode of the pixel electrode layer is configured to have a planar structure completely covering the organic layer; each planar pixel electrode is arranged with a through hole; and the through hole penetrates the pixel electrode layer.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 18, 2021
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Hongwei Du, Haoyue Du, Xianghua Jin
  • Patent number: 10989999
    Abstract: A halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon is provided. The halftone phase shift film includes at least one layer composed of a silicon base material having a transition metal content ?3 at %, a Si+N+O content ?90 at %, a Si content of 30-70 at %, a N+O content of 30-60 at %, and an O content ?30 at %, and having a sheet resistance ?1013/?/?. The halftone phase shift film undergoes minimal pattern size variation degradation upon exposure to sub-200 nm radiation, and has chemical resistance and improved processability.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: April 27, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yukio Inazuki, Takuro Kosaka, Kouhei Sasamoto, Hideo Kaneko
  • Patent number: 10990009
    Abstract: A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: April 27, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Yongsik Ahn, Yongmi Kim, Minyoung Lim
  • Patent number: 10983258
    Abstract: Disclosed are a color filter substrate, a method for fabricating the same, and a display device. The color filter substrate includes a plurality of color-resist elements, and the color filter substrate further includes: a base substrate, and a groove arranged on the base substrate in correspondence to each of the color-resist elements, wherein a size of an opening of each groove is increase from the bottom to the top, a reflecting layer is coated on an inner surface of the groove, and a color-resist filler corresponding to a color of light emitted by the color-resist element is further filled in the groove above the reflecting layer.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: April 20, 2021
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Song Yang, Ge Shi, Ming Zhu, Shiyu Zhang, Zheng Fang, Haijun Niu, Yujie Liu, Jiahui Han, Yuyao Wang
  • Patent number: 10981411
    Abstract: A method of manufacturing an image element array for a security device is disclosed.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: April 20, 2021
    Assignee: DE LA RUE INTERNATIONAL LIMITED
    Inventors: Adam Lister, Brian William Holmes
  • Patent number: 10976663
    Abstract: A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: April 13, 2021
    Assignee: KANEKA CORPORATION
    Inventors: Hirofumi Inari, Susumu Amano, Aki Kitajima, Yoshikatsu Ichiryu, Masahito Ide, Takao Manabe
  • Patent number: 10962824
    Abstract: A color filter substrate includes a light transmissive substrate, a light blocking layer, a light transmissive layer, and a color layer. The light blocking layer is formed on the light transmissive substrate. The light transmissive layer is formed along an edge of the light blocking layer on the light transmissive substrate. The color layer passes rays of visible light and is tinted a predefined color so that the rays passing therethrough exhibit a predefined color. The color layer includes a section disposed on a top surface of the light transmissive substrate in a blank area and an edge section extending from the section in the blank area over the light transmissive layer and a section of the light blocking layer. A thickness of a section of the light transmissive layer on a blank area side is less than a thickness of the light blocking layer.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: March 30, 2021
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Katsuhiro Mikumo, Junichi Morinaga, Hikaru Yoshino
  • Patent number: 10948822
    Abstract: A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: March 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masahiro Fukushima
  • Patent number: 10947403
    Abstract: A dispersion contains, as essential ingredients, light-emitting nanocrystals, a polymeric dispersant having an amine value of 5 mg/KOH g or more, and a stimulation-responsive curable material that cures in response to an external stimulus.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: March 16, 2021
    Assignee: DIC CORPORATION
    Inventors: Takeshi Isonaka, Yasuo Umezu, Hidehiko Yamaguchi, Yoshio Aoki, Hirotomo Sasaki, Sunao Yoshihara, Takayuki Miki, Aya Ishizuka, Takeo Kizaki
  • Patent number: 10948790
    Abstract: A display panel manufacturing method and display panel are provided. By forming a first spacer on a first photoresist reservation region of a light-shielding layer and forming a second spacer on a second photoresist reservation region, photoresist material required to be removed is preserved to increase material usage rate such that display panel manufacturing processes are reduced and productivity is raised.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: March 16, 2021
    Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventor: Wu Cao
  • Patent number: 10942450
    Abstract: An inorganic nanoparticles-based structure in accordance with the present disclosure includes inorganic nano-particles; and a novel ligand coordinated to a surface of each of the inorganic nano-particles, wherein the ligand has a urethane bond resulting from reaction with an isocyanate compound having a double bond, and, thus, has a double bond at terminals thereof. Further, the present disclosure provides an optical member, a light-emitting device, and a quantum dot display device including the inorganic nanoparticles-based structure.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: March 9, 2021
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Heeyeop Chae, Chang Min Lee, Hee Young Kim, Woo Suk Lee
  • Patent number: 10942451
    Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: March 9, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Daisuke Hamada, Shunsuke Kitajima, Hirokazu Kyota, Kaoru Aoyagi, Mitsuji Yoshibayashi
  • Patent number: 10942304
    Abstract: The present technology relates to a solid-state imaging element, a manufacturing method of the same, and an electronic device that achieve the extension of a dynamic range by making a difference in light-receiving sensitivity between low-sensitivity pixels and high-sensitivity pixels without changing spectral characteristics. The solid-state imaging element includes a pixel array portion in which two kinds of pixels different in light-receiving sensitivity, high-sensitivity pixels and low-sensitivity pixels are arrayed. The low-sensitivity pixels have a gray filter on or under a color filter to decrease light transmission factor in a visible-light region by a predetermined ratio. The present technology is applicable to solid-state imaging elements and the like, for example.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: March 9, 2021
    Assignee: SONY CORPORATION
    Inventors: Ami Higashitani, Nobuyuki Ohba, Yukihiro Sayama
  • Patent number: 10926571
    Abstract: A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: February 23, 2021
    Assignee: LEONHARD KURZ STIFTUNG & CO. KG
    Inventors: Ludwig Brehm, Tibor Mannsfeld, Juri Attner, Thorsten Schaller
  • Patent number: 10928730
    Abstract: A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the R1 group, and diamine monomers each having the R2 group. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having R1 group is a soft long-chain diamine monomer. R2 group comprises at least one secondary amine group or tertiary amine group.
    Type: Grant
    Filed: July 4, 2018
    Date of Patent: February 23, 2021
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Chen-Feng Yen, Shou-Jui Hsiang, Pei-Jung Wu, Szu-Hsiang Su