Abstract: The present disclosure discloses a mask plate, the mask plate includes: a substrate; a plurality of shading portions respectively arranged in intervals on a surface of the substrate; a plurality of semi-transparent portions respectively arranged against both sides of the shading portions, wherein, a transparent region between two adjacent shading portions are formed between two-adjacent-semi-transparent-portions. The present disclosure discloses a manufacturing method of a color filter substrate.

Abstract: A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.

Abstract: The present invention provides a photosensitive resin laminate in which (A) an alkali-soluble polymer, (B) a compound having an ethylenically unsaturated double bond, and (C) a photosensitive resin layer including a photopolymerization initiator are laminated on a support film. The photosensitive resin laminate is used in forming the protective film of a conductor part, the thickness of the photosensitive resin is 20 ?m or less, and the cured product of the photosensitive resin layer satisfies conditions (1) to (3): (1) the crosslink density is 1,000 mol/m3-8,000 mol/m3; (2) the peak top value of Tan ? is 0.4 or greater; and (3) the refractive index at a wavelength of 532 nm is 1.50-1.60.

Abstract: A photosensitive composition and a quantum dot-polymer composite pattern formed from the photosensitive composition are disclosed, and the photosensitive composition includes: a plurality of quantum dots; a color filter material including an absorption dye, an absorption pigment, or a combination thereof; a polymer binder; a photopolymerizable monomer having a carbon-carbon double bond; a photoinitiator; and a solvent, wherein in a normalized photoluminescence spectrum of the quantum dot and a normalized ultraviolet-visible absorption spectrum of the color filter material, a photoluminescence peak wavelength (PL peak wavelength) of the quantum dot and a wavelength of maximum absorbance of the color filter material do not overlap with each other, and the color filter material is included in an amount of less than or equal to 1 part by weight per 10 parts by weight of the plurality of quantum dots.

Abstract: The present invention relates to a black matrix mask, a method for manufacturing a black matrix, and an application thereof. The black matrix mask includes a light-shielding layer having a predetermined transmission rate and coated along an edge of a black matrix pattern of the black matrix mask. The present invention also provides methods for manufacturing a black matrix, a color filter, an array substrate, and a liquid crystal display device. The method for manufacturing the black matrix includes: Step 100: using the black matrix mask to subject a black matrix material layer on a base plate to exposure; Step 200: subjecting the exposed black matrix material layer to development; and Step 300: subjecting the developed black matrix material layer to baking to finally form a black matrix on the base plate.

Abstract: A coloring composition having excellent light fastness, color migration properties, and flatness, a colorant, and a method for producing a colorant are provided. Further, a cured film, a color filter, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and an organic electroluminescent element, each using such the coloring composition, are also provided. The coloring composition contains a colorant represented by General Formula (1) and a curable compound, and has a specific absorbance of 5 or more at a maximum absorption wavelength of 400 nm to 800 nm. R1 represents an (m+n)-valent linking group, P represents a monovalent substituent having a repeating units derived from a vinyl compound, D represents a colorant structure, and R2 and L1 each independently represent a single bond or a divalent linking group.

Abstract: An imaging device, comprising: an infrared light absorption layer including a cyanine dye represented by Chemical Formula (A) below: wherein R1 and R2 are selected from the group consisting of: a chain alkyl group, a cyclic alkyl group, a phenyl group, and a benzyl group; wherein the chain alkyl group and the cyclic alkyl group including at least one group member selected from the group consisting of: 1) a first group having one or more hydrogen atoms in a first alkyl group substituted with at least one functional group selected from the group consisting of: a halogen atom, an alkoxy group, an alkanoloxy group, an amino group, a thiol group, and a mercapto group; 2) a second group having at least one reactive group selected from the group consisting of: a vinyl group, an acrylic group, a carbonyl group, a carboxyl group, an alkenyl group, an alkenyloxy group, an alkoxycarbonyl group, a nitrile group, a carboxyl group, a carbonyl group, a sulfonyl group, a sulfamoyl group, a carbamoyl group, a benzoyloxy group

Abstract: Provided are a photomask and a method of manufacturing a color filter substrate. This belongs to the field of display technologies, and can be used to simplify manufacturing process of the color filter substrate and improve manufacturing efficiency of the color filter substrate.

Abstract: The present invention is to provide a light screening composition that allow forming of a light screening film having excellent adhesiveness to a substrate and excellent residue removability at the time of development. The light screening composition according to the invention contains (A) any one of light screening particles and a light screening dye; (B) a dispersing resin; (C) a binder polymer having an acid value of 50 mg KOH/g or less and a weight-average molecular weight of 8,000 to 50,000; and (D) a polymerizable compound.

Abstract: A method for manufacturing a structure includes, preparing a substrate with a recessed portion provided therein, attaching a film including a photosensitive resin layer containing photosensitive resin therein and a support layer to the substrate to cover the recessed portion with the photosensitive resin layer, irradiating the photosensitive resin layer covering the recessed portion with light via the support layer to form a latent image pattern on the photosensitive resin layer, heating the photosensitive resin layer at 30 degrees Celsius or higher and X degrees Celsius or lower for one minute or longer, wherein a softening point of the photosensitive resin is X degrees Celsius (X?30), separating the support layer from the photosensitive resin layer, heating the photosensitive resin layer at X+10 degrees Celsius or higher, and carrying out development on the photosensitive resin layer.

Abstract: A method of manufacturing an imprint master template including forming a first layer pattern only in a partial region and a second layer formed in the entire region, and then a back exposure process is performed.

Abstract: A display panel, a fabrication method thereof and a display device are provided. The display panel has a display region (100) and a frame region (200).

Abstract: Provided is a photosensitive resin composition including: a nanophosphor, a photopolymerization initiator, a photopolymerization compound, an antioxidant, and a solvent, in which the antioxidant includes one kind or more selected from phenol-based, phosphorus-based, and sulfur-based compounds.

Abstract: A color conversion panel according to an exemplary embodiment of the present invention includes: a substrate; a first color filter and a second color filter adjacent to the first color filter disposed on the substrate; a first color conversion layer disposed on the first color filter; and a second color conversion layer disposed on the second color filter, wherein each of the first color conversion layer and the second color conversion layer includes at least two quantum dots representing different colors, and wherein the first color filter displays a different color from the second color filter.

Abstract: A coloring composition includes Color Index Pigment Red 264, a graft resin having an acid group, a photopolymerizable compound, and a photopolymerization initiator.

Abstract: The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula I QAaBbCc??(I) where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a+b+c is 1, 2, 3, 4 or 6 where A is a group B is a group C is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.

Abstract: Compounds of the formula (I) wherein Q is a direct bond or an n-valent linking group; n is an integer 2, 3, or 4; Z is for example C1-C20alkylene, C2-C20alkenylene, C5-C8cycloalkylene or C5-C8cycloalkenylene; Y is for example C6-C20aryl or C3-C20heteroaryl; R1 is for example hydrogen, C2-C5alkenyl, C3-C8cycloalkyl, C1-C12alkyl, phenyl, naphthyl, C3-C20heteroaryl, C1-C8alkoxy, benzyloxy or phenoxy; R2 is for example C1-C20alkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C2-C12alkinyl, C3-C10cycloalkyl, phenyl or naphthyl; R15, R16, R17, R18, R19 and R20 independently of each other for example are hydrogen, halogen, C1-C20alkyl, C6-C20aryl or C4-C20heteroaryl; provided that a compound wherein R15, R16, R17, R18, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q is a direct bond and Z is n-propylene and a compound wherein R15, R16, R17, R18, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q as an n-valent linking group is methylene and Z is methylene are exclude

Abstract: A method of manufacturing a layer containing quantum dots, the layer including first regions where the quantum dots are active and second regions where the quantum dots are inactive, the method including: a) depositing on a support a first layer of a matrix containing quantum dots; b) depositing on the first layer a second resist layer; c) exposing the second layer to light through a mask delimiting the first and second regions, and then developing the resin of the second layer to remove the resin of the second layer opposite the second regions while keeping it opposite the first regions; and d) removing the resin of the second layer opposite the first regions without removing the first layer.

Abstract: The present disclosure provides a method for manufacturing a touch panel, a touch panel and a touch display device. The method for manufacturing a touch panel includes a step of forming connecting lines, black matrixes, an isolating film, a plurality of first touch electrodes and a plurality of second touch electrodes. Each of the first touch electrodes comprises a plurality of first sub-electrodes separated from each other, adjacent first sub-electrodes are bridged to each other by a corresponding connecting line, and each of the second touch electrodes is insulated from the connecting line by the isolating film. The black matrixes and the isolating film are formed by one patterning process.

Abstract: A liquid crystal polymer composition comprising a liquid crystal, acrylic monomers including an acrylic monomer group (A) including a cyclic ring and an acrylic monomer group (B) including a chain structure or a cyclohexanol, and a photo initiator.